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1. 发明申请

WO2012125287A3 DRIVE LASER DELIVERY SYSTEMS FOR EUV LIGHT SOURCE 审中-公开
标题翻译：用于EUV光源的驱动激光输送系统
公开(公告)号：WO2012125287A3
公开(公告)日：2013-12-27
申请号：PCT/US2012027026
申请日：2012-02-28
申请人： CYMER LLC , ERSHOV ALEXANDER I
发明人： ERSHOV ALEXANDER I
IPC分类号： A61N5/06
CPC分类号： H05G2/008 , G03F7/70025 , G03F7/70033 , G03F7/70983 , H01S3/10061 , H01S3/2232 , H01S3/2316 , H01S3/2383 , H05G2/003 , H05G2/005
摘要： An EUV light source is disclosed herein which may comprise a droplet generator producing a stream of target material droplets, a first optical gain medium amplifying light on a first beam path without a seed laser providing a seed laser output to the first beam path, a second optical gain medium amplifying light on a second beam path without a seed laser providing a seed laser output to the second beam path, and a beam combiner combining light from the first beam path and the second beam path for interaction with a target material droplet to produce EUV light emitting plasma.
摘要翻译：本文公开了一种EUV光源，其可以包括产生目标材料液滴流的液滴发生器，第一光学增益介质，在第一光束路径上放大光，而没有提供种子激光器输出到第一光束路径的种子激光器，第二光学增益介质光学增益介质，在第二光束路径上放大光，而没有提供种子激光器输出到第二光束路径的种子激光器;以及光束组合器，其组合来自第一光束路径和第二光束路径的光，以与靶材料液滴相互作用 EUV发光等离子体。

2. 发明申请

WO2012125287A2 DRIVE LASER DELIVERY SYSTEMS FOR EUV LIGHT SOURCE 审中-公开
标题翻译：用于EUV光源的驱动激光输送系统
公开(公告)号：WO2012125287A2
公开(公告)日：2012-09-20
申请号：PCT/US2012/027026
申请日：2012-02-28
申请人： CYMER, INC. , ERSHOV, Alexander, I.
发明人： ERSHOV, Alexander, I.
IPC分类号： G01J3/10 , H05B31/02
CPC分类号： H05G2/008 , G03F7/70025 , G03F7/70033 , G03F7/70983 , H01S3/10061 , H01S3/2232 , H01S3/2316 , H01S3/2383 , H05G2/003 , H05G2/005
摘要： An EUV light source is disclosed herein which may comprise a droplet generator producing a stream of target material droplets, a first optical gain medium amplifying light on a first beam path without a seed laser providing a seed laser output to the first beam path, a second optical gain medium amplifying light on a second beam path without a seed laser providing a seed laser output to the second beam path, and a beam combiner combining light from the first beam path and the second beam path for interaction with a target material droplet to produce EUV light emitting plasma.
摘要翻译：本文公开了一种EUV光源，其可以包括产生目标材料液滴流的液滴发生器，第一光学增益介质，在第一光束路径上放大光，而没有提供种子激光器输出到第一光束路径的种子激光器，第二光学增益介质光学增益介质，在第二光束路径上放大光，而没有提供种子激光器输出到第二光束路径的种子激光器;以及光束组合器，其组合来自第一光束路径和第二光束路径的光，以与靶材料液滴相互作用 EUV发光等离子体。

3. 发明申请

WO2010118146A1 ALIGNMENT LASER 审中-公开
标题翻译：对准激光
公开(公告)号：WO2010118146A1
公开(公告)日：2010-10-14
申请号：PCT/US2010/030258
申请日：2010-04-07
申请人： CYMER, INC. , FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , PARTLO, William, N. , PAXTON, Jason, A. , KIM, Nam-Hyong , HOFFMAN, Jerzy, R.
发明人： FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , PARTLO, William, N. , PAXTON, Jason, A. , KIM, Nam-Hyong , HOFFMAN, Jerzy, R.
IPC分类号： H01S3/091
CPC分类号： H01S3/2232 , G03F7/70033 , H01S3/0014 , H01S3/0407 , H01S3/041 , H01S3/086 , H01S3/2308 , H05G2/008
摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.
摘要翻译：用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

