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1. 发明申请

US20120250944A1 IMAGE DETERMINING DEVICE 有权
标题翻译：图像确定装置
公开(公告)号：US20120250944A1
公开(公告)日：2012-10-04
申请号：US13513704
申请日：2010-12-28
申请人： Tetsuya Yamamoto , Masahiro Nei , Isao Totsuka , Tomoyuki Matsuyama , Masamitsu Yanagihara , Satoshi Hagiwara , Masakazu Sekiguchi
发明人： Tetsuya Yamamoto , Masahiro Nei , Isao Totsuka , Tomoyuki Matsuyama , Masamitsu Yanagihara , Satoshi Hagiwara , Masakazu Sekiguchi
IPC分类号： G06K9/62
CPC分类号： G06K9/00369 , G06T7/30 , G08B21/0476 , H04N7/18 , H04N7/181
摘要： To determine the state of a subject person with a simple structure, an image determining device includes: an imaging unit that captures an image from a first direction, the image including the subject person; a first detector that detects size information from the image, the size information being about the subject person in the first direction; a second detector that detects position-related information, the position-related information being different from the information detected by the first detector; and a determining unit that determines the state of the subject person, based on a result of the detection performed by the first detector and a result of the detection performed by the second detector.
摘要翻译：为了确定具有简单结构的被摄体人的状态，图像确定装置包括：成像单元，其从第一方向捕获图像，所述图像包括被摄体人; 第一检测器，其检测来自图像的尺寸信息，所述尺寸信息是关于所述被摄体在所述第一方向上; 第二检测器，其检测位置相关信息，所述位置相关信息不同于由所述第一检测器检测的信息; 以及确定单元，其基于由第一检测器执行的检测结果和由第二检测器执行的检测结果来确定被检者的状态。

2. 发明授权

US06213607B1 Exposure apparatus and field stop thereof 有权
标题翻译：曝光装置及其现场停止
公开(公告)号：US06213607B1
公开(公告)日：2001-04-10
申请号：US09293953
申请日：1999-04-19
申请人： Tomoyuki Watanabe , Masamitsu Yanagihara , Hideji Goto , Noritsugu Hanazaki
发明人： Tomoyuki Watanabe , Masamitsu Yanagihara , Hideji Goto , Noritsugu Hanazaki
IPC分类号： G02B2700
CPC分类号： G03F7/70066 , G03F7/70475
摘要： An exposure apparatus has a field stop, disposed in a position conjugate to a reticle, for regulating an illumination area on the reticle. The field stop is constructed of two aperture members including light shielding portions, rectangular first and second apertures and light reducing portions formed at sides of these apertures. The exposure apparatus also has a drive system for shifting positions of light reducing portions and relatively moving the two aperture members during the projection.
摘要翻译：曝光装置具有设置在与掩模版共轭的位置的场停止件，用于调节掩模版上的照明区域。场挡由两个光圈构件构成，包括遮光部分，矩形第一和第二孔以及形成在这些孔的侧面的减光部分。曝光装置还具有用于在投影期间移动减光部分的位置并相对移动两个光圈构件的驱动系统。

