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1. 发明专利

JP2007221163A Electric discharge laser capable of correcting acoustic chirp 审中-公开
标题翻译：电动放电灯可校正声音
公开(公告)号：JP2007221163A
公开(公告)日：2007-08-30
申请号：JP2007107898
申请日：2007-04-17
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： PARTLO WILLIAM N , FOMENKOV IGOR V , HUEBER JEAN-MARC , BOR ZSOLT , ONKELS ECKEHARD D , CATES MICHAEL C , UJAZDOWSKI RICHARD C , FLEUROV VLADIMIR B , GAIDARENKO DMITRI V
IPC分类号： H01S3/03 , H01S3/225 , G03F7/20 , H01S3/036 , H01S3/038
CPC分类号： G03F7/70025 , G03F7/70575 , G03F7/708 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0382
摘要： PROBLEM TO BE SOLVED: To provide an electric discharge laser capable of correcting acoustic chirp. SOLUTION: A structural change and a method for minimizing a wavelength chirp in a high pulse frequency gas electric discharge laser are provided. The present inventor has found that a main cause of a wavelength chirp in a high pulse repetition frequency gas electric discharge laser for a lithography is a pressure wave from the electric discharge which is reflected and returns to an electric discharge region simultaneously upon the following electric discharge. The timing of the arrival of the pressure wave depends on the temperature of a laser gas through which the wave is propagated. A solution for the chirp problem is to relax or disperse a pressure wave generated by the electric discharge, or to maintain the temperature of the laser gas as near as realizable to a constant value. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够校正声线啁啾的放电激光器。解决方案：提供了一种用于最小化高脉冲频率气体放电激光器中的波长啁啾的结构变化和方法。本发明人发现，用于光刻的高脉冲重复频率气体放电激光器中的波长啁啾的主要原因是来自放电的压力波，其在随后的放电时被反射并同时返回到放电区域。压力波的到达时间取决于传播波的激光气体的温度。啁啾问题的解决方案是松弛或分散由放电产生的压力波，或者将激光气体的温度保持在接近可实现的值。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2007281517A F2 laser with visible red and ir control 审中-公开
标题翻译： F2激光与可见的红色和红外控制
公开(公告)号：JP2007281517A
公开(公告)日：2007-10-25
申请号：JP2007181874
申请日：2007-07-11
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： ECKHARDT D ONKERUSU , SANDSTROM RICHARD L , THOMAS P DAFFY
IPC分类号： H01S3/097 , H01S3/225 , H01L21/027 , H01S3/036
摘要： PROBLEM TO BE SOLVED: To provide an F2 excimer laser capable of producing laser pulses with pulse energies greater than 10 mJ at wavelength in the range of 157 nm, at repetition rates in the range of 1,000 to 2,000 Hz. SOLUTION: Using a laser, which is operated in the range of 1000 to 4000 Hz with energies, or pulse energies in the range of 10 to 5 mJ, as an illumination source, a stepper or a scanner equipment can produce integrated circuit resolution of 0.1 μm or less. In a preferred embodiment, the laser was tuned to the Fluorine 157.6 nm line using a set of two external prisms. In a second preferred embodiment, the laser is operated broad band and the 157.6 nm line is selected external to the resonance cavity. In a preferred embodiment, a line width of 0.2 pm is provided using injection seeding. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够产生在157nm范围内的波长下具有大于10mJ的脉冲能量的激光脉冲的F2准分子激光器，其重复率在1,000至2,000Hz的范围内。解决方案：使用在能量范围为1000至4000Hz范围内的激光器或10至5mJ范围内的脉冲能量作为照明源，步进器或扫描仪设备可以产生集成电路分辨率为0.1μm以下。在优选实施例中，使用一组两个外部棱镜将激光器调谐到氟157.6nm线。在第二优选实施例中，激光器被操作为宽带，并且157.6nm线选择在谐振腔外部。在优选实施例中，使用注射接种提供0.2μm的线宽。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2008022026A Reliable, modular, production-quality narrow-band high repetition-rate f2 laser 审中-公开
标题翻译：可靠，模块化，生产质量窄带高反射率F2激光
公开(公告)号：JP2008022026A
公开(公告)日：2008-01-31
申请号：JP2007236405
申请日：2007-09-12
