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1. 发明授权

US5912726A Projection exposure apparatus and method having a positional deviation detection system that employs light from an exposure illumination system 失效
标题翻译：具有使用来自曝光照明系统的光的位置偏差检测系统的投影曝光装置和方法
公开(公告)号：US5912726A
公开(公告)日：1999-06-15
申请号：US922598
申请日：1997-09-03
申请人： Manabu Toguchi , Kei Nara , Masaichi Murakami , Nobutaka Fujimori , Toshio Matsuura
发明人： Manabu Toguchi , Kei Nara , Masaichi Murakami , Nobutaka Fujimori , Toshio Matsuura
IPC分类号： G03B27/32 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , G03B27/42 , G03B27/54
CPC分类号： G03F9/7026 , G03F7/70241 , G03F7/70275
摘要： A projection exposure apparatus includes an illumination optical system for illuminating a plurality of partial areas on a mask. A plurality of projection optical systems each project images of the partial areas thus illuminated onto a photosensitive substrate. A mask table holds the mask. A position detector detects a position of the mask table. A substrate table holds the photosensitive substrate. A plurality of first reference marks are provided on the mask table; each of the plurality of first reference marks are disposed at a position corresponding to each of the plurality of projection optical systems. A plurality of second reference marks are provided on the substrate table; the second reference marks are substantially conjugate with the first reference marks with respect to the projection optical systems and are in a predetermined positional relation with the first reference marks in in-plane directions of the mask and the photosensitive substrate. A positional deviation detector detects positional deviations between the first reference marks and second reference marks when light beams from the illumination optical system are radiated onto the plurality of first reference marks to project the plurality of first reference marks through the projection optical systems onto the plurality of second reference marks. A correcting device corrects imaging characteristics of the projection optical systems, based on the positional deviations. The first reference marks can comprise a single aperture of a plurality of apertures. A reverse-type aperture may be employed. The positional deviation detector may include a single photodetector or a plurality of photodetectors.
摘要翻译：投影曝光装置包括用于照亮掩模上的多个部分区域的照明光学系统。多个投影光学系统各自投影如此照射到感光基片上的部分区域的图像。掩模台保持面具。位置检测器检测掩模台的位置。基板台保持感光基板。多个第一参考标记设置在掩模台上; 多个第一参考标记中的每一个被布置在与多个投影光学系统中的每一个对应的位置处。多个第二参考标记设置在衬底台上; 第二参考标记与第一参考标记相对于投影光学系统基本共轭，并且与掩模和感光基板的面内方向上的第一参考标记处于预定的位置关系。当将来自照明光学系统的光束照射到多个第一参考标记上时，位置偏差检测器检测第一参考标记和第二参考标记之间的位置偏差，以将多个第一参考标记通过投影光学系统突出到多个第二个参考标记。校正装置基于位置偏差校正投影光学系统的成像特性。第一参考标记可以包括多个孔的单个孔。可以采用反向孔径。位置偏差检测器可以包括单个光电检测器或多个光电检测器。

2. 发明授权

US06204912B1 Exposure method, exposure apparatus, and mask 失效
标题翻译：曝光方法，曝光装置和面罩
公开(公告)号：US06204912B1
公开(公告)日：2001-03-20
申请号：US08848394
申请日：1997-05-08
申请人： Makoto Tsuchiya , Kei Nara , Nobutaka Fujimori , Manabu Toguchi , Masami Seki
发明人： Makoto Tsuchiya , Kei Nara , Nobutaka Fujimori , Manabu Toguchi , Masami Seki
IPC分类号： G03B2742
CPC分类号： G03F7/70066 , G03F7/70275 , G03F7/70283 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： An exposure method, exposure apparatus and mask are suitable for manufacturing an active matrix liquid crystal display including, for example, a gate electrode layer and a source/drain electrode layer. A stitching portion between unit patterns in a second layer is offset from the stitching portion in a first layer by a predetermined distance. The stitching portions of the second layer are always positioned over unit patterns of the first layer. Accordingly, the contrast gap that occurs at the stitching portion as a boundary is defined only by an error in the exposure position of the second layer. The contrast gap is not affected by an error in the exposure position of the first layer, unlike the conventional method. Because the contrast gap caused by the error in the exposure position of the first layer is eliminated, the total contrast gap that occurs at the stitching portion as a boundary is significantly reduced.
摘要翻译：曝光方法，曝光装置和掩模适用于制造包括例如栅极电极层和源极/漏极电极层的有源矩阵液晶显示器。第二层中的单元图案之间的缝合部分在第一层中与缝合部分偏移预定距离。第二层的缝合部分总是位于第一层的单位图案之上。因此，在作为边界的缝合部分发生的对比度间隙仅由第二层的曝光位置的误差限定。与传统方法不同，对比度间隙不受第一层的曝光位置的误差的影响。由于消除了由第一层的曝光位置的误差引起的对比度间隙，所以在作为边界的缝合部分发生的总对比度间隙显着减小。

