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1. 发明申请

WO2006053751A3 PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION 审中-公开
标题翻译：投影镜头的微光刻投射曝光设备
公开(公告)号：WO2006053751A3
公开(公告)日：2006-10-12
申请号：PCT/EP2005012327
申请日：2005-11-17
申请人： ZEISS CARL SMT AG , BEIERL HELMUT , BLEIDISTEL SASCHA , SINGER WOLFGANG , GRUNER TORALF , EPPLE ALEXANDER , WABRA NORBERT , BEDER SUSANNE , WEBER JOCHEN , FELDMANN HEIKO , SCHWAER BAERBEL , ROGALSKY OLAF , KAZI ARI
发明人： BEIERL HELMUT , BLEIDISTEL SASCHA , SINGER WOLFGANG , GRUNER TORALF , EPPLE ALEXANDER , WABRA NORBERT , BEDER SUSANNE , WEBER JOCHEN , FELDMANN HEIKO , SCHWAER BAERBEL , ROGALSKY OLAF , KAZI ARIF
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure installation comprises a projection lens system (20), which projects an object (24) onto a focal plane (28) and which has a lens (L3) with a curved surface (S). A liquid or solid medium (34) is located in the projection lens system (20) and directly abuts against the curved surface (S) over an area that can be used for the projection of the object (24). The projection exposure installation also comprises an adjustable manipulator (M) for reducing a curvature of field that is caused by a heating of the medium (34) during the projection operation.
摘要翻译：微光刻投射曝光设备包括：一个投影透镜（20），该图像的对象（24）到图像平面（28）和具有弯曲表面（S）的透镜（L3）。在投影透镜（20）是液体或固体培养基（34），紧邻所述弯曲表面（S）在一定范围内作为用于所述对象（24）的成像。的投影曝光装置还包括一个可调节的操纵器（M），以减少的场曲，这是由投影操作期间介质（34）的加热而引起的。

2. 发明申请

WO2005081068A3 IMAGING SYSTEM FOR A MICROLITHOGRAPHICAL PROJECTION LIGHT SYSTEM 审中-公开
标题翻译：微米级投影曝光设备的图解系统
公开(公告)号：WO2005081068A3
公开(公告)日：2005-11-10
申请号：PCT/EP2005000277
申请日：2005-01-13
申请人： ZEISS CARL SMT AG , GRUNER TORALF , EPPLE ALEXANDER , KNEER BERNHARD , WABRA NORBERT , BEDER SUSANNE , DORSEL ANDREAS
发明人： GRUNER TORALF , EPPLE ALEXANDER , KNEER BERNHARD , WABRA NORBERT , BEDER SUSANNE , DORSEL ANDREAS
IPC分类号： G03F7/20
CPC分类号： G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： The invention relates to an imaging system of a microlithographical projection light system, comprising a projection lens (200, 300, 500, 600) which is used to reproduce a mask which can be positioned on a lens plane on a light-sensitive layer which can be positioned on an image plane; and a fluid inlet (205) which is used to fill an intermediate chamber between the image plane and a final optical element (201, 309, 506) of the projection lens, with immersion liquid (202, 310, 507, 601), on the image plane. The final optical element of the projection lens on the image plane is arranged, in the direction of gravity, after the image plane and the projection lens is embodied in such a manner that the immersion fluid, in the immersion state, comprises a convex curve, in the direction oriented away from the image plane, at least in one area. According to the invention, the final optical element (201, 309, 506) of the projection lens on the image plane is arranged below the image plane in such a manner that the immersion fluid (202, 310, 507, 601) is at least partially arranged in an essentially dish-shaped area on the final optical element on the image plane. Said system can also comprises a rotator which is used to rotate a substrate comprising the light-sensitive layer (401) between a transport position, wherein the light-sensitive layer is arranged on a substrate surface disposed in the counter direction to the direction of gravity, and a position of exposure, wherein the light-sensitive layer (401) is arranged on a substrate surface disposed in the direction of gravity.
摘要翻译：具有用于在光敏感层的图像平面上的定位在物平面掩模成像可定位的投影透镜（200，300，500，600）的微光刻投射曝光设备的成像系统; 和用于填充所述投射物镜的像平面和图像平面侧最后的光学元件（201，309，506）之间的间隙与浸没液体（202，310，507，601）的液体供给（205）; 其中投影透镜的图像平面侧最后一个光学元件沿像平面在重力方向上布置; 并且其中所述投影透镜被设计成使得在浸没模式中，所述浸没液体在远离所述像平面的方向上至少部分地凸出地弯曲。还可以预期的是，投影透镜的像面侧最后的光学元件（201，309，506）设置在图像平面下方，使得浸没液体（202，310，507，601）至少部分地基于所述像面侧的大致槽形区域部分地最后一个光学元件被安排。用于旋转具有输送方向之间的衬底的感光层（401）旋转器罐，被布置在位于一个相对的衬底表面的重力方向上的感光层，和一个曝光取向，其中在重力的方向上的感光层（401）可以设置平躺的基板表面。