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： HOFMANN THOMAS , HUEBER JEAN-MARC , DAS PALASH P , ISHIHARA TOSHIHIKO , THOMAS P DAFFY , JOHN T MELCHIOR , BESAUCELE HERVE A , MORTON RICHARD G , NESS RICHARD M , NEWMAN PETER C , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L
IPC分类号： H01S3/03 , H01S3/097 , G03F7/20 , H01S3/137 , H01S3/225
CPC分类号： G03F7/70575
摘要： PROBLEM TO BE SOLVED: To provide a reliable, modular, production-quality narrow-band high repetition-rate F 2 laser. SOLUTION: A reliable, modular, production-quality excimer laser capable of producing 10 mJ laser pulses in the range of 1,000 Hz to 2,000 Hz or greater is provided. Replaceable modules include a laser chamber, a pulse power system including three modules, an optical resonator comprised of a line narrowing module and an output coupler module, a wavemeter module, an electrical control module, a cooling water module, and a gas control module. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供可靠的模块化生产质量窄带高重复率F 2 激光器。
解决方案：提供了一种可靠，模块化，生产质量准分子激光器，能够产生1,000 Hz至2,000 Hz或更大范围内的10 mJ激光脉冲。可替代模块包括激光室，包括三个模块的脉冲电力系统，包括线路窄化模块和输出耦合器模块的光学谐振器，波形计模块，电气控制模块，冷却水模块和气体控制模块。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2007019534A Single-chamber gas discharge laser having seed beam with narrowed line width 审中-公开
标题翻译：单孔气体放电激光具有窄幅线宽的种子束
公开(公告)号：JP2007019534A
公开(公告)日：2007-01-25
申请号：JP2006241557
申请日：2006-09-06
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： PARTLO WILLIAM N , PAN XIAOJIANG , ONKELS ECKEHARD D
IPC分类号： H01S3/038 , H01S3/104 , G03F7/20 , H01S3/034 , H01S3/036 , H01S3/07 , H01S3/0971 , H01S3/225 , H01S3/23
CPC分类号： H01S3/2366 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/036 , H01S3/073 , H01S3/225 , H01S3/2333
摘要： PROBLEM TO BE SOLVED: To provide two gain means of short lives, one of which generates a seed beam and the other amplifies the seed beam.
SOLUTION: A single-chamber gas discharge laser system is provided, which has a pulse power supply that repeatedly generates electric discharges at least at 1,000 pulses a second. The discharges, together with a laser optical device, generate two gain means for a short duration, one of which gain means for generating the seed beam, and the other for amplifying the seed beam. A laser gas is circulated along a circulation path in a chamber. An electrode (18A) and the discharges are so arranged that debris generated from one of the gain means do not circulate to the other gain means until the debris has circulated around 90% of the circulation path in the chamber during discharge.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供两种寿命短的增益装置，其中之一产生一个种子束，另一个放大种子束。
解决方案：提供了一个单室气体放电激光系统，其具有脉冲电源，每秒至少重复产生1000次脉冲的放电。放电与激光光学装置一起产生短时间的两个增益装置，其中一个增益装置用于产生种子束，另一个用于放大种子束。激光气体沿着腔室中的循环路径循环。电极（18A）和排出物被布置成使得从增益装置中的一个产生的碎屑不循环到另一增益装置，直到在排放期间碎屑已经循环在腔室中的循环路径的90％周围。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2006261689A Extremely narrow band two-chamber type high-repetition rate gas discharging laser system 审中-公开
标题翻译：极致窄带双层高速重启速率排气激光系统
公开(公告)号：JP2006261689A
公开(公告)日：2006-09-28
申请号：JP2006129553
申请日：2006-05-08
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： MYERS DAVID W , BESAUCELE HERVE A , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , DAS PALASH P , ANDERSON STUART L , FOMENKOV IGOR V , UJAZDOWSKI RICHARD C , PAN XIAOJIANG J , ONKELS ECKEHARD D , NESS RICHARD M , BROWN DANIEL J W
