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1. 发明申请

WO2007002748A3 LPP EUV DRIVE LASER INPUT SYSTEM 审中-公开
公开(公告)号：WO2007002748A3
公开(公告)日：2007-01-04
申请号：PCT/US2006/025171
申请日：2006-06-27
申请人： CYMER, INC. , SIMMONS, Rodney, D. , VIATELLA, John , HOFFMAN, Jerzy, R. , WEBB, R., Kyle , BYKANOV, Alexander, N. , KHODYKIN, Oleh
发明人： SIMMONS, Rodney, D. , VIATELLA, John , HOFFMAN, Jerzy, R. , WEBB, R., Kyle , BYKANOV, Alexander, N. , KHODYKIN, Oleh
IPC分类号： G21G4/02 , G21G4/04 , G01J3/10
摘要： A laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source and method of operating same is disclosed which may comprise an EUV plasma production chamber (12) having a chamber wall (14); a drive laser entrance window (16) in the chamber wall; a drive laser entrance enclosure (20) intermediate the entrance window (16) and a plasma initiation site (not shown) within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening (120) and the entrance window comprising at least one drive laser passage aperture (92). The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space (not shown). The at least one drive laser aperture passage (80) may comprise at least two drive laser aperture passages (82, 84).

2. 发明申请

WO2007002748A2 LPP EUV DRIVE LASER INPUT SYSTEM 审中-公开
标题翻译： LPP EUV驱动激光输入系统
公开(公告)号：WO2007002748A2
公开(公告)日：2007-01-04
申请号：PCT/US2006025171
申请日：2006-06-27
申请人： CYMER INC , SIMMONS RODNEY D , VIATELLA JOHN , HOFFMAN JERZY R , WEBB R KYLE , BYKANOV ALEXANDER N , KHODYKIN OLEH
发明人： SIMMONS RODNEY D , VIATELLA JOHN , HOFFMAN JERZY R , WEBB R KYLE , BYKANOV ALEXANDER N , KHODYKIN OLEH
IPC分类号： G21G4/00
CPC分类号： H05G2/001
摘要： A laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages. The laser passage aperture may define an opening large enough to let the drive laser beam pass without attenuation and small enough to substantially reduce debris passing through the laser passage aperture in the direction of the entrance window.
摘要翻译：公开了一种激光产生的等离子体（“LPP”）极紫外（“EUV”）光源及其操作方法，其可以包括具有室壁的EUV等离子体生产室; 在室壁中的驱动激光入口窗口; 在入口窗口中间的驱动激光入口外壳和腔室内的等离子体起始位置，并且包括入口外壳远端开口; 在远端开口和入口窗之间的至少一个孔板包括至少一个驱动激光通道孔。至少一个孔板可以包括至少两个孔板，其包括限定孔板中间空间的第一孔板和第二孔板。至少一个驱动激光孔通道可以包括至少两个驱动激光孔通道。激光通道孔可以限定足够大的开口，以使驱动激光束通过而没有衰减并且足够小以基本上减少通过入口窗的方向穿过激光通道孔的碎屑。

3. 发明申请

WO2005091879A2 EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源
公开(公告)号：WO2005091879A2
公开(公告)日：2005-10-06
申请号：PCT/US2005005935
申请日：2005-02-24
申请人： CYMER INC , PARTLO WILLIAM N , BOWERING NORBERT R , ERSHOV ALEXANDER I , FOMENKOV IGOR V , OLIVER I ROGER , VIATELLA JOHN , JACQUES ROBERT N
发明人： PARTLO WILLIAM N , BOWERING NORBERT R , ERSHOV ALEXANDER I , FOMENKOV IGOR V , OLIVER I ROGER , VIATELLA JOHN , JACQUES ROBERT N
IPC分类号： G03F7/20 , G21K1/06 , H01J35/20 , H05G2/00
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.
摘要翻译：公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集光学元件具有限定期望的等离子体起始位置的焦点，包括：目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中，所述目标流轨迹来自所述目标流轨迹的成像速度摄像机太慢，不能成像形成被作为目标流轨迹成像的目标流的各个等离子体形成目标; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流轨道检测在大致垂直于目标流轨迹的至少一个轴上的目标流轨迹位置的误差。至少一个目标交叉检测器可以瞄准目标轨道并且检测等离子体形成目标通过目标轨道中的选定点的通过。驱动激光触发机构利用目标交叉检测器的输出来确定驱动激光触发的定时，以便驱动激光输出脉冲在等离子体引发目标处沿着目标轨道在一般最接近的等离子体起始位置处相交接近所需的等离子体引发位点。等离子体起始检测器可以瞄准目标轨道并且检测针对相应目标的等离子体起始位置沿着目标轨迹的位置。中间焦点照明器可以照亮形成在中间焦点处的孔，以对至少一个成像装置中的孔进行成像。所述至少一个成像装置可以是至少两个成像装置，每个成像装置基于对所述中间焦点的图像的图像的分析，提供与所述目标轨道与所述中间焦点的图像的垂直中心线轴线分离相关的误差信号所述至少两个成像装置。目标传送反馈和控制系统可以包括目标传送单元; 目标传送位移控制机构至少在对应于从第一成像装置中的图像的分析导出的第一位移误差信号的轴上移动目标传送机构，并且至少在与由第二位移误差信号对第二成像装置中的图像进行分析。

