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1. 发明申请

WO1995016798A1 PLASMA-ACTIVATED VAPOUR-DEPOSITION PROCESS AND DEVICE 审中-公开
标题翻译：方法和设备等离子体活化蒸镀
公开(公告)号：WO1995016798A1
公开(公告)日：1995-06-22
申请号：PCT/DE1994001415
申请日：1994-11-22
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , KIRCHHOFF, Volker , GOEDICKE, Klaus , NEUMANN, Manfred , RESCHKE, Jonathan , SCHILLER, Siegfried
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
IPC分类号： C23C14/08
CPC分类号： C23C14/32
摘要： The object of the invention is to achieve a high and stable deposition rate over a long period of time in order to apply preferably reactive layers of electrically insulating compounds. Reactivity, energetic activation and layer composition and structure should be regulated and kept constant by acting on the plasma density. For that purpose, vapour propagates from the vaporiser (1) through a plasma produced between electrodes (1, 1') and interacts therewith. The electrodes are made of a material to be vaporised or of a component and/or doting material of the layer to be applied. The plasma is maintained in the vapour of the material to be vaporised and/or in an inert gas. This process is suitable for improving the surface of semi-finished products and assembly units, in particular for applying oxide layers with barrier effect on plastic foils in the packaging industry.
摘要翻译：的目的是实现在长时间内稳定的高沉积量反应性地沉积优选电绝缘接头的层。反应性和活力的激活和层组成和结构是要被调节并通过控制等离子体密度保持恒定。根据本发明，从贯通电极之间（2 2，“）蒸汽中传播的蒸发器（1）所产生的等离子体的推移和与该反应进行交互。所述电极由蒸发材料或组分和/或掺杂的层的材料被施加的。等离子体被保持在蒸发材料和/或惰性气体的蒸汽。该方法被用于半成品和成品表面精加工，特别是用于具有在塑料薄膜用于包装工业的阻挡效果的氧化物层。

2. 发明申请

WO1995012005A1 PROCESS AND SYSTEM FOR PLASMA-ACTIVATED ELECTRON-BEAM VAPORISATION 审中-公开
标题翻译：方法和设备等离子体激活电子
公开(公告)号：WO1995012005A1
公开(公告)日：1995-05-04
申请号：PCT/DE1994001207
申请日：1994-10-11
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , GOEDICKE, Klaus , SCHEFFEL, Bert , RESCHKE, Jonathan , SCHILLER, Siegfried , KIRCHHOFF, Volker , WERNER, Torsten
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
IPC分类号： C23C14/30
CPC分类号： C23C14/562 , C23C14/24 , C23C14/30 , H01J37/3053
摘要： A process and system for plasma-activated electron-beam vaporisation are disclosed. Known processes are not suitable to achieve very high coating rates under an intensive plasma influence. The spectrum of materials capable of being deposited should be very large, even in the case of insulating layers. The efficiency of the process should be high. According to the invention, the material to be vaporised is vaporised by means of electron beams (7 ) from at least two vaporisation crucibles (1; 1). An electric voltage is applied to the vaporisation crucibles, so that their vapour-generating areas act as electrodes of an electric discharge. The material to be vaporised acts as a cathode or anode. The vaporisation crucibles (1; 1) are connected to earth potential through ohmic resistances (R1; R2). This process and system are preferably suitable for reactive coating large surfaces, as well as for reactive coating components, tools and steel strips (substrate 3).
摘要翻译：已知的方法是不适合与密集的等离子行动实现了非常高的沉积速率。颗粒材料的光谱应该非常大，即使对于绝缘层。该方法的效率是高。根据本发明，蒸发材料是至少两种蒸发坩埚（1; 2）的用电子束（7 <1>）被蒸发。电电压被施加，以使得蒸汽发射部分充当电排放到蒸发坩埚的电极。蒸发材料用作阴极或阳极。所述汽化坩埚（1; 2）在欧姆电阻器（R1; R2）连接到地电位。该方法和该装置是优选的大面积的反应性涂层，以及用于的组件，工具的反应性涂层和带钢（基材3）。