3. 依法登记的发明

USH1733H Exposure method 失效
标题翻译：曝光方法
公开(公告)号：USH1733H
公开(公告)日：1998-06-02
申请号：US539986
申请日：1995-10-06
申请人： Kei Nara , Masaichi Murakami , Nobutaka Fujimori
发明人： Kei Nara , Masaichi Murakami , Nobutaka Fujimori
IPC分类号： G03F7/20 , G03B27/32 , G03F9/00 , H01L21/027
CPC分类号： G03F9/70
摘要： An exposure method for transferring a pattern on a mask onto a photosensitive substrate. The exposure method has steps of (1) preparing the mask with a first alignment mark and the substrate with a second alignment mark, a length of the first alignment mark in a scan direction being shorter than a length of the second alignment mark in the same direction; (2) scanning the first and second alignment marks; (3) detecting an intensity of the light which has been emitted from the light source optical system and irradiated the mask and the substrate; (4) calculating an amount of dislocation between the first and second alignment marks in the scan direction; (5) correcting the dislocation between the mask and the substrate; (6) effecting an exposure to transfer the pattern on the mask onto the substrate.
摘要翻译：用于将掩模上的图案转印到感光基板上的曝光方法。曝光方法具有以下步骤：（1）制备具有第一对准标记的掩模和具有第二对准标记的基板，第一对准标记在扫描方向上的长度短于其中的第二对准标记的长度方向; （2）扫描第一和第二对准标记; （3）检测从光源光学系统发射的光的强度并照射掩模和基板; （4）计算扫描方向上的第一和第二对准标记之间的位错量; （5）校正掩模和基板之间的位错; （6）进行曝光以将掩模上的图案转印到基板上。

4. 发明授权

US5973766A Exposure method and exposure device 失效
标题翻译：曝光方法和曝光装置
公开(公告)号：US5973766A
公开(公告)日：1999-10-26
申请号：US856029
申请日：1997-05-14
申请人： Toshio Matsuura , Nobutaka Fujimori , Toshinobu Morioka , Kei Nara
发明人： Toshio Matsuura , Nobutaka Fujimori , Toshinobu Morioka , Kei Nara
IPC分类号： G03F7/20 , G03F9/00 , G03B27/68 , G03B27/42
CPC分类号： G03F7/70691 , G03F7/70241 , G03F7/70258 , G03F7/70425 , G03F7/70475 , G03F7/70883 , G03F9/70
摘要： An exposure device sequentially transfers a pattern formed in a mask onto connected multiple regions present consecutively on a substrate through a projection optical system. The device includes a substrate stage moving in two dimensions and carrying the substrate in a movement coordinate system determined by a first axis and a mutually perpendicular second axis. A mark detecting sensor detects positions of alignment marks formed on the substrate. A magnification adjustment device corrects the magnification of the projection optical system. At least one calculating device is used to separately calculate extension amounts of the substrate in the direction of the first axis and in the direction of the second axis based on information relating to the positions of the alignment marks detected by the mark detecting sensor. An amount of magnification correction provided by the magnification adjustment device is set based on the extension amounts calculated, and scales of the first and second axes of the movement coordinate system specifying movement of the substrate stage are changed by identical amounts.
摘要翻译：曝光装置通过投影光学系统将形成在掩模中的图案顺序地传送到在基板上连续存在的连续的多个区域上。该装置包括在两个维度上移动的衬底台，并且以由第一轴线和相互垂直的第二轴线确定的运动坐标系承载衬底。标记检测传感器检测在基板上形成的对准标记的位置。放大调整装置校正投影光学系统的放大率。基于与由标记检测传感器检测到的对准标记的位置有关的信息，使用至少一个计算装置来分别计算基板在第一轴方向和第二轴方向上的延伸量。基于所计算的扩展量来设定由倍率调整装置提供的倍率校正量，并且指定基准载台的移动坐标系的第一和第二轴的尺寸相等量的变化。