3. 发明授权

US5623343A Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US5623343A
公开(公告)日：1997-04-22
申请号：US548402
申请日：1995-10-26
申请人： Kei Nara , Masamitsu Yanagihara , Seiji Miyazaki
发明人： Kei Nara , Masamitsu Yanagihara , Seiji Miyazaki
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F7/70225 , G03F7/70275 , G03F7/70358 , G03F9/70
摘要： In the first step of an exposure method of the present invention, an alignment optical system is arranged to oppose one of a first mask mark on a photomask and a first substrate mark on a photosensitive substrate, thereby detecting a first deviation amount between the position of the first mask mark and that of the first substrate mark. In the second step, the alignment optical system is arranged to oppose one of a second mask mark on the photomask and a second substrate mark on the photosensitive substrate, thereby detecting a second deviation mark between the position of the second mask mark and that of the second substrate mark. In the third step, correction values for minimizing the first and second deviation amounts are calculated. In the fourth step, the relative positional relationship between the image of an original pattern on the photomask and a shot area on the photosensitive substrate is adjusted on the basis of a correction value. In the fifth step, at least one of the first and second steps is executed subsequent to the fourth step to newly detect the first or second deviation amount. In the sixth step, the first to fifth steps are repeatedly executed until one of the first and second deviation amounts detected in the fifth step falls within a predetermined allowance.
摘要翻译：在本发明的曝光方法的第一步骤中，对准光学系统被布置为与光掩模上的第一掩模标记和感光基板上的第一基板标记中的一个相对，从而检测在光敏基板的位置之间的第一偏移量第一个掩码标记和第一个掩码标记。在第二步骤中，对准光学系统布置成与光掩模上的第二掩码标记和感光基板上的第二基板标记之一相对，从而检测第二掩模标记的位置与第二掩模标记的位置之间的第二偏移标记第二基板标记。在第三步骤中，计算用于使第一和第二偏移量最小化的校正值。在第四步骤中，基于校正值来调整光掩模上的原始图案的图像与感光基板上的照射区域之间的相对位置关系。在第五步骤中，在第四步骤之后执行第一和第二步骤中的至少一个，以重新检测第一或第二偏差量。在第六步骤中，重复执行第一至第五步骤，直到在第五步骤中检测到的第一和第二偏移量之一落入预定余量之内。

4. 发明授权

US5502313A Exposure apparatus and method having a measuring unit for measuring distances between a mask surface and a projection optical system 失效
标题翻译：曝光装置和方法具有用于测量掩模表面和投影光学系统之间的距离的测量单元
公开(公告)号：US5502313A
公开(公告)日：1996-03-26
申请号：US302479
申请日：1994-09-12
申请人： Osamu Nakamura , Masamitsu Yanagihara , Hideji Goto
发明人： Osamu Nakamura , Masamitsu Yanagihara , Hideji Goto
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G01N21/86
CPC分类号： G03F9/70
摘要： An exposure apparatus includes a projection optical system for projecting a pattern on a mask onto a photosensitive substrate and a measuring unit for measuring distances between the mask and the projection optical system at a plurality of positions within a surface of the mask. The position of the photosensitive substrate with respect to the projection optical system is changed on the basis of a plurality of the distances measured by the measuring unit.
摘要翻译：曝光装置包括用于将掩模上的图案投影到感光基板上的投影光学系统和用于在掩模的表面内的多个位置处测量掩模和投影光学系统之间的距离的测量单元。基于由测量单元测量的多个距离来改变感光基片相对于投影光学系统的位置。

5. 发明授权

US5936712A Exposure method and apparatus including focus control 失效
标题翻译：包括焦点控制在内的曝光方法和设备
公开(公告)号：US5936712A
公开(公告)日：1999-08-10
申请号：US18558
申请日：1998-02-04
申请人： Masanobu Ito , Masamitsu Yanagihara , Hideji Goto , Yoshiyuki Katamata
发明人： Masanobu Ito , Masamitsu Yanagihara , Hideji Goto , Yoshiyuki Katamata
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G03B27/42 , G03B27/52 , G03B27/32 , G01B11/00
CPC分类号： G03F9/7026 , G03F7/70275 , G03F7/70358 , G03F9/70
摘要： To improve the focus accuracy during alignment and to improve the alignment accuracy even if a substrate has warpage, during alignment, an approximate focus plane is obtained by using only the detection results at focus points of focus sensors located near the ends of a substrate, close to alignment points, and without using the detection results at focus points of two central focus sensors. The auto-focus operation is performed by using the above operation results. As a result, a substrate is driven so as to be adjusted to the approximate focus plane during alignment.
摘要翻译：为了提高对准时的聚焦精度，即使基板翘曲，也能够提高对准精度，在对准期间，仅使用位于基板端部附近的聚焦传感器的聚焦点处的检测结果来获得近似聚焦面到对准点，并且不在两个中央焦点传感器的对焦点处使用检测结果。通过使用上述操作结果进行自动对焦操作。结果，基板被驱动以在对准期间被调整到近似的聚焦平面。