3. 发明申请

WO2005015316A2 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 审中-公开
标题翻译：微压印技术的投影目标
公开(公告)号：WO2005015316A2
公开(公告)日：2005-02-17
申请号：PCT/EP2004008220
申请日：2004-07-23
申请人： ZEISS CARL SMT AG , SHAFER DAVID , EPPLE ALEXANDER , ULRICH WILHELM , BEIERL HELMUT
发明人： SHAFER DAVID , EPPLE ALEXANDER , ULRICH WILHELM
IPC分类号： G03F7/20 , G02B17/08
CPC分类号： G03F7/70225
摘要： A projection objective for projecting a pattern of a mask arranged in an object plane of the projection objective into an image plane of the projection objective has a pupil surface (11) near the image plane, a radiance transformation group (100) that is arranged at a distance upstream of the image plane (4); and an aperture-generating group (200) arranged downstream of the radiance transformation group. The radiance transformation group is designed to transform an input radiance distribution with a uniform angular radiance that is substantially independent of beam height into an output radiance distribution with a nonuniform angular radiance that is dependent on beam height, wherein the angular radiance decreases with increasing beam height, at least in a region near a maximum beam height. The output radiance distribution is adapted to beam guidance properties of the aperture-generating group in such a way that the sine condition is substantially fulfilled in the image plane for all beams of the input light distribution.
摘要翻译：用于将布置在投影物镜的物平面中的掩模的图案投影到投影物镜的像平面中的投影物镜具有靠近像平面的光瞳表面（11），辐射转换组（100），其布置在距图像平面（4）上游的距离; 和布置在辐亮度变换组下游的孔径生成组（200）。辐亮度变换组被设计成将具有基本上与光束高度无关的均匀角度辐射率的输入辐射率分布变换成具有取决于光束高度的不均匀角度辐射率的输出辐射率分布，其中角度辐射率随着光束高度至少在靠近最大光束高度的区域。输出辐射分布适合于孔径生成组的束引导属性，使得输入光分布的所有束在图像平面中基本上满足正弦条件。