4. 发明申请

WO2012003033A1 HIGH THROUGHPUT SOLAR CELL ABLATION SYSTEM 审中-公开
标题翻译：高通量太阳能电池系统
公开(公告)号：WO2012003033A1
公开(公告)日：2012-01-05
申请号：PCT/US2011/033764
申请日：2011-04-25
申请人： SUNPOWER CORPORATION , HARLEY, Gabriel , PASS, Thomas , COUSINS, Peter John , VIATELLA, John
发明人： HARLEY, Gabriel , PASS, Thomas , COUSINS, Peter John , VIATELLA, John
IPC分类号： B23K26/073
CPC分类号： B23K26/40 , B23K26/067 , B23K26/082 , B23K26/0823 , B23K2203/50 , H01L31/02168 , H01L31/022441 , H01L31/0682 , H01L31/18 , H01L31/202 , Y02E10/52 , Y02E10/547
摘要： A solar cell is formed using a solar cell ablation system (100). The ablation system (100) includes a single laser source (102) and several laser scanners (104). The laser scanners (104) include a master laser scanner, with the rest of the laser scanners (104) being slaved to the master laser scanner. A laser beam from the laser source (102) is split into several laser beams, with the laser beams being scanned onto corresponding wafers using the laser scanners (104) in accordance with one or more patterns. The laser beams may be scanned on the wafers using the same or different power levels of the laser source (102).
摘要翻译：使用太阳能电池消融系统（100）形成太阳能电池。消融系统（100）包括单个激光源（102）和几个激光扫描器（104）。激光扫描器（104）包括主激光扫描器，其余的激光扫描器（104）被从属于主激光扫描器。来自激光源（102）的激光束被分成几个激光束，根据一个或多个图案，使用激光扫描仪（104）将激光束扫描到相应的晶片上。可以使用激光源（102）的相同或不同的功率水平在晶片上扫描激光束。

5. 发明申请

WO2010047768A1 VERY HIGH POWER LASER CHAMBER OPTICAL IMPROVEMENTS 审中-公开
标题翻译：非常大的功率激光室光学改进
公开(公告)号：WO2010047768A1
公开(公告)日：2010-04-29
申请号：PCT/US2009/005691
申请日：2009-10-20
申请人： CYMER, INC. , YE, Hong , ROKITSKI, Rostislava , BERGSTEDT, Robert, A. , ERSHOV, Alexander, I. , LIU, Lauren , VIATELLA, John, W. , RAO, Rajasekhar, H. , CYBULSKI, Raymond, F. , DUFFEY, Thomas, P. , BROWN, Daniel, J. W. , FERRELL, James, J.
发明人： YE, Hong , ROKITSKI, Rostislava , BERGSTEDT, Robert, A. , ERSHOV, Alexander, I. , LIU, Lauren , VIATELLA, John, W. , RAO, Rajasekhar, H. , CYBULSKI, Raymond, F. , DUFFEY, Thomas, P. , BROWN, Daniel, J. W. , FERRELL, James, J.
IPC分类号： H01S3/08
CPC分类号： G02B5/04 , G02B5/12 , H01S3/0057 , H01S3/0346 , H01S3/081 , H01S3/225
摘要： An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
摘要翻译：所公开的主题的一个方面包括减少由以下至少之一组成的光束反向棱镜的激光吸收的方法：增加第一入射点和倒角之间的第一距离，其中第一入射点在在棱镜的第一反射面和第二反射面之间形成棱镜的第一反射面和倒角，其中倒角具有倒角面; 增加第二入射点和倒角之间的第二距离，其中第二入射点在棱镜的第二反射表面上; 并且增加棱镜倒角的倒角表面的反射率。还公开了一种确定光学部件的主切割的方法。还公开了包括至少一个初级切割光学部件的激光器。

6. 发明申请

WO2005091879A3 EUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2005091879A3
公开(公告)日：2005-10-06
申请号：PCT/US2005/005935
申请日：2005-02-24
申请人： CYMER, INC. , PARTLO, William, N. , BOWERING, Norbert, R. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , OLIVER, I., Roger , VIATELLA, John , JACQUES, Robert, N.
发明人： PARTLO, William, N. , BOWERING, Norbert, R. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , OLIVER, I., Roger , VIATELLA, John , JACQUES, Robert, N.
IPC分类号： H01J35/20
摘要： A laser produced plasma extreme ultraviolet light source control system (10) includes a target delivery system (80) for delivering plasma initiation targets (20), an EUV light collection optic (40), a target tracking and feedback system (150), at least one imaging device (60, 62) for providing an image of a target stream track (92); a stream track error detector (120, 122) for detecting an error in the position of the target stream track (92) in at least one axis perpendicular to the target stream track (92).

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