6. 发明授权

US5625436A Scanning type exposure apparatus and exposure method 失效
标题翻译：扫描式曝光装置和曝光方法
公开(公告)号：US5625436A
公开(公告)日：1997-04-29
申请号：US689691
申请日：1996-08-13
申请人： Masamitsu Yanagihara , Susumu Mori , Tsuyoshi Naraki , Masami Seki , Seiji Miyazaki , Tsuyoshi Narabe , Hiroshi Chiba
发明人： Masamitsu Yanagihara , Susumu Mori , Tsuyoshi Naraki , Masami Seki , Seiji Miyazaki , Tsuyoshi Narabe , Hiroshi Chiba
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70275 , G03F7/70241 , G03F7/70258 , G03F7/70358 , G03F7/70858 , G03F7/70883 , G03F9/70
摘要： In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification.
摘要翻译：在扫描型曝光装置中，通过以与所述掩模和所述基板相对于所述投影光学系统的倍率相对于投影光学系统沿预定方向扫描所述掩模上的图案区域的整个表面，提供了多个照明光学系统，用于利用来自各个光源的各个光束照射掩模上的图案区域的各个区域; 多个投影光学系统被布置为对应于各个照明光学系统，所述投影光学系统将由各个照明光学系统照射的区域的各个图像投射到所述基板上的相应的投影区域上; 用于获取和存储基板的形状变化的存储装置; 放大率改变装置，用于根据基板的形状变化来改变至少一个投影光学系统的放大率; 以及成像位置改变装置，用于根据放大率的变化改变经由至少一个投影光学系统投影的所述图像的位置。

7. 发明授权

US5602620A Scanning exposure apparatus and exposure method 失效
标题翻译：扫描曝光装置和曝光方法
公开(公告)号：US5602620A
公开(公告)日：1997-02-11
申请号：US490212
申请日：1995-06-14
申请人： Seiji Miyazaki , Kei Nara , Masami Seki , Masamitsu Yanagihara
发明人： Seiji Miyazaki , Kei Nara , Masami Seki , Masamitsu Yanagihara
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42 , G01B11/00
CPC分类号： G03F9/7003 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791 , G03F9/70
摘要： The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction. Then a relative displacement is given by an amount of the orthogonality error between positions of images projected through a first optical system and positions of images projected through a second optical system, and relative positions of the mask and the photosensitive substrate are continuously changed by the amount of the orthogonality error in the first direction in accordance with the position of the mask or photosensitive substrate in the scanning direction.
摘要翻译：本发明涉及扫描曝光装置和曝光方法，以通过校正掩模或感光基底上的图案的正交性误差来将掩模上的多个区域的图像同时投影到感光基板上。如果掩模或感光基板上的图案具有在沿着扫描方向进入垂直于扫描方向的第一方向上产生一定角度的偏差的正交性误差，则掩模和感光基板相对于彼此旋转其平面将每个图案的坐标系中的一个坐标轴与第一方向对齐。然后通过第一光学系统投影的图像的位置和通过第二光学系统投影的图像的位置之间的正交性误差的量给出相对位移，并且掩模和感光基板的相对位置连续地改变量根据掩模或感光基板在扫描方向上的位置，在第一方向上的正交性误差。

8. 发明授权

US5581075A Multi-beam scanning projection exposure apparatus and method with beam monitoring and control for uniform exposure of large area 失效
标题翻译：多光束扫描投影曝光装置和方法，具有大面积均匀曝光的光束监视和控制
公开(公告)号：US5581075A
公开(公告)日：1996-12-03
申请号：US446509
申请日：1995-05-22
申请人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
发明人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
IPC分类号： G03F7/20 , G01J1/32
CPC分类号： G03F7/7005 , G03F7/70091 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： An exposure apparatus comprises a plurality of illumination optical systems for generating a plurality of light beams, a plurality of projection optical systems disposed corresponding to the plurality of illumination optical systems, respectively, a plurality of light intensity detectors, provided respectively for the plurality of illumination optical systems, for detecting individual intensities of the plurality of light beams, a light intensity changing device for changing the respective intensities of the plurality of light beams, and a control device for controlling the light intensity changing device and uniformizing the intensities of the plurality of light beams to a substantially fixed level.
摘要翻译：曝光装置包括多个用于产生多个光束的照明光学系统，分别对应于多个照明光学系统设置的多个投影光学系统，分别为多个照明设置的多个光强度检测器用于检测多个光束的各个强度的光学系统，用于改变多个光束的各个强度的光强度改变装置，以及用于控制光强度改变装置的控制装置，并且使多个光束的强度均匀化光束达到基本上固定的水平。