4. 发明申请

WO2010117861A1 SYSTEM, METHOD AND APPARATUS FOR ALIGNING AND SYNCHRONIZING TARGET MATERIAL FOR OPTIMUM EXTREME ULTRAVIOLET LIGHT OUTPUT 审中-公开
标题翻译：用于最佳超极紫外光输出的对准和同步目标材料的系统，方法和装置
公开(公告)号：WO2010117861A1
公开(公告)日：2010-10-14
申请号：PCT/US2010/029447
申请日：2010-03-31
申请人： CYMER, INC. , CHROBAK, Christopher, P. , PARTLO, William N. , FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , CROUCH, James, H.
发明人： CHROBAK, Christopher, P. , PARTLO, William N. , FOMENKOV, Igor, V. , ERSHOV, Alexander, I. , CROUCH, James, H.
IPC分类号： G01J3/10
CPC分类号： H05G2/005 , G03F7/70033 , G21K5/00 , H05G2/003 , H05G2/006
摘要： An extreme ultraviolet light system includes a drive laser system, an extreme ultraviolet light chamber including an extreme ultraviolet light collector and a target material dispenser including a target material outlet capable of outputting a plurality of portions of target material along a target material path, wherein the target material outlet is adjustable. The extreme ultraviolet light system further includes a drive laser steering device, a detection system including at least one detector directed to detect a reflection of the drive laser reflected from the first one of the plurality of portions of target material and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of a first one of the plurality of portions of target material from a first light reflected from the first target material.
摘要翻译：一种极紫外光系统包括驱动激光系统，包括极紫外光收集器的极紫外光室和包括能够沿目标材料路径输出多个目标材料部分的靶材料出口的目标材料分配器，其中，目标材料出口可调。所述极紫外光系统还包括驱动激光转向装置，所述检测系统包括至少一个检测器，所述检测器被引导以检测从所述目标材料的所述多个部分中的第一部分反射的所述驱动激光的反射，以及耦合到所述目标的控制器材料分配器，检测器系统和驱动激光转向装置。控制器包括用于从第一目标材料反射的第一光检测目标材料的多个部分中的第一部分的位置的逻辑。

5. 发明申请

WO2009117048A3 SYSTEM AND METHODS FOR TARGET MATERIAL DELIVERY IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源的目标物质输送系统与方法
公开(公告)号：WO2009117048A3
公开(公告)日：2009-12-30
申请号：PCT/US2009000994
申请日：2009-02-17
申请人： CYMER INC , VASCHENKO GEORGIY O , BYKANOV ALEXANDER N , BOWERING NORBERT R , BRANDT DAVID C , ERSHOV ALEXANDER I , SIMMONS RODNEY D , KHODYKIN OLEH V , FOMENKOV IGOR V
发明人： VASCHENKO GEORGIY O , BYKANOV ALEXANDER N , BOWERING NORBERT R , BRANDT DAVID C , ERSHOV ALEXANDER I , SIMMONS RODNEY D , KHODYKIN OLEH V , FOMENKOV IGOR V
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译：本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。

6. 发明申请

WO2007146329A2 DRIVE LASER FOR EUV LIGHT SOURCE 审中-公开
标题翻译：用于EUV光源的驱动激光器
公开(公告)号：WO2007146329A2
公开(公告)日：2007-12-21
申请号：PCT/US2007013862
申请日：2007-06-11
申请人： CYMER INC , ERSHOV ALEXANDER I , BYKANOV ALEXANDER N , HOFFMAN JERZY R , FOMENKOV IGOR V , PARTLO WILLIAM N
发明人： ERSHOV ALEXANDER I , BYKANOV ALEXANDER N , HOFFMAN JERZY R , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： H01S3/00
CPC分类号： H01S3/2316 , H01S3/0057 , H01S3/11 , H01S3/2232 , H01S3/225 , H05G1/54 , H05G2/008
摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (E s, 1 ) and a small signal gain (g o , 1 ); and the second amplifier may have a gain medium characterized by a saturation energy (E s, 2 ) and a small signal gain (g o , 2 ), with (g o , 1 ) > (g o , 2 ) and (E S , 2 ) > (E s,
摘要翻译：公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。对于源极，第一放大器可以具有特征在于饱和能量（E S，S 1）和小信号增益（g 1，...，）; 并且第二放大器可以具有特征在于饱和能量（E S，S 2）和小信号增益（g 0，S 2，N 2）的增益介质（g ，＆lt; 2＆gt;）和（E

7. 发明申请

WO2006020080A3 SYSTEMS AND METHODS FOR REDUCING THE INFLUENCE OF PLASMA-GENERATED DEBRIS ON THE INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE 审中-公开
标题翻译：用于减少等离子体生成物对EUV光源的内部成分的影响的系统和方法
公开(公告)号：WO2006020080A3
公开(公告)日：2007-04-05
申请号：PCT/US2005025232
申请日：2005-07-15
申请人： CYMER INC , ERSHOV ALEXANDER I , MARX WILLIAM F , BOWERING NORBERT R , HANSSON BJORN A M , KHODYKIN OLEH , FOMENKOV IGOR V , PARTLO WILLIAM N
发明人： ERSHOV ALEXANDER I , MARX WILLIAM F , BOWERING NORBERT R , HANSSON BJORN A M , KHODYKIN OLEH , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： C25F1/00 , G03F7/20 , G21K5/10 , H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/7085 , G03F7/70916 , G21K1/06 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.
摘要翻译：公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

