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1. 发明公开

EP2591490A2 CHARGED PARTICLE BEAM PROCESSING SYSTEM WITH VISUAL AND INFRARED IMAGING 有权
标题翻译：视觉和红外成像货船RAY处理系统
公开(公告)号：EP2591490A2
公开(公告)日：2013-05-15
申请号：EP11804426.2
申请日：2011-07-08
申请人： FEI Company
发明人： RUE, Chad , CROWLEY, Daniel
IPC分类号： H01J37/22 , H01J37/08 , H01J37/20 , H01J37/244
CPC分类号： G01J3/0262 , G01J3/0208 , G01J3/0278 , G01N21/9501 , G01N21/95684 , G01N2021/8825 , G01N2021/95653 , H01J37/226 , H01J37/3005 , H01J37/3056 , H01J2237/31749
摘要： A charged particle beam system for processing substrates is disclosed, comprising a charged particle column, combination infrared radiation and visible light illumination and imaging subsystems, in-vacuum optics, and a precision stage for supporting and positioning the substrate alternately under the charged particle column and the imaging system. The axes of the charged particle column and imaging system are offset to enable much closer working distances for both imaging and beam processing than would be possible in a single integrated assembly. A method for extremely accurately calibrating the offset between the column and imaging system is disclosed, enabling beam processing at precisely-determined locations on the substrate. The imaging system is capable of locating sub-surface features on the substrate which cannot be seen using the charged particle beam. Two illumination modes are disclosed, enabling both bright-field and dark-field imaging in infrared radiation and visible light.

2. 发明授权

EP2591490B1 CHARGED PARTICLE BEAM PROCESSING SYSTEM WITH VISUAL AND INFRARED IMAGING 有权
标题翻译：视觉和红外成像货船RAY处理系统
公开(公告)号：EP2591490B1
公开(公告)日：2016-02-03
申请号：EP11804426.2
申请日：2011-07-08
申请人： FEI Company
发明人： RUE, Chad , CROWLEY, Daniel
IPC分类号： H01J37/22 , H01J37/08 , H01J37/20 , H01J37/244 , G01J3/02 , G01N21/95 , G01N21/956 , H01J37/30 , H01J37/305 , G01N21/88
CPC分类号： G01J3/0262 , G01J3/0208 , G01J3/0278 , G01N21/9501 , G01N21/95684 , G01N2021/8825 , G01N2021/95653 , H01J37/226 , H01J37/3005 , H01J37/3056 , H01J2237/31749

3. 发明公开

EP2943769A1 ION IMPLANTATION TO ALTER ETCH RATE 有权
标题翻译：离子注入，以改变的刻蚀速度
公开(公告)号：EP2943769A1
公开(公告)日：2015-11-18
申请号：EP14737997.8
申请日：2014-01-10
申请人： FEI Company
发明人： FOORD, David , RUE, Chad
IPC分类号： G01N1/28 , G01N23/225
CPC分类号： H01J37/3056 , G01N1/32 , H01J37/3171 , H01J2237/31713 , H01J2237/31745 , H01J2237/31749 , Y10T428/24479
摘要： Implanting a material in a pattern hardens the material in the pattern for subsequent etching. When the region is etched, by ion beam sputtering, chemically enhanced charged particle beam etching, or chemical etching, a thicker structure remains because of the reduced etch rate of the hardened pattern. The invention is particularly useful for the preparation of thin lamella for viewing on a transmission electron microscope.

