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    • 3. 发明申请
    • HIGH DENSITY INTERCONNECT STRUCTURES CONFIGURED FOR MANUFACTURING AND PERFORMANCE
    • 配置用于制造和性能的高密度互连结构
    • WO2018004619A1
    • 2018-01-04
    • PCT/US2016/040486
    • 2016-06-30
    • BRAUNISCH, HenningAYGUN, KemalJAIN, AjayQIAN, Zhiguo
    • BRAUNISCH, HenningAYGUN, KemalJAIN, AjayQIAN, Zhiguo
    • H01L23/48H01L23/00H01L23/495H01L23/498H01L23/522
    • Discussed generally herein are methods and devices including or providing a high density interconnect structure. A high density interconnect structure can include a stack of alternating dielectric layers and metallization layers comprising at least three metallization layers including conductive material with low k dielectric material between the conductive material, and at least two dielectric layers including first medium k dielectric material with one or more first vias extending therethrough, the at least two dielectric layers situated between two metallization layers of the at least three metallization layers, a second medium k dielectric material directly on a top surface of the stack, a second via extending through the second medium k dielectric material, the second via electrically connected to conductive material in a metallization layer of the three or more metallization layers, and a pad over the second medium k dielectric material and electrically connected to the second via.
    • 这里通常讨论的是包括或提供高密度互连结构的方法和设备。 高密度互连结构可以包括交替介电层和金属化层的叠层,所述金属化层包括至少三个金属化层,所述至少三个金属化层包括在导电材料之间具有低k介电材料的导电材料,以及至少两个介电层,包括第一介质k介电材料, 所述至少两个电介质层位于所述至少三个金属化层的两个金属化层之间,第二介质k电介质材料直接位于所述堆叠的顶表面上,第二通孔延伸穿过所述第二介质k电介质 所述第二通孔电连接到所述三个或更多个金属化层的金属化层中的导电材料,所述第二介质k电介质材料上方的焊盘并且电连接到所述第二通孔。