专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US4704020A Projection optical apparatus 失效
标题翻译：投影光学仪器
公开(公告)号：US4704020A
公开(公告)日：1987-11-03
申请号：US903500
申请日：1986-09-04
申请人： Masaichi Murakami , Hidemi Kawai , Kyoichi Suwa
发明人： Masaichi Murakami , Hidemi Kawai , Kyoichi Suwa
IPC分类号： H01L21/30 , G03F9/00 , H01L21/027 , H01L21/66 , H01L21/67 , G01B11/26
CPC分类号： G03F9/7023
摘要： A projection optical apparatus for projecting the pattern of a mask onto a substrate through a projection optical system includes a stage for supporting thereon a substrate having a plurality of marks for detection on the surface thereof, first detecting means for detecting the amount of inclination of the surface of the substrate relative to the surface on which the pattern is projected and imaged, through the projection optical system, second detecting means for detecting the amount of inclination of the surface of the substrate relative to a predetermined reference plane independently of the projection optical system, and calibrating means for calibrating the amount of inclination detected by the second detecting means on the basis of the amount of inclination detected by the first detecting means.
摘要翻译：一种用于通过投影光学系统将掩模的图案投影到基板上的投影光学装置包括：用于在其上表面支撑具有多个用于检测的标记的基板的台，用于检测其上的倾斜量的第一检测装置通过投影光学系统相对于图案投射和成像的表面的基板的表面，用于独立于投影光学系统检测基板相对于预定参考平面的表面的倾斜量的第二检测装置以及校准装置，用于基于由第一检测装置检测到的倾斜量来校准由第二检测装置检测到的倾斜量。

2. 发明授权

US4679942A Method of aligning a semiconductor substrate and a photomask 失效
标题翻译：对准半导体衬底和光掩模的方法
公开(公告)号：US4679942A
公开(公告)日：1987-07-14
申请号：US703941
申请日：1985-02-21
申请人： Kyoichi Suwa , Hidemi Kawai , Masaichi Murakami
发明人： Kyoichi Suwa , Hidemi Kawai , Masaichi Murakami
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/7092 , G03F9/7023 , G03F9/7076
摘要： This specification discloses an alignment method for aligning a photomask with a substrate covered with a photosensitive layer and printing the pattern of the photomask on the substrate. The method comprises the steps of providing a reference mark on the photomask, providing on the substrate a pair of alignment marks correlated to the reference mark, the pair of alignment marks being spaced apart from each other by a predetermined distance in a mark area, one of the pair of alignment marks being formed projectedly relative to the surroundings thereof and the other alignment mark being formed as a depression relative to the surroundings thereof, providing the photosensitive layer on the substrate so that the outermost surface of the layer is substantially flat, and imaging the reference mark and the pair of alignment marks superposedly on an imaging plane by a light having a single wavelength. The specification also discloses a photomask and an apparatus for executing such method.
摘要翻译：本说明书公开了一种用于将光掩模与被感光层覆盖的基板对准并将光掩模的图案印刷在基板上的对准方法。该方法包括以下步骤：在光掩模上提供参考标记，在基板上提供与参考标记相关的一对对准标记，该对对准标记在标记区域中彼此间隔开预定距离，一个对准标记一对对准标记相对于其周围突出地形成，另一个对准标记相对于其周围形成为凹陷，在基板上提供感光层，使得该层的最外表面基本上平坦，以及通过具有单一波长的光将参考标记和一对对准标记叠加在成像平面上。本说明书还公开了一种光掩模和用于执行这种方法的装置。