3. 发明申请

WO1995003682A1 METHOD FOR MATCHING THE GENERATOR IN DIPOLAR LOW-PRESSURE GLOW PROCESSES 审中-公开
标题翻译：方法发电机的双极性低压力调整GLIMMPROZESSEN
公开(公告)号：WO1995003682A1
公开(公告)日：1995-02-02
申请号：PCT/DE1994000817
申请日：1994-07-13
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , KIRCHHOFF, Volker , RESCHKE, Jonathan , SCHILLER, Siegfried , GOEDICKE, Klaus
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
IPC分类号： H05H01/46
CPC分类号： H01J37/32018 , H01J37/32036 , H05H1/46
摘要： The generator must be statically and dynamically matched to the electrodes in the high power and frequency range in order to perform dipolar low-pressure glow processes. The prior art processes either require considerable complexity or are not usable in the range. According to the invention, the operating time during the positive and/or negative half-wave is controlled in such a way that no power is fed to the glow device, at least during the time of a part of a negative and/or positive half-wave. The invention is applicable to plasma surface treatment, the separation of layers from the plasma and plasma-enhanced surface cleaning.
摘要翻译：发生器到电极上的功率大的频率范围内的一个静态未动态调整是必需的用于双极低压Glimmprozesse的实施。已知的方法或者需要很高的成本或并不适用于该地区。根据本发明的控制的正和/或负半波期间的动作时间为预热过程，使得至少为的负和/或不供电Glimmeinrichtung的正半波的部分的周期。本发明是在等离子体处理中的表面，该等离子体和等离子体辅助表面清洁应用的层的沉积使用。

4. 发明申请

WO1995028508A1 PROCESS AND DEVICE FOR ION-SUPPORTED VACUUM COATING 审中-公开
标题翻译：方法和装置离子辅助真空镀膜
公开(公告)号：WO1995028508A1
公开(公告)日：1995-10-26
申请号：PCT/DE1995000476
申请日：1995-04-07
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , NEUMANN, Manfred , GOEDICKE, Klaus , SCHILLER, Siegfried , RESCHKE, Jonathan , MORGNER, Henry , MILDE, Falk , FIETZKE, Fred
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
IPC分类号： C23C14/32
CPC分类号： H01J37/32422 , C23C14/32 , C23C14/562 , H01J37/32706
摘要： The process and appropriate device is designed to facilitate the coating at a high rate of large-area electrically conductive and electrically insulating substrates with electrically insulating and electrically conductive coatings comparatively economically. The substrates are primarily strip-like and are especially plastic foils more than a metre wide. According to the invention, negative and positive voltage pulses are alternately applied in a prior art vacuum coating device to the electrically conductive substrate or, in the case of electrically insulating substrates, to an electrode arranged behind it, e.g. the cooling roller, relative to the plasma or to an electrode at approximately plasma potential. The shape, voltage and duration of the pulses is suitable for the coating purpose and the material. The process is particularly suitable for applying wear and corrosion protection and barrier coatings for use, for example, in the packaging industry.
摘要翻译：该方法和相关的装置是允许大面积的导电的，并电绝缘层，且以相对较少的努力导电层电绝缘性基材的高速率的涂层。基板主要是带状，在具有宽度约一米特别是塑料膜。根据本发明，以本身公知的设备，用于在导电基底的真空镀膜或电布置在后面的电极，例如绝缘衬底冷却辊，给等离子体或大致位于所述等离子体电极电位交替正，负电压脉冲施加相对。电压和脉冲的持续时间的形状适应于该涂层任务和材料。该方法特别用于施加抗磨保护，腐蚀保护层和阻挡层。用户是等包装行业。

