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1. 发明公开

EP2400524A3 Method of processing of an object 审中-公开
标题翻译：对象的处理方法
公开(公告)号：EP2400524A3
公开(公告)日：2017-06-28
申请号：EP11005111.7
申请日：2011-06-22
申请人： Carl Zeiss NTS GmbH
发明人： Biberger, Josef , Pulwey, Ralph , Paluszynski, Jaroslaw , Dönitz, Dietmar , Mathée, Hans , Steigerwald, Michael
IPC分类号： H01J37/30 , H01J37/305 , H01J37/304 , H01J37/317 , G01B15/08
CPC分类号： H01J37/3056 , G01B15/04 , H01J37/30 , H01J37/3005 , H01J37/3007 , H01J37/304 , H01J37/3174 , H01J2237/2611 , H01J2237/30455 , H01J2237/30494 , H01J2237/31722 , H01J2237/31749
摘要： A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning (103,105); determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons (107); determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations (113).
摘要翻译：一种处理物体的方法包括扫描物体表面上的粒子束并检测由于扫描而从物体出现的电子（103,105）; 基于检测到的电子，确定物体表面上的多个位置中的每一个位置处的物体的表面与预定表面之间的高度差（107）; 基于所确定的高度差确定对象的表面上的多个位置中的每一个的处理强度; 以及基于所确定的处理强度将粒子束引导至所述多个位置，以便从所述多个位置（113）处的物体上去除材料或将材料沉积在所述物体上。

2. 发明公开

EP2400524A2 Method of processing of an object 审中-公开
标题翻译：维尔法赫恩·贝尔贝通（Isbe Obbe）
公开(公告)号：EP2400524A2
公开(公告)日：2011-12-28
申请号：EP11005111.7
申请日：2011-06-22
申请人： Carl Zeiss NTS GmbH
发明人： Biberger, Josef , Pulwey, Ralph , Paluszynski, Jaroslaw , Dönitz, Dietmar , Mathée, Hans , Steigerwald, Michael
IPC分类号： H01J37/305 , H01J37/30 , H01J37/304
CPC分类号： H01J37/3056 , G01B15/04 , H01J37/30 , H01J37/3005 , H01J37/3007 , H01J37/304 , H01J37/3174 , H01J2237/2611 , H01J2237/30455 , H01J2237/30494 , H01J2237/31722 , H01J2237/31749
摘要： A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning (103,105); determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons (107); determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations (113).
摘要翻译：一种处理物体的方法包括扫描物体表面上的粒子束并检测由于扫描而从物体出射的电子（103,105）; 基于检测到的电子，确定物体表面和物体表面上的多个位置中的每一个的预定表面之间的高度差; 基于所确定的高度差来确定所述对象表面上的所述多个位置中的每一个的处理强度; 并且基于所确定的处理强度将粒子束引导到多个位置，以便在多个位置（113）处去除材料或在物体上沉积材料。

3. 发明公开

EP2575159A1 Particle beam system and method for operating the same 有权转让
标题翻译： Teilchenstrahlsystem und Verfahren zum Betreiben dieses Systems
公开(公告)号：EP2575159A1
公开(公告)日：2013-04-03
申请号：EP11007980.3
申请日：2011-09-30
申请人： Carl Zeiss NTS GmbH
发明人： Biberger, Josef , Pulwey, Ralph , Wieczorek, Volker
IPC分类号： H01J37/28 , H01J37/04 , H01J37/147 , H01J37/26
CPC分类号： H01J37/265 , H01J37/045 , H01J37/1472 , H01J37/1474 , H01J37/28 , H01J2237/043 , H01J2237/063 , H01J2237/15 , H01J2237/2487 , H01J2237/2602
摘要： A method of operating a particle beam system comprises determining a deflection amount and a deflection time of a beam deflection module connected to a data network; determining an un-blank time of a beam blanking module connected to the data network; determining a blank time of the beam blanking module connected to the data network; generating a data structure comprising plural data records, wherein each data record includes a command representing an instruction for at least one of the modules, and a command time representing a time at which the instruction is to be sent to the data network; sorting the records of the data structure by command time; generating a set of digital commands based on the data structure; and sending the digital commands of the set to the network in an order corresponding to an order of the sorted records.
摘要翻译：操作粒子束系统的方法包括确定连接到数据网络的光束偏转模块的偏转量和偏转时间; 确定连接到数据网络的波束消隐模块的非空白时间; 确定连接到数据网络的波束消隐模块的空白时间; 生成包括多个数据记录的数据结构，其中每个数据记录包括表示至少一个所述模块的指令的命令以及表示所述指令要发送到所述数据网络的时间的命令时间; 通过命令时间对数据结构的记录进行排序; 基于数据结构生成一组数字命令; 并且以与排序记录的顺序相对应的顺序将集合的数字命令发送到网络。