3. 发明授权

US4806987A Projection-exposing apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US4806987A
公开(公告)日：1989-02-21
申请号：US135377
申请日：1987-12-21
申请人： Takashi Mori , Koichi Matsumoto , Tsutomu Takai , Masaichi Murakami , Kyoichi Suwa
发明人： Takashi Mori , Koichi Matsumoto , Tsutomu Takai , Masaichi Murakami , Kyoichi Suwa
IPC分类号： H01L21/30 , G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70475
摘要： A projection-exposing apparatus comprises a projecting optical system for projecting an image of a reticle having a predetermined pattern onto a wafer, and a stage for causing a relative shifting movement between a position of the wafer and a position of the reticle. A first exposure is effected for projecting and exposing the reticle image pattern from the projection optical system in a first area on the wafer and then the stage is shifted by a predetermined amount to effect second exposure for projecting and exposing the reticle image pattern in a second area positioned adjacent to the first area on the wafer thereby the reticle image being projected and exposed onto different areas on the same wafer. The stage causes the relative shifting movement between the reticle and the wafer in such a manner that the reticle image pattern obtained by the first exposure and the reticle image pattern obtained by the second exposure are overlapped with each other on the wafer by a predetermined amount.
摘要翻译：投影曝光装置包括投影光学系统，用于将具有预定图案的掩模版的图像投影到晶片上，以及用于在晶片的位置和光罩之间进行相对移动的台。进行第一曝光以在晶片上的第一区域中投影和曝光来自投影光学系统的标线片图像图案，然后将该台移动预定量，以进行第二次曝光，以在第二曝光中投影和曝光标线图像图案区域定位成与晶片上的第一区域相邻，从而掩模版图像被投影并暴露在同一晶片上的不同区域上。该阶段以这样的方式引起标线片和晶片之间的相对移动运动，使得通过第一曝光获得的标线图像图案和通过第二次曝光获得的标线图像图案在晶片上彼此重叠预定量。

4. 发明授权

US4741622A Method and apparatus for detecting diversion 失效
标题翻译：检测转移的方法和装置
公开(公告)号：US4741622A
公开(公告)日：1988-05-03
申请号：US835526
申请日：1986-03-03
申请人： Kyoichi Suwa , Masaichi Murakami
发明人： Kyoichi Suwa , Masaichi Murakami
IPC分类号： H01L21/30 , G03F7/20 , G03F9/00 , G06F3/03 , G06F3/033 , H01L21/027 , H01L21/67 , H01L21/68 , G01B11/27
CPC分类号： G03F9/70 , G03F7/70066
摘要： A method of detecting a registration diversion between a mask and a wafer prior to a main exposure. This method detects relative diversions between marks on the wafer and latent images of marks on the mask formed on a photosensitive layer of the wafer. The latent images of the marks on the mask are preliminarily formed on the photosensitive layer of the wafer by an exposure energy beam prior to the main exposure.
摘要翻译：一种在主曝光之前检测掩模和晶片之间的配准转移的方法。该方法检测晶片上的标记之间的相对转移以及形成在晶片的感光层上的掩模上的标记的潜像。通过在主曝光之前的曝光能量束，在晶片的感光层上预先形成掩模上的标记的潜像。

5. 发明授权

US5838450A Direct reticle to wafer alignment using fluorescence for integrated circuit lithography 失效
标题翻译：使用荧光进行集成电路光刻的直接光罩到晶圆对准
公开(公告)号：US5838450A
公开(公告)日：1998-11-17
申请号：US457710
申请日：1995-06-02
申请人： John H. McCoy , Martin E. Lee , Kyoichi Suwa
发明人： John H. McCoy , Martin E. Lee , Kyoichi Suwa
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F9/7084 , G03F7/70358 , G03F7/70425 , G03F9/7076
摘要： A mask alignment system for integrated circuit lithography achieves reticle to wafer referencing. A detection system located below the main projection lens detects the image of reticle alignment marks while also detecting wafer alignment marks. The reticle marks are imaged in light at the exposure wavelength. A first detection method images the fluorescence produced in the photoresist by the reticle mark images. A microscope located below the main projection lens produces the image and also images the wafer marks with broadband non-actinic illumination. The second method images the reticle marks in exposure light using a microscope which images and detects the exposure wavelength while maintaining the illumination and detection of the wafer marks. The third method collects directly both the exposure light and fluorescent light that is scattered and reflected from the wafer surface; the presence of wafer alignment marks changes this light collection. Scanning the wafer relative to the reticle produces a signal indicating the relative position of reticle and wafer alignment marks. All three methods provide information for complete field-by-field alignment including offsets, reticle-to-wafer magnification, rotation, and skew for both step-and-repeat and scanning exposure systems.
摘要翻译：用于集成电路光刻的掩模对准系统实现了光栅到晶片参考。位于主投影透镜下方的检测系统检测标线对准标记的图像，同时检测晶片对准标记。掩模版标记以曝光波长的光照成像。第一检测方法通过标线图像对在光致抗蚀剂中产生的荧光进行成像。位于主投影透镜下方的显微镜产生图像，并且还利用宽带非光化照明对晶片标记进行成像。第二种方法使用显微镜在曝光光下对掩模版标记进行成像，并在保持照明和晶片标记的检测的同时检测曝光波长。第三种方法直接收集从晶片表面散射和反射的曝光光和荧光; 晶片对准标记的存在会改变这种光集合。相对于掩模版扫描晶片产生指示标线片和晶片对准标记的相对位置的信号。所有这三种方法提供了完整的逐场校准的信息，包括步进重复扫描和扫描曝光系统的偏移量，标尺到晶圆倍率，旋转和偏斜。

