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1. 发明申请

WO2013069088A1 ウェーハ収納容器审中-公开
标题翻译： WAFER储物容器
公开(公告)号：WO2013069088A1
公开(公告)日：2013-05-16
申请号：PCT/JP2011/075656
申请日：2011-11-08
申请人：ミライアル株式会社 , 小山貴立 , 松鳥千明 , 永島剛 , 井上修一 , 信越ポリマー株式会社 , 志田啓之 , 山岸裕樹 , 大貫和正
发明人：小山　貴立 , 松鳥　千明 , 永島　剛 , 井上　修一 , 志田　啓之 , 山岸　裕樹 , 大貫　和正
IPC分类号： H01L21/673
CPC分类号： H01L21/67383 , H01L21/67386 , Y10S206/832
摘要：容器本体（１）内の左右両側に配置されたウェーハ支持棚（１０，１０）に各々、半導体ウェーハ（Ｗ）の外縁部が局部的に載置されるウェーハ支持凸部（Ａ，Ｂ１，Ｂ２）が、半導体ウェーハ（Ｗ）の中心位置より奥側に一か所と手前側に二箇所ずつ設けられている。それによって、ウェーハ出し入れ開口（２）に蓋体（３）が取り付けられていない状態において、ウェーハ支持棚（１０，１０）の複数箇所の支持凸部（Ａ，Ｂ１，Ｂ２）上に載置された半導体ウェーハ（Ｗ）の撓み量を、最小限の支持凸部数で、ロボットアームによる取り出し等に支障が発生しないように抑制することができる。
摘要翻译：放置在容器主体（1）内的左侧和右侧的晶片支撑架（10,10）分别设置有晶片支撑突起（A，B1，B2），半导体晶片的外边缘部分（W ）将被放置。在每种情况下，在半导体晶片（W）的中心位置的远侧设置支撑突起（A，B1，B2）中的一个，并且将两个支撑突起（A，B1，B2）设置在半导体晶片（W）的中心的近侧。通过这种结构，在盖体（3）未安装在晶片拔出/插入口（2）的状态下，放置在支撑突起（A，B1）上的半导体晶片（W）的弯曲量可以以最少数量的突起来减少晶片支撑架（10,10）中的多个位置的位移，B2），从而不会对诸如由机器人臂提取的操作产生障碍。

2. 发明申请

WO0021119A8 AN APPARATUS FOR HOLDING A SEMICONDUCTOR WAFER 审中-公开
标题翻译：用于保持半导体波形的装置
公开(公告)号：WO0021119A8
公开(公告)日：2000-10-19
申请号：PCT/US9921554
申请日：1999-09-17
申请人： UNION OIL CO
发明人： WINGO LARRY S
IPC分类号： H01L21/673 , H01L21/00
CPC分类号： H01L21/67309 , Y10S206/832 , Y10S269/902 , Y10S269/904 , Y10S269/909 , Y10S414/135 , Y10S414/141 , Y10T29/49996
摘要： An apparatus for holding a plurality of semi-conductor wafers during heat treatment of the wafers in a furnace comprises a plurality of rails extending essentially vertically between a top and bottom plate. Each rail contains a plurality of teeth arranged such that the space between adjacent teeth can receive a portion of a single semiconductor wafer. Each tooth contains a raised support structure, typically a ledge, located on the top surface of each tooth for supporting the wafer, usually from the edge of the wafer inward to a point located from the center of the wafer a distance equal to between about 25 % and about 75 % of the wafer's radius. Such an apparatus with its relatively long teeth is especially designed to uniformly support larger wafers, i.e., wafers having a nominal diameter greater than about 200 millimeters, such that their own weight does not cause the wafers to sag and thereby produce crystal dislocations or slip when the wafers are heated to high temperatures.
摘要翻译：在炉中的晶片的热处理期间保持多个半导体晶片的装置包括在顶板和底板之间基本垂直延伸的多个轨道。每个轨道包含多个齿，其布置成使得相邻齿之间的空间可以容纳单个半导体晶片的一部分。每个齿都包含凸起的支撑结构，通常为凸缘，位于每个齿的顶表面上，用于支撑晶片，通常从晶片的边缘向内到达位于晶片中心的点，距离等于约25 ％和约75％的晶圆半径。具有相对长的齿的这种装置特别设计成均匀地支撑较大的晶片，即具有大于约200毫米的公称直径的晶片，使得它们自身的重量不会导致晶片下垂，从而产生晶体位错或滑动，将晶片加热至高温。