4. 发明公开

EP4394080A2 CONDENSATE PRECURSORS AND CONTAMINANT PURGE APPARATUS AND METHODS 审中-实审
公开(公告)号：EP4394080A2
公开(公告)日：2024-07-03
申请号：EP23219066.0
申请日：2023-12-21
申请人： FEI Company
发明人： WANG, Jing , RUE, Chad , BOTMAN, Aureilen Philippe Jean Maclou
IPC分类号： C23C16/48 , H01J37/317 , H01J37/26 , G01N1/42
CPC分类号： H01J37/26 , H01J37/3178 , H01J2237/00620130101 , H01J2237/3174920130101 , C23C16/486 , H01J2237/182520130101 , H01J2237/200120130101 , G01N1/42
摘要： Methods include arranging a substrate 102 in a vacuum chamber 108 of a charged particle beam microscope 100, wherein the substrate is held at a cryogenic temperature, and depositing on the substrate at the cryogenic temperature a condensate precursor 120 that is stored in a crucible 118, wherein the deposited condensate precursor forms a deposition layer 132 on the substrate.
An apparatus include a vacuum chamber configured to support a substrate, a condensate precursor system coupled to the vacuum chamber, wherein a vacuum pump is configured to draw a vacuum on a storage reservoir to reduce a vapor pressure build-up of a one or more volatile contaminants in the storage reservoir and thereby reduce a deposition of the one or more contaminants on the substrate during the condensing of the condensate precursor on the substrate. A condensate precursor can comprise a transition metal center comprising hafnium or osmium. Related deposition and cap layers are disclosed.

5. 发明公开

EP4160196A1 METHODS AND SYSTEMS FOR ELEMENTAL MAPPING 审中-实审
公开(公告)号：EP4160196A1
公开(公告)日：2023-04-05
申请号：EP22198137.6
申请日：2022-09-27
申请人： FEI Company
发明人： BUDNIK, Garrett , JIAO, Chengge , MAAZOUZ, Mostafa , OFFICER, Suzanna , GLEDHILL, Galen , RUE, Chad
IPC分类号： G01N23/2208 , G01N23/2252 , G01N23/2255
摘要： Methods and systems for imaging a sample with a charged particle microscope comprises after scanning a region of interest (ROI) of a sample with an electron beam and acquiring X-rays emitted from the sample, scanning the ROI with an ion beam and acquiring ion-induced photons emitted from the sample. A spatial distribution of multiple elements in the sample may be determined based on both the acquired X-rays and the acquired ion-induced photons.

6. 发明公开

EP3159910A1 ADAPTIVE CONTROL FOR CHARGED PARTICLE BEAM PROCESSING 审中-公开
标题翻译：带电粒子束加工的自适应控制
公开(公告)号：EP3159910A1
公开(公告)日：2017-04-26
申请号：EP15190491.9
申请日：2015-10-20
申请人： FEI Company
发明人： STRAW, Marcus , RUE, Chad , RANDOLPH, Steven , BOTMAN, Aurélien , CHANDLER, Clive , UTLAUT, Mark
IPC分类号： H01J37/302 , B28B1/00 , B33Y10/00 , C23C16/04
CPC分类号： C23C16/047 , B29C64/386 , B33Y10/00 , B33Y50/02 , H01J37/3026 , H01J37/317 , H01J2237/30455 , H01J2237/30483 , H01J2237/31749
摘要： An improved process control for a charged beam system is provided that allows the capability of accurately producing complex two and three dimensional structures from a computer generated model in a material deposition process. The process control actively monitors the material deposition process and makes corrective adjustments as necessary to produce a pattern or structure that is within an acceptable tolerance range with little or no user intervention. The process control includes a data base containing information directed to properties of a specific pattern or structure and uses an algorithm to instruct the beam system during the material deposition process. Feedback through various means such as image recognition, chamber pressure readings, and EDS signal can be used to instruct the system to make automatic system modifications, such as, beam and gas parameters, or other modifications to the pattern during a material deposition run.
摘要翻译：提供了一种改进的带电束系统的过程控制，该过程控制允许在材料沉积过程中从计算机生成的模型准确地产生复杂的二维和三维结构。过程控制主动监控材料沉积过程，并根据需要进行纠正性调整，以在很少或没有用户干预的情况下生成在可接受的公差范围内的图案或结构。过程控制包括数据库，该数据库包含针对特定模式或结构的属性的信息，并使用算法在材料沉积过程期间指示射束系统。通过图像识别，腔室压力读数和EDS信号等各种方式的反馈可用于指示系统在材料沉积运行期间对系统进行自动系统修改，例如光束和气体参数或对图案的其他修改。

