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1. 发明授权

EP2612342B1 NAVIGATION AND SAMPLE PROCESSING USING AN ION SOURCE CONTAINING BOTH LOW-MASS AND HIGH-MASS SPECIES 有权
公开(公告)号：EP2612342B1
公开(公告)日：2018-08-22
申请号：EP11822623.2
申请日：2011-08-31
申请人： FEI Company
发明人： RUE, Chad
IPC分类号： H01J37/20 , H01J37/08 , H01J37/304 , H01J37/305
CPC分类号： H01J37/317 , H01J37/3005 , H01J37/304 , H01J37/3056 , H01J2237/0805 , H01J2237/0825 , H01J2237/30466 , H01J2237/30472 , H01J2237/31749
摘要： An improved method and apparatus for imaging and milling a substrate using a FIB system. Preferred embodiments of the present invention use a mixture of light and heavy ions, focused to the same focal point by the same beam optics, to simultaneously mill the sample surface (primarily with the heavy ions) while the light ions penetrate deeper into the sample to allow the generation of images of subsurface features. Among other uses, preferred embodiments of the present invention provide improved methods of navigation and sample processing that can be used for various circuit edit applications, such as backside circuit edit.

2. 发明公开

EP2873088A4 ENDPOINTING FOR FOCUSED ION BEAM PROCESSING 审中-公开
标题翻译：离子束处理终止点确定FOCUSED
公开(公告)号：EP2873088A4
公开(公告)日：2015-08-05
申请号：EP12881505
申请日：2012-07-16
申请人： FEI CO
发明人： FULLER SCOTT EDWARD , DONALD JASON , SEEMUNTCHAIBOWORN TERMSUPT
IPC分类号： H01J37/317 , H01J37/30 , H01J37/304 , H01J37/305 , H01L21/265
CPC分类号： H01J37/317 , H01J37/22 , H01J37/28 , H01J37/3005 , H01J37/304 , H01J37/3056 , H01J2237/08 , H01J2237/24578 , H01J2237/2814 , H01J2237/30466 , H01J2237/31745 , H01J2237/31749
摘要： To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a pre-determined criterion is met.

3. 发明公开

EP2660846A4 CHARGED PARTICLE BEAM DEVICE AND METHOD OF MANUFACTURE OF SAMPLE 审中-公开
标题翻译：货运航空公司束装置及其制造方法样本
公开(公告)号：EP2660846A4
公开(公告)日：2015-01-21
申请号：EP11853766
申请日：2011-12-08
申请人： HITACHI HIGH TECH CORP
发明人： NANRI TERUTAKA , TOMIMATSU SATOSHI , AGEMURA TOSHIHIDE
IPC分类号： H01J37/317 , H01J37/22 , H01J37/244 , H01J37/28 , H01J37/304 , H01J37/305
CPC分类号： H01J37/304 , H01J37/3056 , H01J2237/2804 , H01J2237/30466 , H01J2237/31749

4. 发明公开

EP2873088A1 ENDPOINTING FOR FOCUSED ION BEAM PROCESSING 审中-公开
标题翻译：聚焦离子束加工的研究进展
公开(公告)号：EP2873088A1
公开(公告)日：2015-05-20
申请号：EP12881505.7
申请日：2012-07-16
申请人： FEI Company
发明人： FULLER, Scott Edward , DONALD, Jason , SEEMUNTCHAIBOWORN, Termsupt
IPC分类号： H01J37/317 , H01L21/265
CPC分类号： H01J37/317 , H01J37/22 , H01J37/28 , H01J37/3005 , H01J37/304 , H01J37/3056 , H01J2237/08 , H01J2237/24578 , H01J2237/2814 , H01J2237/30466 , H01J2237/31745 , H01J2237/31749
摘要： To expose a desired feature, focused ion beam milling of thin slices from a cross section alternate with forming a scanning electron image of each newly exposed cross section. Milling is stopped when automatic analysis of an electron beam image of the newly exposed cross section shows that a predetermined criterion is met.
摘要翻译：为了暴露所需的特征，来自横截面的薄片的聚焦离子束铣削交替形成每个新暴露的横截面的扫描电子图像。当新曝露的横截面的电子束图像的自动分析显示满足预定标准时停止铣削。

