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1. 发明授权

US5442418A Exposure method 失效
标题翻译：曝光方法
公开(公告)号：US5442418A
公开(公告)日：1995-08-15
申请号：US318521
申请日：1994-10-05
申请人： Masaichi Murakami , Muneyasu Yokota , Toshio Matsuura , Atsuyuki Aoki
发明人： Masaichi Murakami , Muneyasu Yokota , Toshio Matsuura , Atsuyuki Aoki
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , G03B27/42
CPC分类号： G03F7/70475 , G03F7/70241 , G03F7/706 , G03F9/70
摘要： Prior to exposures, the imaging characteristics of a projection optical system to be used are determined by measuring the positions of plural projection points (evaluation points) within the projection area, on a photosensitive substrate, of the projection optical system. Then the positional aberrations between the evaluation points are determined in the area of image superposition or jointing, and correcting parameters are determined so as to minimize at least the component of the aberrations in a direction, perpendicular to an extending direction patterns of a reticle. The reticle or the photosensitive substrate is rotated or shifted according to thus determined correcting parameters. This exposure method achieves the superposition or jointing of patterns, or the superposition of the jointed parts thereof, in optimum manner, according to the structure (directionality) of the patterns or the imaging characteristics of the projection optical system employed.
摘要翻译：在曝光之前，通过测量投影光学系统的感光基板上的投影区域内的多个投影点（评价点）的位置来确定投影光学系统的成像特性。然后，在图像叠加或接合的区域中确定评估点之间的位置像差，并且确定校正参数，使得至少垂直于光罩的延伸方向图案的方向上的像差的分量至少最小化。掩模版或感光基片根据如此确定的校正参数旋转或移动。根据所使用的投影光学系统的图案的结构（方向性）或成像特性，该曝光方法以最佳方式实现图案的叠合或连接，或其连接部分的叠合。

2. 发明授权

US5617211A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5617211A
公开(公告)日：1997-04-01
申请号：US515783
申请日：1995-08-16
申请人： Kei Nara , Toshio Matsuura , Muneyasu Yokota , Yukio Kakizaki , Yoshio Fukami , Seiji Miyazaki , Tsuyoshi Narabe
发明人： Kei Nara , Toshio Matsuura , Muneyasu Yokota , Yukio Kakizaki , Yoshio Fukami , Seiji Miyazaki , Tsuyoshi Narabe
IPC分类号： G03F7/20 , G03F9/00 , G01B11/00 , G01U21/86 , G06K7/015 , G03B27/52
CPC分类号： G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F9/70
摘要： This invention relates to an exposure apparatus for synchronously scanning a mask and a photosensitive substrate with respect to a plurality of projection optical systems, thereby properly transferring an entire pattern area on the mask onto the photosensitive substrate. A plurality of sets of mask-side reference marks and substrate-side reference marks are arranged at positions corresponding to each other on the mask surface and the photosensitive substrate surface and at least at two positions conjugate with the plurality of projection optical systems. The displacement amount between an image of a mask-side reference mark or a substrate-side reference mark formed on the corresponding substrate-side reference mark or mask-side reference mark through the projection optical system and the position of the substrate-side reference mark and the mask-side reference mark is measured. The imaging characteristics of the plurality of projection optical systems are corrected in accordance with the displacement amount.
摘要翻译：本发明涉及一种用于相对于多个投影光学系统同时扫描掩模和感光基板的曝光装置，从而将掩模上的整个图案区域适当地转印到感光基板上。多个掩模侧参考标记和基板侧参考标记组被布置在掩模表面和感光基板表面上并且至少在与多个投影光学系统共轭的两个位置处彼此对应的位置处。掩模侧基准标记的图像或通过投影光学系统形成在相应的基板侧参考标记或掩模侧参考标记上的基板侧参考标记之间的位移量和基板侧参考标记的位置并且测量掩模侧参考标记。根据位移量校正多个投影光学系统的成像特性。

