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1. 发明申请

WO2010047768A1 VERY HIGH POWER LASER CHAMBER OPTICAL IMPROVEMENTS 审中-公开
标题翻译：非常大的功率激光室光学改进
公开(公告)号：WO2010047768A1
公开(公告)日：2010-04-29
申请号：PCT/US2009/005691
申请日：2009-10-20
申请人： CYMER, INC. , YE, Hong , ROKITSKI, Rostislava , BERGSTEDT, Robert, A. , ERSHOV, Alexander, I. , LIU, Lauren , VIATELLA, John, W. , RAO, Rajasekhar, H. , CYBULSKI, Raymond, F. , DUFFEY, Thomas, P. , BROWN, Daniel, J. W. , FERRELL, James, J.
发明人： YE, Hong , ROKITSKI, Rostislava , BERGSTEDT, Robert, A. , ERSHOV, Alexander, I. , LIU, Lauren , VIATELLA, John, W. , RAO, Rajasekhar, H. , CYBULSKI, Raymond, F. , DUFFEY, Thomas, P. , BROWN, Daniel, J. W. , FERRELL, James, J.
IPC分类号： H01S3/08
CPC分类号： G02B5/04 , G02B5/12 , H01S3/0057 , H01S3/0346 , H01S3/081 , H01S3/225
摘要： An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
摘要翻译：所公开的主题的一个方面包括减少由以下至少之一组成的光束反向棱镜的激光吸收的方法：增加第一入射点和倒角之间的第一距离，其中第一入射点在在棱镜的第一反射面和第二反射面之间形成棱镜的第一反射面和倒角，其中倒角具有倒角面; 增加第二入射点和倒角之间的第二距离，其中第二入射点在棱镜的第二反射表面上; 并且增加棱镜倒角的倒角表面的反射率。还公开了一种确定光学部件的主切割的方法。还公开了包括至少一个初级切割光学部件的激光器。

2. 发明申请

WO2012012267A1 ALIGNMENT OF LIGHT SOURCE FOCUS 审中-公开
标题翻译：光源对焦
公开(公告)号：WO2012012267A1
公开(公告)日：2012-01-26
申请号：PCT/US2011/044058
申请日：2011-07-14
申请人： CYMER, INC. , GRAHAM, Matthew, R. , PARTLO, William, N. , CHANG, Steven , BERGSTEDT, Robert, A.
发明人： GRAHAM, Matthew, R. , PARTLO, William, N. , CHANG, Steven , BERGSTEDT, Robert, A.
IPC分类号： A61N5/06
CPC分类号： H05G2/008 , G01B11/0608 , G01B11/26 , H05G2/003 , H05G2/005
摘要： An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber,, a wavefront modification system in the path of the reflected laser beam and between, the target location- and the detection system, and a controller. The -wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location o f the focal plane of the amplified light' beam relative to the target material based on the detected image of the reflected laser beam,
摘要翻译：一种极紫外光系统包括：转向系统，其将沿着传播方向传播的放大的光束转向并聚焦在远紫外光室内的目标位置附近的焦平面;检测系统，包括至少一个检测器，其被定位成检测图像从腔室内的目标材料的至少一部分反射的激光束，在反射激光束的路径中以及目标位置与检测系统之间的波前修改系统以及控制器。波前修改系统被配置为根据沿着传播方向的目标焦平面位置来修改反射激光束的波前。控制器包括用于基于检测到的反射激光束的图像来调整放大的光束相对于目标材料的焦平面的位置的逻辑，

3. 发明申请

WO2007053335A3 LASER SYSTEM 审中-公开
标题翻译：激光系统
公开(公告)号：WO2007053335A3
公开(公告)日：2008-04-24
申请号：PCT/US2006041107
申请日：2006-10-20
申请人： CYMER INC , ERSHOV ALEXANDER I , PARTLO WILLIAM N , BROWN DANIEL J W , FOMENKOV IGOR V , BERGSTEDT ROBERT A , SANDSTROM RICHARD L , LALOVIC IVAN
发明人： ERSHOV ALEXANDER I , PARTLO WILLIAM N , BROWN DANIEL J W , FOMENKOV IGOR V , BERGSTEDT ROBERT A , SANDSTROM RICHARD L , LALOVIC IVAN
IPC分类号： H01S3/22
CPC分类号： H01S3/225 , G03F7/70583 , H01S3/005 , H01S3/0057 , H01S3/03 , H01S3/034 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/105 , H01S3/2251 , H01S3/2333
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage wherein the output of the seed laser oscillator passes through the amplifying gain medium of the ring power amplification stage at least two times per loop.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括：激光输出光束脉冲，其可以包括环形功率放大级，其中种子激光振荡器的输出通过环形功率放大级的放大增益介质至少每循环两次。

