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1. 发明授权

US5912726A Projection exposure apparatus and method having a positional deviation detection system that employs light from an exposure illumination system 失效
标题翻译：具有使用来自曝光照明系统的光的位置偏差检测系统的投影曝光装置和方法
公开(公告)号：US5912726A
公开(公告)日：1999-06-15
申请号：US922598
申请日：1997-09-03
申请人： Manabu Toguchi , Kei Nara , Masaichi Murakami , Nobutaka Fujimori , Toshio Matsuura
发明人： Manabu Toguchi , Kei Nara , Masaichi Murakami , Nobutaka Fujimori , Toshio Matsuura
IPC分类号： G03B27/32 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , G03B27/42 , G03B27/54
CPC分类号： G03F9/7026 , G03F7/70241 , G03F7/70275
摘要： A projection exposure apparatus includes an illumination optical system for illuminating a plurality of partial areas on a mask. A plurality of projection optical systems each project images of the partial areas thus illuminated onto a photosensitive substrate. A mask table holds the mask. A position detector detects a position of the mask table. A substrate table holds the photosensitive substrate. A plurality of first reference marks are provided on the mask table; each of the plurality of first reference marks are disposed at a position corresponding to each of the plurality of projection optical systems. A plurality of second reference marks are provided on the substrate table; the second reference marks are substantially conjugate with the first reference marks with respect to the projection optical systems and are in a predetermined positional relation with the first reference marks in in-plane directions of the mask and the photosensitive substrate. A positional deviation detector detects positional deviations between the first reference marks and second reference marks when light beams from the illumination optical system are radiated onto the plurality of first reference marks to project the plurality of first reference marks through the projection optical systems onto the plurality of second reference marks. A correcting device corrects imaging characteristics of the projection optical systems, based on the positional deviations. The first reference marks can comprise a single aperture of a plurality of apertures. A reverse-type aperture may be employed. The positional deviation detector may include a single photodetector or a plurality of photodetectors.
摘要翻译：投影曝光装置包括用于照亮掩模上的多个部分区域的照明光学系统。多个投影光学系统各自投影如此照射到感光基片上的部分区域的图像。掩模台保持面具。位置检测器检测掩模台的位置。基板台保持感光基板。多个第一参考标记设置在掩模台上; 多个第一参考标记中的每一个被布置在与多个投影光学系统中的每一个对应的位置处。多个第二参考标记设置在衬底台上; 第二参考标记与第一参考标记相对于投影光学系统基本共轭，并且与掩模和感光基板的面内方向上的第一参考标记处于预定的位置关系。当将来自照明光学系统的光束照射到多个第一参考标记上时，位置偏差检测器检测第一参考标记和第二参考标记之间的位置偏差，以将多个第一参考标记通过投影光学系统突出到多个第二个参考标记。校正装置基于位置偏差校正投影光学系统的成像特性。第一参考标记可以包括多个孔的单个孔。可以采用反向孔径。位置偏差检测器可以包括单个光电检测器或多个光电检测器。

2. 依法登记的发明

USH1733H Exposure method 失效
标题翻译：曝光方法
公开(公告)号：USH1733H
公开(公告)日：1998-06-02
申请号：US539986
申请日：1995-10-06
申请人： Kei Nara , Masaichi Murakami , Nobutaka Fujimori
发明人： Kei Nara , Masaichi Murakami , Nobutaka Fujimori
IPC分类号： G03F7/20 , G03B27/32 , G03F9/00 , H01L21/027
CPC分类号： G03F9/70
摘要： An exposure method for transferring a pattern on a mask onto a photosensitive substrate. The exposure method has steps of (1) preparing the mask with a first alignment mark and the substrate with a second alignment mark, a length of the first alignment mark in a scan direction being shorter than a length of the second alignment mark in the same direction; (2) scanning the first and second alignment marks; (3) detecting an intensity of the light which has been emitted from the light source optical system and irradiated the mask and the substrate; (4) calculating an amount of dislocation between the first and second alignment marks in the scan direction; (5) correcting the dislocation between the mask and the substrate; (6) effecting an exposure to transfer the pattern on the mask onto the substrate.
摘要翻译：用于将掩模上的图案转印到感光基板上的曝光方法。曝光方法具有以下步骤：（1）制备具有第一对准标记的掩模和具有第二对准标记的基板，第一对准标记在扫描方向上的长度短于其中的第二对准标记的长度方向; （2）扫描第一和第二对准标记; （3）检测从光源光学系统发射的光的强度并照射掩模和基板; （4）计算扫描方向上的第一和第二对准标记之间的位错量; （5）校正掩模和基板之间的位错; （6）进行曝光以将掩模上的图案转印到基板上。

