专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2007008470A3 SYSTEMS AND METHODS FOR EUV LIGHT SOURCE METROLOGY 审中-公开
标题翻译：用于EUV光源计量的系统和方法
公开(公告)号：WO2007008470A3
公开(公告)日：2007-11-22
申请号：PCT/US2006025792
申请日：2006-06-29
申请人： CYMER INC , FOMENKOV IGOR V , BOWERING NORBERT R , HOFFMAN JERZY R
发明人： FOMENKOV IGOR V , BOWERING NORBERT R , HOFFMAN JERZY R
IPC分类号： G01J1/42
CPC分类号： G03F7/7085 , B82Y10/00 , G21K2201/061
摘要： Systems and methods for EUV Light Source metrology are disclosed. In a first aspect, a system for measuring an EUV light source power output may include a photoelectron source material disposed along an EUV light pathway to expose the material and generate a quantity of photoelectrons. The system may further include a detector for detecting the photoelectrons and producing an output indicative of EUV power. In another aspect, a system for measuring an EUV light intensity may include a multi-layer mirror, e.g., Mo/Si, disposable along an EUV light pathway to expose the mirror and generate a photocurrent in the mirror. A current monitor may be connected to the mirror to measure the photocurrent and produce an output indicative of EUV power. In yet another aspect, an off-line EUV metrology system may include an instrument for measuring a light characteristic and MoSi 2 /Si multi layer mirror.
摘要翻译：公开了用于EUV光源度量衡的系统和方法。在第一方面，用于测量EUV光源功率输出的系统可以包括沿着EUV光路径设置的光电子源材料，以暴露材料并产生一定量的光电子。该系统还可以包括用于检测光电子并产生指示EUV功率的输出的检测器。另一方面，用于测量EUV光强度的系统可以包括沿着EUV光路径可抛弃的多层反射镜，例如Mo / Si，以暴露反射镜并在反射镜中产生光电流。电流监测器可以连接到反射镜以测量光电流并产生指示EUV功率的输出。在又一方面，离线EUV测量系统可以包括用于测量光特性的仪器和MoSi 2 / Si多层镜。

2. 发明申请

WO2007005414A2 ALTERNATIVE FUELS FOR EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源替代燃料
公开(公告)号：WO2007005414A2
公开(公告)日：2007-01-11
申请号：PCT/US2006/024959
申请日：2006-06-27
申请人： CYMER, INC. , BOWERING, Norbert, R. , KHODYKIN, Oleh , BYKANOV, Alexander, N. , FOMENKOV, Igor, V.
发明人： BOWERING, Norbert, R. , KHODYKIN, Oleh , BYKANOV, Alexander, N. , FOMENKOV, Igor, V.
IPC分类号： G01J1/00
CPC分类号： H05G2/006 , B82Y10/00 , G21K2201/061 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and / or Indium.
摘要翻译：公开了一种EUV光源，其可以包括具有表面的至少一个光学元件，例如多层收集镜; 产生激光束的激光源; 以及由激光束照射以形成等离子体并发射EUV光的源材料。在一个方面，源材料可以基本上由锡化合物组成，并且可以通过沉积在光学元件上的等离子体形成而产生锡屑，此外，锡化合物可以包括有效地从光学蚀刻沉积的锡的元素元素表面。锡化合物可以包括SnBr4，SnBr2和SnH4。另一方面，EUV光源可以包括由激光束照射以形成等离子体并发射EUV光的熔融源材料，源材料包含锡和至少一种其它金属，例如锡与镓和/或铟。

3. 发明申请

WO2006093781A3 SYSTEMS FOR PROTECTING INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE FROM PLASMA-GENERATED DEBRIS 审中-公开
公开(公告)号：WO2006093781A3
公开(公告)日：2006-09-08
申请号：PCT/US2006/006408
申请日：2006-02-24
申请人： CYMER, INC. , BOWERING, Norbert, R. , HANSSON, Bjorn, A., M. , BYKANOV, Alexander, N. , KHODYKIN, Oleh , ERSHOV, Alexander, I. , PARTLO, William, N.
发明人： BOWERING, Norbert, R. , HANSSON, Bjorn, A., M. , BYKANOV, Alexander, N. , KHODYKIN, Oleh , ERSHOV, Alexander, I. , PARTLO, William, N.
IPC分类号： G01J1/00
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

