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1. 发明申请

WO2005081068A3 IMAGING SYSTEM FOR A MICROLITHOGRAPHICAL PROJECTION LIGHT SYSTEM 审中-公开
标题翻译：微米级投影曝光设备的图解系统
公开(公告)号：WO2005081068A3
公开(公告)日：2005-11-10
申请号：PCT/EP2005000277
申请日：2005-01-13
申请人： ZEISS CARL SMT AG , GRUNER TORALF , EPPLE ALEXANDER , KNEER BERNHARD , WABRA NORBERT , BEDER SUSANNE , DORSEL ANDREAS
发明人： GRUNER TORALF , EPPLE ALEXANDER , KNEER BERNHARD , WABRA NORBERT , BEDER SUSANNE , DORSEL ANDREAS
IPC分类号： G03F7/20
CPC分类号： G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： The invention relates to an imaging system of a microlithographical projection light system, comprising a projection lens (200, 300, 500, 600) which is used to reproduce a mask which can be positioned on a lens plane on a light-sensitive layer which can be positioned on an image plane; and a fluid inlet (205) which is used to fill an intermediate chamber between the image plane and a final optical element (201, 309, 506) of the projection lens, with immersion liquid (202, 310, 507, 601), on the image plane. The final optical element of the projection lens on the image plane is arranged, in the direction of gravity, after the image plane and the projection lens is embodied in such a manner that the immersion fluid, in the immersion state, comprises a convex curve, in the direction oriented away from the image plane, at least in one area. According to the invention, the final optical element (201, 309, 506) of the projection lens on the image plane is arranged below the image plane in such a manner that the immersion fluid (202, 310, 507, 601) is at least partially arranged in an essentially dish-shaped area on the final optical element on the image plane. Said system can also comprises a rotator which is used to rotate a substrate comprising the light-sensitive layer (401) between a transport position, wherein the light-sensitive layer is arranged on a substrate surface disposed in the counter direction to the direction of gravity, and a position of exposure, wherein the light-sensitive layer (401) is arranged on a substrate surface disposed in the direction of gravity.
摘要翻译：具有用于在光敏感层的图像平面上的定位在物平面掩模成像可定位的投影透镜（200，300，500，600）的微光刻投射曝光设备的成像系统; 和用于填充所述投射物镜的像平面和图像平面侧最后的光学元件（201，309，506）之间的间隙与浸没液体（202，310，507，601）的液体供给（205）; 其中投影透镜的图像平面侧最后一个光学元件沿像平面在重力方向上布置; 并且其中所述投影透镜被设计成使得在浸没模式中，所述浸没液体在远离所述像平面的方向上至少部分地凸出地弯曲。还可以预期的是，投影透镜的像面侧最后的光学元件（201，309，506）设置在图像平面下方，使得浸没液体（202，310，507，601）至少部分地基于所述像面侧的大致槽形区域部分地最后一个光学元件被安排。用于旋转具有输送方向之间的衬底的感光层（401）旋转器罐，被布置在位于一个相对的衬底表面的重力方向上的感光层，和一个曝光取向，其中在重力的方向上的感光层（401）可以设置平躺的基板表面。

2. 发明申请

WO2006053751A3 PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION 审中-公开
标题翻译：投影镜头的微光刻投射曝光设备
公开(公告)号：WO2006053751A3
公开(公告)日：2006-10-12
申请号：PCT/EP2005012327
申请日：2005-11-17
申请人： ZEISS CARL SMT AG , BEIERL HELMUT , BLEIDISTEL SASCHA , SINGER WOLFGANG , GRUNER TORALF , EPPLE ALEXANDER , WABRA NORBERT , BEDER SUSANNE , WEBER JOCHEN , FELDMANN HEIKO , SCHWAER BAERBEL , ROGALSKY OLAF , KAZI ARI
发明人： BEIERL HELMUT , BLEIDISTEL SASCHA , SINGER WOLFGANG , GRUNER TORALF , EPPLE ALEXANDER , WABRA NORBERT , BEDER SUSANNE , WEBER JOCHEN , FELDMANN HEIKO , SCHWAER BAERBEL , ROGALSKY OLAF , KAZI ARIF
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure installation comprises a projection lens system (20), which projects an object (24) onto a focal plane (28) and which has a lens (L3) with a curved surface (S). A liquid or solid medium (34) is located in the projection lens system (20) and directly abuts against the curved surface (S) over an area that can be used for the projection of the object (24). The projection exposure installation also comprises an adjustable manipulator (M) for reducing a curvature of field that is caused by a heating of the medium (34) during the projection operation.
摘要翻译：微光刻投射曝光设备包括：一个投影透镜（20），该图像的对象（24）到图像平面（28）和具有弯曲表面（S）的透镜（L3）。在投影透镜（20）是液体或固体培养基（34），紧邻所述弯曲表面（S）在一定范围内作为用于所述对象（24）的成像。的投影曝光装置还包括一个可调节的操纵器（M），以减少的场曲，这是由投影操作期间介质（34）的加热而引起的。

