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    • 1. 发明申请
    • IMPROVED FLUID METERING DEVICE
    • 改进的流体计量装置
    • WO2002093506A1
    • 2002-11-21
    • PCT/US2002/014999
    • 2002-05-13
    • ROPER PUMP COMPANYFLAVELLE, William, D.
    • FLAVELLE, William, D.
    • G07D11/00
    • G05D11/003F02C7/228F04C2/18F04C11/001F04C15/0042G05D11/006Y10T137/0363Y10T137/2516Y10T137/2524Y10T137/85938
    • A fluid metering device (30) preferably includes a substantially linear series of intermeshing gears (310, 314). The device includes an inlet port (340I-342I) adjacent the intermeshing portion of each pair of gears (310-313) within the series adjacent the point at which the pair of gears diverge. The device (300) further includes a discharge port (340D-342D) adjacent the intermeshing portion of each pair of gears within the series adjacent the point at which the pair of gears converge. The device (30) is configured to convey liquid from a main inlet stream of liquid, through the inlet ports (340I-342I), and out the discharge ports (140D-142D) at substantially equal rates. The device (30) preferably includes a pressure balance inlet port (344I-345I) and a pressure balance discharge port (344D-345D) adjacent the exterior portion of each end gear (310, 314) within the series of gears (310-314) for balancing forces exerted on the end gear (310, 314) by liquid passing through the various inlet and discharge ports (340I-342I, 340D-34dD).
    • 流体计量装置(30)优选地包括基本上线性的一系列相互啮合的齿轮(310,314)。 所述装置包括邻近所述一对齿轮发散点处的所述串联中的每对齿轮(310-313)的相互啮合部分的入口端口(340I-342I)。 该装置(300)还包括一排放口(340D-342D),该排出口邻近该对齿轮会聚的点,邻近该系列内的每对齿轮啮合部分。 装置(30)构造成以大致相等的速率从液体的主入口流,通过入口端口(340I-342I)输出液体,并排出排出口(140D-142D)。 装置(30)优选地包括与该系列齿轮(310-314)内的每个端齿轮(310,314)的外部相邻的压力平衡入口(344I-345I)和压力平衡排出口(344D-345D) ),用于通过液体通过各种入口和排出口(340I-342I,340D-34dD)平衡施加在端齿轮(310,314)上的力。
    • 2. 发明申请
    • 流量比率制御装置
    • 流量比控制装置
    • WO2009084422A1
    • 2009-07-09
    • PCT/JP2008/072828
    • 2008-12-16
    • 株式会社堀場エステック安田 忠弘
    • 安田 忠弘
    • G05D7/06
    • G05D11/132Y10T137/2521Y10T137/2524Y10T137/2529Y10T137/7762
    • 流量比率制御装置において、複数種類の機器を必要とすることがなく、部品種類数の低減を図ることができ、低コスト化が可能なものを提供することを目的とし、同一の差圧式流量制御装置MFC1、MFC2と、前記流量制御装置MFC1、MFC2に指令を与えてこれを制御する制御処理機構Cと、を具備したものであって、メイン流路MLの終端から分岐させた分岐流路BL1、BL2上に、前記流量制御装置MFC1、MFC2を互いに逆向きに設けておき、一の分岐流路BL1上に設けた流量制御装置MFC1については、検知圧力が予め定めた目標圧力となるように動作させる一方、他の分岐流路BL2上に設けた流量制御装置MFC2については、測定流量の総量と予め設定した流量比率とから、該流量制御装置MFC2に流すべき目標流量を設定し、その目標流量となるように該流量制御装置MFC2を動作させるようにした。  
    • 流量比控制装置不需要多种类型的装置,并且能够减少零件的数量和制造成本。 该装置包括相同类型的差压流量控制器(MFC1,MFC2)和用于向流量控制器(MFC1,MFC2)发出命令以控制它们的控制机构(C)。 流量控制器(MFC1,MFC2)设置在从主通道(ML)的端子沿相反方向分支的各分支通道(BL1,BL2)。 设置在分支通道(BL1)中的流量控制器(MFC1)被操作,使得检测到的压力达到预定的目标压力; 根据测量的总流量和预定流量比确定设置在分支通道(BL2)中的流量控制器(MFC2)的目标流量,并且操作流量控制器(MFC2),以实现 目标流量。
    • 3. 发明申请