4. 发明申请

WO2006093781A2 SYSTEMS FOR PROTECTING INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE FROM PLASMA-GENERATED DEBRIS 审中-公开
标题翻译：用于保护来自等离子体生物反应器的EUV光源的内部组分的系统
公开(公告)号：WO2006093781A2
公开(公告)日：2006-09-08
申请号：PCT/US2006006408
申请日：2006-02-24
申请人： CYMER INC , BOWERING NORBERT R , HANSSON BJORN A M , BYKANOV ALEXANDER N , KHODYKIN OLEH , ERSHOV ALEXANDER I , PARTLO WILLIAM N
发明人： BOWERING NORBERT R , HANSSON BJORN A M , BYKANOV ALEXANDER N , KHODYKIN OLEH , ERSHOV ALEXANDER I , PARTLO WILLIAM N
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
摘要翻译：公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

5. 发明申请

WO2009117048A3 SYSTEM AND METHODS FOR TARGET MATERIAL DELIVERY IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源的目标物质输送系统与方法
公开(公告)号：WO2009117048A3
公开(公告)日：2009-12-30
申请号：PCT/US2009000994
申请日：2009-02-17
申请人： CYMER INC , VASCHENKO GEORGIY O , BYKANOV ALEXANDER N , BOWERING NORBERT R , BRANDT DAVID C , ERSHOV ALEXANDER I , SIMMONS RODNEY D , KHODYKIN OLEH V , FOMENKOV IGOR V
发明人： VASCHENKO GEORGIY O , BYKANOV ALEXANDER N , BOWERING NORBERT R , BRANDT DAVID C , ERSHOV ALEXANDER I , SIMMONS RODNEY D , KHODYKIN OLEH V , FOMENKOV IGOR V
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译：本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。

6. 发明申请

WO2007053334A3 EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源
公开(公告)号：WO2007053334A3
公开(公告)日：2009-04-30
申请号：PCT/US2006041102
申请日：2006-10-20
申请人： CYMER INC , BOWERING NORBERT R , HANSSON BJORN A M , SIMMONS RODNEY D
发明人： BOWERING NORBERT R , HANSSON BJORN A M , SIMMONS RODNEY D
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/006
摘要： An EUV light source and method of operating same is disclosed which may comprise: an EUV plasma production chamber comprising a chamber wall comprising an exit opening for the passage of produced EUV light focused to a focus point; a first EUV exit sleeve comprising a terminal end comprising an opening facing the exit opening; a first exit sleeve chamber housing the first exit sleeve and having an EUV light exit opening; a gas supply mechanism supplying gas under a pressure higher than the pressure within the plasma production chamber to the first exit sleeve chamber. The first exit sleeve may be tapered toward the terminal end opening, and may, e.g., be conical in shape comprising a narrowed end at the terminal end.
摘要翻译：公开了一种EUV光源及其操作方法，其可以包括：EUV等离子体生成室，其包括室壁，该室壁包括用于使产生的EUV光聚焦到聚焦点的通过的出口; 第一EUV出口套筒，其包括终端，所述终端包括面向所述出口的开口; 第一出口套筒室，其容纳所述第一出口套筒并具有EUV光出口; 气体供给机构，其在高于等离子体生成室内的压力的压力下向第一出口套筒室供给气体。第一出口套筒可以朝向终端开口渐缩，并且可以例如是在终端处包括窄端的圆锥形形状。

7. 发明申请

WO2006020080A3 SYSTEMS AND METHODS FOR REDUCING THE INFLUENCE OF PLASMA-GENERATED DEBRIS ON THE INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE 审中-公开
标题翻译：用于减少等离子体生成物对EUV光源的内部成分的影响的系统和方法
公开(公告)号：WO2006020080A3
公开(公告)日：2007-04-05
申请号：PCT/US2005025232
申请日：2005-07-15
申请人： CYMER INC , ERSHOV ALEXANDER I , MARX WILLIAM F , BOWERING NORBERT R , HANSSON BJORN A M , KHODYKIN OLEH , FOMENKOV IGOR V , PARTLO WILLIAM N
发明人： ERSHOV ALEXANDER I , MARX WILLIAM F , BOWERING NORBERT R , HANSSON BJORN A M , KHODYKIN OLEH , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： C25F1/00 , G03F7/20 , G21K5/10 , H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/7085 , G03F7/70916 , G21K1/06 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.
摘要翻译：公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

8. 发明申请

WO2005091887A2 EUV LIGHT SOURCE OPTICAL ELEMENTS 审中-公开
标题翻译： EUV光源光学元件
公开(公告)号：WO2005091887A2
公开(公告)日：2005-10-06
申请号：PCT/US2005/006199
申请日：2005-02-24
申请人： CYMER, INC. , BOWERING, Norbert, R. , ERSHOV, Alexander, I. , DYER, Timothy, S. , GRINOLDS, Hugh, R.
发明人： BOWERING, Norbert, R. , ERSHOV, Alexander, I. , DYER, Timothy, S. , GRINOLDS, Hugh, R.
IPC分类号： G03F7/20 , G03F9/00 , G21K1/06
CPC分类号： G21K1/062 , B82Y10/00 , G03F7/70175 , G03F7/70916
摘要： Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.
摘要翻译：公开了用于形成等离子体产生的EUV光源光学元件的装置和方法，例如，包括使用各种二元层材料的MLM堆叠的反射器和包括用于等离子体产生的EUV光源室中的单个和二进制封盖层的封盖层，特别是在等离子体源材料与一种或多种MLM材料反应。

