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    • 1. 发明授权
    • Method and device for controlling pressure and flow rate
    • 用于控制压力和流量的方法和装置
    • US6131307A
    • 2000-10-17
    • US129760
    • 1998-08-05
    • Mitsuaki KominoOsamu UchisawaYasuhiro Chiba
    • Mitsuaki KominoOsamu UchisawaYasuhiro Chiba
    • H01L21/304F26B21/10F26B21/12G05B11/36G05D7/06G05D16/06G05D16/20F26B3/00
    • F26B21/10F26B21/12
    • A pressure and flow rate of a gas flowing into or out of a processing chamber are controlled, so as to decrease or increase an atmosphere in the processing chamber higher or lower than a target pressure to obtain a target pressure. During a first period, an opening speed of an opening degree adjusting device provided in an inlet pipe communicating to the processing chamber is controlled to a first target value toward a first predetermined functional approximation line (for example a function of second degree) as ideal value. During the rest of periods other than the first period, the opening speed is controlled stepwise to two or more predetermined target values so that the processing chamber reaches the target pressure. During a period before the first period, the opening speed may be controlled to a second target value among the two or more target values, based on a control amount for the opening degree adjusting device. During another period after the first period, the opening speed may be controlled toward a second predetermined functional approximation line (e.g., linear) as ideal value, which has a larger change than the first functional approximation line, until the second target value reaches the target pressure.
    • 控制流入或流出处理室的气体的压力和流量,以便降低或增加处理室中的气氛高于或低于目标压力以获得目标压力。 在第一时段期间,设置在与处理室连通的入口管中的开度调节装置的打开速度被控制为朝向第一预定功能近似线(例如第二度的函数)的第一目标值作为理想值 。 在除了第一时段之外的其余时段中,打开速度被逐步地控制到两个或更多个预定目标值,使得处理室达到目标压力。 在第一期间之前的期间,基于开度调节装置的控制量,可以将打开速度控制在两个以上目标值中的第二目标值。 在第一时段之后的另一时段期间,打开速度可以被控制为第二预定功能近似线(例如,线性)作为理想值,其具有比第一功能近似线更大的变化,直到第二目标值达到目标 压力。
    • 2. 发明授权
    • Method and system for controlling gas system
    • 控制气体系统的方法和系统
    • US6167323A
    • 2000-12-26
    • US130668
    • 1998-08-07
    • Mitsuaki KominoOsamu UchisawaYasuhiro Chiba
    • Mitsuaki KominoOsamu UchisawaYasuhiro Chiba
    • C23C16/455C23C16/52H01L21/00G05D23/00
    • H01L21/67248C23C16/455C23C16/45561C23C16/52H01L21/67017
    • Flow sensors 41 and 42 for detecting a flow load including the presence of a flow of gas are provided in supply lines 2a through 2d for supplying a given gas into a treatment chamber 6. A CPU 40 is provided for previously storing control parameters corresponding to the presence of a flow of gas. The presence of a flow of gas or a flow of IPA is detected by the flow sensors 41, 42 or an IPA supply pump 43, and detected signals are transmitted to the CPU 40. On the basis of a control signal outputted from the CPU 40, a cartridge heater 14, inner and outer tube heaters 25 and 26 and an insulation heater 52 are controlled. Thus, a control parameter adopted in accordance with the presence of a flow of gas to be used is determined, so that the control parameter previously stored in a data table 100 is selected in accordance with a control mode to control the temperature or pressure of the gas.
    • 用于检测包括气流存在的流量负载的流量传感器41和42设置在用于将给定气体供应到处理室6中的供应管线2a至2d中。CPU 40用于预先存储对应于 存在气体流。 通过流量传感器41,42或IPA供给泵43检测气体流动或IPA流的存在,并且将检测信号传送到CPU 40.基于从CPU 40输出的控制信号 ,盒式加热器14,内管加热器25和外管加热器26以及绝缘加热器52被控制。 因此,确定根据所使用的气体流的存在而采用的控制参数,使得根据控制模式选择先前存储在数据表100中的控制参数,以控制温度或压力 加油站。
    • 3. 发明授权
    • Drying processing method and apparatus using same
    • 干燥处理方法及其使用方法
    • US6134807A
    • 2000-10-24
    • US79768
    • 1998-05-15
    • Mitsuaki KominoOsamu Uchisawa
    • Mitsuaki KominoOsamu Uchisawa
    • H01L21/304H01L21/00H01L21/08F26B7/00
    • H01L21/67034
    • A drying processing apparatus for supplying a dry gas to a processing chamber 35, which houses therein semiconductor wafers W, to dry the semiconductor wafers W, including a heater 32 for heating N.sub.2 gas serving as a carrier gas; a vapor generator 34 for making IPA misty by using the N.sub.2 gas heated by the heater 32 and for heating the IPA to produce the dry gas; and a flow control element 36 for supplying a predetermined rate of N.sub.2 gas to the processing chamber 35. Thus, it is possible to improve the efficiency of heat transfer of N.sub.2 gas, and it is possible to increase the amount of produced IPA gas and decrease the time to produce IPA gas. In addition, it is possible to prevent the turbulence of atmosphere in the processing chamber 35 after the drying processing is completed.