3. 发明授权

US06873400B2 Scanning exposure method and system 有权
标题翻译：扫描曝光方法和系统
公开(公告)号：US06873400B2
公开(公告)日：2005-03-29
申请号：US09772907
申请日：2001-01-31
申请人： Masaichi Murakami , Masaki Kato , Katsuya Machino , Manabu Toguchi
发明人： Masaichi Murakami , Masaki Kato , Katsuya Machino , Manabu Toguchi
IPC分类号： H01L21/027 , G03F7/20 , G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70066 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： It is an object of the present invention to smoothly join divided patterns adjacent to each other in a synchronous moving direction when a mask and a substrate are moved in synchronization, and the divided patterns are joined and picture-synthesized on the substrate. According to the invention, when the mask and the substrate are moved in synchronization with respect to irradiation with an exposing light, the divided patterns of the mask are projected on the substrate, and a plurality of divided patterns adjacent on the substrate are joined and exposed, the divided patterns adjacent to each other in the synchronous moving direction partially overlap each other.
摘要翻译：本发明的一个目的是在掩模和衬底同步移动的同时沿同步移动方向平滑地连接彼此相邻的分割图案，并且分割的图案在衬底上被接合和图像合成。根据本发明，当掩模和衬底相对于曝光光的照射同步地移动时，掩模的划分图案被投射在衬底上，并且在衬底上相邻的多个分割图案被接合并暴露在同步移动方向上彼此相邻的分割图案部分地重叠。

4. 发明授权

US5442418A Exposure method 失效
标题翻译：曝光方法
公开(公告)号：US5442418A
公开(公告)日：1995-08-15
申请号：US318521
申请日：1994-10-05
申请人： Masaichi Murakami , Muneyasu Yokota , Toshio Matsuura , Atsuyuki Aoki
发明人： Masaichi Murakami , Muneyasu Yokota , Toshio Matsuura , Atsuyuki Aoki
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , G03B27/42
CPC分类号： G03F7/70475 , G03F7/70241 , G03F7/706 , G03F9/70
摘要： Prior to exposures, the imaging characteristics of a projection optical system to be used are determined by measuring the positions of plural projection points (evaluation points) within the projection area, on a photosensitive substrate, of the projection optical system. Then the positional aberrations between the evaluation points are determined in the area of image superposition or jointing, and correcting parameters are determined so as to minimize at least the component of the aberrations in a direction, perpendicular to an extending direction patterns of a reticle. The reticle or the photosensitive substrate is rotated or shifted according to thus determined correcting parameters. This exposure method achieves the superposition or jointing of patterns, or the superposition of the jointed parts thereof, in optimum manner, according to the structure (directionality) of the patterns or the imaging characteristics of the projection optical system employed.
摘要翻译：在曝光之前，通过测量投影光学系统的感光基板上的投影区域内的多个投影点（评价点）的位置来确定投影光学系统的成像特性。然后，在图像叠加或接合的区域中确定评估点之间的位置像差，并且确定校正参数，使得至少垂直于光罩的延伸方向图案的方向上的像差的分量至少最小化。掩模版或感光基片根据如此确定的校正参数旋转或移动。根据所使用的投影光学系统的图案的结构（方向性）或成像特性，该曝光方法以最佳方式实现图案的叠合或连接，或其连接部分的叠合。

