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    • 4. 发明申请
    • SEMICONDUCTOR MANUFACTURING GAS FLOW DIVIDER SYSTEM AND METHOD
    • 半导体制造气体分流器系统和方法
    • WO2005094404A2
    • 2005-10-13
    • PCT/US2005002783
    • 2005-02-01
    • MKS INSTR INCSHAJII ALINAGARKATTI SIDDHARTH
    • SHAJII ALINAGARKATTI SIDDHARTH
    • C23F1/00F17D3/00
    • G05D7/0664C23C16/45561C23C16/52Y10T137/0363Y10T137/2524
    • A system for dividing a single flow into two or more secondary flows of desired ratios, including an inlet adapted to receive the single flow, at least two secondary flow lines connected to the inlet, an input device adapted to receive at least one desired ratio of flow, at least one in-situ process monitor providing measurements of products produced by each of the flows lines, and a controller connected to the input device and the in-situ process monitor. The controller is programmed to receive the desired ratio of flow through the input device, receive the product measurements from the in-situ process monitor, and calculate a corrected ratio of flow based upon the desired ratio of flow and the product measurements. If the product measurements are not equal, then the corrected ratio of flow will be different than the desired ratio of flow.
    • 一种用于将单个流分成两个或更多个期望比例的二次流的系统,包括适于接收单个流的入口,连接到入口的至少两个二次流线,适于接收至少一个期望比例的输入装置 至少一个原位过程监视器,其提供由每个流水线产生的产品的测量值,以及连接到输入设备和原位过程监控器的控制器。 控制器被编程为接收通过输入设备的期望流量比,从原位过程监控器接收产品测量值,并且基于所需的流量比和产品测量值来计算校正的流量比。 如果产品测量值不相等,则校正后的流量比将不同于所需的流量比。