    • SEMICONDUCTOR MANUFACTURING GAS FLOW DIVIDER SYSTEM AND METHOD
    • 半导体制造气体分流器系统和方法
    • WO2005094404A2
    • 2005-10-13
    • PCT/US2005002783
    • 2005-02-01
    • MKS INSTR INCSHAJII ALINAGARKATTI SIDDHARTH
    • SHAJII ALINAGARKATTI SIDDHARTH
    • C23F1/00F17D3/00
    • G05D7/0664C23C16/45561C23C16/52Y10T137/0363Y10T137/2524
    • A system for dividing a single flow into two or more secondary flows of desired ratios, including an inlet adapted to receive the single flow, at least two secondary flow lines connected to the inlet, an input device adapted to receive at least one desired ratio of flow, at least one in-situ process monitor providing measurements of products produced by each of the flows lines, and a controller connected to the input device and the in-situ process monitor. The controller is programmed to receive the desired ratio of flow through the input device, receive the product measurements from the in-situ process monitor, and calculate a corrected ratio of flow based upon the desired ratio of flow and the product measurements. If the product measurements are not equal, then the corrected ratio of flow will be different than the desired ratio of flow.
    • 一种用于将单个流分成两个或更多个期望比例的二次流的系统,包括适于接收单个流的入口,连接到入口的至少两个二次流线,适于接收至少一个期望比例的输入装置 至少一个原位过程监视器,其提供由每个流水线产生的产品的测量值,以及连接到输入设备和原位过程监控器的控制器。 控制器被编程为接收通过输入设备的期望流量比,从原位过程监控器接收产品测量值,并且基于所需的流量比和产品测量值来计算校正的流量比。 如果产品测量值不相等,则校正后的流量比将不同于所需的流量比。
    • 4. 发明申请
    • FLUID REGULATOR
    • 流体调节器
    • WO1993015603A1
    • 1993-08-19
    • PCT/SE1993000101
    • 1993-02-10
    • LINDEROTH, Sven
    • A01M07/00
    • A01M7/0089G05D7/0126Y10T137/2524Y10T137/2579Y10T137/265
    • A fluid regulator comprising two valve bodies (24, 25) placed opposite and cooperating with two openings (22, 23) for controlling the fluid flow from an inlet chamber to two outlet chambers. A spindle (34) interconnects said valve bodies (24, 25) at a predetermined mutual distance forming a spindle assembly. Each valve body and each opening form a passage (30, 31), the sum of the areas of said two passages being constant, but adjustable by a handle (9). The spindle assembly is freely moveable in the axial direction under the influence of the pressures across the openings acting upon the valve bodies so that the pressure drop times the area of each opening is equal for the two openings, and dividing the fluid flow from the inlet chamber into two fluid flows to the outlet chambers. The fluid regulator is intended to be used in an agricultural sprayer for a distribution of a fluid composition to a soil to be treated. The agricultural sprayer comprises a tank (2), a pump (6), said fluid regulator, and a plurality of nozzles. The fluid regulator divides the fluid flow from the pump into a flow to the nozzles and a surplus flow back to the tank.