5. 发明公开

EP2869328A1 Differential imaging with pattern recognition for process automation of cross sectioning applications 审中-公开
标题翻译：差动成像模式识别的交叉应用过程自动化
公开(公告)号：EP2869328A1
公开(公告)日：2015-05-06
申请号：EP14190567.9
申请日：2014-10-28
申请人： FEI COMPANY
发明人： Buxbaum, Alexander
IPC分类号： H01J37/304 , H01J37/305
CPC分类号： H01J37/222 , G01N1/286 , G01N1/32 , G01N1/44 , H01J37/261 , H01J37/304 , H01J37/3056 , H01J2237/08 , H01J2237/20 , H01J2237/221 , H01J2237/226 , H01J2237/262 , H01J2237/30466 , H01J2237/31745
摘要： A method for using differential imaging for applications involving TEM samples by allowing operators to take multiple images during a procedure involving a focused ion beam procedure and overlaying the multiple images to create a differential image that clearly shows the differences between milling steps. The methods also involve generating real-time images of the area being milled and using the overlays of the differential images to show small changes in each image, and thus highlight the ion beam milling location. The methods also involve automating the process of creating differential images and using them to automatically mill subsequent slices.
摘要翻译：一种用于使用用于应用涉及TEM样品差动成像通过允许运营商涉及的聚焦离子束过程的过程期间采取的多个图像和覆盖在多个图像来创建差分图像显然没有方法示出了研磨步骤之间的差异。因此，该方法包括产生被研磨的区域的实时图像和使用该差分图像的重叠来显示每个图像中的微小变化，从而突出显示离子束研磨位置。因此，该方法涉及自动创建差分图像，并使用它们来自动磨随后切片的过程。

6. 发明公开

EP2704179A2 Dose-based end-pointing for low-kv FIB milling in TEM sample preparation 有权
标题翻译： Dissbasierte Endpunktbestimungfürdas Nieder-kV-FIB-Ätzenbei der TEM-Probenherstellung
公开(公告)号：EP2704179A2
公开(公告)日：2014-03-05
申请号：EP13182112.6
申请日：2013-08-29
申请人： FEI COMPANY
发明人： Miller, Tom , Arjavac, Jason , Moriarty, Michael
IPC分类号： H01J37/304 , H01J37/305 , H01J37/302 , G01N1/32
CPC分类号： C23F1/04 , G01N1/32 , H01J37/3023 , H01J37/3056 , H01J2237/30466 , H01J2237/31745
摘要： A method, system, and computer-readable medium for forming transmission electron microscopy sample lamellae (104) using a focused ion beam including directing a high energy focused ion beam toward a bulk volume of material; milling away the unwanted volume of material to produce an unfinished sample lamella with one or more exposed faces having a damage layer; characterizing the removal rate of the focused ion beam; subsequent to characterizing the removal rate, directing a low energy focused ion beam toward the unfinished sample lamella for a predetermined milling time to deliver a specified dose of ions per area from the low energy focused ion beam; and milling the unfinished sample lamella with the low energy focused ion beam to remove at least a portion of the damage layer (402) to produce the finished sample lamella (304) including at least a portion of the feature of interest.
摘要翻译：一种用于使用聚焦离子束形成透射电子显微镜样品薄片（104）的方法，系统和计算机可读介质，包括将高能量聚焦离子束引向体积体积的材料; 铣削不需要的体积的材料以产生具有一个或多个具有损伤层的暴露面的未完成的样品薄片; 表征聚焦离子束的去除速率; 在表征去除速率之后，将低能量聚焦离子束朝向未完成的样品层引导预定的研磨时间，以从低能量聚焦离子束输送每个面积的特定剂量的离子; 以及用低能量聚焦离子束研磨未完成的样品薄片以去除损伤层（402）的至少一部分，以产生包括感兴趣特征的至少一部分的成品样品薄片（304）。

