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1. 发明授权

US5920378A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5920378A
公开(公告)日：1999-07-06
申请号：US853389
申请日：1997-05-09
申请人： Masaichi Murakami , Hiroshi Shirasu , Tomohide Hamada , Kazuaki Saiki , Susumu Mori
发明人： Masaichi Murakami , Hiroshi Shirasu , Tomohide Hamada , Kazuaki Saiki , Susumu Mori
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70691 , G03F7/70791 , G03F9/70
摘要： A projection exposure apparatus includes off-axis type plate alignment systems which make it possible to reduce alignment time and thereby increase throughput. Exposure of large photosensitive plates is made possible without increasing the length of the plate stage stroke. Multiple fiducial mark members including fiducial mark members in different positions on a plate stage are utilized. Multiple off-axis type plate alignment systems are used to observe the multiple fiducial marks.
摘要翻译：投影曝光装置包括离轴型板对准系统，其能够缩短对准时间，从而提高生产量。大型感光板的曝光是可能的，而不会增加平板台面行程的长度。使用了多个基准标记，其中包括在平台上不同位置的基准标记成员。多个离轴型板对准系统用于观察多个基准标记。

2. 发明授权

US5657130A Exposure apparatus and method 失效
标题翻译：曝光装置和方法
公开(公告)号：US5657130A
公开(公告)日：1997-08-12
申请号：US408714
申请日：1995-03-22
申请人： Hiroshi Shirasu , Kazuaki Saiki , Seiji Miyazaki , Susumu Mori
发明人： Hiroshi Shirasu , Kazuaki Saiki , Seiji Miyazaki , Susumu Mori
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F7/70216 , G03F7/70275 , G03F7/70358 , G03F7/70791 , G03F9/70
摘要： In an exposure apparatus and method, a mask and a substrate are scanned in synchronism with each other so that the pattern of the mask may be transferred onto the substrate through a projection optical system. First beams of light are irradiated to least two locations on the mask spaced apart in a direction intersecting the scanning direction of the mask. The reflected light thereof is received, and the positions of the points on the mask to which the beam of light has been irradiated are detected in the direction of the optical axis of the projection optical system. In addition, second beams of light are irradiated to at least two locations on the substrate spaced apart in the scanning direction, and the reflected light thereof is received. The positions of the points on the substrate to which the second beam of light has been irradiated are also detected in the direction of the optical axis of the projection optical system are detected. The posture of at least one of the mask and the substrate is adjusted on the basis of the positions detected with the first and second beams.
摘要翻译：在曝光装置和方法中，掩模和基板彼此同步地扫描，使得掩模的图案可以通过投影光学系统被转印到基板上。第一光束照射在与掩模的扫描方向相交的方向间隔开的掩模上的至少两个位置。在投影光学系统的光轴的方向上检测其反射光，并且在光束照射的掩模上的点的位置被检测。此外，第二光束照射到沿扫描方向间隔开的基板上的至少两个位置，并且其反射光被接收。检测到在投影光学系统的光轴的方向上检测到已经照射第二光束的基板上的点的位置。基于由第一和第二光束检测到的位置来调整掩模和基板中的至少一个的姿势。

3. 发明授权

US5715037A Scanning exposure apparatus 失效
标题翻译：扫描曝光装置
公开(公告)号：US5715037A
公开(公告)日：1998-02-03
申请号：US615853
申请日：1996-03-12
申请人： Kazuaki Saiki , Susumu Mori , Hiroshi Shirasu
发明人： Kazuaki Saiki , Susumu Mori , Hiroshi Shirasu
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F9/00 , G03F9/70
摘要： The present invention provides a scanning exposure apparatus for projecting an image of a pattern area of a mask having a first alignment mark onto a photosensitive substrate disposed on a substrate stage. A second alignment mark is provided on at least one of the photosensitive substrate and the substrate stage. The scanning exposure apparatus includes a plurality of projection optical systems disposed along a predetermined direction and adapted to receive the luminous fluxes passed through the mask and to project elected images of unchanged dimension of the plurality of illuminated regions of the mask onto the substrate. There is provided a mark detection system for detecting the first alignment mark on the mask and the second alignment mark, and at least one of the projection optical systems constitutes a part of the mark detection system.
摘要翻译：本发明提供了一种用于将具有第一对准标记的掩模的图案区域的图像投影到设置在基板台上的感光基板上的扫描曝光装置。在感光基板和基板台的至少一个上设置第二对准标记。扫描曝光装置包括沿着预定方向设置的多个投影光学系统，其适于接收通过掩模的光通量，并将掩模的多个照明区域的未改变尺寸的选定图像投影到基板上。提供了一种用于检测掩模上的第一对准标记和第二对准标记的标记检测系统，并且至少一个投影光学系统构成标记检测系统的一部分。