3. 发明申请

WO2006111319A2 PROJECTION EXPOSURE SYSTEM, METHOD FOR MANUFACTURING A MICRO-STRUCTURED STRUCTURAL MEMBER BY THE AID OF SUCH A PROJECTION EXPOSURE SYSTEM AND POLARIZATION-OPTICAL ELEMENT ADAPTED FOR USE IN SUCH A SYSTEM 审中-公开
标题翻译：投影曝光系统，通过这种投影曝光系统的辅助制造微结构结构构件的方法和适用于这种系统的偏光光学元件
公开(公告)号：WO2006111319A2
公开(公告)日：2006-10-26
申请号：PCT/EP2006003401
申请日：2006-04-12
申请人： ZEISS CARL SMT AG , MANN HANS-JUERGEN , SINGER WOLFGANG , GRUNER TORALF , DITTMANN OLAF , TOTZECK MICHAEL
发明人： MANN HANS-JUERGEN , SINGER WOLFGANG , GRUNER TORALF , DITTMANN OLAF , TOTZECK MICHAEL
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F7/70058
摘要： The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source (18) for producing light in the EUV region. The projection exposure system further comprises a first optical system (19, 20, 21, 22, 23, 24) for illuminating a mask (25) by the light of the light source (18) and a second optical system (26, 27, 28, 29, 30, 31) for imaging the mask (25) on a component (32). At least one polarization-optical element (1) is disposed on the beam path between the light source (18) and the component (32).
摘要翻译：本发明涉及一种投影曝光系统，特别涉及微光刻技术。根据本发明的投影曝光系统包括用于在EUV区域中产生光的光源（18）。投影曝光系统还包括用于通过光源（18）的光照射掩模（25）的第一光学系统（19,20,21,22,23,24）和第二光学系统（26,27,24） 28,29,30,31），用于将所述掩模（25）成像在部件（32）上。至少一个偏振光学元件（1）设置在光源（18）和部件（32）之间的光束路径上。

4. 发明申请

WO2008037384A3 PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE SYSTEM 审中-公开
标题翻译：投影曝光方法和投影曝光系统
公开(公告)号：WO2008037384A3
公开(公告)日：2008-06-26
申请号：PCT/EP2007008145
申请日：2007-09-19
申请人： ZEISS CARL SMT AG , KALLER JULIAN , GRUNER TORALF
发明人： KALLER JULIAN , GRUNER TORALF
IPC分类号： G03F7/20
CPC分类号： G03F7/70933 , G03F7/70191 , G03F7/70575 , G03F7/70941
摘要： In a projection exposure method primary radiation having a center wavelength ? is generated and guided through an illumination system along an illumination path and through a projection system along a projection path. The center wavelength is varied within a wavelength variation range ?? having a lower limit ? MIN = ? and an upper limit ? MAX > ?. A specific absorption coefficient k(?) of at least one gaseous absorbent species selected from the group consisting of oxygen (O 2 ), ozone (O 3 ) and water vapor (H 2 O) present in at least one gas-filled space along at least one of the illumination path and the projection path varies between a minimum absorption coefficient k MIN and a maximum absorption coefficient k MAX within the wavelength variation range such that an absorption ratio (k MAX / k MIN ) exceeds 10. A concentration of the absorbent species within the gas-filled space is controlled such that an overall absorption variation effected by the absorbent species for all rays running along different ray paths towards the image field is maintained below a predetermined absorption variation threshold value.
摘要翻译：在投影曝光方法中，具有中心波长λ 沿着照明路径被产生并引导通过照明系统，并沿着投影路径通过投影系统。中心波长在波长变化范围内变化具有下限？ =？和上限？最大值？至少一种选自氧（O 2 O 3），臭氧（O 3 3）和水蒸汽（O 3））的气态吸收物质的比吸收系数k（ω）沿着照明路径和投影路径中的至少一个存在于至少一个气体填充空间中的H 2 O 2 O在最小吸收系数k MIN和最大值之间变化吸收系数k max max在波长变化范围内，使得吸收比（k max / k MIN MIN）超过10。吸收剂的浓度控制气体填充空间内的物质，使得沿着沿着不同射线路径朝向图像场行进的所有射线的吸收物质的整体吸收变化保持在预定的吸收变化阈值以下。