4. 发明申请

WO2006037444A3 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置
公开(公告)号：WO2006037444A3
公开(公告)日：2006-08-10
申请号：PCT/EP2005009966
申请日：2005-09-16
申请人： ZEISS CARL SMT AG , FELDMANN HEIKO , EPPLE ALEXANDER , BLAHNIK VLADAN
发明人： FELDMANN HEIKO , EPPLE ALEXANDER , BLAHNIK VLADAN
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/70341
摘要： A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element (TE; TE2; TE3) that has no refractive power and is designed for dry operation of the projection objective (20; 220; 320). According to the invention, the projection exposure apparatus furthermore contains an immersion terminating element (TE'; TE2'; TE3') that has no refractive power and is designed for immersed operation of the projection objective. The immersion terminating element (TE'; TE2'; TE3') is replaceable with the dry terminating element (TE; TE2; TE3). Preferably, the dry terminating element (TE; TE2; TE3) and/or the immersion terminating element (TE'; TE2'; TE3') is composed of a plurality of plates (TP1, TP2; TP31', TP32'), which are made of materials having different refractive indices.
摘要翻译：微光刻投影曝光装置包括投影物镜，其投影物镜的最后一个光学元件是干燥的终端元件（TE; TE2; TE3），其不具有屈光力并被设计用于投影物镜（20; 220; 320）。根据本发明，投影曝光装置还包含没有屈光力的浸没终端元件（TE'; TE2'; TE3'），并被设计用于投影物镜的浸入操作。浸没端接元件（TE'; TE2'; TE3'）可以用干端接元件（TE; TE2; TE3）代替。优选地，干终端元件（TE; TE2; TE3）和/或浸没端接元件（TE'; TE2'; TE3'）由多个板（TP1，TP2; TP31'，TP32'）组成，其中由具有不同折射率的材料制成。

5. 发明申请

WO2004010164A2 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2004010164A2
公开(公告)日：2004-01-29
申请号：PCT/EP0307758
申请日：2003-07-17
申请人： ZEISS CARL SMT AG , EPPLE ALEXANDER , DODOC AURELIAN
发明人： EPPLE ALEXANDER , DODOC AURELIAN
IPC分类号： G02B5/00 , G02B17/00 , G02B17/08 , G03F7/20 , H01L21/027 , G02B
CPC分类号： G02B17/0892 , G02B5/005 , G02B13/22 , G02B17/08 , G03F7/70225 , G03F7/7025 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective which images a pattern arranged in an object plane of the projection objective into the image plane of the projection objective whilst generating a real intermediate image has a catadioptric objective part having at least one concave mirror and a beam deflecting device and also a dioptric objective part. The imaging system has a system diaphragm having a variable diaphragm diameter for variably limiting the cross section of the radiation passing through the projection objective. This system diaphragm is arranged in the catadioptric objective part, preferably in direct proximity to the concave mirror. The invention enables a projection objective with a simple construction.
摘要翻译：将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中同时产生真正的中间图像的反射折射投影物镜具有反射折射物镜部分，其具有至少一个凹面镜和光束偏转装置，并且还具有屈光客观部分。成像系统具有可变光阑直径的系统隔膜，用于可变地限制通过投影物镜的辐射的横截面。该系统隔膜布置在反折射物镜部分中，优选地直接靠近凹面镜。本发明能够实现具有简单结构的投影物镜。

6. 发明申请

WO2009040011A3 HIGH APERTURE CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：高孔径预测目标
公开(公告)号：WO2009040011A3
公开(公告)日：2009-05-22
申请号：PCT/EP2008007631
申请日：2008-09-15
申请人： ZEISS CARL SMT AG , EPPLE ALEXANDER
发明人： EPPLE ALEXANDER
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G02B17/08 , G02B17/0892 , G03F7/70225 , G03F7/70341
摘要： A catadioptric projection objective has a plurality of optical elements arranged along an optical axis to image a pattern from an object field in an object surface of the objective to an image field in an image surface region of the objective at an image-side numerical aperture NA =1.35 with electromagnetic radiation defining an operating wavelength ?. The optical elements form a first objective part configured to image the pattern from the object surface into a first intermediate image, a second objective part configured to image the first intermediate image into a second intermediate image, the second objective part including a concave mirror having a reflective mirror surface positioned at or close to a pupil surface; and a third objective part configured to image the second intermediate image into the image surface. A first deflecting mirror is arranged to deflect radiation from the object surface towards the concave mirror, and a second deflecting mirror is arranged to deflect radiation from the concave mirror towards the image surface such that the image surface is parallel to the object surface. The projection objective has an immersion lens group having a convex object-side entry surface bounding at a gas or vacuum and an image-side exit surface in contact with an immersion liquid in operation. The immersion lens group is at least partly made of a high-index material with refractive index n = 1.6 at the operating wavelength.
摘要翻译：反折射投影物镜具有沿着光轴布置的多个光学元件，用于将物镜的物体表面中的物体的图案成像到图像侧数值孔径NA的物镜的图像表面区域中的图像场 = 1.35，其中电磁辐射限定了工作波长λ。所述光学元件形成第一物镜部分，被配置为将所述图案从所述物体表面成像为第一中间图像;第二物镜部分，被配置为将所述第一中间图像成像为第二中间图像，所述第二物镜部分包括凹面镜，位于或靠近瞳孔表面的反射镜表面; 以及构造成将所述第二中间图像成像到所述图像表面中的第三目标部分。第一偏转镜布置成将来自物体表面的辐射偏转到凹面镜，并且布置第二偏转镜以将来自凹面镜的辐射偏转到图像表面，使得图像表面平行于物体表面。投影物镜具有浸没透镜组，其具有在气体或真空下界定的凸面物体入射面和在操作中与浸没液体接触的像侧出射面。浸没透镜组至少部分地由在工作波长处的折射率n = 1.6的高折射率材料制成。