8. 发明申请

WO2005050795A3 LASER OUTPUT LIGHT PULSE STRETCHER 审中-公开
标题翻译：激光输出光脉冲拉伸器
公开(公告)号：WO2005050795A3
公开(公告)日：2006-04-13
申请号：PCT/US2004036371
申请日：2004-11-01
申请人： CYMER INC , SMITH SCOT T , ERSHOV ALEXANDER I , LUKASHEV ALEXEI
发明人： SMITH SCOT T , ERSHOV ALEXANDER I , LUKASHEV ALEXEI
IPC分类号： H01S3/00 , H01S3/225 , H01S3/223
CPC分类号： G03F7/7055 , H01S3/0057 , H01S3/225
摘要： An apparatus and method for providing a high peak power short pulse duration gas discharge laser comprising a pulse stretcher which may comprise a laser output pulse optical delay initiating optic diverting a portion of the output laser pulse into an optical delay having an optical delay path and comprising; a plurality of confocal resonators in series aligned to deliver an output of the optical delay to the laser output pulse optical delay initiating optic. The plurality of confocal resonators comprises four confocal resonators may comprise a first spherical having a radius of curvature a second concave spherical mirror having the same radius of curvature and separated from the first concave spherical mirror by the radius of curvature and receiving the first reflected beam at a first point on a face of the second concave spherical mirror and generating a second reflected beam incident on a second point on the face of the first concave spherical mirror, the second reflected beam being reflected by the first concave spherical mirror from the second point on the first mirror to form an output beam from the first confocal resonator cell; and, a second confocal resonator cell receiving the output beam of the first confocal resonator cell as an input beam of the second confocal resonator cell. The apparatus and method may comprise a plurality, e.g., two pulse stretchers in series and may include spatial coherency metrology.
摘要翻译：一种用于提供高峰值功率短脉冲持续时间气体放电激光器的装置和方法，包括脉冲展宽器，其可以包括激光输出脉冲光学延迟启动光学，将输出激光脉冲的一部分转移到具有光学延迟路径的光学延迟中，并且包括 ; 串联的多个共焦共振器对准以将光延迟的输出传递到激光输出脉冲光延迟启动光学元件。多个共焦共振器包括四个共聚焦共振器可以包括具有曲率半径的第一球形，第二凹球面镜具有相同的曲率半径，并且通过曲率半径与第一凹球面镜分离，并将第一反射光束在第二凹球面镜的表面上的第一点并且产生入射在第一凹球面的表面上的第二点上的第二反射光束，第二反射光束被第一凹球面镜从第二点反射所述第一反射镜从所述第一共焦共振腔形成输出光束; 以及接收第一共焦共振器单元的输出光束作为第二共焦共振器单元的输入光束的第二共焦共振器单元。该装置和方法可以包括多个例如串联的两个脉冲担架，并且可以包括空间相干度度量。

9. 发明申请

WO2005091887A2 EUV LIGHT SOURCE OPTICAL ELEMENTS 审中-公开
标题翻译： EUV光源光学元件
公开(公告)号：WO2005091887A2
公开(公告)日：2005-10-06
申请号：PCT/US2005/006199
申请日：2005-02-24
申请人： CYMER, INC. , BOWERING, Norbert, R. , ERSHOV, Alexander, I. , DYER, Timothy, S. , GRINOLDS, Hugh, R.
发明人： BOWERING, Norbert, R. , ERSHOV, Alexander, I. , DYER, Timothy, S. , GRINOLDS, Hugh, R.
IPC分类号： G03F7/20 , G03F9/00 , G21K1/06
CPC分类号： G21K1/062 , B82Y10/00 , G03F7/70175 , G03F7/70916
摘要： Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.
摘要翻译：公开了用于形成等离子体产生的EUV光源光学元件的装置和方法，例如，包括使用各种二元层材料的MLM堆叠的反射器和包括用于等离子体产生的EUV光源室中的单个和二进制封盖层的封盖层，特别是在等离子体源材料与一种或多种MLM材料反应。

10. 发明申请

WO2004012308A2 CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER 审中-公开
标题翻译：两台气体放电激光器的控制系统
公开(公告)号：WO2004012308A2
公开(公告)日：2004-02-05
申请号：PCT/US2003/024146
申请日：2003-07-30
申请人： CYMER, INC. , FALLON, John, P. , RULE, John, A. , JACQUES, Robert, N. , LIPCON, Jacob, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , ERSHOV, Alexander I. , ISHIHARA, Toshihiko , MEISNER, John , NESS, Richard, M. , MELCHER, Paul, C.
发明人： FALLON, John, P. , RULE, John, A. , JACQUES, Robert, N. , LIPCON, Jacob, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , ERSHOV, Alexander I. , ISHIHARA, Toshihiko , MEISNER, John , NESS, Richard, M. , MELCHER, Paul, C.
IPC分类号： H01S
CPC分类号： H01S3/2333 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultra violet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F 2 injection controls with novel learning algorithm.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。特别适用于双室气体放电激光系统的新型控制功能包括：（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度控制和（4）F2注入控制与新的学习算法。

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