5. 发明申请

WO1995012006A1 PROCESS AND DEVICE FOR ELECTRON BEAM VAPOUR DEPOSITION 审中-公开
标题翻译：方法和装置电子
公开(公告)号：WO1995012006A1
公开(公告)日：1995-05-04
申请号：PCT/DE1994001210
申请日：1994-10-11
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , SCHILLER, Siegfried , GOEDICKE, Klaus , RESCHKE, Jonathan , SCHEFFEL, Bert , METZNER, Christoph , KERN, Heinz
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
IPC分类号： C23C14/32
CPC分类号： H01J37/3053 , C23C14/30 , C23C14/32
摘要： In the electron beam vapour deposition using an arc, cathode spots occur which lead to the formation of droplets. These very adversely affect the quality of the coatings. Accordingly to the invention, a periodically deflectable, high-energy electron beam is moved over the deposition material to form a virtually uniformly heated region in which there is a high rate of evaporation. An arc discharge is struck in this region which impinges in a diffuse manner and extends over said region. A high proportion of the vapour is ionised. No process gas is fed in during the process. The invention is applicable even to the reactive coating of components, tools and steel strip.
摘要翻译：当电子结合光束与电弧Katodenbrennflecke发生从而导致液滴的形成。这些影响层在它们的质量非常不利。根据本发明，在蒸发材料上的周期性偏转，高能量电子束被移动到形成准，其中蒸发的高速率产生均匀加热的区域。在这个区域中，电弧放电被点燃，电弧附着形成漫射和延伸在所述范围内。有被电离，蒸汽的比例很高。在此过程中，没有处理气体被供给。本发明用于涂覆组件，工具和带钢，包括反应性应用。

6. 发明申请

WO1996013964A1 PROCESS AND CIRCUIT FOR THE BIPOLAR PULSED SUPPLY OF POWER IN LOW-PRESSURE PLASMAS 审中-公开
标题翻译：方法和电路，用于低压等离子体双极脉冲整形能源供应
公开(公告)号：WO1996013964A1
公开(公告)日：1996-05-09
申请号：PCT/DE1995001473
申请日：1995-10-19
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , WALDE, Hendrik , RESCHKE, Jonathan , GOEDICKE, Klaus , WINKLER, Torsten , KIRCHHOFF, Volker , FRACH, Peter
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
IPC分类号： H05H01/46
CPC分类号： H01J37/32018 , H01J37/32027 , H01J37/32064 , H05H1/46
摘要： The greatest possible power is to be supplied to the low-pressure discharge at the median point of a period of time. The same power is to be supplied to each pole although the impedance differs widely. In a plasma and surface treatment technology plant with at least two electrodes and a power supply, the outputs of at least two potential-free d.c. power supplies are connected in such a way that an output of one of them is conductively connected to that of the other having the same polarity. Via a switch connected to the electrodes by each line, the other outputs of which are connected together to the other outputs of the d.c. source, said switches are actuated at the rate of the pole change frequency by a clock unit. The switches are opened on the occurence of an arc discharge. The process is used in bipolar pulsed sputtering for depositing electrically insulating coatings on workpieces. Such coatings are preferably used for mechanical protection, wear prevention and the improvement of sliding properties.
摘要翻译：它是在时间内应供给装置在低压力放电可能的最高性能。在每一个极性被馈送相同的功率，虽然阻抗非常不同。在等离子表面工程和具有至少两个电极和电源的植物，至少两个浮动直流电源的输出进行切换，使得一个与其它的相同极性的输出导电连接。经由与各相关到电极的开关，其在其他直流电源的另一输出端连接在一起的输出端的进料管线被引导，该开关可以通过在交变频率的节奏的时钟发生器的装置来致动。当电弧放电，开关被打开。该方法被用于双极性脉冲溅射的在工件上的电绝缘层的沉积。优选地，这样的层，用于机械保护，磨损和改善滑动性使用。