3. 发明申请

WO2005102870A2 WAFER CONTAINER DOOR WITH PARTICULATE COLLECTING STRUCTURE 审中-公开
标题翻译：具有颗粒收集结构的水箱门
公开(公告)号：WO2005102870A2
公开(公告)日：2005-11-03
申请号：PCT/US2005/013162
申请日：2005-04-18
申请人： ENTEGRIS, INC. , TIEBEN, Anthony, Mathius , LYSTAD, John , HALBMAIER, David, L.
发明人： TIEBEN, Anthony, Mathius , LYSTAD, John , HALBMAIER, David, L.
IPC分类号： B65D85/00
CPC分类号： H01L21/67373 , H01L21/67393 , Y10S206/832
摘要： A substrate container having an enclosure with an access opening for inserting and removing substrates into an interior of the enclosure and a door chassis that is configured to selectively enclose the opening, the door chassis comprising a first wall having a peripheral wall extending therefrom. The substrate container includes a latch mechanism that is operably coupled with the chassis, the latch mechanism configured to operably secure the chassis to the opening. The door of the substrate container includes a texture particle capture region wherein particles generated by the latch mechanism and elsewhere are captured by the particle capture region.
摘要翻译：一种具有外壳的基板容器，该外壳具有用于将基板插入和移除到外壳内部的进入开口，以及构造成选择性地封闭开口的门底板，所述门框架包括具有从其延伸的周壁的第一壁。基板容器包括与底盘可操作地联接的闩锁机构，闩锁机构构造成将底盘可操作地固定到开口。基板容器的门包括纹理颗粒捕获区域，其中由闩锁机构和其他地方产生的颗粒被颗粒捕获区域捕获。

4. 发明申请

WO2005047117A2 FRONT OPENING SUBSTRATE CONTAINER WITH BOTTOM PLATE 审中-公开
标题翻译：带底板的前开式底板容器
公开(公告)号：WO2005047117A2
公开(公告)日：2005-05-26
申请号：PCT/US2004037017
申请日：2004-11-08
申请人： ENTEGRIS INC , BURNS JOHN , FULLER MATTHEW A , KING JEFFERY J , FORBES MARTIN L , SMITH MARK V
发明人： BURNS JOHN , FULLER MATTHEW A , KING JEFFERY J , FORBES MARTIN L , SMITH MARK V
IPC分类号： B65D20060101 , B65D85/30 , H01L21/673 , B65D
CPC分类号： H01L21/67369 , H01L21/67379 , H01L21/67393 , Y10S206/832
摘要： A substrate container and a bottom plate are connected with a mechanism for adjusting the distance between the container and bottom plate, by, e.g., a threaded connection between two members of the connector mechanism. Also provided are a duck-billed valve for venting the container and a dampener for minimizing damage due to shocks.
摘要翻译：衬底容器和底板通过例如连接器机构的两个构件之间的螺纹连接的方式与用于调节容器和底板之间的距离的机构连接。还提供了用于排放容器的鸭嘴阀和用于使由冲击引起的损坏最小化的阻尼器。