4. 发明公开

EP2360712A3 Particle beam system 有权转让
标题翻译：粒子束
公开(公告)号：EP2360712A3
公开(公告)日：2017-01-04
申请号：EP11001143.4
申请日：2011-02-11
申请人： Carl Zeiss NTS GmbH
发明人： Biberger, Josef , Pulwey, Ralph
IPC分类号： H01J37/04 , H01J37/24 , H01J37/26 , H01J37/317
CPC分类号： H01J37/3174 , H01J37/045 , H01J37/24 , H01J37/26 , H01J2237/0432 , H01J2237/2485 , H01J2237/28 , H01J2237/317
摘要： A particle beam system includes a particle beam source for generating a particle beam, a high voltage source, a beam blanker system with deflection plates 56, 57, and a control circuit. The control circuit provides a first current path 67 between the two deflection plates, wherein a switch 70, a node 72 connected to the high voltage source and a switch 76 are arranged in this order in the first current path starting from the deflection plate 56. The control circuit provides a second current path 85 between the deflection plate 56 and the deflection plate 57, wherein in the second current path, starting from the deflection plate 56, a series connection 88 comprising a voltage source 91 a switch 90, a node 86 connected to the high voltage source and a series connection 92 comprising a voltage source 95 and a switch 94 are arranged in this order.

5. 发明公开

EP2343726A3 Method for producing a representation of an object by means of a particle beam, as well as a particle beam device for carrying out the method 有权转让
标题翻译：一种用于通过粒子束和用于执行该方法的粒子射线的装置产生对象的表示方法
公开(公告)号：EP2343726A3
公开(公告)日：2012-07-04
申请号：EP10196658.8
申请日：2010-12-22
申请人： Carl Zeiss NTS GmbH
发明人： Biberger, Josef , Pulwey, Ralph , Draszba, Ernst , Hegele, Klaus , Niebel, Harald , Adolf, Andreas , Arnold, Rainer
IPC分类号： H01J37/153 , H01J37/28 , H01J37/22
CPC分类号： H01J37/28 , H01J37/222 , H01J2237/1536 , H01J2237/223
摘要： The invention relates to a method for producing a representation of an object by means of a particle beam. The invention also relates to a particle beam device for carrying out the method. The invention is based on the object of specifying the method and the particle beam device for producing a representation of an object such that images which are produced, in particular including FFT images, are as free as possible of artifacts which are not caused by the object to be examined. This is achieved in particular in that pixel lives, line flyback times and pixel pause times are varied in raster patterns.

6. 发明公开

EP2360712A2 Particle beam system 有权转让
标题翻译： Teilchenstrahlsystem
公开(公告)号：EP2360712A2
公开(公告)日：2011-08-24
申请号：EP11001143.4
申请日：2011-02-11
申请人： Carl Zeiss NTS GmbH
发明人： Biberger, Josef , Pulwey, Ralph
IPC分类号： H01J37/04 , H01J37/24
CPC分类号： H01J37/3174 , H01J37/045 , H01J37/24 , H01J37/26 , H01J2237/0432 , H01J2237/2485 , H01J2237/28 , H01J2237/317
摘要： A particle beam system includes a particle beam source for generating a particle beam, a high voltage source, a beam blanker system with deflection plates 56, 57, and a control circuit. The control circuit provides a first current path 67 between the two deflection plates, wherein a switch 70, a node 72 connected to the high voltage source and a switch 76 are arranged in this order in the first current path starting from the deflection plate 56. The control circuit provides a second current path 85 between the deflection plate 56 and the deflection plate 57, wherein in the second current path, starting from the deflection plate 56, a series connection 88 comprising a voltage source 91 a switch 90, a node 86 connected to the high voltage source and a series connection 92 comprising a voltage source 95 and a switch 94 are arranged in this order.
摘要翻译：粒子束系统包括用于产生粒子束的粒子束源，高压源，具有偏转板56,57和控制电路的束消除系统。控制电路在两个偏转板之间提供第一电流通路67，其中开关70，连接到高电压源的节点72和开关76以从偏转板56开始的第一电流路径依次布置。控制电路在偏转板56和偏转板57之间提供第二电流路径85，其中在偏转板56的第二电流路径中，串联连接88包括电压源91，开关90，节点86 连接到高电压源，并且包括电压源95和开关94的串联连接92按此顺序排列。