5. 发明授权

US5565988A Alignment method and apparatus 失效
标题翻译：对准方法和装置
公开(公告)号：US5565988A
公开(公告)日：1996-10-15
申请号：US384953
申请日：1995-02-07
申请人： Kei Nara , Nobutaka Fujimori
发明人： Kei Nara , Nobutaka Fujimori
IPC分类号： G01B11/00 , G03F9/00 , G06T1/00 , H01L21/027 , H01L21/68
CPC分类号： G03F9/70
摘要： In an alignment method an apparatus for scanning an alignment mark formed on a substrate with a beam of light, and detecting the position of the alignment mark on the basis of a signal conforming to reflected light obtained from the alignment mark, a dummy mark of the same shape as the alignment mark is formed near the alignment mark formed on the substrate, the dummy mark and the alignment mark are continuously scanned by the beam of light, and during the time from after the beam of light has scanned the dummy mark until the scanning of the alignment mark is started, the intensity (signal level) of a first signal obtained in conformity with reflected light reflected by the dummy mark is found to thereby calculate the amplification factor of the signal, and during the scanning of the alignment mark, a second signal obtained in conformity with reflected Light reflected from the alignment mark is amplified with this amplification factor, and the position of the alignment mark is detected on the basis of the amplified second signal.
摘要翻译：在对准方法中，一种用光束扫描形成在基板上的对准标记的装置，并且基于符合从对准标记获得的反射光的信号检测对准标记的位置，在形成在基板上的对准标记附近形成与对准标记相同的形状，通过光束连续地扫描虚设标记和对准标记，并且在光束从扫描后的时间到虚拟标记直到开始对准标记的扫描，发现根据由虚拟标记反射的反射光获得的第一信号的强度（信号电平），从而计算信号的放大系数，并且在对准标记的扫描期间，利用该放大系数放大与从对准标记反射的反射光一致的第二信号，并检测对准标记的位置基于放大的第二信号。

6. 发明授权

US5523841A Distance measuring apparatus using multiple switched interferometers 失效
标题翻译：使用多个切换干涉仪的距离测量装置
公开(公告)号：US5523841A
公开(公告)日：1996-06-04
申请号：US357090
申请日：1994-12-15
申请人： Kei Nara , Toshio Matsuura
发明人： Kei Nara , Toshio Matsuura
IPC分类号： G03F9/00 , G01B11/00 , G03F7/20 , H01L21/027 , H01L21/30 , G01B9/02
CPC分类号： G03F7/70716 , G01B11/002
摘要： A plurality of interference length (distance) measuring means which are opposed to a movable mirror are aligned in the direction in which said movable mirror moves at an interval narrower than the length of the mirror surface. These interference length measuring means are switched according to movement of the movable mirror. Thus, the range within which distances from the mirror surface are measured can be made wider than the length of the mirror surface of the movable mirror.
摘要翻译：与可动镜相对的多个干涉长度（距离）测量装置在所述可移动镜以比镜面的长度窄的间隔移动的方向上对准。这些干涉长度测量装置根据可移动镜的移动而被切换。因此，可以使与测量镜面距离的范围比可动镜的镜面的长度更宽。

7. 发明授权

US5985496A Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US5985496A
公开(公告)日：1999-11-16
申请号：US837277
申请日：1997-04-11
申请人： Kei Nara , Toshio Matsuura
发明人： Kei Nara , Toshio Matsuura
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70275 , G03F7/2002 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： An exposure apparatus for exposing a photomask pattern onto a photosensitive substrate via a plurality of optical systems includes a source of illumination for irradiating the photomask pattern with beams of light adapted to pass through the pattern and optical systems onto the substrate. A scanning mechanism for synchronously scanning the photomask pattern with the beams of light is included to transfer the pattern to the substrate. A plurality of illumination intensity measuring devices is provided for substantially simultaneously measuring the illumination intensities of the beams of light passing through the optical systems.
摘要翻译：用于通过多个光学系统将光掩模图案曝光到感光基板上的曝光装置包括用于将适合于穿过图案的光束照射到光掩模图案和光学系统到基板上的照明源。包括用于将光束同时扫描光掩模图案的扫描机构，以将图案转移到基板。提供了多个照明强度测量装置，用于基本上同时测量通过光学系统的光束的照明强度。

8. 发明授权

US5617211A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5617211A
公开(公告)日：1997-04-01
申请号：US515783
申请日：1995-08-16
申请人： Kei Nara , Toshio Matsuura , Muneyasu Yokota , Yukio Kakizaki , Yoshio Fukami , Seiji Miyazaki , Tsuyoshi Narabe
发明人： Kei Nara , Toshio Matsuura , Muneyasu Yokota , Yukio Kakizaki , Yoshio Fukami , Seiji Miyazaki , Tsuyoshi Narabe
IPC分类号： G03F7/20 , G03F9/00 , G01B11/00 , G01U21/86 , G06K7/015 , G03B27/52
CPC分类号： G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F9/70
摘要： This invention relates to an exposure apparatus for synchronously scanning a mask and a photosensitive substrate with respect to a plurality of projection optical systems, thereby properly transferring an entire pattern area on the mask onto the photosensitive substrate. A plurality of sets of mask-side reference marks and substrate-side reference marks are arranged at positions corresponding to each other on the mask surface and the photosensitive substrate surface and at least at two positions conjugate with the plurality of projection optical systems. The displacement amount between an image of a mask-side reference mark or a substrate-side reference mark formed on the corresponding substrate-side reference mark or mask-side reference mark through the projection optical system and the position of the substrate-side reference mark and the mask-side reference mark is measured. The imaging characteristics of the plurality of projection optical systems are corrected in accordance with the displacement amount.
摘要翻译：本发明涉及一种用于相对于多个投影光学系统同时扫描掩模和感光基板的曝光装置，从而将掩模上的整个图案区域适当地转印到感光基板上。多个掩模侧参考标记和基板侧参考标记组被布置在掩模表面和感光基板表面上并且至少在与多个投影光学系统共轭的两个位置处彼此对应的位置处。掩模侧基准标记的图像或通过投影光学系统形成在相应的基板侧参考标记或掩模侧参考标记上的基板侧参考标记之间的位移量和基板侧参考标记的位置并且测量掩模侧参考标记。根据位移量校正多个投影光学系统的成像特性。