4. 发明申请

WO2007053335A2 LASER SYSTEM 审中-公开
标题翻译：激光系统
公开(公告)号：WO2007053335A2
公开(公告)日：2007-05-10
申请号：PCT/US2006/041107
申请日：2006-10-20
申请人： CYMER, INC. , ERSHOV, Alexander, I. , PARTLO, William, N. , BROWN, Daniel, J.W. , FOMENKOV, Igor, V. , BERGSTEDT, Robert, A. , SANDSTROM, Richard, L. , LALOVIC, Ivan
发明人： ERSHOV, Alexander, I. , PARTLO, William, N. , BROWN, Daniel, J.W. , FOMENKOV, Igor, V. , BERGSTEDT, Robert, A. , SANDSTROM, Richard, L. , LALOVIC, Ivan
IPC分类号： G11C8/00
CPC分类号： H01S3/225 , G03F7/70583 , H01S3/005 , H01S3/0057 , H01S3/03 , H01S3/034 , H01S3/08036 , H01S3/08059 , H01S3/10092 , H01S3/105 , H01S3/2251 , H01S3/2333
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage wherein the output of the seed laser oscillator passes through the amplifying gain medium of the ring power amplification stage at least two times per loop.
摘要翻译：一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括：激光输出光束脉冲，其可以包括环形功率放大级，其中种子激光振荡器的输出通过环形功率放大级的放大增益介质至少每循环两次。

5. 发明申请

WO2007005511A2 ACTIVE BANDWIDTH CONTROL FOR A LASER 审中-公开
标题翻译：激光的有源带宽控制
公开(公告)号：WO2007005511A2
公开(公告)日：2007-01-11
申请号：PCT/US2006/025349
申请日：2006-06-28
申请人： CYMER, INC. , REILEY, Daniel, J. , RYLOV, German, E. , BERGSTEDT, Robert, A.
发明人： REILEY, Daniel, J. , RYLOV, German, E. , BERGSTEDT, Robert, A.
IPC分类号： A61N5/00
CPC分类号： G03F7/70575 , G03F7/70025 , H01S3/005 , H01S3/08036 , H01S3/106 , H01S3/137 , H01S3/225
摘要： In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range and increase a bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is above the predetermined bandwidth range. In another aspect an active bandwidth control system may include an optic for altering a wavefront of a laser beam in a laser cavity of the laser source to selectively adjust an output laser bandwidth in response to the control signal. In yet another aspect, the bandwidth of a laser having a wavelength variation across an aperture may be actively controlled by an aperture blocking element that is moveable to adjust a size of the aperture.
摘要翻译：在第一方面，光刻设备可以包括使用光学邻近校正（OPC），脉冲激光源和有源带宽控制系统设计的掩模，该有源带宽控制系统被配置为增加后续脉冲的带宽响应于低于预定带宽范围的测量脉冲带宽并且响应于高于预定带宽范围的测量脉冲带宽来增加后续脉冲的带宽。在另一方面，有源带宽控制系统可以包括用于改变激光源的激光腔中的激光束的波阵面的光学器件，以响应于控制信号选择性地调整输出激光器带宽。在又一个方面中，具有穿过孔径的波长变化的激光器的带宽可以由可移动以调节孔径尺寸的孔径阻挡元件主动控制。

