专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

2. 发明授权

EP3247553B1 METHOD FOR CHARACTERIZING AN ELECTRON BEAM 有权转让
公开(公告)号：EP3247553B1
公开(公告)日：2018-11-28
申请号：EP16700736.8
申请日：2016-01-15
申请人： ARCAM AB
发明人： LOCK, Tomas
IPC分类号： B29C67/00 , B23K15/00 , H01J37/30 , H01J37/304 , G01T1/29
CPC分类号： H01J37/3045 , B22F3/1055 , B22F2003/1056 , B22F2003/1057 , B23K15/0013 , B23K15/002 , B23K15/0026 , B23K15/0086 , B23K15/02 , B28B1/001 , B28B17/00 , B28B17/0081 , B29C64/153 , B29C64/20 , B29C64/386 , B33Y10/00 , B33Y30/00 , B33Y40/00 , B33Y50/02 , G01T1/295 , H01J37/09 , H01J37/244 , H01J37/30 , H01J37/3005 , H01J37/304 , H01J37/305 , H01J37/317 , H01J2237/0453 , H01J2237/2445 , H01J2237/2448 , H01J2237/24514 , H01J2237/2826 , H01J2237/30433 , H01J2237/3045 , H01J2237/30472 , H01J2237/3128 , Y02P10/295
摘要： A device for detecting X-rays radiated out of a substrate surface, said device comprising at least one X-ray detector, a resolver grating and a modulator grating, said resolver grating with at least one opening facing towards said X-ray detector is arranged in front of said X-ray detector. Said modulator grating is provided between said resolver grating and said substrate at a predetermined distance from said resolver grating and said substrate, where said modulator grating having a plurality of openings in at least a first direction, wherein said x-rays from said surface is spatially modulated with said modulator grating and resolver grating.

3. 发明授权

EP3065161B1 ELECTRON GUN, CONTROL METHOD AND CONTROL PROGRAM THEREOF, AND THREE-DIMENSIONAL SHAPING APPARATUS 失效转让
公开(公告)号：EP3065161B1
公开(公告)日：2018-11-21
申请号：EP15778595.7
申请日：2015-01-09
申请人： Technology Research Association For Future Additive Manufacturing
发明人： SATO, Takashi
IPC分类号： H01J37/06 , H01J37/04 , H01J1/13 , B29C67/00
CPC分类号： H01J37/065 , B22F3/1055 , B22F2003/1056 , B22F2003/1057 , B22F2999/00 , B33Y30/00 , H01J3/08 , H01J3/12 , H01J37/06 , H01J37/304 , H01J2237/06308 , H01J2237/0653 , Y02P10/295 , B22F2203/03 , B22F2202/06 , B22F2202/11
摘要： When an emission current is changed, a decrease in brightness of an electron beam is prevented. An electron gun includes a cathode that emits thermoelectrons, a Wehnelt electrode that focuses the thermoelectrons, a control electrode that extracts the thermoelectrons from a distal end of said cathode, an anode that accelerates the thermoelectrons and irradiates a powder with the thermoelectrons as an electron beam, and an optimum condition collection controller that changes at least one of a bias voltage to be applied to the Wehnelt electrode and a control electrode voltage to be applied to the control electrode, and decides a combination of the bias voltage and the control electrode voltage at which the brightness of the electron beam reaches a peak.