7. 发明申请

WO1997022988A1 METHOD AND DEVICE FOR PRE-TREATMENT OF SUBSTRATES 审中-公开
标题翻译：方法和设备处理基质的
公开(公告)号：WO1997022988A1
公开(公告)日：1997-06-26
申请号：PCT/EP1996005032
申请日：1996-11-15
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , GOEDICKE, Klaus , FIETZKE, Fred , RESCHKE, Jonathan , HEMPEL, Wolfgang , SCHEFFEL, Bert , METZNER, Christoph , SCHILLER, Siegfried
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
IPC分类号： H01J37/32
CPC分类号： H01J37/32018 , C23C14/022 , H01J37/34 , H01J2237/3322
摘要： Known methods and devices for pre-treatment of electrically conducting and non-conducting substrates require a relatively high level of technical outlay and are difficult to incorporate into the following coating process. Pre-treatment frequently does not ensure the adhesion required for coating. The invention proposes to maintain a low pressure glow discharge between the substrate to be cleaned and a counter-electrode. The substrate is periodically alternately switched as a cathode or anode, the frequency of the alternation being set in the range of from 1 Hz to 1000 Hz and the pulse lengths and/or the discharge voltage being independently adjustable. The method is used as a preliminary process for the coating of substrates which require an adhesive layer. Cutting tools, in particular, made of steel, hard metal or ceramic are treated before being coated.
摘要翻译：对于导电和非导电基底的预处理的已知方法和装置需要相对高的技术努力，并且难以与随后的涂敷过程结合起来。预处理常常不能保证所需要的涂层的粘附性。根据本发明，保持待清洁的基板和对置电极之间的低压辉光放电。衬底被周期性地交替切换为阴极或阳极，其特征在于，在1赫兹至1000千赫的范围内的磁极变化的频率被调整和脉冲长度和/或放电电压可以单独设定。该方法应用于作为用于涂布基材，需要牢固粘附的层的前处理。它将被视为特别切割涂覆之前由钢，硬金属或陶瓷的工具。

8. 发明申请

WO1997013003A2 TRANSPARENT HEAT PROTECTION FOIL AND PROCESS FOR PRODUCING THE SAME 审中-公开
标题翻译：透明过热保护，方法及其
公开(公告)号：WO1997013003A2
公开(公告)日：1997-04-10
申请号：PCT/DE1996001905
申请日：1996-10-02
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , KIRCHHOFF, Volker , SCHILLER, Siegfried , NEUMANN, Manfred , MILDE, Falk
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
IPC分类号： C23C14/20
CPC分类号： C23C14/0641 , B32B17/10018 , C23C14/0021 , C23C14/0036 , C23C14/0676 , C23C14/08 , C23C14/352 , C23C28/00
摘要： Known heat protection foils have several metal layers which reflect thermal radiation and let light through. Systems of alternating metal and non-metal layers are also known. Their disadvantage is that in particular the metal layers are subject to corrosion. The outermost protection layer is not sufficiently scratch-resistant either. Consequently, such heat protection foils may hardly be used on the outer side of glass panes. They are not weather-resistant either. According to the invention, a selectively reflecting system of alternating layers is applied on the plastic foil, together with an anti-abrasive layer. The system of alternating layers consists of corrosion-resistant metal, oxide, nitride and/or oxinitride layers. The anti-abrasive layer consists of an at least 1 mu m thick, highly transparent and homogeneous amorphous oxide layer with high packing density and a micro-hardness of at least 4 Gpa. These layers are applied by high-speed sputtering by means of a dual magnetron. The anti-abrasive layer is applied by plasma- and/or ion-assisted high-speed vapour deposition. This heat protection foil may be applied on the outer side of window panes of buildings and vehicles.
摘要翻译：已知的热保护膜具有多层金属反射热射线和透射光。也已知的是交替的金属和非金属的层系统。有一个缺点，即特别腐蚀金属层。最外面的保护层不具有所需的耐擦伤性。因此，这样的热绝缘薄膜可以很差施加到窗户的外侧。他们也有不防水。根据本发明的一个选择反射交替层系统沉积有在塑料膜的耐磨层。交替层系统由耐腐蚀金属，氧化物，氮化物和/或氧氮化物层。耐磨层由至少1微米厚的高度透明的和均匀的，无定形氧化物层具有高填充密度和至少为4GPa的显微硬度。层通过溅射杜赫高理事会双磁控管施加。耐磨层是通过等离子体和/或离子辅助Hochratebedampfen施加。热保护器在Windows和车窗户外使用。