4. 发明申请

US20110043784A1 OBJECT MOVING APPARATUS, OBJECT PROCESSING APPARATUS, EXPOSURE APPARATUS, OBJECT INSPECTING APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：对象移动装置，对象处理装置，曝光装置，对象检查装置和装置制造方法
公开(公告)号：US20110043784A1
公开(公告)日：2011-02-24
申请号：US12855181
申请日：2010-08-12
申请人： Yasuo AOKI , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
发明人： Yasuo AOKI , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
IPC分类号： G03B27/58 , B65G47/00 , B65G43/00
CPC分类号： G03F7/707 , B65G49/065 , G03F1/82 , G03F7/70791 , G03F7/70816 , H01L21/67784 , H01L21/68 , H01L21/6838
摘要： A substrate is held by adsorption by a substrate holding frame that is formed into a frame shape and is lightweight, and the substrate holding frame is driven along a horizontal plane by a drive unit that includes a linear motor. Below the substrate holding frame, a plurality of air levitation units are placed that support by levitation the substrate in a noncontact manner such that the substrate is substantially horizontal, by jetting air to the lower surface of the substrate. Since the plurality of air levitation units cover a movement range of the substrate holding frame, the drive unit can guide the substrate holding frame (substrate) along the horizontal plane at high speed and with high precision.
摘要翻译：基板通过被形成为框架形状的基板保持框架的吸附保持并且重量轻，并且基板保持框架通过包括线性马达的驱动单元沿着水平面驱动。在基板保持框架下方，放置多个空气悬浮单元，其通过以非接触方式悬浮基板来支撑，使得基板基本上水平，通过将空气喷射到基板的下表面。由于多个空气悬浮单元覆盖基板保持框架的移动范围，所以驱动单元可以高速且高精度地沿着水平面引导基板保持框架（基板）。

5. 发明授权

US08699001B2 Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method 有权
标题翻译：物体移动装置，物体处理装置，曝光装置，物体检查装置和装置的制造方法
公开(公告)号：US08699001B2
公开(公告)日：2014-04-15
申请号：US12855181
申请日：2010-08-12
申请人： Yasuo Aoki , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
发明人： Yasuo Aoki , Tomohide Hamada , Hiroshi Shirasu , Manabu Toguchi
IPC分类号： G03B27/58 , G03F7/20 , H01L21/677 , B65G49/06
CPC分类号： G03F7/707 , B65G49/065 , G03F1/82 , G03F7/70791 , G03F7/70816 , H01L21/67784 , H01L21/68 , H01L21/6838
摘要： A substrate is held by adsorption by a substrate holding frame that is formed into a frame shape and is lightweight, and the substrate holding frame is driven along a horizontal plane by a drive unit that includes a linear motor. Below the substrate holding frame, a plurality of air levitation units are placed that support by levitation the substrate in a noncontact manner such that the substrate is substantially horizontal, by jetting air to the lower surface of the substrate. Since the plurality of air levitation units cover a movement range of the substrate holding frame, the drive unit can guide the substrate holding frame (substrate) along the horizontal plane at high speed and with high precision.
摘要翻译：基板通过被形成为框架形状的基板保持框架的吸附保持并且重量轻，并且基板保持框架通过包括线性马达的驱动单元沿着水平面驱动。在基板保持框架下方，放置多个空气悬浮单元，其通过以非接触方式悬浮基板来支撑，使得基板基本上水平，通过将空气喷射到基板的下表面。由于多个空气悬浮单元覆盖基板保持框架的移动范围，所以驱动单元可以高速且高精度地沿着水平面引导基板保持框架（基板）。

