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    • 5. 发明公开
    • HIGH-VOLTAGE DEVICE OF COMPOSITE STRUCTURE AND STARTING CIRCUIT
    • 爱尔兰VERBUNDSTRUKTUR UNLAUFSCHALTUNG的HOCHSPANNUNGSVORRICHTUNG
    • EP2765604A1
    • 2014-08-13
    • EP13840111.2
    • 2013-08-09
    • Shenzhen Sunmoon Microelectronics Co. Ltd.
    • LI, Zhaohua
    • H01L27/02H01L27/088H01L27/098H03K3/353
    • H01L29/0623H01L27/0203H01L27/085H01L29/7817H01L29/7832H01L29/7835H01L29/808H02M1/36H03K17/22
    • An embodiment of the invention provides a high voltage device with composite structure. The high voltage device with composite structure comprises a high voltage power MOS transistor HVNMOS and a JFET. The high voltage power MOS transistor HVNMOS comprises a drain, a source, a gate and a substrate, and a P-type well region Pwell as a conducting channel which is arranged between the source and the drain. The JFET comprises the drain, the source, the gate and the substrate, and an N-type well region Nwell as a conducting channel which is arranged between the source and the drain. The high voltage power MOS transistor HVNMOS and the JFET share the same drain, and the drain is processed by using N-type double diffusion process. The embodiment of the present invention further presents a starting circuit using the high voltage device with composite structure. The above solution provided by the embodiment of the present invention effectively saves the chip area and reduces the cost of the chip, due to the composite structure of the high voltage device.
    • 本发明的一个实施例提供一种具有复合结构的高压装置。 具有复合结构的高压器件包括高压功率MOS晶体管HVNMOS和JFET。 高压功率MOS晶体管HVNMOS包括漏极,源极,栅极和衬底,以及P型阱区P阱作为布置在源极和漏极之间的导电沟道。 JFET包括漏极,源极,栅极和衬底以及布置在源极和漏极之间的作为导电沟道的N型阱区Nwell。 高压功率MOS晶体管HVNMOS和JFET共享相同的漏极,并且通过使用N型双扩散处理来处理漏极。 本发明的实施例还提供了一种使用具有复合结构的高电压装置的启动电路。 由于高电压装置的复合结构,本发明实施例提供的上述方案有效地节省了芯片面积并降低了芯片的成本。
    • 6. 发明公开
    • Semiconductor device and driver circuit with an active device and isolation structure interconnected through a resistor circuit, and method of manufacture thereof
    • 半导体器件,并与活性组分的驱动电路,并且经由电阻器电路隔离结构连接和相关联的制造过程
    • EP2731144A2
    • 2014-05-14
    • EP13191777.5
    • 2013-11-06
    • Freescale Semiconductor, Inc.
    • Bode, HubertChen, WeizeDe Souza, Richard J.Parris, Patrice M.
    • H01L29/78H01L21/336H01L29/66H01L21/761
    • H01L21/761H01L29/0653H01L29/0847H01L29/0869H01L29/1083H01L29/1087H01L29/1095H01L29/66659H01L29/66689H01L29/7817H01L29/7818H01L29/782H01L29/7835
    • Embodiments of semiconductor devices and driver circuits include a semiconductor substrate (1510) having a first conductivity type, an isolation structure (including a sinker region (1522) and a buried layer (1520)), an active device (1462, 1463, 1500, 1600, 1700, 1800, 1900, 2000) within a portion (1530) of the substrate contained by the isolation structure, and a resistor circuit (1546, 1646, 1746, 1846, 1946, 2046). The buried layer is positioned below the top substrate surface (1512), and has a second conductivity type. The sinker region extends between the top substrate surface and the buried layer, and has the second conductivity type. The active device includes a body region (1534), which is separated from the isolation structure by a portion (1537) of the semiconductor substrate having the first conductivity type. The resistor circuit is connected between the isolation structure and the body region. The resistor circuit may include one or more resistor networks and, optionally, a Schottky diode (1710, 1810) and/or one or more PN diode(s) (1910, 2010) in series and/or parallel with the resistor network(s).
    • 半导体器件和驱动器电路的实施例包括具有第一导电类型,在隔离结构的半导体基片(1510)(包括下沉区(1522)和埋层(1520))到有源器件(1462,1463,1500, 1600,1700,1800,1900,2000年)由隔离结构包含在衬底的一部分(1530),和一个电阻器电路(1546,1646,1746,1846,1946,2046)内。 掩埋层位于顶表面的衬底(1512)的下方,并具有第二导电类型。 下沉区域的顶部表面与所述掩埋层基板之间延伸,并且具有第二导电类型。 所述有源器件包括从所述隔离结构由具有第一导电类型的半导体衬底的一部分(1537)分开的本体区(1534),所有。 电阻电路连接在隔离结构和本体区域之间。 电阻器电路可以包括一个或多个电阻器网络,并且任选地,一个肖特基二极管(1710,1810)和/或一个或更多个PN二极管(一个或多个)(1910,2010)(以串联和/或平行于电阻器网络小号 )。
    • 9. 发明公开
    • Junction-isolated high voltage MOS integrated device
    • 接头分离器,Hochspannungsintegriertes MOS-Bauelement。
    • EP0565808A1
    • 1993-10-20
    • EP92830190.2
    • 1992-04-17
    • SGS-THOMSON MICROELECTRONICS S.r.l.
    • Ravanelli, Enrico Maria AlfonsVilla,Flavio
    • H01L29/06
    • H01L29/7816H01L29/0696H01L29/404H01L29/7801H01L29/7817
    • An integrated device comprising isolating regions (18) of a first type of conductivity, each surrounding an epitaxial pocket (8) of an opposite type of conductivity, housing drain and source regions, and covered with an oxide layer (22a, 22b) housing gate regions (7) and over which extend the source (31), drain and gate connections. For linearizing potential distribution at the epitaxial pocket (8)- isolating region (18) junction and close to the source regions beneath the connections (31), these regions are provided with a double chain of condensers (11, 12) embedded in the oxide layer (22a, 22b) and the terminal elements (12a, 11a) and the intermediate element (11b) of which are biased to predetermined potentials (V G , ground, V D ).
    • 一种集成器件,包括隔离第一导电类型的区域(18),每个区域围绕具有相反导电类型的外延腔(8),容纳漏极和源极区域,并且覆盖有容纳栅极的氧化物层(22a,22b) 区域(7)和其上延伸源(31),漏极和栅极连接。 为了线性化外延阱(8) - 隔离区(18)结处并且靠近连接(31)下方的源极区的电位分布,这些区域设置有嵌入氧化物中的双链冷凝器(11,12) 层(22a,22b)和端子元件(12a,11a)和中间元件(11b)偏置到预定电位(VG,接地,VD)。