5. 发明授权

US06356341B1 Exposure device, beam shape setting device and illuminating area setting device 失效
标题翻译：曝光装置，光束形状设定装置及照明区域设定装置
公开(公告)号：US06356341B1
公开(公告)日：2002-03-12
申请号：US09334260
申请日：1999-06-16
申请人： Masaichi Murakami , Norimi Takemura , Noritsugu Hanazaki
发明人： Masaichi Murakami , Norimi Takemura , Noritsugu Hanazaki
IPC分类号： G03B2754
CPC分类号： G03F7/70066 , G03B27/54
摘要： The present invention has an objective to prevent images of particles from being transferred onto a photosensitive substrate, so in order to achieve such an objective, an exposure device of the present invention, which has an illumination optical system for illuminating a reticle having a pattern with a beam from an illumination source so that the pattern is formed on the substrate on exposure to light, is equipped with illuminating area setting means, which are arranged at two locations within the illumination optical system so as to set an illuminating area of the beam illuminating the reticle, and an optical system which places the illuminating area setting means being conjugate to the reticle.
摘要翻译：本发明的目的是防止颗粒的图像转印到感光基板上，因此为了实现这一目的，本发明的曝光装置具有用于照亮具有图案的图案的照明光学系统来自照明源的光束使得图案在曝光时在基板上形成，配备有照明区域设定装置，其布置在照明光学系统内的两个位置处，以设置照射光束的照明区域光罩，以及将照明区域设定装置与掩模版共轭的光学系统。

6. 发明授权

US5920378A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5920378A
公开(公告)日：1999-07-06
申请号：US853389
申请日：1997-05-09
申请人： Masaichi Murakami , Hiroshi Shirasu , Tomohide Hamada , Kazuaki Saiki , Susumu Mori
发明人： Masaichi Murakami , Hiroshi Shirasu , Tomohide Hamada , Kazuaki Saiki , Susumu Mori
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70691 , G03F7/70791 , G03F9/70
摘要： A projection exposure apparatus includes off-axis type plate alignment systems which make it possible to reduce alignment time and thereby increase throughput. Exposure of large photosensitive plates is made possible without increasing the length of the plate stage stroke. Multiple fiducial mark members including fiducial mark members in different positions on a plate stage are utilized. Multiple off-axis type plate alignment systems are used to observe the multiple fiducial marks.
摘要翻译：投影曝光装置包括离轴型板对准系统，其能够缩短对准时间，从而提高生产量。大型感光板的曝光是可能的，而不会增加平板台面行程的长度。使用了多个基准标记，其中包括在平台上不同位置的基准标记成员。多个离轴型板对准系统用于观察多个基准标记。

7. 发明授权

US4679942A Method of aligning a semiconductor substrate and a photomask 失效
标题翻译：对准半导体衬底和光掩模的方法
公开(公告)号：US4679942A
公开(公告)日：1987-07-14
申请号：US703941
申请日：1985-02-21
申请人： Kyoichi Suwa , Hidemi Kawai , Masaichi Murakami
发明人： Kyoichi Suwa , Hidemi Kawai , Masaichi Murakami
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/7092 , G03F9/7023 , G03F9/7076
摘要： This specification discloses an alignment method for aligning a photomask with a substrate covered with a photosensitive layer and printing the pattern of the photomask on the substrate. The method comprises the steps of providing a reference mark on the photomask, providing on the substrate a pair of alignment marks correlated to the reference mark, the pair of alignment marks being spaced apart from each other by a predetermined distance in a mark area, one of the pair of alignment marks being formed projectedly relative to the surroundings thereof and the other alignment mark being formed as a depression relative to the surroundings thereof, providing the photosensitive layer on the substrate so that the outermost surface of the layer is substantially flat, and imaging the reference mark and the pair of alignment marks superposedly on an imaging plane by a light having a single wavelength. The specification also discloses a photomask and an apparatus for executing such method.
摘要翻译：本说明书公开了一种用于将光掩模与被感光层覆盖的基板对准并将光掩模的图案印刷在基板上的对准方法。该方法包括以下步骤：在光掩模上提供参考标记，在基板上提供与参考标记相关的一对对准标记，该对对准标记在标记区域中彼此间隔开预定距离，一个对准标记一对对准标记相对于其周围突出地形成，另一个对准标记相对于其周围形成为凹陷，在基板上提供感光层，使得该层的最外表面基本上平坦，以及通过具有单一波长的光将参考标记和一对对准标记叠加在成像平面上。本说明书还公开了一种光掩模和用于执行这种方法的装置。