6. 发明申请

WO2006060360A2 LINE NARROWING MODULE 审中-公开
标题翻译：线窄行模块
公开(公告)号：WO2006060360A2
公开(公告)日：2006-06-08
申请号：PCT/US2005/043056
申请日：2005-11-28
申请人： CYMER, INC. , ALGOTS, Martin, J. , BERGSTEDT, Robert, A. , GILLESPIE, Walter, D. , KULGEYKO, Vladimir, A. , PARTLO, William, N. , RYLOV, German, E. , SANDSTROM, Richard. L. , STRATE, Brian, D. , DYER, Timothy, S.
发明人： ALGOTS, Martin, J. , BERGSTEDT, Robert, A. , GILLESPIE, Walter, D. , KULGEYKO, Vladimir, A. , PARTLO, William, N. , RYLOV, German, E. , SANDSTROM, Richard. L. , STRATE, Brian, D. , DYER, Timothy, S.
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要： A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength.
摘要翻译：公开了一种用于窄脉冲DUV高功率高重复频率气体放电激光器的线窄化方法和模块，其以脉冲串的脉冲产生输出激光脉冲束脉冲，该模块具有标称光路，其可以包括：色散中心波长选择光学器件，可移动地安装在所述线缩窄模块的光路内，为每个脉冲选择至少一个中心波长，所述每个脉冲至少部分由包含相应脉冲的激光脉冲束的入射角确定色散波长选择光学器件; 第一调谐机构部分地工作以通过选择包含朝向色散中心的脉冲的激光脉冲束的传输角度来选择包含相应脉冲的激光脉冲束在色散中心波长选择光学器件上的入射角波长选择镜片; 第二调谐机构，其部分地操作以通过相对于所述线缩窄模块的标称光路改变所述色散中心波长选择光学器件的位置来选择包含相应脉冲的所述激光脉冲束的入射角; 其中第二调谐机构粗略地选择中心波长的值，并且第一调谐机构更精细地选择中心波长的值。

7. 发明申请

WO2007005512A3 GAS DISCHARGE LASER LINE NARROWING MODULE 审中-公开
标题翻译：气体放电激光线路延迟模块
公开(公告)号：WO2007005512A3
公开(公告)日：2007-11-22
申请号：PCT/US2006025350
申请日：2006-06-28
申请人： CYMER INC , CYBULSKI RAYMOND F , BERGSTEDT ROBERT A , PARTLO WILLIAM N , SANDSTROM RICHARD L , WANG GON
发明人： CYBULSKI RAYMOND F , BERGSTEDT ROBERT A , PARTLO WILLIAM N , SANDSTROM RICHARD L , WANG GON
IPC分类号： H01S3/22 , H01S3/03
CPC分类号： H01S3/03 , H01S3/034 , H01S3/036 , H01S3/1055 , H01S3/225
摘要： A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.
摘要翻译：公开了一种窄气体放电激光系统及其操作方法，其可以包括分散中心波长选择元件; 包括多个折射元件的光束扩展器; 折射元件定位机构，其定位折射元件中的至少一个，以改变激光束在分散中心波长选择元件上的入射角; 分散中心波长选择元件和扩束器中的每一个彼此对准并且至少包含分散中心波长选择元件的壳体; 壳体定位机构相对于气体放电激光系统的光轴定位壳体。色散元件可以包括光栅，并且光束扩展器可以包括多个棱镜。壳体可以包含分散中心波长选择元件和扩束器。壳体定位元件可以包括位置锁定机构。

8. 发明申请

WO2007005511A3 ACTIVE BANDWIDTH CONTROL FOR A LASER 审中-公开
标题翻译：激光的主动带宽控制
公开(公告)号：WO2007005511A3
公开(公告)日：2007-06-14
申请号：PCT/US2006025349
申请日：2006-06-28
申请人： CYMER INC , REILEY DANIEL J , RYLOV GERMAN E , BERGSTEDT ROBERT A
发明人： REILEY DANIEL J , RYLOV GERMAN E , BERGSTEDT ROBERT A
IPC分类号： H01S3/10
CPC分类号： G03F7/70575 , G03F7/70025 , H01S3/005 , H01S3/08036 , H01S3/106 , H01S3/137 , H01S3/225
摘要： In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range and increase a bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is above the predetermined bandwidth range. In another aspect an active bandwidth control system may include an optic for altering a wavefront of a laser beam in a laser cavity of the laser source to selectively adjust an output laser bandwidth in response to the control signal. In yet another aspect, the bandwidth of a laser having a wavelength variation across an aperture may be actively controlled by an aperture blocking element that is moveable to adjust a size of the aperture.
摘要翻译：在第一方面，光刻设备可以包括使用光学邻近校正（OPC），脉冲激光源和有源带宽控制系统设计的掩模，该有源带宽控制系统被配置为响应于测量的脉冲带宽而增加后续脉冲的带宽，低于预定带宽范围，并且响应于高于预定带宽范围的测量脉冲带宽增加随后脉冲的带宽。在另一方面，有源带宽控制系统可以包括用于改变激光源的激光腔中的激光束的波前的光学器件，用于响应于控制信号选择性地调节输出激光器带宽。在另一方面，具有穿过孔的波长变化的激光器的带宽可以由可移动以调节孔径的孔径阻挡元件主动地控制。