4. 发明公开

EP3047502A4 NON-INVASIVE CHARGED PARTICLE BEAM MONITOR 无效
标题翻译： NICHTINVASIVERLADUNGSTRÄGERSTRAHLMONITOR
公开(公告)号：EP3047502A4
公开(公告)日：2017-09-20
申请号：EP14846116
申请日：2014-09-16
申请人： KLA-TENCOR CORP
发明人： PLETTNER TOMAS , GERLING JOHN
IPC分类号： H01J37/22 , H01J37/244 , H01J37/28 , H01J37/304
CPC分类号： H01J37/244 , H01J37/22 , H01J37/28 , H01J37/304 , H01J2237/24485 , H01J2237/24507 , H01J2237/24535 , H01J2237/24542 , H01J2237/2482
摘要： An electromagnetic wakefield detector placed in close proximity to a design trajectory of a non-relativistic charged particle beam produces an optical signal in response to passage of the charged particle beam without interrupting the charged particle beam. A photon detector receives the optical signal and produces a corresponding output. The wakefield detector may be based on the electro optic effect. Specifically, the detector may measure the effect of the charged particle beam a beam of radiation on the phase of radiation travelling parallel to the beam in a nearby electro optic waveguide. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
摘要翻译：放置在非相对论带电粒子束的设计轨迹附近的电磁尾场检测器响应于带电粒子束的通过产生光信号而不中断带电粒子束。光子检测器接收光信号并产生相应的输出。尾场检测器可以基于电光效应。具体而言，检测器可以测量带电粒子束对辐射束的影响，该辐射束在与附近电光波导中的束平行地传播的辐射的相位上。提供此摘要是为了遵守要求摘要的规则，该摘要将允许搜索者或其他读者快速确定技术公开的主题。提交时的理解是，它不会被用来解释或限制权利要求的范围或含义。

5. 发明公开

EP3207555A1 METHODS AND APPARATUS FOR DETERMINING, USING, AND INDICATING ION BEAM WORKING PROPERTIES 有权转让
标题翻译：确定，使用和指示离子束加工性能的方法和设备
公开(公告)号：EP3207555A1
公开(公告)日：2017-08-23
申请号：EP15850466.2
申请日：2015-10-14
申请人： Hunt, John Andrew , Coyle, Steven Thomas , Hassel-Shearer, Michael Patrick , Hosman, Thijs C.
发明人： Hunt, John Andrew , Coyle, Steven Thomas , Hassel-Shearer, Michael Patrick , Hosman, Thijs C.
IPC分类号： H01J37/20
CPC分类号： H01J37/243 , G01N1/44 , H01J37/08 , H01J37/30 , H01J37/304 , H01J37/305 , H01J37/3056 , H01J37/3178 , H01J2237/081 , H01J2237/24514 , H01J2237/24535 , H01J2237/30483 , H01J2237/31 , H01J2237/3151 , H01J2237/316
摘要： Disclosed are embodiments of an ion beam sample preparation and coating apparatus and methods. A sample may be prepared in one or more ion beams and then a coating may be sputtered onto the prepared sample within the same apparatus. A vacuum transfer device may be used with the apparatus in order to transfer a sample into and out of the apparatus while in a controlled environment. Various methods to improve preparation and coating uniformity are disclosed including: rotating the sample retention stage; modulating the sample retention stage; variable tilt ion beam irradiating means, more than one ion beam irradiating means, coating thickness monitoring, selective shielding of the sample, and modulating the coating donor holder.
摘要翻译：公开了离子束样品制备和涂覆设备和方法的实施例。可以在一个或多个离子束中制备样品，然后可以在同一装置内将涂层溅射到制备的样品上。真空传输装置可以与设备一起使用，以便在受控环境中将样品传入和传出设备。公开了改进制备和涂层均匀性的各种方法，包括：旋转样品保持阶段; 调节样品保留阶段; 可变倾斜离子束照射装置，多于一个离子束照射装置，涂层厚度监测，样品的选择性屏蔽以及调节涂层供体支架。

6. 发明授权

EP1351272B1 Electron beam exposure method 有权
标题翻译：电子束曝光方法
公开(公告)号：EP1351272B1
公开(公告)日：2017-03-01
申请号：EP02017787.9
申请日：2002-08-12
申请人： Hitachi, Ltd. , CANON KABUSHIKI KAISHA , ADVANTEST CORPORATION
发明人： Ohta, Hiroya, Hitachi, Ltd., Int. Prop. Gp. , Sohda, Yasunari, Hitachi, Ltd., Int. Prop. Gp. , Saitou, Norio, Hitachi, Ltd., Int. Prop. Gp. , Yoda, Haruo, Hitachi, Ltd., Int. Prop. Gp. , Yui, Yoshikiyo , Hashimoto, Shinichi
IPC分类号： H01J37/304 , H01J37/317 , H01J37/302
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J37/304 , H01J37/3177