5. 发明申请

WO2005036609A2 SHIPPER WITH TOOTH DESIGN FOR IMPROVED LOADING 审中-公开
标题翻译：具有改进装载的牙齿设计的运输商
公开(公告)号：WO2005036609A2
公开(公告)日：2005-04-21
申请号：PCT/US2004/033641
申请日：2004-10-12
申请人： ENTEGRIS, INC. , DUBAN-HU, Joy, A. , KOLBOW, Steven, P.
发明人： DUBAN-HU, Joy, A. , KOLBOW, Steven, P.
IPC分类号： H01L
CPC分类号： G11B33/0444 , Y10S206/832
摘要： A shipper for memory disks comprises a cassette having an open top and an open bottom, a top cover to cover the open top, and a bottom cover to cover the bottom. The body portion has opposing side walls and opposing end walls. The two side walls each have with a vertical upper portions and an inwardly converging bottom portion. Said sidewalls have inwardly facing elongate teeth or spacers defining slots to hold the substrates in a vertically positioned and spaced array. Each tooth is continuous from the open top to the open bottom and each tooth has a upper vertical portion at the vertical upper portion of the side wall and a converging lower portion at the bottom portion of the side walls. The converging lower portion of each tooth follows the convergence of the bottom portions of the sidewalls. The converging lower portion of each tooth is configured to be different than the configuration of the tooth at the upper portion providing for improved performance in receiving disks to minimize or eliminate the incomplete receipt of disks in the slots such as by the disks catching and resting on the top of the teeth.
摘要翻译：用于存储盘的托运器包括具有开口顶部和敞开的底部的盒，覆盖开放顶部的顶盖和用于覆盖底部的底盖。主体部分具有相对的侧壁和相对的端壁。两个侧壁各自具有垂直的上部和向内会聚的底部。所述侧壁具有向内的细长齿或间隔物，其限定狭槽以将基底保持在垂直定位和间隔的阵列中。每个齿从敞开的顶部到开放的底部是连续的，并且每个齿在侧壁的垂直上部具有上垂直部分，在侧壁的底部具有会聚下部。每个齿的会聚下部跟随侧壁的底部的会聚。每个齿的会聚下部构造成不同于在上部的齿的构造，以提供接收盘中的改进的性能以最小化或消除槽中的盘的不完全接收，例如通过盘捕获并搁置顶部的牙齿。

6. 发明申请

WO2005102870A3 WAFER CONTAINER DOOR WITH PARTICULATE COLLECTING STRUCTURE 审中-公开
标题翻译：具有颗粒收集结构的水箱门
公开(公告)号：WO2005102870A3
公开(公告)日：2007-03-15
申请号：PCT/US2005013162
申请日：2005-04-18
申请人： ENTEGRIS INC , TIEBEN ANTHONY MATHIUS , LYSTAD JOHN , HALBMAIER DAVID L
发明人： TIEBEN ANTHONY MATHIUS , LYSTAD JOHN , HALBMAIER DAVID L
IPC分类号： B65D45/16 , B65D85/00 , B65D85/30 , B65D85/48 , H01L21/673
CPC分类号： H01L21/67373 , H01L21/67393 , Y10S206/832
摘要： A substrate container (20) having an enclosure (22) with an access opening (26) for inserting and removing substrates into an interior the enclosure and a door chassis (40A) that is configured to selectively enclose the opening. The door chassis comprising a first wall having a peripheral wall extending therefrom. The substrate container includes a latch mechanism (50) that is operably coupled with the chassis, the latch mechanism configured to operably secure the chassis to the opening. The door of the substrate container include a textured particle capture region (75) wherein particles generated by the latch mechanism and elsewhere are captured by the particle capture region.
摘要翻译：一种具有外壳（22）的基板容器（20），其具有用于将基板插入和移除到外壳内部的进入开口（26），以及构造成选择性地封闭开口的门框（40A）。门底盘包括具有从其延伸的周壁的第一壁。基板容器包括与底盘可操作地联接的闩锁机构（50），所述闩锁机构构造成将底盘可操作地固定到开口。基板容器的门包括纹理粒子捕获区域（75），其中由所述闩锁机构和其他地方产生的颗粒被所述颗粒捕获区域捕获。