6. 发明授权

US5835227A Method and apparatus for determining performance characteristics in lithographic tools 失效
标题翻译：用于确定光刻工具的性能特征的方法和装置
公开(公告)号：US5835227A
公开(公告)日：1998-11-10
申请号：US818375
申请日：1997-03-14
申请人： Ilya Grodnensky , Etsuya Morita , Kyoichi Suwa , Shigeru Hirukawa
发明人： Ilya Grodnensky , Etsuya Morita , Kyoichi Suwa , Shigeru Hirukawa
IPC分类号： G01M11/00 , G03F7/20 , G01B11/00 , G01B11/02
CPC分类号： G03F7/70058 , G03F7/70241 , G03F7/706
摘要： A method and apparatus for determining performance characteristics in lithographic tools includes projecting a predetermined image with a projection system having a known predetermined performance characteristic to obtain data indicative of the relationship between the size of the projected image and the predetermined performance characteristic. The same image is then projected in a system having an unknown value for the predetermined performance characteristic. The predetermined performance characteristic for the system under consideration is then determined based on the data obtained when the image was projected in the system having the known predetermined performance characteristic.
摘要翻译：用于确定光刻工具中的性能特征的方法和装置包括用具有已知预定性能特征的投影系统投影预定图像，以获得指示投影图像的尺寸与预定性能特征之间的关系的数据。然后将相同的图像投影在具有用于预定性能特征的未知值的系统中。然后，基于在具有已知的预定性能特征的系统中投影图像时获得的数据来确定所考虑的系统的预定性能特性。

7. 发明授权

US5777729A Wafer inspection method and apparatus using diffracted light 失效
$Wafer inspection method and apparatus using diffracted light$
标题翻译：使用衍射光的晶片检查方法和装置
公开(公告)号：US5777729A
公开(公告)日：1998-07-07
申请号：US644649
申请日：1996-05-07
申请人： Arun A. Aiyer , John H. McCoy , Kyoichi Suwa , Henry K. Chau
发明人： Arun A. Aiyer , John H. McCoy , Kyoichi Suwa , Henry K. Chau
IPC分类号： G01N21/88 , G01N21/47 , G01N21/94 , G01N21/956 , H01L21/66 , G01N21/00
CPC分类号： G01N21/8806 , G01N21/4788 , G01N21/9501 , G01N21/956
摘要： Defects in a processed or partly processed semiconductor wafer, or other similar three-dimensional periodic pattern formed on a substrate surface, are detected by light diffraction. Incident monochromatic light is provided from an elongated and extended source to illuminate the entire wafer surface. By use of automated image processing techniques, wafer macro inspection is thereby automated. The elongated and extended light source allows light at different angles to be incident upon each point of the wafer surface, thereby allowing defect detection for an entire wafer surface in a single field of view and reducing inspection time. The particular wavelength of the incident monochromatic light is predetermined to allow optimum detection of defects in the periodic pattern on the wafer, depending on the width and pitch of the features of the periodic pattern.
摘要翻译：通过光衍射检测经处理或部分处理的半导体晶片或形成在基板表面上的其它类似三维周期图案的缺陷。入射单色光从细长的和延伸的源提供，以照亮整个晶片表面。通过使用自动图像处理技术，晶片宏观检查因此被自动化。细长的和延伸的光源允许以不同角度的光入射到晶片表面的每个点上，从而允许在单个视场中的整个晶片表面的缺陷检测并减少检查时间。入射单色光的特定波长是预定的，以允许根据周期性图案的特征的宽度和间距来最佳地检测晶片上的周期性图案中的缺陷。