6. 发明授权

US5581075A Multi-beam scanning projection exposure apparatus and method with beam monitoring and control for uniform exposure of large area 失效
标题翻译：多光束扫描投影曝光装置和方法，具有大面积均匀曝光的光束监视和控制
公开(公告)号：US5581075A
公开(公告)日：1996-12-03
申请号：US446509
申请日：1995-05-22
申请人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
发明人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
IPC分类号： G03F7/20 , G01J1/32
CPC分类号： G03F7/7005 , G03F7/70091 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： An exposure apparatus comprises a plurality of illumination optical systems for generating a plurality of light beams, a plurality of projection optical systems disposed corresponding to the plurality of illumination optical systems, respectively, a plurality of light intensity detectors, provided respectively for the plurality of illumination optical systems, for detecting individual intensities of the plurality of light beams, a light intensity changing device for changing the respective intensities of the plurality of light beams, and a control device for controlling the light intensity changing device and uniformizing the intensities of the plurality of light beams to a substantially fixed level.
摘要翻译：曝光装置包括多个用于产生多个光束的照明光学系统，分别对应于多个照明光学系统设置的多个投影光学系统，分别为多个照明设置的多个光强度检测器用于检测多个光束的各个强度的光学系统，用于改变多个光束的各个强度的光强度改变装置，以及用于控制光强度改变装置的控制装置，并且使多个光束的强度均匀化光束达到基本上固定的水平。

7. 发明授权

US5798822A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5798822A
公开(公告)日：1998-08-25
申请号：US950964
申请日：1997-10-15
申请人： Seiji Miyazaki , Hiroshi Shirasu , Kazuaki Saiki , Tsuyoshi Narabe
发明人： Seiji Miyazaki , Hiroshi Shirasu , Kazuaki Saiki , Tsuyoshi Narabe
IPC分类号： G03F7/207 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70691 , G03F7/70358 , G03F9/7026
摘要： A pair of reference plates is so arranged as to have a predetermined positional relationship on a carriage that integrally holds a mask and a photosensitive substrate such that the mask and the photosensitive substrate oppose each other on two sides of a projecting optical system. By periodically detecting the positional relationship between the reference plates in the optical axis direction, a variation with time occurring in the detection characteristics of position detecting devices is detected. Both stable image formation characteristics and a high throughput are realized by correcting a driving signal to be supplied to a driving device in accordance with the detected variation.
摘要翻译：一对参考板被布置为在一体地保持掩模和感光基板的托架上具有预定的位置关系，使得掩模和感光基板在投影光学系统的两侧彼此相对。通过周期性地检测基准板在光轴方向上的位置关系，检测位置检测装置的检测特性中随时间的变化。通过根据检测到的变化来校正要提供给驱动装置的驱动信号，实现稳定的图像形成特性和高吞吐量。

8. 发明授权

US06266131B1 Exposure apparatus 有权
标题翻译：曝光装置
公开(公告)号：US06266131B1
公开(公告)日：2001-07-24
申请号：US09309709
申请日：1999-05-11
申请人： Tomohide Hamada , Hiroshi Shirasu
发明人： Tomohide Hamada , Hiroshi Shirasu
IPC分类号： G03B2742
CPC分类号： G03F7/70691 , G02F1/1303 , G03B27/58 , G03F7/70358
摘要： A method of transferring a pattern of a mask onto an object through a projection system, includes the steps of providing a carriage having a mask holder surface adapted to hold the mask in a position which is angularly displaced from a horizontal position by a predetermined angle and an object holder surface adapted to the object in a position which is angularly displaced from the horizontal position by the predetermined angle, the carriage being movable in a first direction; transferring the pattern onto the object, the projection system being located between the mask and the object during the transfer operation; moving the carriage so that the projection system comes to a position out of a place between the mask holder surface and the object holder surface; and conveying the object from the object holder surface.
摘要翻译：通过投影系统将掩模图案转印到物体上的方法包括以下步骤：提供具有掩模保持器表面的托架，所述托架表面适于将掩模保持在与水平位置成角度地移位预定角度的位置，以及所述物体保持器表面适于在与所述水平位置成角度地移位预定角度的位置处，所述托架能够沿第一方向移动; 将图案转移到物体上，投影系统在转印操作期间位于掩模和物体之间; 移动滑架使得投影系统进入位于掩模保持器表面和物体保持器表面之间的位置; 并从物体保持器表面传送物体。