3. 发明授权

US5912726A Projection exposure apparatus and method having a positional deviation detection system that employs light from an exposure illumination system 失效
标题翻译：具有使用来自曝光照明系统的光的位置偏差检测系统的投影曝光装置和方法
公开(公告)号：US5912726A
公开(公告)日：1999-06-15
申请号：US922598
申请日：1997-09-03
申请人： Manabu Toguchi , Kei Nara , Masaichi Murakami , Nobutaka Fujimori , Toshio Matsuura
发明人： Manabu Toguchi , Kei Nara , Masaichi Murakami , Nobutaka Fujimori , Toshio Matsuura
IPC分类号： G03B27/32 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , G03B27/42 , G03B27/54
CPC分类号： G03F9/7026 , G03F7/70241 , G03F7/70275
摘要： A projection exposure apparatus includes an illumination optical system for illuminating a plurality of partial areas on a mask. A plurality of projection optical systems each project images of the partial areas thus illuminated onto a photosensitive substrate. A mask table holds the mask. A position detector detects a position of the mask table. A substrate table holds the photosensitive substrate. A plurality of first reference marks are provided on the mask table; each of the plurality of first reference marks are disposed at a position corresponding to each of the plurality of projection optical systems. A plurality of second reference marks are provided on the substrate table; the second reference marks are substantially conjugate with the first reference marks with respect to the projection optical systems and are in a predetermined positional relation with the first reference marks in in-plane directions of the mask and the photosensitive substrate. A positional deviation detector detects positional deviations between the first reference marks and second reference marks when light beams from the illumination optical system are radiated onto the plurality of first reference marks to project the plurality of first reference marks through the projection optical systems onto the plurality of second reference marks. A correcting device corrects imaging characteristics of the projection optical systems, based on the positional deviations. The first reference marks can comprise a single aperture of a plurality of apertures. A reverse-type aperture may be employed. The positional deviation detector may include a single photodetector or a plurality of photodetectors.
摘要翻译：投影曝光装置包括用于照亮掩模上的多个部分区域的照明光学系统。多个投影光学系统各自投影如此照射到感光基片上的部分区域的图像。掩模台保持面具。位置检测器检测掩模台的位置。基板台保持感光基板。多个第一参考标记设置在掩模台上; 多个第一参考标记中的每一个被布置在与多个投影光学系统中的每一个对应的位置处。多个第二参考标记设置在衬底台上; 第二参考标记与第一参考标记相对于投影光学系统基本共轭，并且与掩模和感光基板的面内方向上的第一参考标记处于预定的位置关系。当将来自照明光学系统的光束照射到多个第一参考标记上时，位置偏差检测器检测第一参考标记和第二参考标记之间的位置偏差，以将多个第一参考标记通过投影光学系统突出到多个第二个参考标记。校正装置基于位置偏差校正投影光学系统的成像特性。第一参考标记可以包括多个孔的单个孔。可以采用反向孔径。位置偏差检测器可以包括单个光电检测器或多个光电检测器。

4. 发明申请

US20130199400A1 GAS GENERATOR, GAS GENERATOR HOLDER AND METHOD FOR MANUFACTURING GAS GENERATOR HOLDER 有权
标题翻译：气体发生器，气体发生器支架及制造气体发生器支架的方法
公开(公告)号：US20130199400A1
公开(公告)日：2013-08-08
申请号：US13877826
申请日：2011-10-03
申请人： Toshio Matsuura , Shigeru Maeda , Eiji Komatsu , Masahiro Kato , Kenichirou Yamashita
发明人： Toshio Matsuura , Shigeru Maeda , Eiji Komatsu , Masahiro Kato , Kenichirou Yamashita
IPC分类号： C06D5/00 , B21K23/00
CPC分类号： C06D5/00 , B21K23/00 , B60R22/1954 , F42B3/103 , F42B3/195 , F42B3/26
摘要： A gas generator includes a holder made of metal having assembled thereto a cup filled with a gas generating agent and an igniter for burning the gas generating agent. The holder includes a body part, and an igniter fixing engagement part and a cup fixing engagement part projecting from the body part. These engagement parts are bent, so that the igniter and the cup are fixed by crimping to the holder. The engagement parts are both finish shaped by forging processing. A metal flow appearing in superficial layers of the engagement parts extends continuously from the body part through the engagement parts to return to the body part, without being divided in surfaces of the engagement parts.
摘要翻译：气体发生器包括由金属制成的保持器，其上装有填充有气体发生剂的杯子和用于燃烧气体发生剂的点火器。保持器包括主体部分和点火器固定接合部分以及从主体部分突出的杯子固定接合部分。这些接合部分被弯曲，使得点火器和杯子通过卷曲固定到支架上。接合部分均通过锻造加工成型。出现在接合部件的表面层中的金属流动通过接合部分从主体部分连续地延伸以返回到主体部分，而不被划分在接合部分的表面中。