IPC分类号： H01S3/03 , G01J9/00 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： PROBLEM TO BE SOLVED: To generate high quality pulsed laser beams at a pulse rate of about 4,000 Hz or greater and at a pulse energy of about 5 mJ or greater. SOLUTION: Two individual discharge chambers are provided and one of which is a part of a master oscillator producing a very narrow-band seed beam which is amplified in the second discharge chamber. The chambers can be controlled individually permitting individual optimization of wavelength parameters in the master oscillator and the optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system is configured as a MOPA (Master Oscillator Power Amplifier) and specifically designed for use as a light source for integrated-circuit pattern lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing a sufficient gas flow to permit operation at a pulse rate of 4,000 Hz or greater by clearing debris from a discharging region in a time shorter than approximately 0.25 milliseconds between pulses. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。解决方案：提供两个单独的放电室，其中一个是主振荡器的一部分，产生在第二放电室中放大的非常窄带子光束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中脉冲能量参数的优化。 ArF准分子激光器系统中的优选实施例被配置为MOPA（主振荡器功率放大器），并被专门设计为用作集成电路图案光刻的光源。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在短于脉冲之间的大约0.25毫秒的时间内从放电区域清除碎屑，从而提供足够的气流以允许以4,000Hz或更高的脉冲速率运行。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2007150333A Injection seeded laser with precise timing control 审中-公开
标题翻译：注射式激光与精确时序控制
公开(公告)号：JP2007150333A
公开(公告)日：2007-06-14
申请号：JP2007000213
申请日：2007-01-04
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： NESS RICHARD M , SANDSTOROM RICHARD L , PARTLO WILLIAM N , ERSHOV ALEXANDER I
IPC分类号： H01L21/027 , H01S3/0975 , G03F7/20 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/102 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/2366 , G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/10092 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2258 , H01S3/2325 , H01S3/2333
摘要： PROBLEM TO BE SOLVED: To provide a narrow band laser system having two laser subsystems. SOLUTION: The first laser subsystem is configured to provide a very narrow band pulsed output beam which is used to injection-seed the second laser subsystem where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply is provided which is specially configured to precisely synchronize the discharges in the two laser subsystem so that the discharges are properly synchronized. A pulse power system is preferably included with a pulse transformer unit having two sets of transformer cores. A single upstream pulse compression circuit provides high voltage pulses in parallel to the primary winding of all of the cores in both sets. Separate secondary conductors (one passing through one set of cores and the other passing through the other set of cores) provide very high voltage pulses respectively to separate downstream circuits supplying discharge pulses to the electrodes in each of two separate laser chambers. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有两个激光子系统的窄带激光系统。解决方案：第一激光子系统被配置为提供非常窄的带状脉冲输出光束，其用于对第二激光子系统进行注入种子，其中窄带脉冲种子束被放大以产生窄带脉冲输出光束。提供脉冲电源，其特别配置为精确地同步两个激光子系统中的放电，使得放电正确同步。脉冲电力系统优选地包括具有两组变压器磁芯的脉冲变压器单元。单个上游脉冲压缩电路在两组中提供与所有磁芯的初级绕组并联的高电压脉冲。分离的次级导体（一个穿过一组芯，另一组穿过另一组芯）分别提供非常高的电压脉冲，以分离向两个单独的激光室中的每一个中的电极提供放电脉冲的下游电路。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2006138874A Double optical pass double-etalon spectroscope 审中-公开
标题翻译：双光通道双通道光谱仪
公开(公告)号：JP2006138874A
公开(公告)日：2006-06-01
申请号：JP2006032382
申请日：2006-02-09
申请人： Cymer Inc , サイマー, インコーポレイテッドCymer, Inc.
发明人： SMITH SCOTT T , ERSHOV ALEXANDER I , BUCK JESSE D
IPC分类号： G01J3/26 , G01B9/02 , G01J3/36 , G01J3/447
CPC分类号： G01J3/26
摘要： PROBLEM TO BE SOLVED: To provide a very compact spectroscope which generates very accurate fringe data, and is capable of measuring bandwidth having the required accuracy for microlithography regarding to both Δλ
FWHM and Δλ
95% .
