专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06213607B1 Exposure apparatus and field stop thereof 有权
标题翻译：曝光装置及其现场停止
公开(公告)号：US06213607B1
公开(公告)日：2001-04-10
申请号：US09293953
申请日：1999-04-19
申请人： Tomoyuki Watanabe , Masamitsu Yanagihara , Hideji Goto , Noritsugu Hanazaki
发明人： Tomoyuki Watanabe , Masamitsu Yanagihara , Hideji Goto , Noritsugu Hanazaki
IPC分类号： G02B2700
CPC分类号： G03F7/70066 , G03F7/70475
摘要： An exposure apparatus has a field stop, disposed in a position conjugate to a reticle, for regulating an illumination area on the reticle. The field stop is constructed of two aperture members including light shielding portions, rectangular first and second apertures and light reducing portions formed at sides of these apertures. The exposure apparatus also has a drive system for shifting positions of light reducing portions and relatively moving the two aperture members during the projection.
摘要翻译：曝光装置具有设置在与掩模版共轭的位置的场停止件，用于调节掩模版上的照明区域。场挡由两个光圈构件构成，包括遮光部分，矩形第一和第二孔以及形成在这些孔的侧面的减光部分。曝光装置还具有用于在投影期间移动减光部分的位置并相对移动两个光圈构件的驱动系统。

2. 发明授权

US5777722A Scanning exposure apparatus and method 失效
标题翻译：扫描曝光装置和方法
公开(公告)号：US5777722A
公开(公告)日：1998-07-07
申请号：US654382
申请日：1996-05-28
申请人： Seiji Miyazaki , Tsuyoshi Narabe , Kei Nara , Tomohide Hamada , Kazuaki Saiki , Hideji Goto , Muneyasu Yokota
发明人： Seiji Miyazaki , Tsuyoshi Narabe , Kei Nara , Tomohide Hamada , Kazuaki Saiki , Hideji Goto , Muneyasu Yokota
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G03B27/32 , G01B11/00
CPC分类号： G03F7/70275 , G03F7/70358 , G03F9/70
摘要： A scanning exposure apparatus is arranged to illuminate a mask, to project an image of the mask through a projection optical system onto a photosensitive substrate, and to move the mask and the photosensitive substrate relative to the projection optical system, thereby effecting exposure of an entire surface of the mask on the photosensitive substrate, and the exposure apparatus comprises a position detector which detects a relative positional relation between the mask and the photosensitive substrate; a memory which stores positional information obtained by the position detector; a position correcting device which corrects the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory device; and a controller which makes the position detector detect the relative positional relation between the mask and the photosensitive substrate while the mask and the photosensitive substrate are carried past a projection region of the projection optical system to an exposure start position, and makes the position correcting device correct the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory, while the mask and the photosensitive substrate are stopped at the exposure start position and/or during the exposure.
摘要翻译：扫描曝光装置被布置为照亮掩模，通过投影光学系统将光掩模的图像投射到感光基板上，并且使掩模和感光基板相对于投影光学系统移动，从而实现整个曝光感光基板上的掩模表面，曝光装置包括检测掩模和感光基板之间的相对位置关系的位置检测器; 存储器，其存储由所述位置检测器获取的位置信息; 基于从存储装置读出的位置信息来校正掩模和感光基板之间的相对位置关系的位置校正装置; 以及控制器，其使得位置检测器在将掩模和感光基板通过投影光学系统的投影区域到曝光开始位置时检测掩模和感光基板之间的相对位置关系，并使位置校正装置基于从存储器读出的位置信息，掩模和感光基板在曝光开始位置和/或曝光期间停止时，校正掩模和感光基板之间的相对位置关系。

3. 发明授权

US5502313A Exposure apparatus and method having a measuring unit for measuring distances between a mask surface and a projection optical system 失效
标题翻译：曝光装置和方法具有用于测量掩模表面和投影光学系统之间的距离的测量单元
公开(公告)号：US5502313A
公开(公告)日：1996-03-26
申请号：US302479
申请日：1994-09-12
申请人： Osamu Nakamura , Masamitsu Yanagihara , Hideji Goto
发明人： Osamu Nakamura , Masamitsu Yanagihara , Hideji Goto
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G01N21/86
CPC分类号： G03F9/70
摘要： An exposure apparatus includes a projection optical system for projecting a pattern on a mask onto a photosensitive substrate and a measuring unit for measuring distances between the mask and the projection optical system at a plurality of positions within a surface of the mask. The position of the photosensitive substrate with respect to the projection optical system is changed on the basis of a plurality of the distances measured by the measuring unit.
摘要翻译：曝光装置包括用于将掩模上的图案投影到感光基板上的投影光学系统和用于在掩模的表面内的多个位置处测量掩模和投影光学系统之间的距离的测量单元。基于由测量单元测量的多个距离来改变感光基片相对于投影光学系统的位置。