5. 发明申请

WO2008113605A2 METHOD FOR IMPROVING THE IMAGING PROPERTIES OF AN OPTICAL SYSTEM AND SUCH AN OPTICAL SYSTEM 审中-公开
标题翻译：方法的光学系统的改善画面属性，而这种光学系统
公开(公告)号：WO2008113605A2
公开(公告)日：2008-09-25
申请号：PCT/EP2008002289
申请日：2008-03-20
申请人： ZEISS CARL SMT AG , GRUNER TORALF , KWAN YIM-BUN-PATRICK
发明人： GRUNER TORALF , KWAN YIM-BUN-PATRICK
IPC分类号： G02B27/00 , G03F7/20
CPC分类号： G02B7/028 , G02B27/0068 , G03F7/70258 , G03F7/70308 , G03F7/706 , G03F7/70891
摘要： The invention relates to a method for improving the imaging properties of an optical system (10, 12). The optical system (10, 12) has a plurality of optical elements in order to depict a structure (24) on a substrate (28) that is disposed in an image plane (32) of the optical system (10, 12). The method comprises a process step (a) of detecting at least one first time-dependent and at least partially reversible imaging error of the optical system (10, 12) caused by the heating of at least one of the optical elements (36, 38, and a process step (b) of at least partially correcting the at least first imaging error by replacing at least one of the first optical elements (36, 38) from the plurality of the optical elements with at least one first optical compensation element. The invention further relates to such an optical system (10, 12) having improved imaging properties (Fig. 1).
摘要翻译：本发明涉及一种用于改进的光学系统（10，12）的成像特性的方法。所述光学系统（10，12）具有多个在所述光学系统（10，12）的图像平面（32）的基板（28）上的光学元件被布置成映射结构（24）。该方法包括处理步骤（a）中，检测至少一个第一通过加热光学元件中的至少一个（36，38）引起的与时间相关的至少部分可逆的光学系统（10，12）的像差，以及方法步骤（b）中，至少部分地校正由至少多个光学元件中的第一光学元件（36，38）交换为对至少一个第一光学补偿元件的至少第一图像缺陷。本发明还涉及这样的光学系统（10，12）具有改善的成像特性（图1）。

6. 发明申请

WO2007066225A2 MICROLITHOGRAPHIC PROJECTION ILLUMINATION SYSTEM, AND METHOD FOR PRODUCING MICROSTRUCTURED COMPONENTS 审中-公开
标题翻译：微结构投影提取系统和生产微结构元件的方法
公开(公告)号：WO2007066225A2
公开(公告)日：2007-06-14
申请号：PCT/IB2006003878
申请日：2006-11-08
申请人： ZEISS CARL SMT AG , GRUNER TORALF , GEH BERND
发明人： GRUNER TORALF , GEH BERND
CPC分类号： G03F7/70441 , G03F7/70083 , G03F7/70141 , G03F7/70391 , G03F7/70566 , G03F7/70941
摘要： The invention relates to a method for producing microstructured components. According to said method, a pattern (M) of structures (STl to ST6) is imaged into an image plane of a projection objective (PL), in a microlithographic projection illumination system (PEA). According to the invention, the dose distribution of projection light is influenced in such a way that the image of a structure is at least essentially independent of the topography of structures located inside a region surrounding the structure.
摘要翻译：在用于制造微结构部件的方法中，在微光刻投影曝光设备（PEA）中，结构（ST1至ST6）的图案（M）被成像到投影物镜（PL）的图片平面中。根据本发明，投影光在像平面中的剂量分布以这样的方式受到影响，即结构的图像至少基本上独立于位于围绕结构的区域内的结构的形貌。