7. 发明申请

WO2005069055A3 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2005069055A3
公开(公告)日：2006-03-02
申请号：PCT/EP2005000262
申请日：2005-01-13
申请人： ZEISS CARL SMT AG , SHAFER DAVID , ULRICH WILHELM , DODOC AURELIAN , VON BUENAU RUDOLF , MANN HANS-JUERGEN , EPPLE ALEXANDER
发明人： SHAFER DAVID , ULRICH WILHELM , DODOC AURELIAN , VON BUENAU RUDOLF , MANN HANS-JUERGEN , EPPLE ALEXANDER
IPC分类号： G02B17/08 , G03F7/20 , G02B17/00
CPC分类号： G03F7/70958 , G02B13/22 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70966
摘要： A catadioptric projection objective (200) for imaging a pattern provided in an object plane (201) of the projection objective onto an image plane (202) of the projection objective comprises: a first objective part (210) for imaging the pattern provided in the object plane into a first intermediate image; a second objective part (220) for imaging the first intermediate imaging into a second intermediate image; a third objective part (230) for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror (221) having a first continuous mirror surface and at least one second concave mirror (222) having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面（201）中的图案成像到投影物镜的像平面（202）上的反射折射投射物镜（200）包括：第一物镜部分（210），用于对设置在投影物镜物平面成为第一中间图像; 第二目标部分（220），用于将第一中间成像成像成第二中间图像; 用于将所述第二中间成像直接成像到所述图像平面上的第三目标部分（230）其中具有第一连续镜面的第一凹面镜（221）和具有第二连续镜面的至少一个第二凹面镜（222）布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

8. 发明申请

WO2004090600A3 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2004090600A3
公开(公告)日：2005-02-17
申请号：PCT/EP2004003708
申请日：2004-04-07
申请人： ZEISS CARL SMT AG , EPPLE ALEXANDER , DODOC AURELIAN
发明人： EPPLE ALEXANDER , DODOC AURELIAN
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging a pattern arranged in the object plane (102) of the projection objective into the image plane (104) of the projection objective has a catadioptric first objective part (105) having at least one concave mirror (106), and a dioptric second objective part (108) in which there is situated a pupil surface (111) near the image. At least one concave lens (140, 145) with a concave surface (140', 145') directed towards the pupil surface (111) is arranged in a near zone (160) of the pupil surface. There are no lenses with a strongly curved concave surface directed towards the image plane between the pupil surface and the image plane. Such projection objectives can be produced in a way which saves material in conjunction with good optical correction, and are relatively insensitive to production-induced deviations from the ideal de sign.
摘要翻译：用于将布置在投影物镜的物平面（102）中的图案成像到投影物镜的像平面（104）中的反射折射投射物镜具有反射折射的第一物镜部分（105），其具有至少一个凹面镜（106），以及其中在图像附近设置瞳孔表面（111）的屈光度第二目标部分（108）。具有指向瞳孔表面（111）的凹表面（140'，145'）的至少一个凹透镜（140,145）布置在瞳孔表面的近区（160）中。没有透镜具有朝向瞳孔表面和图像平面之间的图像平面的强弯曲凹面。这样的投影物镜可以以与光学校正良好相结合的方式产生，并且对生产诱导的理想偏差的偏差相对不敏感。

