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    • 1. 发明授权
    • Apparatus for detecting position of reference pattern
    • 用于检测参考图案位置的装置
    • US4860374A
    • 1989-08-22
    • US218503
    • 1988-07-06
    • Seiro MurakamiAkikazu TanimotoSusumu MakinouchiHidemi KawaiMasaichi Murakami
    • Seiro MurakamiAkikazu TanimotoSusumu MakinouchiHidemi KawaiMasaichi Murakami
    • G03F9/00G06K9/46
    • G03F9/70G06K9/4609
    • An apparatus for detecting a position of a reference pattern or mark formed in a substrate to be aligned with a photomask pattern performs the following functions: scanning a reference pattern having at least two edges and generating a time-serial pattern signal corresponding to the scanned pattern; extracting all scanning positions at which a waveform of the pattern signal has a shape corresponding to an edge of the pattern within a predetermined scanning range including the pattern; selecting one pair from all possible pairs of a plurality of extracted scanning positions in accordance with a degree to which a pattern signal between the two scanning positions defined by each pair satisfies predetermined waveform conditions; and determining as a pattern position a predetermined position at which the interval between the two scanning positions of the selected pair is divided into two intervals by a predetermined ratio.
    • 用于检测形成在衬底中的与光掩模图案对准的参考图案或标记的位置的装置执行以下功能:扫描具有至少两个边缘的参考图案,并产生与扫描图案对应的时间序列图案信号 ; 提取在包括图案的预定扫描范围内图案信号的波形具有与图案的边缘相对应的形状的所有扫描位置; 根据由每对定义的两个扫描位置之间的图案信号满足预定波形条件的程度,从多个提取的扫描位置的所有可能的对中选择一对; 并且将所选择的对的两个扫描位置之间的间隔被划分成两个间​​隔预定比例的预定位置作为图案位置。
    • 2. 发明授权
    • Projection optical apparatus
    • 投影光学仪器
    • US4801977A
    • 1989-01-31
    • US198688
    • 1988-05-24
    • Shoji IshizakaHideo MizutaniSusumu MakinouchiAkikazu Tanimoto
    • Shoji IshizakaHideo MizutaniSusumu MakinouchiAkikazu Tanimoto
    • H01L21/30G03F7/20H01L21/027G03B27/52G03B27/74G03B27/80
    • G03F7/706G03F7/70241G03F7/70858G03F7/70883
    • A projection optical apparatus comprises a projection optical system for projecting the image of an object onto a substrate, data collecting means for obtaining data regarding a factor which causes a variation in the optical characteristic of the projection optical system, adjusting means for adjusting the relation between the substrate and the image of the object relative to the variation in the optical characteristic of the projection optical system, means for determining the amount of adjustment by the adjusting means in accordance with a model formula using a predetermined parameter on the basis of the data obtained by the data collecting means, means for independently measuring the variation in the optical characteristic of the projection optical system, and means for correcting the parameter of the model formula on the basis of the result measured by the measuring means.
    • 投影光学装置包括用于将物体的图像投影到基板上的投影光学系统,用于获得关于引起投影光学系统的光学特性变化的因素的数据的数据收集装置,用于调整投影光学系统的光学特性之间的关系的调整装置 基板和物体相对于投影光学系统的光学特性的变化的图像,用于根据获得的数据使用预定参数根据模型公式确定调节装置的调整量的装置 通过数据采集装置,用于独立地测量投影光学系统的光学特性的变化的装置,以及用于基于由测量装置测量的结果来校正模型公式的参数的装置。
    • 8. 发明授权
    • Exposure apparatus
    • 曝光装置
    • US5907392A
    • 1999-05-25
    • US682992
    • 1996-07-18
    • Susumu Makinouchi
    • Susumu Makinouchi
    • G03B27/42G03F7/20G01N21/86
    • G03F7/70358G03B27/42G03F7/70725G03F7/70775
    • A scanning type exposure apparatus includes a mask stage position-measuring unite a substrate stage position-measuring unit, an arithmetic processing unit, and a control unit. The arithmetic processing unit multiplies results of measurement (WX, WY, W.theta.) by the substrate position-measuring unit by a conversion vector including components containing a magnification of a projection optical system and an angle of rotation between a mask and a substrate to determine a target vector quantity (RX*, RY*, R.theta.*) of a mask stage. An error vector is determined by subtracting, from the target vector quantity, results of measurement (RX, RY, R.theta.) by the mask stage position-measuring unit. The controller controls the mask stage so that the error vector becomes zero. The exposure apparatus includes correcting sections for correcting time lags in measurement by the respective position-measuring units. The arithmetic processing unit uses corrected positional information. The mask stage can accurately follow a substrate stage.
    • 扫描型曝光装置包括掩模台位置测量,联合基板台位置测量单元,运算处理单元和控制单元。 算术处理单元通过包括投影光学系统的放大率和掩模与基板之间的旋转角度的分量的转换矢量将测量结果(WX,WY,Wθ)相乘,以确定 掩模台的目标矢量(RX *,RY *,Rθ*)。 通过从掩模台位置测量单元从目标矢量量中减去测量结果(RX,RY,Rθ)来确定误差向量。 控制器控制掩模级,使得误差向量变为零。 曝光装置包括用于通过各个位置测量单元来校正测量中的时间滞后的校正部分。 算术处理单元使用校正的位置信息。 掩模阶段可以准确地跟随衬底阶段。