7. 发明公开

EP2343726A2 Method for producing a representation of an object by means of a particle beam, as well as a particle beam device for carrying out the method 有权转让
标题翻译：一种用于通过粒子束和用于执行该方法的粒子射线的装置产生对象的表示方法
公开(公告)号：EP2343726A2
公开(公告)日：2011-07-13
申请号：EP10196658.8
申请日：2010-12-22
申请人： Carl Zeiss NTS GmbH
发明人： Biberger, Josef , Pulwey, Ralph , Draszba, Ernst , Hegele, Klaus , Niebel, Harald , Adolf, Andreas , Arnold, Rainer
IPC分类号： H01J37/153 , H01J37/28
CPC分类号： H01J37/28 , H01J37/222 , H01J2237/1536 , H01J2237/223
摘要： The invention relates to a method for producing a representation of an object by means of a particle beam. The invention also relates to a particle beam device for carrying out the method. The invention is based on the object of specifying the method and the particle beam device for producing a representation of an object such that images which are produced, in particular including FFT images, are as free as possible of artifacts which are not caused by the object to be examined. This is achieved in particular in that pixel lives, line flyback times and pixel pause times are varied in raster patterns.
摘要翻译：本发明涉及一种用于通过粒子束来生产的物体的表示的方法。因此本发明涉及一种用于实施该方法的粒子射线装置。本发明是基于指定的方法和用于生产目标搜索的表示并包括FFT图像产生的影像，尤其是粒子射线装置的物体上，尽可能伪像的作为游离未由对象引起的要检查。这在像素particulare取得并现场表演，回扫时间和像素休息时间在网格图案的变化。

8. 发明公开

EP2437279A3 Ion beam system and method of operating an ion beam system 有权转让
标题翻译：离子束的系统和方法用于操作离子束系统
公开(公告)号：EP2437279A3
公开(公告)日：2012-12-05
申请号：EP11007981.1
申请日：2011-09-30
申请人： Carl Zeiss NTS GmbH
发明人： Biberger, Josef , Pulwey, Ralph , Adolf, Andreas
IPC分类号： H01J37/147 , H01J37/28
CPC分类号： H01J3/26 , H01J3/14 , H01J37/1477 , H01J37/28 , H01J37/317 , H01J2237/303 , H01J2237/31749
摘要： An ion beam system comprises a voltage supply system (7) and at least one beam deflector (39) having at least one first deflection electrode (51a,51b,51c) and plural second deflection electrodes (52a,52b,52c), wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation.
The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

9. 发明公开

EP2437279A2 Ion beam system and method of operating an ion beam system 有权转让
标题翻译： Ionenstrahlsystem und Verfahren zum Betrieb eines Ionenstrahlsystems
公开(公告)号：EP2437279A2
公开(公告)日：2012-04-04
申请号：EP11007981.1
申请日：2011-09-30
申请人： Carl Zeiss NTS GmbH
发明人： Biberger, Josef , Pulwey, Ralph , Adolf, Andreas
IPC分类号： H01J37/147 , H01J37/28
CPC分类号： H01J3/26 , H01J3/14 , H01J37/1477 , H01J37/28 , H01J37/317 , H01J2237/303 , H01J2237/31749
摘要： An ion beam system comprises a voltage supply system (7) and at least one beam deflector (39) having at least one first deflection electrode (51a,51b,51c) and plural second deflection electrodes (52a,52b,52c), wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation.
The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.
摘要翻译：离子束系统包括电压供应系统（7）和至少一个具有至少一个第一偏转电极（51a，51b，51c）和多个第二偏转电极（52a，52b，52c）的光束偏转器（39），其中电压供给系统被配置为向多个第二偏转电极提供不同的可调偏转电压，使得多个第二偏转电极和相对的至少一个第一偏转电极之间的电偏转场具有共同的取向。该系统具有高动能模式，其中电偏转场的分布具有较大的宽度，其中电偏转场的分布具有较小宽度的低动能模式。

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