7. 发明申请

WO2005041267B1 Substrate carrrier 审中-公开
标题翻译：基材carrrier
公开(公告)号：WO2005041267B1
公开(公告)日：2006-06-15
申请号：PCT/US2004035313
申请日：2004-10-25
申请人： ENTEGRIS INC , BURNS JOHN , FULLER MATTHEW A , KING JEFFERY J , FORBES MARTIN L , SMITH MARK V , ZABKA MICHAEL
发明人： BURNS JOHN , FULLER MATTHEW A , KING JEFFERY J , FORBES MARTIN L , SMITH MARK V , ZABKA MICHAEL
IPC分类号： B65D85/00 , H01L20060101
CPC分类号： H01L21/67379 , H01L21/67383 , Y10S206/832 , Y10T16/469 , Y10T16/4707
摘要： A carrier for transporting silicon semiconductor wafers during semiconductor wafer processing operations including an enclosure, a door and a flange structured to interface with a machine so that the carrier can be lifted by the machine. A lift saddle connects the flange to the container so that the load on the flange is transferred to a part of the enclosure other than the top of the enclosure to prevent distortion of the enclosure to maintaining seal integrity between the enclosure and the door.
摘要翻译：一种用于在半导体晶片处理操作期间传输硅半导体晶片的载体，包括壳体，门和与机器接合的凸缘和凸缘，使得载体能够被机器提升。提升鞍座将法兰连接到容器，使得法兰上的负载被转移到外壳的除了外壳的顶部之外的一部分，以防止外壳变形，以保持外壳和门之间的密封完整性。

8. 发明申请

WO2005021831A1 MICROFEATURE WORKPIECE PROCESSING APPARATUS AND METHODS FOR BATCH DEPOSITION OF MATERIALS ON MICROFEATURE WORKPIECES 审中-公开
标题翻译：微型工件加工设备和方法在微生物工件上沉积材料
公开(公告)号：WO2005021831A1
公开(公告)日：2005-03-10
申请号：PCT/US2004/027012
申请日：2004-08-18
申请人： MICRON TECHNOLOGY, INC. , ZHENG, Lingyi, A. , DOAN, Trung, T. , BREINER, Lyle, D. , PING, Er-Xuan , WEIMER, Ronald, A. , KUBISTA, David, J. , BEAMAN, Kevin, L. , BASCERI, Cem
发明人： ZHENG, Lingyi, A. , DOAN, Trung, T. , BREINER, Lyle, D. , PING, Er-Xuan , WEIMER, Ronald, A. , KUBISTA, David, J. , BEAMAN, Kevin, L. , BASCERI, Cem
IPC分类号： C23C16/458
CPC分类号： C23C16/4583 , C23C16/45546 , C23C16/45578 , Y10S206/832
摘要： The present disclosure describes apparatus and methods for processing microfeature workpieces, e.g., by depositing material on a microelectronic semiconductor using atomic layer deposition. Some of these apparatus include microfeature workpiece holders that include gas distributors. One exemplary implementation provides a microfeature workpiece holder adapted to hold a plurality of microfeature workpieces. This workpiece holder includes a plurality of workpiece supports and a gas distributor. The workpiece supports are adapted to support a plurality of microfeature workpieces in a spaced-apart relationship to define a process space adjacent a surface of each microfeature workpiece. The gas distributor includes an inlet and a plurality of outlets, with each of the outlets positioned to direct a flow of process gas into one of the process spaces.
摘要翻译：本公开描述了用于处理微特征工件的装置和方法，例如通过使用原子层沉积在微电子半导体上沉积材料。这些设备中的一些包括微型工件保持器，其包括气体分配器。一个示例性实施例提供了适于保持多个微特征工件的微特征工件保持器。该工件保持器包括多个工件支撑件和气体分配器。工件支撑件适于以间隔的关系支撑多个微特征工件以限定与每个微特征工件的表面相邻的工艺空间。气体分配器包括入口和多个出口，其中每个出口被定位成将处理气体流引导到处理空间中的一个中。