7. 发明授权

EP1732102B1 Method and apparatus for preparing specimen 有权
标题翻译：用于制备样品的方法和装置
公开(公告)号：EP1732102B1
公开(公告)日：2013-08-28
申请号：EP06252156.2
申请日：2006-04-21
申请人： JEOL Ltd.
发明人： Yoshioka, Tadanori , Kawatsu, Kiyoshi , Miyao, Hirofumi
IPC分类号： H01J37/304 , H01J37/305 , G01N1/32
CPC分类号： G01N1/32 , H01J37/304 , H01J37/3056 , H01J2237/30466 , H01J2237/3174

8. 发明公开

EP2351062A4 MEASUREMENT AND ENDPOINTING OF SAMPLE THICKNESS 审中-公开
标题翻译：试样厚度测量和终点测定
公开(公告)号：EP2351062A4
公开(公告)日：2012-10-31
申请号：EP09824231
申请日：2009-11-02
申请人： FEI CO
发明人： YOUNG RICHARD J , PETERSON BRENNAN , MORIARTY MICHAEL , SCHAMPERS RUDOLF JOHANNES PETER GERARDUS
IPC分类号： H01J37/304 , G01N1/28 , H01J37/305
CPC分类号： H01J37/3056 , G01N1/286 , H01J37/304 , H01J2237/24455 , H01J2237/30466 , H01J2237/31745 , H01J2237/31749

9. 发明公开

EP1903596A3 Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof 有权转让
标题翻译：电子显微镜用于与微型化结构及其方法检查和处理对象
公开(公告)号：EP1903596A3
公开(公告)日：2011-01-05
申请号：EP07018076.5
申请日：2007-09-14
申请人： Carl Zeiss NTS GmbH
发明人： Bihr, Johannes , Panteleit, Friedhelm, Dr. , Clauss, Tobias , Budach, Michael
IPC分类号： H01J37/317 , H01J37/305 , H01J37/28
CPC分类号： H01J37/301 , G03F1/72 , G03F1/86 , H01J37/244 , H01J37/28 , H01J37/304 , H01J37/3056 , H01J2237/006 , H01J2237/18 , H01J2237/24475 , H01J2237/2448 , H01J2237/2449 , H01J2237/30466 , H01J2237/30472 , H01J2237/31732 , H01J2237/31744
摘要： The invention relates to a method for manufacturing an object with miniaturized structures, comprising: Processing the object by supplying reaction gas during concurrent directing an electron beam onto a location to be processed, to deposit material or ablate material; and inspecting the object by scanning the surface of the object with an electron beam and leading generated backscattered electrons and secondary electrons to an energy selector, reflecting the secondary electrons from the energy selector, detecting the backscattered electrons passing the energy selector and generating an electron microscopic image of the scanned region in dependence on the detected backscattered electrons; and examining the generated electron microscopic image and deciding whether further depositing or ablating of material should be carried out. Furthermore, the invention relates to an electron microscope and a processing system which are adapted for performing the method.

10. 发明公开

EP1332510A4 REAL TIME MONITORING FOR SIMULTANEOUS IMAGING AND EXPOSURE IN CHARGED PARTICLE BEAM SYSTEMS 有权
标题翻译：为方便系统PICTURE法同时和曝光实时监测带电粒子
公开(公告)号：EP1332510A4
公开(公告)日：2007-04-04
申请号：EP01973743
申请日：2001-09-20
申请人： FEI CO
发明人： CHAO PETER S , ROSENBERG STEVE
IPC分类号： H01J37/22 , H01J37/30 , G01Q20/04 , H01J37/304 , H01J37/317
CPC分类号： H01J37/3005 , H01J37/304 , H01J2237/30466 , H01J2237/3175
摘要： A beam processing system, such as a focused ion beam or an electron beam (232) system addressing an arbitrary series of points and receives data from the point in real time. The data can be used to image or to alter the processing, even within a single dwell period, thereby allowing closed feedback loop for processing. A delay calculator (324) automatically determines the delay between instructing the system to move the beam and detecting a signal from the work piece surface so that the detector signal can be matched with the location on the work piece (239) at which the signal was generated.

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