9. 发明授权

US5500736A Method of detecting positions 失效
标题翻译：检测位置的方法
公开(公告)号：US5500736A
公开(公告)日：1996-03-19
申请号：US339284
申请日：1994-11-07
申请人： Hideki Koitabashi , Masamitsu Yanagihara , Junji Hazama
发明人： Hideki Koitabashi , Masamitsu Yanagihara , Junji Hazama
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30 , H01L21/68 , G01B11/00
CPC分类号： G03F9/70
摘要： A position detecting method detects each position of a photosensitive substrate when executing shots of circuit patterns so that the circuit patterns are further superposed on the photosensitive substrate already formed with the circuit patterns. The method comprises the steps of performing a shot of a circuit pattern of a reticle in superposition on liquid crystal pixel segments already formed on a glass plate, registering, in a memory, a circuit pattern as a reference image in the liquid crystal pixel segment and performing pattern matching with other fields of the liquid crystal pixel segments by use of this reference image. An alignment is conducted based on a position of circuit pattern extracted thereby.
摘要翻译：当执行电路图案的拍摄时，位置检测方法检测感光基板的每个位置，使得电路图案进一步叠加在已经形成有电路图案的感光基板上。该方法包括以下步骤：在已经形成在玻璃板上的液晶像素段上叠加掩模版的电路图案，在存储器中将作为参考图像的电路图案配置在液晶像素段中，以及通过使用该参考图像来执行与液晶像素段的其它场的模式匹配。基于由此提取的电路图案的位置进行对准。

10. 发明授权

US09047751B2 Image determining device to determine the state of a subject 有权
标题翻译：图像确定装置，用于确定被摄体的状态
公开(公告)号：US09047751B2
公开(公告)日：2015-06-02
申请号：US13513704
申请日：2010-12-28
申请人： Tetsuya Yamamoto , Masahiro Nei , Isao Totsuka , Tomoyuki Matsuyama , Masamitsu Yanagihara , Satoshi Hagiwara , Masakazu Sekiguchi
发明人： Tetsuya Yamamoto , Masahiro Nei , Isao Totsuka , Tomoyuki Matsuyama , Masamitsu Yanagihara , Satoshi Hagiwara , Masakazu Sekiguchi
IPC分类号： G06K9/00 , G08B21/04 , H04N7/18
CPC分类号： G06K9/00369 , G06T7/30 , G08B21/0476 , H04N7/18 , H04N7/181
摘要： To determine the state of a subject person with a simple structure, an image determining device includes: an imaging unit that captures an image from a first direction, the image including the subject person; a first detector that detects size information from the image, the size information being about the subject person in the first direction; a second detector that detects position-related information, the position-related information being different from the information detected by the first detector; and a determining unit that determines the state of the subject person, based on a result of the detection performed by the first detector and a result of the detection performed by the second detector.
摘要翻译：为了确定具有简单结构的被摄体人的状态，图像确定装置包括：成像单元，其从第一方向捕获图像，所述图像包括被摄体人物; 第一检测器，其检测来自图像的尺寸信息，所述尺寸信息是关于所述被摄体在所述第一方向上; 第二检测器，其检测位置相关信息，所述位置相关信息不同于由所述第一检测器检测的信息; 以及确定单元，其基于由第一检测器执行的检测结果和由第二检测器执行的检测结果来确定被检者的状态。

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