7. 发明申请

WO2007025783A3 MICROLITHOGRAPHIC PROJECTION LIGHTING SYSTEM 审中-公开
标题翻译：微光刻投射曝光设备
公开(公告)号：WO2007025783A3
公开(公告)日：2007-05-10
申请号：PCT/EP2006008605
申请日：2006-09-04
申请人： ZEISS CARL SMT AG , KAMENOV VLADIMIR , KRAEHMER DANIEL , GRUNER TORALF , WEISSENRIEDER KARL-STEFAN , FELDMANN HEIKO , ZIRKEL ACHIM , PAZIDIS ALEXANDRA , THOME BRUNO , SIX STEPHAN
发明人： KAMENOV VLADIMIR , KRAEHMER DANIEL , GRUNER TORALF , WEISSENRIEDER KARL-STEFAN , FELDMANN HEIKO , ZIRKEL ACHIM , PAZIDIS ALEXANDRA , THOME BRUNO , SIX STEPHAN
IPC分类号： G03F7/20
CPC分类号： G02B1/11 , G03F7/70191 , G03F7/70308 , G03F7/70958
摘要： A microlithographic projection lighting system contains an optical element (36) that supports an antireflection coating (32) or a reflection coating in order to reduce or increase the reflectance. According to the invention, the antireflection coating is designed in such a manner that, over an angle of incident sector of 70°, the transmission coefficients of the antireflection coating for polarization states (42p 42s), which are orthogonal to one another, do not differ from one another by more than 10 %, preferably by no more than 3 %, and more preferably by no more than 1 %. The same applies to the reflection coefficients of the reflection coating. In order to correct for errors, which are caused by larger angular dependencies of the middle transmission or reflection coefficients and the effect upon the phase, the projection lighting system contains means (50) for homogenizing or distributing intensity, which are preferably placed in or in the vicinity of a field plane or pupil plane.
摘要翻译：微光刻投射曝光设备包括这有助于减少或抗反射涂层（32）和反射涂层的反射率的增加的光学元件（36）。根据本发明，Antiref法涂层被设计成使得在一定范围的70°远离的入射角，由不超过10％的Antire-柔性涂层相互正交的偏振态（42P 42S）的传输系数，优选不超过3％，更优选地，不超过1％，从彼此不同。这同样适用于反射涂层的反射系数。为了纠正错误，由平均传输或Ref和均质化的强度分布，其优选位于或靠近一个场或光瞳平面上引起含有该投射曝光系统的装置相（50）的效果的更大的角度依赖性lexionskoeffizienten 是。

8. 发明申请

WO2004092801A3 CATADIOPTRIC REDUCTION LENS COMPRISING A POLARISATION BEAM SPLITTER 审中-公开
标题翻译：带极化辐射的新型折反射透镜
公开(公告)号：WO2004092801A3
公开(公告)日：2004-12-09
申请号：PCT/EP2004003576
申请日：2004-04-03
申请人： ZEISS CARL SMT AG , DODOC AURELIAN , ULRICH WILHELM , GRUNER TORALF , SCHULTZ JOERG
发明人： DODOC AURELIAN , ULRICH WILHELM , GRUNER TORALF , SCHULTZ JOERG
IPC分类号： G02B13/14 , G02B17/08 , G02B27/28 , G03F7/20
CPC分类号： G03F7/70225 , G02B13/143 , G02B17/08 , G02B17/0804 , G02B17/0892 , G02B27/283
摘要： The invention relates to a catadioptric projection lens for reproducing a pattern that is located on the object plane of the projection lens on the imaging plane of said projection lens. The latter comprises an optical axis, a catadioptric first lens part (103) with a concave mirror (105) and a physical beam splitter (106) comprising at least one polarisation-selective beam-splitter layer (107), in addition to a second, preferably dioptric lens part (103). A retroreflective mirror (110) is situated in the optical path that includes the concave mirror (105), said retroreflective mirror retroreflecting the radiation emanating from the beam splitter towards said beam splitter. The multiple use of the beam splitter that is thus possible enables the creation of novel constructions, also including in particular catadioptric projection lenses with coaxial object and image fields.
摘要翻译：用于成像放置在投影透镜图案的物平面中的投射物镜的像平面中的对象的反射折射投影物镜具有至少一个偏振选择分束器层的光学轴，反射折射第一物镜部分（103）与凹面镜（105）和物理分束器（106）（107 ）和第二，优选屈光物镜部分（103）。在光路中，其包括凹面反射镜（105），后反射镜（110），用于从分束器来的辐射的背反射被布置在分束器的方向。在由此，能够多次使用分束器的使用允许新的设计，与同轴布置的物体和像场特别反射折射投影目标。