9. 发明授权

US09178155B2 Flexible substrate, manufacturing method of display element, and manufacturing apparatus of display element 有权
标题翻译：柔性基板，显示元件的制造方法以及显示元件的制造装置
公开(公告)号：US09178155B2
公开(公告)日：2015-11-03
申请号：US12576752
申请日：2009-10-09
申请人： Kei Nara , Tomohide Hamada , Masaki Kato , Tohru Kiuchi
发明人： Kei Nara , Tomohide Hamada , Masaki Kato , Tohru Kiuchi
IPC分类号： B05D5/12 , B65G47/26 , B65G1/133 , H01L51/00 , H01L51/52 , H01L51/56
CPC分类号： H01L51/00 , H01L51/52 , H01L51/56 , H01L2251/5338 , Y10T428/24479
摘要： In a manufacturing apparatus of display element, a display element is formed in a flexible substrate that has a first surface and a second surface that is an opposite surface thereof, and this manufacturing apparatus of display element includes a transportation section that transports the flexible substrate in a predetermined direction that intersects with a width direction of the flexible substrate; a first partition wall formation section that forms a first partition wall for a display element in the first surface; and a second partition wall formation section that forms a second partition wall in the second surface.
摘要翻译：在显示元件的制造装置中，显示元件形成在柔性基板中，该柔性基板具有作为其相对表面的第一表面和第二表面，并且该显示元件的制造装置包括：输送柔性基板的输送部与柔性基板的宽度方向相交的预定方向; 第一分隔壁形成部，其形成第一表面中的显示元件的第一分隔壁; 以及在所述第二表面中形成第二隔壁的第二分隔壁形成部。

10. 发明授权

US5777722A Scanning exposure apparatus and method 失效
标题翻译：扫描曝光装置和方法
公开(公告)号：US5777722A
公开(公告)日：1998-07-07
申请号：US654382
申请日：1996-05-28
申请人： Seiji Miyazaki , Tsuyoshi Narabe , Kei Nara , Tomohide Hamada , Kazuaki Saiki , Hideji Goto , Muneyasu Yokota
发明人： Seiji Miyazaki , Tsuyoshi Narabe , Kei Nara , Tomohide Hamada , Kazuaki Saiki , Hideji Goto , Muneyasu Yokota
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G03B27/32 , G01B11/00
CPC分类号： G03F7/70275 , G03F7/70358 , G03F9/70
摘要： A scanning exposure apparatus is arranged to illuminate a mask, to project an image of the mask through a projection optical system onto a photosensitive substrate, and to move the mask and the photosensitive substrate relative to the projection optical system, thereby effecting exposure of an entire surface of the mask on the photosensitive substrate, and the exposure apparatus comprises a position detector which detects a relative positional relation between the mask and the photosensitive substrate; a memory which stores positional information obtained by the position detector; a position correcting device which corrects the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory device; and a controller which makes the position detector detect the relative positional relation between the mask and the photosensitive substrate while the mask and the photosensitive substrate are carried past a projection region of the projection optical system to an exposure start position, and makes the position correcting device correct the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory, while the mask and the photosensitive substrate are stopped at the exposure start position and/or during the exposure.
摘要翻译：扫描曝光装置被布置为照亮掩模，通过投影光学系统将光掩模的图像投射到感光基板上，并且使掩模和感光基板相对于投影光学系统移动，从而实现整个曝光感光基板上的掩模表面，曝光装置包括检测掩模和感光基板之间的相对位置关系的位置检测器; 存储器，其存储由所述位置检测器获取的位置信息; 基于从存储装置读出的位置信息来校正掩模和感光基板之间的相对位置关系的位置校正装置; 以及控制器，其使得位置检测器在将掩模和感光基板通过投影光学系统的投影区域到曝光开始位置时检测掩模和感光基板之间的相对位置关系，并使位置校正装置基于从存储器读出的位置信息，掩模和感光基板在曝光开始位置和/或曝光期间停止时，校正掩模和感光基板之间的相对位置关系。

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