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    • 8. 发明申请
    • STAMP FOR USE IN A LITHOGRAPHIC PROCESS, METHOD OF MANUFACTURING A STAMP, AND METHOD OF MANUFACTURING A PATTERNED LAYER ON A SUBSTRATE
    • 用于光刻工艺的印章,制造印章的方法和在基板上制作图案层的方法
    • WO01059523A1
    • 2001-08-16
    • PCT/EP2001/000198
    • 2001-01-10
    • B41K1/02G03F7/00H01L21/48
    • B82Y10/00B41K1/02B82Y40/00G03F7/0002G03F7/0015H01L21/4803
    • The stamp (10) for a lithographic process, such as patterning a surface layer, of the invention has a stamp body (5) with at least a first recess (11) formed therein, which recess defines a first aperture (15) in the printing face (3) of the stamp (10). The first recess (11) narrows with increasing distance to the printing face, while any cross-section of the first recess, when perpendicularly projected on the printing face (3), will lie within the aperture (15). The printing face may comprise small (11, 12) and large apertures (13) as well as small surfaces (14) in between apertures, while it is nevertheless able to produce prints which are accurate replicas of the printing face. Even details on a submicron scale can be adequately printed. The stamp (10) can be manufactured by a method which comprises anisotropic etching of a first body to make a mold and replicating the mold in the printing face (3) of the stamp (10).
    • 本发明的用于光刻工艺(例如图案化表面层)的印模(10)具有形成在其中的至少第一凹部(11)的印模体(5),该凹部限定了第一孔 印章(10)的印刷面(3)。 第一凹部(11)随着与打印面的距离的增加而变窄,而当垂直投影在打印面(3)上时,第一凹部的任何横截面将位于孔15内。 印刷面可以包括小的(11,12)和大的孔(13)以及孔之间的小表面(14),同时它仍然能够产生作为印刷面的精确复制品的印刷品。 甚至可以适当地打印亚微米尺度的细节。 印模(10)可以通过包括各向异性蚀刻第一主体以制作模具并在印模(10)的印刷面(3))中复制模具的方法制造。