5. 发明授权

US07876118B2 Test equipment 失效
标题翻译：测验设备
公开(公告)号：US07876118B2
公开(公告)日：2011-01-25
申请号：US12365900
申请日：2009-02-05
申请人： Satoshi Iwamoto , Shigeki Takizawa , Koichi Yatsuka , Toshio Matsuura
发明人： Satoshi Iwamoto , Shigeki Takizawa , Koichi Yatsuka , Toshio Matsuura
IPC分类号： G01R31/26
CPC分类号： G01R31/31919 , G01R31/31922
摘要： Provided is a test apparatus that tests a device under test, comprising a pattern generating section that generates a test pattern for testing the device under test; a signal supplying section that supplies the device under test with a test signal corresponding to the test pattern; a trigger generating section that supplies a trigger signal to an external instrument connected to the device under test; and a synchronization control section that outputs, to the trigger generating section, a synchronization signal instructing generation of the trigger signal, based on at least a portion of the test pattern generated by the pattern generating section.
摘要翻译：提供了一种测试被测设备的测试装置，包括产生用于测试被测设备的测试图案的模式产生部分; 信号提供部分，向所述被测器件供给与所述测试图案相对应的测试信号; 触发生成部，其将触发信号提供给与被测设备连接的外部仪器; 以及同步控制部，其基于由所述图案生成部生成的所述测试图案的至少一部分，向所述触发生成部输出指示所述触发信号的生成的同步信号。

6. 发明授权

US4677301A Alignment apparatus 失效
标题翻译：校准装置
公开(公告)号：US4677301A
公开(公告)日：1987-06-30
申请号：US681843
申请日：1984-12-14
申请人： Akikazu Tanimoto , Toshio Matsuura , Seiro Murakami , Makoto Uehara , Kyoichi Suwa
发明人： Akikazu Tanimoto , Toshio Matsuura , Seiro Murakami , Makoto Uehara , Kyoichi Suwa
IPC分类号： G03B27/53 , B65G1/00 , G03F9/00 , H01L21/027 , H01L21/30 , G01N21/86 , H01J3/14
CPC分类号： G03F9/70
摘要： A position alignment apparatus aligns a photosensitive substrate and a mask (projection image) at high speed and with high precision. The apparatus has a projection optical system for projecting a pattern image on a mask or reticle onto a photosensitive substrate, a detector for detecting a two-dimensional misalignment of a projected pattern image and a wafer, and means for moving the wafer along orthogonal x- and y-axis directions and for rotating the wafer along a rotational direction within a plane defined by the x- and y-axis directions so as to eliminate the misalignment, wherein the detector has first detecting means with an optical system for detecting at least a misalignment of the wafer along the x-axis direction through the projection lens, and second detecting means with an optical system separate from the projection lens and for detecting at least a misalignment of the wafer along a rotational direction.
摘要翻译：位置对准装置以高精度和高精度对准感光基片和掩模（投影图象）。该装置具有用于将掩模或掩模版上的图案图像投影到感光基板上的投影光学系统，用于检测投影图案图像和晶片的二维未对准的检测器，以及用于沿正交x轴移动晶片的装置，和y轴方向，并且用于在由x轴方向和y轴方向限定的平面内沿着旋转方向旋转晶片，以消除所述未对准，其中所述检测器具有第一检测装置，其具有用于检测至少一个晶片沿着x轴方向通过投影透镜偏移，以及第二检测装置，其具有与投影透镜分离的光学系统，并用于至少检测晶片沿旋转方向的不对准。

7. 发明授权

US5985496A Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US5985496A
公开(公告)日：1999-11-16
申请号：US837277
申请日：1997-04-11
申请人： Kei Nara , Toshio Matsuura
发明人： Kei Nara , Toshio Matsuura
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70275 , G03F7/2002 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： An exposure apparatus for exposing a photomask pattern onto a photosensitive substrate via a plurality of optical systems includes a source of illumination for irradiating the photomask pattern with beams of light adapted to pass through the pattern and optical systems onto the substrate. A scanning mechanism for synchronously scanning the photomask pattern with the beams of light is included to transfer the pattern to the substrate. A plurality of illumination intensity measuring devices is provided for substantially simultaneously measuring the illumination intensities of the beams of light passing through the optical systems.
摘要翻译：用于通过多个光学系统将光掩模图案曝光到感光基板上的曝光装置包括用于将适合于穿过图案的光束照射到光掩模图案和光学系统到基板上的照明源。包括用于将光束同时扫描光掩模图案的扫描机构，以将图案转移到基板。提供了多个照明强度测量装置，用于基本上同时测量通过光学系统的光束的照明强度。