9. 发明申请

WO2009065819A3 POLARISER 审中-公开
标题翻译：偏振器
公开(公告)号：WO2009065819A3
公开(公告)日：2009-07-09
申请号：PCT/EP2008065733
申请日：2008-11-18
申请人： ZEISS CARL SMT AG , MUELLER RALF , GRUNER TORALF
发明人： MUELLER RALF , GRUNER TORALF
IPC分类号： G02B5/30 , G02B1/08 , G03F7/20
CPC分类号： G02B5/3083 , G02B1/08 , G03F7/70141 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70566 , G03F7/70966
摘要： The invention concerns an optical system having an optical axis (OA) and comprising a polariser (100, 200) having a first subelement (110, 210) which has a non-planar, optically effective surface wherein the maximum effective retardation introduced by the first subelement along the optical axis (OA) is less than a quarter of the working wavelength of the optical system, and a second subelement (120, 220), wherein said first subelement and said second subelement have mutually facing surfaces (110a, 120a, 210a, 220a) which are mutually complementary, and an actuator (150, 250) for changing the relative position of said first subelement (110, 210) with respect to said second subelement (120, 220).
摘要翻译：本发明涉及具有光轴（OA）并且包括具有非平面光学有效表面的第一子元件（110,210）的偏振器（100,200）的光学系统，其中由第一沿着光轴（OA）的子元件小于光学系统的工作波长的四分之一，以及第二子元件（120,220），其中所述第一子元件和所述第二子元件具有相互面对的表面（110a，120a，210a ，220a），以及用于改变所述第一子元件（110,210）相对于所述第二子元件（120,220）的相对位置的致动器（150,250）。

10. 发明申请

WO2006125617A3 METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTIVE, AND SUCH A PROJECTION OBJECTIVE 审中-公开
标题翻译：改进投影目标成像特性的方法及其投影目标
公开(公告)号：WO2006125617A3
公开(公告)日：2007-04-26
申请号：PCT/EP2006004929
申请日：2006-05-24
申请人： ZEISS CARL SMT AG , CONRADI OLAF , FELDMANN HEIKO , RICHTER GERALD , BLEIDISTEL SASCHA , FROMMEYER ANDREAS , GRUNER TORALF , HUMMEL WOLFGANG
发明人： CONRADI OLAF , FELDMANN HEIKO , RICHTER GERALD , BLEIDISTEL SASCHA , FROMMEYER ANDREAS , GRUNER TORALF , HUMMEL WOLFGANG
IPC分类号： G03F7/20
CPC分类号： G02B27/0068 , G02B3/0081 , G02B26/0825 , G03F7/7015 , G03F7/70266 , G03F7/70558 , Y10S359/90
摘要： The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50) , wherein the projection objective has a plurality of lenses (Ll, L2, L3 , L4 , L5 , L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.
摘要翻译：本发明涉及一种用于改善微光刻投影物镜（50）的成像特性的方法，其中投影物镜具有多个透镜（L1，L2，L3，L4，L5，L6，L7，L8）物镜平面和图像平面，多个透镜中的第一透镜被分配用于主动变形透镜的第一操纵器（ml，Mn），第一透镜被变形以至少部分地校正像差，至少一个第二透镜所述多个透镜还被分配至少一个第二操纵器，并且所述第二透镜除了所述第一透镜之外也变形。此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

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