7. 发明公开

EP3104392A1 METHOD OF ANALYZING SURFACE MODIFICATION OF A SPECIMEN IN A CHARGED-PARTICLE MICROSCOPE 审中-公开
标题翻译：带电粒子显微镜中样品表面改性的分析方法
公开(公告)号：EP3104392A1
公开(公告)日：2016-12-14
申请号：EP16172498.4
申请日：2016-06-01
申请人： FEI Company
发明人： Potocek, Pavel , Boughorbel, Faysal , Van den Boogaard, Ron , Korkmaz, Emine
IPC分类号： H01J37/26 , G01N1/28 , H01J37/304 , H01J37/305
CPC分类号： H01J37/3005 , G01N1/286 , H01J37/20 , H01J37/244 , H01J37/26 , H01J37/304 , H01J37/3056 , H01J37/317 , H01J2237/2067 , H01J2237/221 , H01J2237/24495
摘要： A method of investigating a specimen using:
- A charged-particle microscope comprising:
▪ A specimen holder, for holding the specimen;
▪ A source, for producing a beam of charged-particle radiation;
▪ An illuminator, for directing said beam so as to irradiate a surface of the specimen;
▪ An imaging detector, for receiving a flux of radiation emanating from the specimen in response to said irradiation, so as to produce an image of at least part of said surface;
- An apparatus that can be invoked to modify said surface by performing thereon a process chosen from the group comprising material removal, material deposition, and combinations hereof,
which method comprises the following steps:
- Producing and storing a first image, of a first, initial surface of the specimen;
- In a primary modification step, invoking said apparatus so as to modify said first surface, thereby yielding a second, modified surface;
- Producing and storing a second image, of said second surface;
- Using a mathematical Image Similarity Metric to perform pixel-wise comparison of said second and first images, so as to generate a primary figure of merit for said primary modification step.
摘要翻译：一种使用以下方法研究样本的方法： - 带电粒子显微镜，包括：▪样本架，用于容纳样本; ▪产生一束带电粒子辐射的来源; ▪照射器，用于引导所述光束以照射样本的表面; ▪成像检测器，用于接收响应于所述照射而从样本发出的辐射通量，以便产生至少部分所述表面的图像; - 可以通过在其上执行从包括材料去除，材料沉积及其组合的组中选择的工艺来调用所述表面的装置，所述方法包括以下步骤： - 生成并存储第一图像，试样的初始表面; - 在主修改步骤中，调用所述设备以修改所述第一表面，由此产生第二修改表面; - 产生并存储所述第二表面的第二图像; - 使用数学图像相似度量来执行所述第二图像和第一图像的像素方式比较，以便生成所述主要修改步骤的主要品质因数。

8. 发明公开

EP3104155A1 METHOD OF ANALYZING SURFACE MODIFICATION OF A SPECIMEN IN A CHARGED-PARTICLE MICROSCOPE 审中-公开
标题翻译： VERFAHREN ZUR ANALYZE VONOBERFLÄCHENMODIFIKATIONENEINER PROBE IN EINESLADUNGSTRÄGER-MIKROSKOP
公开(公告)号：EP3104155A1
公开(公告)日：2016-12-14
申请号：EP15171227.0
申请日：2015-06-09
申请人： FEI Company
发明人： Potocek, Pavel , Boughorbel, Faysal , Van den Boogaard, Ron , Korkmaz, Emine
IPC分类号： G01N1/28 , H01J37/26 , H01J37/304 , H01J37/305
CPC分类号： H01J37/3005 , G01N1/286 , H01J37/20 , H01J37/244 , H01J37/26 , H01J37/304 , H01J37/3056 , H01J37/317 , H01J2237/2067 , H01J2237/221 , H01J2237/24495
摘要： A method of investigating a specimen using:
- A charged-particle microscope comprising:
▪ A specimen holder, for holding the specimen;
▪ A source, for producing a beam of charged-particle radiation;
▪ An illuminator, for directing said beam so as to irradiate a surface of the specimen;
▪ An imaging detector, for receiving a flux of radiation emanating from the specimen in response to said irradiation, so as to produce an image of at least part of said surface;