8. 发明授权

US4741622A Method and apparatus for detecting diversion 失效
标题翻译：检测转移的方法和装置
公开(公告)号：US4741622A
公开(公告)日：1988-05-03
申请号：US835526
申请日：1986-03-03
申请人： Kyoichi Suwa , Masaichi Murakami
发明人： Kyoichi Suwa , Masaichi Murakami
IPC分类号： H01L21/30 , G03F7/20 , G03F9/00 , G06F3/03 , G06F3/033 , H01L21/027 , H01L21/67 , H01L21/68 , G01B11/27
CPC分类号： G03F9/70 , G03F7/70066
摘要： A method of detecting a registration diversion between a mask and a wafer prior to a main exposure. This method detects relative diversions between marks on the wafer and latent images of marks on the mask formed on a photosensitive layer of the wafer. The latent images of the marks on the mask are preliminarily formed on the photosensitive layer of the wafer by an exposure energy beam prior to the main exposure.
摘要翻译：一种在主曝光之前检测掩模和晶片之间的配准转移的方法。该方法检测晶片上的标记之间的相对转移以及形成在晶片的感光层上的掩模上的标记的潜像。通过在主曝光之前的曝光能量束，在晶片的感光层上预先形成掩模上的标记的潜像。

9. 发明授权

US5486896A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5486896A
公开(公告)日：1996-01-23
申请号：US195192
申请日：1994-02-14
申请人： Junji Hazama , Masamitsu Yanagihara , Hideji Goto , Masaichi Murakami
发明人： Junji Hazama , Masamitsu Yanagihara , Hideji Goto , Masaichi Murakami
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/70058 , G03F7/70475
摘要： An exposure apparatus adapted for use in manufacture of semiconductor devices or substrates for liquid crystal display panels, comprises an illumination systems for irradiating a first object with a light beam from a light source; a projection optical system for projecting the image of a pattern on the first object, illuminated by the light beam, onto a second object; and a light attenuation device provided in the illumination system and adapted to gradually decrease the amount of light in the peripheral portion of the image of the pattern, projected onto the second object, as the distance from the center of the image increases.
摘要翻译：适用于制造液晶显示面板的半导体器件或衬底的曝光装置包括用于从光源照射第一物体的照明系统; 投影光学系统，用于将由光束照射的第一物体上的图案的图像投影到第二物体上; 以及光照射装置，其设置在所述照明系统中，并且适于随着距离图像中心的距离增加而逐渐减小投射到第二物体上的图案的图像的周边部分中的光量。

10. 发明授权

US4860374A Apparatus for detecting position of reference pattern 失效
标题翻译：用于检测参考图案位置的装置
公开(公告)号：US4860374A
公开(公告)日：1989-08-22
申请号：US218503
申请日：1988-07-06
申请人： Seiro Murakami , Akikazu Tanimoto , Susumu Makinouchi , Hidemi Kawai , Masaichi Murakami
发明人： Seiro Murakami , Akikazu Tanimoto , Susumu Makinouchi , Hidemi Kawai , Masaichi Murakami
IPC分类号： G03F9/00 , G06K9/46
CPC分类号： G03F9/70 , G06K9/4609
摘要： An apparatus for detecting a position of a reference pattern or mark formed in a substrate to be aligned with a photomask pattern performs the following functions: scanning a reference pattern having at least two edges and generating a time-serial pattern signal corresponding to the scanned pattern; extracting all scanning positions at which a waveform of the pattern signal has a shape corresponding to an edge of the pattern within a predetermined scanning range including the pattern; selecting one pair from all possible pairs of a plurality of extracted scanning positions in accordance with a degree to which a pattern signal between the two scanning positions defined by each pair satisfies predetermined waveform conditions; and determining as a pattern position a predetermined position at which the interval between the two scanning positions of the selected pair is divided into two intervals by a predetermined ratio.
摘要翻译：用于检测形成在衬底中的与光掩模图案对准的参考图案或标记的位置的装置执行以下功能：扫描具有至少两个边缘的参考图案，并产生与扫描图案对应的时间序列图案信号 ; 提取在包括图案的预定扫描范围内图案信号的波形具有与图案的边缘相对应的形状的所有扫描位置; 根据由每对定义的两个扫描位置之间的图案信号满足预定波形条件的程度，从多个提取的扫描位置的所有可能的对中选择一对; 并且将所选择的对的两个扫描位置之间的间隔被划分成两个间隔预定比例的预定位置作为图案位置。

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