8. 发明授权

US5504596A Exposure method and apparatus using holographic techniques 失效
标题翻译：使用全息技术的曝光方法和装置
公开(公告)号：US5504596A
公开(公告)日：1996-04-02
申请号：US169055
申请日：1993-12-20
申请人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
发明人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
IPC分类号： G03F7/20 , G03H1/00 , G03H1/26
CPC分类号： G03F7/70558 , G03F7/70625 , G03H1/00
摘要： An exposure apparatus is used for reproducing a mask pattern of a semiconductor device or the like onto a photosensitive substrate using a holography. The holography is utilized also in a process for alignment between a mask pattern hologram and an exposure region of the substrate. The pattern hologram is recorded to a recording medium by interference between an object wave from the pattern and a reference wave, and a second hologram is formed to the medium by diffraction light from an alignment mark formed on the mask. Prior to reconstruction of the pattern image, reconstruction light from the second hologram, illuminated with a reconstruction wave, is irradiated onto the substrate arranged in place of the mask. A reproduction image of the alignment mark on the substrate surface illuminated with the reconstruction light is measured, and relative displacement between the medium and the substrate is detected from a result of the measurement. The relative positional relationship between the medium and the substrate is corrected in accordance with the displacement information, and, thereafter, the surface is exposed with a reconstruction image of the pattern hologram.
摘要翻译：使用曝光装置将半导体装置等的掩模图案再现到使用全息术的感光基板上。全息术也用于掩模图案全息图和衬底的曝光区域之间的对准的过程。图案全息图通过来自图案的对象波与参考波之间的干涉而被记录到记录介质上，并且通过衍射光从形成在掩模上的对准标记的衍射光形成第二全息图。在图案图像重建之前，用重建波照射的来自第二全息图的重建光被照射到布置在掩模上的衬底上。测量用重建光照射的基板表面上的对准标记的再现图像，并且从测量结果检测介质和基板之间的相对位移。根据位移信息来校正介质和基板之间的相对位置关系，然后用图案全息图的重构图像曝光表面。

9. 发明授权

US4702606A Position detecting system 失效
标题翻译：位置检测系统
公开(公告)号：US4702606A
公开(公告)日：1987-10-27
申请号：US737434
申请日：1985-05-24
申请人： Toshio Matsuura , Seiro Murakami , Yuji Imai , Kazuya Ohta , Akikazu Tanimoto
发明人： Toshio Matsuura , Seiro Murakami , Yuji Imai , Kazuya Ohta , Akikazu Tanimoto
IPC分类号： G03F7/20 , G03F9/00 , G01B11/00
CPC分类号： G03F9/7049 , G03F7/70358
摘要： An alignment system includes an element bearing a plurality of patterns on the surface thereof, the plurality of patterns being arranged in a predetermined direction, a stage for holding the element, scanning means for scanning the plurality of patterns of the element held by the stage in the predetermined direction and making position signals indicative of the positions of the plurality of patterns in the predetermined direction on the element, and operation means for operating and putting out a signal indicative of a position which is in a predetermined relation with the positions of the plurality of patterns in the predetermined direction, on the basis of the position signals.
摘要翻译：对准系统包括在其表面上具有多个图案的元件，多个图案沿预定方向布置，用于保持元件的台架，用于扫描由台架保持的元件的多个图案的扫描装置所述预定方向和指示所述多个图案在所述元件上的所述预定方向上的位置的位置信号，以及操作装置，用于操作和输出指示与所述多个位置相关的预定关系的位置的信号的图案在预定方向上，基于位置信号。

10. 发明授权

US4699515A Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween 失效
标题翻译：将掩模图案转移到基板上的工艺和用于在其间对准的装置
公开(公告)号：US4699515A
公开(公告)日：1987-10-13
申请号：US705699
申请日：1985-02-26
申请人： Akikazu Tanimoto , Toshio Matsuura , Kyoichi Suwa
发明人： Akikazu Tanimoto , Toshio Matsuura , Kyoichi Suwa
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/70
摘要： In an exposure apparatus for manufacturing semiconductor devices, a pattern on a photomask is aligned with a plurality of patterns formed on a wafer in a manner that detects and corrects misalignment, including, inter alia, rotational errors, not only between a photomask and a wafer, but also between a photomask and individual chips formed on the wafer, so that pattern matching is attained with very high accuracy. Apparatus for achieving this result employs different arrangements of alignment marks together with optical systems and positional adjustment devices.
摘要翻译：在用于制造半导体器件的曝光装置中，光掩模上的图案以形成在晶片上的多个图案与检测和校正不对准的方式对准，包括尤其是除了光掩模和晶片之间的旋转误差，而且在光掩模和形成在晶片上的单个芯片之间，使得以非常高的精度获得图案匹配。用于实现该结果的装置与光学系统和位置调整装置一起使用对准标记的不同布置。

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