8. 发明授权

US4592625A Double-conjugate maintaining optical system 失效
标题翻译：双共轭保持光学系统
公开(公告)号：US4592625A
公开(公告)日：1986-06-03
申请号：US469015
申请日：1983-02-23
申请人： Makoto Uehara , Satoru Anzai , Kyoichi Suwa
发明人： Makoto Uehara , Satoru Anzai , Kyoichi Suwa
IPC分类号： G02B13/22 , G02B19/00 , G02B21/08 , G02B27/00 , G03F7/20 , G01B11/00
CPC分类号： G03F7/70241 , G02B13/22
摘要： A double-conjugate maintaining optical system for maintaining the conjugate relation between an object and its image even if the distance between the object and the image varies and also maintaining another set of conjugate relation in a predetermined condition includes an afocal system comprising a plurality of lens units, a first positive lens unit disposed on the object side of the afocal system, and a second positive lens unit disposed on the image side of the afocal system. The first positive lens unit is movable relative to the second positive lens unit so that the object is positioned on the focal plane of the first positive lens unit opposite to the afocal system. The afocal system is movable along the optical axis thereof in a predetermined relation with the first positive lens unit.
摘要翻译：即使物体与图像之间的距离发生变化并且在预定条件下也保持另一组共轭关系的双重共轭维持光学系统，用于保持物体与其图像之间的共轭关系，包括包括多个透镜的无焦点系统设置在无焦点系统的物体侧的第一正透镜单元和设置在无焦系统的像侧上的第二正透镜单元。第一正透镜单元可相对于第二正透镜单元移动，使得物体位于与无焦系统相对的第一正透镜单元的焦平面上。无焦点系统可以沿其光轴以与第一正透镜单元预定的关系移动。

9. 发明授权

US4566795A Alignment apparatus 失效
标题翻译：校准装置
公开(公告)号：US4566795A
公开(公告)日：1986-01-28
申请号：US586639
申请日：1984-03-06
申请人： Toshio Matsuura , Kyoichi Suwa
发明人： Toshio Matsuura , Kyoichi Suwa
IPC分类号： H01L21/30 , G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027 , G01B11/27
CPC分类号： G03F9/7046 , G03F7/70358 , G03F9/7049
摘要： An alignment apparatus for aligning one of the substrates with the other by means of first and second reference marks comprises scanning means including a light beam generating means for reciprocally scanning first and second areas respectively by a light beam, discrimination means for generating a discrimination signal indicative of the scanning direction by the scanning means in synchronism with the scanning, first photoelectric means for generating a first signal when the first photoelectric means receives the light beam transmitted through a first area and separated by the first reference mark, second photoelectric means for generating a second signal when the second photoelectric means receives the light beam transmitted through the second area and separated by the second reference mark, operation means for determining the direction and amount of the relative deviation between the first and second reference marks from the first and second signals and from the discrimination signal, and means for moving one of the substrates relative to the other in response to the operation means. The alignment apparatus is simple in structure and can detect alignment marks with higher accuracy. The alignment apparatus enables the alignment of a wafer with a reticle or mask at higher speed and with higher preciseness.
摘要翻译：用于通过第一和第二参考标记将一个基板与另一个基板对准的对准装置包括扫描装置，其包括用于分别由光束往复扫描第一和第二区域的光束产生装置，用于产生指示所述第一光电装置用于当所述第一光电装置接收到透过第一区域并被所述第一参考标记分开的光束时产生第一信号;第二光电装置，用于产生第一信号，第二信号，当第二光电装置接收到通过第二区域传输并被第二参考标记分隔的光束时，用于确定第一和第二参考标记与第一和第二信号之间的相对偏离的方向和量的操作装置，以及从辨别信号以及用于响应于操作装置移动基板之一相对于另一个的装置。对准装置结构简单，可以更精确地检测对准标记。对准装置使得能够以更高的速度和更高的精度将晶片与掩模版或掩模对准。

10. 发明授权

US4531060A Positioning method 失效
标题翻译：定位方法
公开(公告)号：US4531060A
公开(公告)日：1985-07-23
申请号：US422007
申请日：1982-09-23
申请人： Kyoichi Suwa , Kazuo Kuramochi , Kiwao Nakazawa
发明人： Kyoichi Suwa , Kazuo Kuramochi , Kiwao Nakazawa
IPC分类号： H01L21/68 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/70
摘要： A method for positioning an object with patterns being formed thereon, employs a first device for extracting first information relative to patterns in a first region on the object, a second device for extracting second information relative to patterns from a second region including the first region on the object, an operating circuit to calculate a degree of coincidence between the first information and the second information, and a detecting circuit for detecting a position of the first region in the second region, whereby the position of the object can be reproduced with high reproducibility in accordance with the position as detected.
摘要翻译：一种用于定位其上形成图案的物体的方法，采用第一装置，用于提取相对于物体上的第一区域中的图案的第一信息;第二装置，用于从包括第一区域的第二区域提取关于图案的图案的第二信息该目的是计算第一信息和第二信息之间的一致度的操作电路，以及用于检测第二区域中的第一区域的位置的检测电路，从而能够以高再现性再现对象的位置根据检测到的位置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式