9. 发明授权

US06317196B1 Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US06317196B1
公开(公告)日：2001-11-13
申请号：US09209270
申请日：1998-12-11
申请人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kats
发明人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kats
IPC分类号： G03B2118
CPC分类号： G03F7/70775 , G03F7/70358 , G03F7/70716 , G03F9/70
摘要： A projection exposure apparatus is provided. The projection exposure apparatus includes an illumination optical system for illuminating a portion of a mask pattern on a mask with an exposing radiation flux of a predetermined shape, a fixed support, a projection optical system fixed to the fixed support for projecting the image of the illuminated portion of the mask pattern onto a substrate, and a carriage for integrally holding the mask and the substrate, the carriage being movable in a predetermined direction with respect to the projection optical system to successively exposing the substrate with the image of the mask pattern formed by the exposing radiation flux. The projection exposure apparatus further includes a long mirror elongated in the predetermined direction and fixed to the fixed support, the length of the long mirror being at least equal to the stroke of the carriage movement in the predetermined direction, and a measurement system for measuring the position of the mask and the position of the substrate with respect to the long mirror to determine the position of the mask relative to the substrate in a direction perpendicular to the predetermined direction.
摘要翻译：提供投影曝光装置。投影曝光装置包括：照射光学系统，用于以掩模形式曝光掩模图案的一部分，其具有预定形状的曝光辐射通量;固定支架;固定在固定支架上的投影光学系统，用于投射照明图像掩模图案的一部分到基板上，以及滑架，用于一体地保持掩模和基板，托架可相对于投影光学系统沿预定方向移动，以使基板与由曝光辐射通量。投影曝光装置还包括在预定方向上延伸并固定到固定支撑件上的长镜，长反射镜的长度至少等于滑架在预定方向上的行程的行程，以及测量系统掩模的位置和基板相对于长镜的位置，以确定掩模相对于基板在垂直于预定方向的方向上的位置。

10. 发明授权

US06570641B2 Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US06570641B2
公开(公告)日：2003-05-27
申请号：US09955116
申请日：2001-09-19
申请人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kato
发明人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kato
IPC分类号： G03B2118
CPC分类号： G03F7/70775 , G03F7/70358 , G03F7/70716 , G03F9/70
摘要： The projection exposure apparatus can include an illumination optical system for illuminating a portion of a mask pattern on a mask with an exposing radiation flux of a predetermined shape, a fixed support, a projection optical system fixed to the fixed support for projecting the image of the illuminated portion of the mask pattern onto a substrate, and a carriage for integrally holding the mask and the substrate, the carriage being movable in a predetermined direction with respect to the projection optical system successively exposing the substrate with the image of the mask pattern formed by the exposing radiation flux. The projection exposure apparatus further includes a long mirror elongated in the predetermined direction and fixed to the fixed support, the length of the long mirror being at least equal to the stroke of the carriage movement in the predetermined direction, and a measurement system for measuring the position of the mask and the position of the substrate with respect to the long mirror to determine the position of the mask relative to the substrate in a direction perpendicular to the predetermined direction.
摘要翻译：投影曝光装置可以包括照射光学系统，用于以掩模形式的一部分掩模图案照射预定形状的曝光辐射通量，固定支撑件，固定在固定支架上的投影光学系统，用于投影图像的图像掩模图案的照明部分到基板上，以及滑架，用于一体地保持掩模和基板，滑架可相对于投影光学系统沿预定方向移动，连续地将基板与由曝光辐射通量。投影曝光装置还包括在预定方向上延伸并固定到固定支撑件上的长镜，长反射镜的长度至少等于滑架在预定方向上的行程的行程，以及测量系统掩模的位置和基板相对于长镜的位置，以确定掩模相对于基板在垂直于预定方向的方向上的位置。

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