9. 发明申请

WO2005089130A2 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：高重复率激光器生产等离子体光源
公开(公告)号：WO2005089130A2
公开(公告)日：2005-09-29
申请号：PCT/US2005007056
申请日：2005-03-03
申请人： CYMER INC , AKINS ROBERT P , SANDSTROM RICHARD L , PARTLO WILLIAM N , FOMENKOV IGOR V , STEIGER THOMAS D , ALGOTS MARTIN J , BOWERING NORBERT R , JACQUES ROBERT N , PALENSCHAT FREDERICK A , SONG JUN
发明人： AKINS ROBERT P , SANDSTROM RICHARD L , PARTLO WILLIAM N , FOMENKOV IGOR V , STEIGER THOMAS D , ALGOTS MARTIN J , BOWERING NORBERT R , JACQUES ROBERT N , PALENSCHAT FREDERICK A , SONG JUN
IPC分类号： G01J1/00 , G03F7/20 , H01J65/04 , H05G2/00
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.
摘要翻译：公开了一种EUV光源装置和方法，其可以包括脉冲激光，其以所选择的脉冲重复频率提供激光脉冲，聚焦在期望的目标点火部位; 目标形成系统，以与激光脉冲重复率配合的选定间隔提供离散目标; 目标转向系统在目标地层系统和期望的目标点火站点之间; 以及目标跟踪系统，其提供关于目标形成系统和目标转向系统之间的目标移动的信息，使得目标转向系统能够将目标定向到期望的目标点火点。目标跟踪系统可以提供能够创建激光点火控制信号的信息，并且可以包括液滴检测器，该液滴检测器包括指向与靶的投影传送路径上的点相交的准直光源，具有相应的相对设置的光检测器检测目标通过相应点的通道，或包括与坐标轴对准的多个光敏元件的线性阵列的检测器，来自光源的光与目标的投影传送路径相交，至少一个其可以包括平面截距检测装置。液滴检测器可以包括以不同光频率操作的多个液滴检测器，或者具有视场的摄像机和成像视场的二维像素阵列。该装置和方法可以包括静电等离子体容纳装置，其在点火时在目标点火点处或附近提供等离子体限制场，目标跟踪系统提供能够控制静电等离子体容纳装置的信号。该装置和方法可以包括具有中间壁的容器和具有低压阱的容器，其允许EUV光通过并且保持横跨低压阱的压差。该装置和方法可以包括磁性等离子体限制机构，其在目标点火点附近产生磁场，以将等离子体限制在目标点火位置，该目标点火点可以是脉冲的并且可以使用来自目标跟踪系统的输出进行控制。

10. 发明申请

WO2009085095A1 DRIVE LASER FOR EUV LIGHT SOURCE 审中-公开
标题翻译：用于EUV光源的驱动激光器
公开(公告)号：WO2009085095A1
公开(公告)日：2009-07-09
申请号：PCT/US2008/013417
申请日：2008-12-05
申请人： CYMER, INC. , ERSHOV, Alexander, I. , HOFFMAN, Jerzy, R. , BOWERING, Norbert, R. , BYKANOV, Alexander, N.
发明人： ERSHOV, Alexander, I. , HOFFMAN, Jerzy, R. , BOWERING, Norbert, R. , BYKANOV, Alexander, N.
IPC分类号： G02F1/35
CPC分类号： H01S3/105 , G03F7/70033 , H01S3/005 , H01S3/115 , H01S3/2232 , H01S3/225 , H01S3/2325 , H01S2301/02 , H05G2/003 , H05G2/008
摘要： A device is described herein which may comprise an oscillator having an oscillator cavity length, L 0 , and defining an oscillator path; and a multi-pass optical amplifier coupled with the oscillator to establish a combined optical cavity including the oscillator path, the combined cavity having a length, L combined , where L combined = (N + x) * L 0 , where "N" is an integer and "x" is a number between 0.4 and 0.6.
摘要翻译：本文描述了一种器件，其可以包括具有振荡器腔长度L0并且限定振荡器路径的振荡器; 和与所述振荡器耦合的多通光放大器以建立包括所述振荡器路径的组合光腔，所述组合腔具有长度L组合，其中L组合=（N + x）* L0，其中“N”是整数， “x”是介于0.4和0.6之间的数字。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式