SOLUTION: In a spectroscope, more specifically, a first double optical pass etalon-based spectroscope, a second etalon adapted to the first double optical pass etalon is preferably utilized to form very accurate fringe data. The spectral components of the diffused beam are separated by angles, when they permeate through the etalon. A retroreflector reflects the permeated component to return through the etalon. The spectral components that are twice permeated advance through the second etalon to focus onto a photodetector as a photodiode array in the second preferred embodiment.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种非常紧凑的分光镜，其产生非常精确的条纹数据，并且能够测量对于Δλ FWHM 和Δλ的微光刻所需的精度的带宽， 95％。解决方案：在分光镜中，更具体地，优选地，利用第一双光学通过标准具的分光镜，适用于第一双光学通过标准具的第二标准具来形成非常精确的条纹数据。扩散光束的光谱分量当它们渗透通过标准具时被角度分离。后向反射镜反映渗透成分通过标准具返回。在第二优选实施例中，两次渗透的光谱分量通过第二标准具推进以聚焦到作为光电二极管阵列的光电检测器。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2010182698A Extreme ultraviolet light source 审中-公开
标题翻译：极光紫外线光源
公开(公告)号：JP2010182698A
公开(公告)日：2010-08-19
申请号：JP2010110262
申请日：2010-05-12
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： MELNYCHUK STEPHAN T , PARTLO WILLIAM N , FOMENKOV IGOR V , OLIVER I ROGER , NESS RICHARD M , BOWERING NORBERT , KHODYKIN OLEH , RETTIG CURTIS L , BLUMENSTOCK GERRY M , DYER TIMOTHY S , SIMMONS RODNEY D , HOFFMAN JERZY R , JOHNSON R MARK
IPC分类号： H05G2/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a reliable, high-repetition rate, production line compatible high energy photon source. SOLUTION: Very hot plasma containing an active material is produced in a vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit having a pulse transformer, provides electrical pulses having sufficient energy and an electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by the applicants, in-band EUV light energy at the intermediate focus is 45 Watts, extendable to 105.8 Watts. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供可靠，高重复率，生产线兼容的高能光子源。
解决方案：在真空室中产生含有活性物质的非常热的等离子体。活性物质是具有期望的极紫外（EUV）范围内的发射线的原子元素。包括充电电容器和具有脉冲变压器的磁压缩电路的脉冲电源提供具有足够的能量和电势的电脉冲，以足以以超过5瓦的速率以中间焦点产生EUV光。在由申请人设计的优选实施例中，中间焦点的带内EUV光能量为45瓦，可扩展到105.8瓦。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2008034871A Lithography laser light source with beam delivery 有权
标题翻译：光束激光光源与光束交付
公开(公告)号：JP2008034871A
公开(公告)日：2008-02-14
申请号：JP2007260176
申请日：2007-10-03
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： KLENE BRIAN C , DAS PALASH P , GROVE STEVEN L , ERSHOV ALEXANDER I , SMITH SCOTT T , PAN XIAOJIANG J , SANDSTROM RICHARD L
IPC分类号： H01L21/027 , H01S3/10 , G03F7/20 , H01S3/00 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： G03F7/70933 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： PROBLEM TO BE SOLVED: To provide a modular high repetition rate ultraviolet gas discharge laser (4) for a production line machine. SOLUTION: A system includes an enclosed and purged beam path for providing the laser beam to a desired location such as an entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine (2) and two separated discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam amplified in a second discharge chamber. A MOPA system allows outputting pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. The preferred embodiment allows providing illumination approximately constant throughout the operating life of the lithography system. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于生产线机器的模块化高重复率紫外线气体放电激光器（4）。解决方案：系统包括用于将激光束提供到期望位置（例如生产线机器的入口）的封闭和清除的光束路径。在优选实施例中，生产线机器是光刻机（2），并且提供两个分离的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体光束。 MOPA系统允许输出脉冲能量大约是可比较的单室激光系统的两倍，具有极大改善的光束质量。与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。优选实施例允许在光刻系统的整个使用寿命期间提供近似恒定的照明。版权所有（C）2008，JPO＆INPIT

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