9. 发明申请

WO2009030444A3 CHROMATICALLY CORRECTED CATADIOPTRIC OBJECTIVE AND PROJECTION EXPOSURE APPARATUS INCLUDING THE SAME 审中-公开
标题翻译：显色校正阴性对象和投影曝光装置
公开(公告)号：WO2009030444A3
公开(公告)日：2009-06-04
申请号：PCT/EP2008007123
申请日：2008-09-01
申请人： ZEISS CARL SMT AG , EPPLE ALEXANDER
发明人： EPPLE ALEXANDER
IPC分类号： G02B17/08 , G03B27/00 , G03F7/20
CPC分类号： G03F7/70225 , G02B17/0892 , G02B27/0025
摘要： A catadioptric objective comprises a plurality of optical elements arranged along an optical axis to image a pattern from an object field in an object surface of the objective to an image field in an image surface region of the objective at an image-side numerical aperture NA with electromagnetic radiation from a wavelength band around a central wavelength ? The optical elements include a concave mirror and a plurality of lenses. The projection objective forms an image of the pattern in a respective Petzval surface for each wavelength ? of a wavelength band, the Petzval surfaces deviating from each other for different wavelengths. In embodiments a longitudinal departure p of the Petzval surface at a given wavelength from a planar reference surface at an edge field point of the image field (at maximum image height y'), measured parallel to the optical axis in the image surface region, varies with the wavelength ? according to dp/d? 2 ) / nm.
摘要翻译：反射折射物镜包括沿着光轴布置的多个光学元件，以将来自物镜的物体表面中的物场的图案成像到在像侧数值孔径NA处的物镜的图像表面区域中的图像场，围绕中心波长的波长带的电磁辐射？光学元件包括凹面镜和多个透镜。投影物镜在每个波长λ形成相应的Petzval表面中的图案的图像？的波长带，Petzval表面对于不同的波长彼此偏离。在实施例中，平行于图像表面区域中的光轴测量的图像场（最大图像高度y'）的边缘场点处的平坦参考表面处的给定波长处的Petzval表面的纵向偏离p变化与波长？根据dp / d？ 2）/ nm。

10. 发明申请

WO2005111689A3 CATADIOPTRIC PROJECTION OBJECTIVE WITH INTERMEDIATE IMAGES 审中-公开
标题翻译：具有中间图像的目标投影
公开(公告)号：WO2005111689A3
公开(公告)日：2006-06-08
申请号：PCT/EP2005005250
申请日：2005-05-13
申请人： ZEISS CARL SMT AG , DODOC AURELIAN , ULRICH WILHELM , EPPLE ALEXANDER
发明人： DODOC AURELIAN , ULRICH WILHELM , EPPLE ALEXANDER
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror. A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided. A field lens with a positive refractive power is arranged between the first intermediate image and/or the first folding mirror and the concave mirror, in an area close to the field of the first intermediate image.
摘要翻译：用于对投影物镜的物平面上配置的图案进行成像的反射折射投射物镜具有用于对物场进行成像以形成第一实际中间像的第一物镜部分，使用来自第一目标部分的辐射来生成第二实际中间图像的第二目标部分; 以及用于在图像平面上成像第二实际中间图像的第三目标部分。第二个目标部分是具有凹面镜的反射折射物镜部分。提供了用于使来自物体平面的辐射在凹面镜的方向上偏转的第一折叠镜和用于在像面方向偏转来自凹面镜的辐射的第二折叠镜。在第一中间图像和/或第一折叠镜和凹面镜之间，在靠近第一中间图像的场的区域内布置具有正屈光力的场透镜。

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