7. 发明公开

EP4297060A3 METHOD OF PRODUCING MICRORODS FOR ELECTRON EMITTERS, AND ASSOCIATED MICRORODS AND ELECTRON EMITTERS 审中-实审
公开(公告)号：EP4297060A3
公开(公告)日：2024-03-06
申请号：EP23180071.5
申请日：2023-06-19
申请人： FEI Company
发明人： LIU, Kun , RUE, Chad , BAHM, Alan Stephen
IPC分类号： H01J1/304 , H01J19/24 , H01J9/02
摘要： Methods of producing microrods for electron emitters and associated microrods and electron emitters. In one example, a method of producing a microrod 560 for an electron emitter comprises providing a bulk crystal ingot, removing a first plate from the bulk crystal ingot, reducing a thickness of the first plate to produce a second plate 540, and milling the second plate to produce one or more microrods 560. In another example, a microrod 1060 for an electron emitter comprises a microrod tip region 1068 that comprises a nanoneedle 1080 that in turn comprises a nanorod 1082 and a nanoprotrusion tip 1090. The microrod and the nanoneedle are integrally formed from a bulk crystal ingot by sequentially: (i) removing the microrod from the bulk crystal ingot; (ii) coarse processing the microrod tip region to produce the nanorod; and (iii) fine processing the nanorod to produce the nanoprotrusion tip.

8. 发明授权

EP2612342B1 NAVIGATION AND SAMPLE PROCESSING USING AN ION SOURCE CONTAINING BOTH LOW-MASS AND HIGH-MASS SPECIES 有权
公开(公告)号：EP2612342B1
公开(公告)日：2018-08-22
申请号：EP11822623.2
申请日：2011-08-31
申请人： FEI Company
发明人： RUE, Chad
IPC分类号： H01J37/20 , H01J37/08 , H01J37/304 , H01J37/305
CPC分类号： H01J37/317 , H01J37/3005 , H01J37/304 , H01J37/3056 , H01J2237/0805 , H01J2237/0825 , H01J2237/30466 , H01J2237/30472 , H01J2237/31749
摘要： An improved method and apparatus for imaging and milling a substrate using a FIB system. Preferred embodiments of the present invention use a mixture of light and heavy ions, focused to the same focal point by the same beam optics, to simultaneously mill the sample surface (primarily with the heavy ions) while the light ions penetrate deeper into the sample to allow the generation of images of subsurface features. Among other uses, preferred embodiments of the present invention provide improved methods of navigation and sample processing that can be used for various circuit edit applications, such as backside circuit edit.

9. 发明公开

EP4297060A2 METHOD OF PRODUCING MICRORODS FOR ELECTRON EMITTERS, AND ASSOCIATED MICRORODS AND ELECTRON EMITTERS 审中-实审
公开(公告)号：EP4297060A2
公开(公告)日：2023-12-27
申请号：EP23180071.5
申请日：2023-06-19
申请人： FEI Company
发明人： LIU, Kun , RUE, Chad , BAHM, Alan Stephen
IPC分类号： H01J1/304 , H01J19/24 , H01J9/02
摘要： Methods of producing microrods for electron emitters and associated microrods and electron emitters. In one example, a method of producing a microrod 560 for an electron emitter comprises providing a bulk crystal ingot, removing a first plate from the bulk crystal ingot, reducing a thickness of the first plate to produce a second plate 540, and milling the second plate to produce one or more microrods 560. In another example, a microrod 1060 for an electron emitter comprises a microrod tip region 1068 that comprises a nanoneedle 1080 that in turn comprises a nanorod 1082 and a nanoprotrusion tip 1090. The microrod and the nanoneedle are integrally formed from a bulk crystal ingot by sequentially: (i) removing the microrod from the bulk crystal ingot; (ii) coarse processing the microrod tip region to produce the nanorod; and (iii) fine processing the nanorod to produce the nanoprotrusion tip.

10. 发明授权

EP2943769B1 METHOD FOR PREPARING A MICROSCOPIC STRUCTURE USING A FOCUSED ION BEAM 有权
标题翻译：用聚焦离子束制备显微结构的方法
公开(公告)号：EP2943769B1
公开(公告)日：2017-11-22
申请号：EP14737997.8
申请日：2014-01-10
申请人： FEI Company
发明人： FOORD, David , RUE, Chad
IPC分类号： H01J37/305 , H01J37/317 , G01N1/32
CPC分类号： H01J37/3056 , G01N1/32 , H01J37/3171 , H01J2237/31713 , H01J2237/31745 , H01J2237/31749 , Y10T428/24479

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