- An apparatus that can be invoked to modify said surface by performing thereon a process chosen from the group comprising material removal, material deposition, and combinations hereof,

which method comprises the following steps:
- Producing and storing a first image, of a first, initial surface of the specimen;
- In a primary modification step, invoking said apparatus so as to modify said first surface, thereby yielding a second, modified surface;
- Producing and storing a second image, of said second surface;
- Using a mathematical Image Similarity Metric to compare said second and first images, so as to generate a primary figure of merit for said primary modification step.
摘要翻译：一种使用以下方法研究试样的方法： - 带电粒子显微镜，其包括： - 用于保持所述试样的试样保持器; - 一种用于产生带电粒子辐射束的来源; - 一种照明器，用于引导所述光束以照射所述样本的表面; - 一种成像检测器，用于响应于所述照射从所述样本接收辐射通量，以产生所述表面的至少一部分的图像; - 可以通过在其上执行从包括材料去除，材料沉积及其组合的组中选择的工艺来调用所述表面来修饰所述表面的装置，所述方法包括以下步骤： - 制造和存储第一图像，样品的初始表面; - 在一次修改步骤中，调用所述装置以便修改所述第一表面，从而产生第二修改表面; - 生成和存储所述第二表面的第二图像; - 使用数学图像相似性度量来比较所述第二和第一图像，以便产生用于所述主要修改步骤的主要品质因数。

9. 发明公开

EP2950325A1 COMPENSATION OF DOSE INHOMOGENEITY USING OVERLAPPING EXPOSURE SPOTS 有权转让
标题翻译：用重叠曝光点补偿剂量不均匀性
公开(公告)号：EP2950325A1
公开(公告)日：2015-12-02
申请号：EP15169632.5
申请日：2015-05-28
申请人： IMS Nanofabrication AG
发明人： Platzgummer, Elmar , Reiter, Rafael
IPC分类号： H01J37/304 , H01J37/317
CPC分类号： G06F17/5072 , G06F17/5081 , H01J37/304 , H01J37/3177 , H01J2237/24535 , H01J2237/31761
摘要： An exposure pattern is computed which is used for exposing a desired pattern on a target by means of a particle beam and a blanking aperture array in a particle-optical lithography apparatus, taking into account a non-uniform current dose distribution as generated by the beam over the positions of the apertures of the blanking aperture array: From the desired pattern a nominal exposure pattern is calculated as a raster graphics comprising nominal dose values for the pixels of the raster graphics; based on a map of the current dose distribution, which correlates each aperture with a current factor describing the current dose of the beam at the location of the aperture, a compensated dose value is calculated for each pixel, by dividing its nominal dose value by the compensation factor corresponding to the current factor of the corresponding aperture(s); and for each pixel, a discrete value is determined by selecting a value from a discrete gray scale so as to approximate the compensated dose value.
摘要翻译：考虑到光束产生的非均匀电流剂量分布，计算曝光图案，该曝光图案通过粒子光学光刻设备中的粒子束和消隐光圈阵列在目标上曝光期望的图案在消隐孔径阵列的孔的位置上：根据期望的图案，标称曝光图案被计算为包括用于光栅图形的像素的标称剂量值的光栅图形; 基于当前剂量分布的图，其将每个孔与描述在孔的位置处的束的当前剂量的当前因子相关，通过将其标称剂量值除以孔的位置来计算每个像素的补偿剂量值对应于相应孔径的当前因子的补偿因子; 并且对于每个像素，通过从离散灰度级中选择一个值来确定离散值，以便近似于补偿剂量值。

10. 发明授权

EP2077574B1 METHOD OF CONTROLLING ELECTRON BEAM FOCUSING OF PIERCE TYPE ELECTRON GUN AND CONTROL DEVICE THEREFOR 有权
标题翻译：一种用于控制电子皮尔斯电子枪和对焦控制装置THEREFOR
公开(公告)号：EP2077574B1
公开(公告)日：2015-06-17
申请号：EP07830086.0
申请日：2007-10-18
申请人： ULVAC, INC.
发明人： IIJIMA, Eiichi , SHEN, Guo Hua , SATAKE, Tohru
IPC分类号： H01J37/06 , H01J37/04 , H01J3/02 , H01J37/07 , H01J37/304
CPC分类号： H01J37/07 , H01J3/026 , H01J37/06 , H01J37/304 , H01J2237/004 , H01J2237/182

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式