9. 发明申请

WO2007005512A2 GAS DISCHARGE LASER LINE NARROWING MODULE 审中-公开
标题翻译：气体放电激光线窄行模块
公开(公告)号：WO2007005512A2
公开(公告)日：2007-01-11
申请号：PCT/US2006/025350
申请日：2006-06-28
申请人： CYMER, INC. , CYBULSKI, Raymond, F. , BERGSTEDT, Robert, A. , PARTLO, William, N. , SANDSTROM, Richard, L. , WANG, Gon
发明人： CYBULSKI, Raymond, F. , BERGSTEDT, Robert, A. , PARTLO, William, N. , SANDSTROM, Richard, L. , WANG, Gon
IPC分类号： H01S3/22 , H01S3/03
CPC分类号： H01S3/03 , H01S3/034 , H01S3/036 , H01S3/1055 , H01S3/225
摘要： A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.
摘要翻译：公开了一种线变窄的气体放电激光系统及其操作方法，其可以包括色散中心波长选择元件; 包括多个折射元件的扩束器; 折射元件定位机构，所述折射元件定位机构定位所述折射元件中的至少一个，以改变所述色散中心波长选择元件上的激光束的入射角; 色散中心波长选择元件和扩束器中的每一个彼此对齐并且与至少包含色散中心波长选择元件的外壳对齐; 壳体定位机构，其相对于气体放电激光系统的光轴定位壳体。色散元件可以包括光栅，并且扩束器可以包括多个棱镜。外壳可以包含色散中心波长选择元件和扩束器。外壳定位元件可以包括位置锁定机构。

10. 发明申请

WO2006060360A3 LINE NARROWING MODULE 审中-公开
标题翻译：线路延迟模块
公开(公告)号：WO2006060360A3
公开(公告)日：2006-10-26
申请号：PCT/US2005043056
申请日：2005-11-28
申请人： CYMER INC , ALGOTS MARTIN J , BERGSTEDT ROBERT A , GILLESPIE WALTER D , KULGEYKO VLADIMIR A , PARTLO WILLIAM N , RYLOV GERMAN E , SANDSTROM RICHARD L , STRATE BRIAN D , DYER TIMOTHY S
发明人： ALGOTS MARTIN J , BERGSTEDT ROBERT A , GILLESPIE WALTER D , KULGEYKO VLADIMIR A , PARTLO WILLIAM N , RYLOV GERMAN E , SANDSTROM RICHARD L , STRATE BRIAN D , DYER TIMOTHY S
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要： A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength.
摘要翻译：一种用于窄带DUV大功率高重复率气体放电激光器的线窄化方法和模块，其产生具有标称光路的脉冲串中的输出激光束脉冲束脉冲，其可以包括：分散中心波长选择光学器件可移动地安装在线路窄化模块的光路内，为至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定的每个脉冲选择至少一个中心波长; 第一调谐机构部分地通过选择包含脉冲朝向分散中心的激光束的透射角度来选择包含分散中心波长选择光学器件上的各个脉冲的激光束的入射角波长选择光学; 第二调谐机构部分地通过改变色散中心波长选择光学器件相对于线条变窄模块的标称光路的位置来选择包含相应脉冲的激光束的入射角; 其中第二调谐机构粗略地选择中心波长的值，并且第一调谐机构更精细地选择中心波长的值。

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