9. 发明申请

WO00021119A1 AN APPARATUS FOR HOLDING A SEMICONDUCTOR WAFER 审中-公开
标题翻译：用于半导体晶片的支撑装置
公开(公告)号：WO00021119A1
公开(公告)日：2000-04-13
申请号：PCT/US1999/021554
申请日：1999-09-17
IPC分类号： H01L21/673 , H01L21/00
CPC分类号： H01L21/67309 , Y10S206/832 , Y10S269/902 , Y10S269/904 , Y10S269/909 , Y10S414/135 , Y10S414/141 , Y10T29/49996
摘要： An apparatus for holding a plurality of semi-conductor wafers during heat treatment of the wafers in a furnace comprises a plurality of rails extending essentially vertically between a top and bottom plate. Each rail contains a plurality of teeth arranged such that the space between adjacent teeth can receive a portion of a single semiconductor wafer. Each tooth contains a raised support structure, typically a ledge, located on the top surface of each tooth for supporting the wafer, usually from the edge of the wafer inward to a point located from the center of the wafer a distance equal to between about 25 % and about 75 % of the wafer's radius. Such an apparatus with its relatively long teeth is especially designed to uniformly support larger wafers, i.e., wafers having a nominal diameter greater than about 200 millimeters, such that their own weight does not cause the wafers to sag and thereby produce crystal dislocations or slip when the wafers are heated to high temperatures.
摘要翻译：本发明涉及一种用于在烘箱中对晶片进行热处理期间支撑多个半导体晶片的装置。该装置包括在上板和下板之间基本垂直延伸的多个立柱。每个立柱包括多个齿，所述多个齿布置成使得两个相邻齿之间的空间可以接收单个半导体晶片的一部分。每颗牙齿包括位于每颗牙齿上表面上的凸起支撑结构，通常为凸缘。该结构通常将晶片从其边缘支撑到远离中心的点上，晶片半径的25％和75％之间。这种牙齿较长的装置专门设计用于均匀支撑大切片，例如标称直径超过200毫米的切片，因此其自重不会导致向下弯曲。当切片加热到高温时引起位错或晶体滑移。

10. 发明申请

WO1998000860A1 METHOD AND DEVICE FOR HEAT-TREATING SINGLE-CRYSTAL SILICON WAFER, SINGLE-CRYSTAL SILICON WAFER, AND PROCESS FOR PRODUCING SINGLE-CRYSTAL SILICON WAFER 审中-公开
标题翻译：用于加热单晶硅波片，单晶硅波片的方法和装置，以及用于生产单晶硅波片的方法和装置
公开(公告)号：WO1998000860A1
公开(公告)日：1998-01-08
申请号：PCT/JP1997002232
申请日：1997-06-27
申请人： SUMITOMO SITIX CORPORATION , ADACHI, Naoshi , HISATOMI, Takehiro , SANO, Masakazu
发明人： SUMITOMO SITIX CORPORATION
IPC分类号： H01L21/324
CPC分类号： H01L21/67303 , H01L21/3225 , H01L21/324 , H01L21/67309 , Y10S206/832 , Y10S206/833 , Y10T117/1016
摘要： A method for heat-treating a single-crystal silicon wafer by which the number of single-crystal silicon wafers treated in a single heat-treating process is increased and, at the same time, dislocation and slip in a high-temperature heat-treating atmosphere are suppressed at the time of performing various kinds of heat treatment, such as a diffusion heat treatment for forming a DZ layer, a treatment for generating and controlling BMD for giving the IG ability, a heat treatment for improving the withstand voltage of an oxide film by eliminating COP defects on and in the wafers. The wafers are divided into groups of about 10 wafers, the wafers of each group are stacked, and a plurality of groups of wafers are placed horizontally or in a state that the wafers are inclined slightly by an angle of 0.5-5 DEG on a boat which supports the wafers at a plurality of points on the outer peripheries of the wafers. Therefore, as shown in embodiments, various kinds of heat treatment can be applied to the wafers and the wafers are heat-treated uniformly, because dislocation and slip of the wafers are prevented.
摘要翻译：在单一的热处理工序中处理的单晶硅晶片的数量增加的单晶硅晶片的热处理方法增加，同时在高温热处理中发生位错和滑动在进行DZ层的扩散热处理，赋予IG能力的BMD的生成和控制处理等的各种热处理时抑制气氛，提高氧化物的耐电压的热处理通过消除晶片上的和在晶片中的COP缺陷来形成膜。将晶片分成约10个晶片的组，每个组的晶片被堆叠，并且多个晶片组水平放置或者在晶片在船上稍微倾斜0.5-5°的角度的状态其在晶片的外周上的多个点处支撑晶片。因此，如实施例所示，可以对晶片进行各种热处理，并且由于晶片的位错和滑动被阻止，因此均匀地对晶片进行热处理。

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