4. 发明授权

US5486896A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5486896A
公开(公告)日：1996-01-23
申请号：US195192
申请日：1994-02-14
申请人： Junji Hazama , Masamitsu Yanagihara , Hideji Goto , Masaichi Murakami
发明人： Junji Hazama , Masamitsu Yanagihara , Hideji Goto , Masaichi Murakami
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/70058 , G03F7/70475
摘要： An exposure apparatus adapted for use in manufacture of semiconductor devices or substrates for liquid crystal display panels, comprises an illumination systems for irradiating a first object with a light beam from a light source; a projection optical system for projecting the image of a pattern on the first object, illuminated by the light beam, onto a second object; and a light attenuation device provided in the illumination system and adapted to gradually decrease the amount of light in the peripheral portion of the image of the pattern, projected onto the second object, as the distance from the center of the image increases.
摘要翻译：适用于制造液晶显示面板的半导体器件或衬底的曝光装置包括用于从光源照射第一物体的照明系统; 投影光学系统，用于将由光束照射的第一物体上的图案的图像投影到第二物体上; 以及光照射装置，其设置在所述照明系统中，并且适于随着距离图像中心的距离增加而逐渐减小投射到第二物体上的图案的图像的周边部分中的光量。

5. 发明授权

US06325516B1 Exposure apparatus and field stop thereof 失效
标题翻译：曝光装置及其现场停止
公开(公告)号：US06325516B1
公开(公告)日：2001-12-04
申请号：US09706775
申请日：2000-11-07
申请人： Tomoyuki Watanabe , Masamitsu Yanagihara , Hideji Goto , Noritsugu Hanazaki
发明人： Tomoyuki Watanabe , Masamitsu Yanagihara , Hideji Goto , Noritsugu Hanazaki
IPC分类号： G02B2700
CPC分类号： G03F7/70066 , G03F7/70475
摘要： An exposure apparatus has a field stop, disposed in a position conjugate to the reticle, for regulating an illumination area on the reticle. The field stop is constructed of two aperture members including light shielding portions, rectangular first and second apertures and light reducing portions formed at sides of these apertures. The exposure apparatus also has a drive system for shifting a position of the light reducing portion. and relatively moving the two aperture members during the projection.
摘要翻译：曝光装置具有设置在与掩模版共轭的位置的场停止件，用于调节掩模版上的照明区域。场挡由两个光圈构件构成，包括遮光部分，矩形第一和第二孔以及形成在这些孔的侧面的减光部分。曝光装置还具有用于移动减光部的位置的驱动系统。并且在投影期间相对移动两个光圈元件。

6. 发明授权

US5936712A Exposure method and apparatus including focus control 失效
标题翻译：包括焦点控制在内的曝光方法和设备
公开(公告)号：US5936712A
公开(公告)日：1999-08-10
申请号：US18558
申请日：1998-02-04
申请人： Masanobu Ito , Masamitsu Yanagihara , Hideji Goto , Yoshiyuki Katamata
发明人： Masanobu Ito , Masamitsu Yanagihara , Hideji Goto , Yoshiyuki Katamata
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G03B27/42 , G03B27/52 , G03B27/32 , G01B11/00
CPC分类号： G03F9/7026 , G03F7/70275 , G03F7/70358 , G03F9/70
摘要： To improve the focus accuracy during alignment and to improve the alignment accuracy even if a substrate has warpage, during alignment, an approximate focus plane is obtained by using only the detection results at focus points of focus sensors located near the ends of a substrate, close to alignment points, and without using the detection results at focus points of two central focus sensors. The auto-focus operation is performed by using the above operation results. As a result, a substrate is driven so as to be adjusted to the approximate focus plane during alignment.
摘要翻译：为了提高对准时的聚焦精度，即使基板翘曲，也能够提高对准精度，在对准期间，仅使用位于基板端部附近的聚焦传感器的聚焦点处的检测结果来获得近似聚焦面到对准点，并且不在两个中央焦点传感器的对焦点处使用检测结果。通过使用上述操作结果进行自动对焦操作。结果，基板被驱动以在对准期间被调整到近似的聚焦平面。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式