    • 一种用于将干燥气体供给到容纳半导体晶片W的处理室35以干燥半导体晶片W的干燥处理设备,该半导体晶片W包括用于加热作为载气的N 2气体的加热器32; 蒸汽发生器34,用于通过使用由加热器32加热的N 2气体使IPA发生雾化,并加热IPA以产生干燥气体; 以及用于向处理室35提供预定速率的N 2气体的流量控制元件36.因此,可以提高N 2气体的传热效率,并且可以增加产生的IPA气体的量并减少 产生“近期行动计划”气体的时间。 此外,干燥处理完成后,可以防止处理室35内的气氛紊乱。
    • 9. 发明授权
    • Diaphragm type high pressure shut-off valve
    • 隔膜式高压截止阀
    • US5653419A
    • 1997-08-05
    • US525545
    • 1995-11-06
    • Osamu UchisawaJun Yamashima
    • Osamu UchisawaJun Yamashima
    • F16K31/163F16K31/54F16K7/11F16K31/122F16K31/16
    • F16K31/54F16K31/163
    • The invention has its object to provide a diaphragm type high pressure shut-off valve which is simple in external shape, can realize miniaturization and is convenient in handling.The shut-off valve comprises a cylindrical housing (10) having a supply unit for compressed air at its end in an axial direction (Q), a piston (19) provided in the housing (10) and adapted to reciprocate in response to the compressed air, a return spring (20) provided in the housing (10) so as to permit the piston (19) to return, a rack portion (19A) provided to extend from the piston (19), a cam pinion (17) having a pinion portion (17B) provided integrally with the pinion portion (17B) and a rotating shaft (18) supported by the housing (10), and a diaphragm (7) adapted for movement in response to displacements of stems (9,13) and abutting against the cam face portion (17A) of the cam pinion (17). As A drive mechanism and an energizing mechanism are accommodated in the single cylindrical housing, it is possible to realize adequate miniaturization and simplification to thereby contribute to reduction of the number of parts.
    • PCT No.PCT / JP94 / 00457 Sec。 371日期:1995年11月6日 102(e)日期1995年11月6日PCT 1994年3月22日PCT公布。 公开号WO94 / 21951 日期:1994年9月29日本发明的目的是提供一种外形简单的隔膜式高压截止阀,可实现小型化,便于处理。 截止阀包括圆柱形壳体(10),其具有在轴向方向(Q)的端部处的压缩空气供应单元,设置在壳体(10)中的活塞(19),并且适于响应于 压缩空气,设置在所述壳体(10)中以使活塞(19)返回的复位弹簧(20);设置成从活塞(19)延伸的齿条部分(19A),凸轮小齿轮(17) 具有与所述小齿轮部分(17B)一体地设置的小齿轮部分(17B)和由所述壳体(10)支撑的旋转轴(18),以及适于响应于杆的位移而运动的隔膜(9,13) )并与凸轮小齿轮(17)的凸轮面部(17A)抵接。 由于驱动机构和通电机构容纳在单个圆柱形壳体中,所以可以实现足够的小型化和简化,从而有助于减少零件数量。
    • 10. 发明授权
    • Vaporizer for MOCVD and method of vaporizing raw material solutions for MOCVD
    • 用于MOCVD的蒸发器和用于MOCVD的原料溶液的蒸发方法
    • US07744698B2
    • 2010-06-29
    • US10310578
    • 2002-12-05
    • Masayuki TodaMasaki KusuharaMikio DoiMasaru UmedaMitsuru FukagawaYoichi KannoOsamu UchisawaKohei YamamotoToshikatu Meguro
    • Masayuki TodaMasaki KusuharaMikio DoiMasaru UmedaMitsuru FukagawaYoichi KannoOsamu UchisawaKohei YamamotoToshikatu Meguro
    • C23C16/00
    • C23C16/4486C23C16/409
    • Disclosed is a vaporizer constituted of a dispersing section 8 and a vaporizing section 22. The dispersing section 8 comprises a gas introduction port 4 for introducing a carrier gas 3 under pressure into a gas passage, means for feeding raw material solutions 5a and 5b to the gas passage, and a gas outlet 7 for delivering the carrier gas containing the raw material solutions to the vaporizing section 22. The vaporizing section 22 comprises a vaporizing tube 20 having one end connected to a reaction tube of the MOCVD system and having the other end connected to the gas outlet 7 of the dispersing section 8, and heating means for heating the vaporizing tube 20. The vaporizing section 22 serves to heat and vaporize the raw material solution containing carrier gas 3 delivered from the dispersing section 8. The dispersing section 8 includes a dispersing section body 1 having a cylindrical hollow portion, and a rod 10 having an outer diameter smaller than the inner diameter of the cylindrical hollow portion. The rod 10 has a spiral groove 60 formed in the external periphery closer to the vaporizing section 22, the rod i0 being inserted into the cylindrical hollow portion.
    • 公开了由分散部8和蒸发部22构成的蒸发器。分散部8包括用于将载气3在压力下导入气体通道的气体导入口4,将原料溶液5a,5b供给到 气体通道和用于将含有原料溶液的载气输送到汽化部分22的气体出口7.蒸发部分22包括蒸发管20,其一端连接到MOCVD系统的反应管,并具有另一端 连接到分散部8的气体出口7,以及用于加热蒸发管20的加热装置。蒸发部22用于加热和蒸发从分散部8输送的含有载气3的原料溶液。分散部8 包括具有圆柱形中空部分的分散部分主体1和具有小于圆柱形内径的外径的杆10 l中空部分。 杆10具有形成在更靠近蒸发部22的外周中的螺旋槽60,杆i0插入到圆筒形中空部中。