    • 一种流体调节器,包括与两个开口(22,23)相对并配合的两个阀体(24,25),用于控制从入口室到两个出口腔室的流体流动。 主轴(34)以预定的相互距离将所述阀体(24,25)互连,形成主轴组件。 每个阀体和每个开口形成通道(30,31),所述两个通道的面积之和是恒定的,但是可由手柄(9)调节。 主轴组件可以在作用在阀体上的开口的压力的影响下在轴向方向上自由移动,使得两个开口的压力差乘以每个开口的面积相等,并将流体从入口 进入出口室的两个流体流。 流体调节器旨在用于农业喷雾器中以将流体组合物分配到待处理的土壤中。 农业喷雾器包括罐(2),泵(6),所述流体调节器和多个喷嘴。 流体调节器将来自泵的流体流分成流向喷嘴的流体,并将多余的流回到罐中。
    • 5. 发明申请
    • METHOD OF AND APPARATUS FOR MULTIPLE CHANNEL FLOW RATIO CONTROLLER SYSTEM
    • 多通道流量比控制系统的设计方法
    • WO2013052364A1
    • 2013-04-11
    • PCT/US2012/057799
    • 2012-09-28
    • MKS INSTRUMENTS, INC.DING, Junhua
    • DING, Junhua
    • C23C16/52C23C16/455G05D11/13H01L21/00
    • C23C16/52C23C16/45561G05D7/0664Y10T137/2524Y10T137/2529
    • A four channel gas delivery system comprising: an inlet channel; four outlet channels; four flow sensors; four control valves, each valve being arranged so as to control the flow from the inlet channel through a corresponding one of the outlet channels; a flow ratio control system configured so as to control the flow from the inlet channel through the corresponding outlet channels so that the following flow ratios are controlled: (a) a first ratio of flows between the outlet channels of a first pair; (b) a second ratio of flows between the outlet channels of a second pair; and (c) a third ratio of flows between the first pair of outlet channels relative to the second pair of outlet channels; wherein the third ratio is controlled by generating at least one bias signal respectively applied to at least one pair of valves, the bias signal being a function of a predetermined set point of the third ratio and measured values of the third ratio.
    • 一种四通道气体输送系统,包括:入口通道; 四个出口渠道; 四个流量传感器; 四个控制阀,每个阀布置成控制从入口通道流过对应的一个出口通道的流量; 流量比控制系统,被配置为控制从入口通道流过对应出口通道的流量,从而控制以下流量比:(a)第一对出口通道之间的第一流量比; (b)第二对的出口通道之间的第二流量比; 和(c)第一对出口通道之间相对于第二对出口通道的第三流量比; 其中通过产生分别施加到至少一对阀的至少一个偏置信号来控制第三比率,偏置信号是第三比率的预定设定点和第三比率的测量值的函数。
    • 6. 发明申请
    • N-CHANNEL FLOW RATIO CONTROLLER CALIBRATION
    • N通道流量比控制器校准
    • WO2011085064A2
    • 2011-07-14
    • PCT/US2011020316
    • 2011-01-06
    • APPLIED MATERIALS INCGREGOR MARIUSCHLANE JOHN
    • GREGOR MARIUSCHLANE JOHN
    • H01L21/3065
    • F17D3/00G01F25/003G01F25/0053Y10T137/0324Y10T137/0363Y10T137/0379Y10T137/0402Y10T137/2524Y10T137/2529
    • Embodiments of the present invention generally relate to methods of controlling gas flow in etching chambers. The methods generally include splitting a single process gas supply source into multiple inputs of separate process chambers, such that each chamber processes substrates under uniform processing conditions. The method generally includes using a mass flow controller as a reference for calibrating a flow ratio controller. A span correction factor may be determined to account for the difference between the actual flow and the measured flow through the flow ratio controller. The span correction factors may be used to determine corrected set points for each channel of the flow controller using equations provided herein. Furthermore, the set points of the flow ratio controller may be made gas-independent using additional equations provided herein.
    • 本发明的实施例一般涉及控制蚀刻室中的气体流动的方法。 该方法通常包括将单个处理气体供应源分成多个独立处理室的输入,使得每个室在均匀处理条件下处理基板。 该方法通常包括使用质量流量控制器作为用于校准流量比率控制器的参考。 可以确定量程校正因子以解释实际流量和通过流量比率控制器的测量流量之间的差异。 量程校正因子可以用于使用在此提供的等式来确定流量控制器的每个通道的经校正的设定点。 此外,流量比控制器的设定点可以使用在此提供的附加等式而与气体无关。