9. 发明申请

WO1995012008A1 PROCESS FOR ELECTRON BEAM VAPOUR DEPOSITION WITH A MULTI-COMPONENT DEPOSITION MATERIAL 审中-公开
标题翻译：用电子束蒸发MEHRKOMPONENTIGEM EXPANSION材料的方法
公开(公告)号：WO1995012008A1
公开(公告)日：1995-05-04
申请号：PCT/DE1994001208
申请日：1994-10-11
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , SCHILLER, Nicolas , GOEDICKE, Klaus , METZNER, Christoph , KIRCHHOFF, Volker , HEMPEL, Wolfgang
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
IPC分类号： C23C14/54
CPC分类号： C23C14/30 , C23C14/548 , H01J37/304 , H01J37/3053 , H01J2237/3132
摘要： The prior art processes for vapour deposition by applying the deposition material consisting of several components (alloys, mixtures, compounds) do not ensure good coating quality. The coatings are difficult to deposit with a constant composition and thickness. According to the invention, the X-radiation emitted by the deposition material at the point of impingement of the electron beam is measured in situ. The signal obtained is used as a guide to control the deposition process parameters and hence to regulate the rate of coating and the composition of the coating applied. The process is applicable to the production of corrosion-proof, high temperature-resistant, low-wear or optical coatings, e.g. on steel strip or plastic films.
摘要翻译：通过施加若干部件不确保高膜质量的蒸发材料，它由（合金，混合物，化合物），用于气相沉积的已知方法。所述层是气相沉积具有恒定的组成和厚度硬限定。根据本发明的原位测量在所述电子束的X射线的落点由蒸发材料发射的辐射。得到的信号被用作蒸发过程控制的参数的基准变量，从而沉积速率和沉积层控制的材料组成。该方法是用于制造上的耐腐蚀，耐高温，低磨损或光学层，例如上带钢或塑料应用。

10. 发明申请

WO1997030186A1 METHOD AND DEVICE FOR CONTROL OF PLASMA ENHANCED VACUUM COATING PROCESSES 审中-公开
标题翻译：方法和设备控制等离子体辅助真空涂布方法
公开(公告)号：WO1997030186A1
公开(公告)日：1997-08-21
申请号：PCT/DE1997000265
申请日：1997-02-07
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , SCHEFFEL, Bert , GOEDICKE, Klaus , METZNER, Christoph , KIRCHHOFF, Volker
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
IPC分类号： C23C14/54
CPC分类号： H01J37/32935 , C23C14/543 , H01J37/304 , H01J37/3299 , H01J37/3405 , H01J2237/3137
摘要： In the known methods for controlling vacuum coating processes, measurable variables such as plasma emission and coating rate are measured in the plasma or vapor in order to control the vacuum coating process using process parameters of the vaporization or sputtering. This subjects the sensors to high levels of stress, which adversely affects their durability. Using the force of the electrical discharge as a measurable variable, the plasma enhanced vacuum coating process is controlled by measuring the force of the electrical discharge on the coating source. The coating source is arranged in the vacuum chamber with the aid of force transducers (3), and the signal emanating from the force transducers can be used to control, for example, the electrical energy to heat the vaporizing material, the beam deflection or the distribution of the electrical discharge to several coating sources, without the sensors coming in contact with the plasma or the vapor. Plasma enhanced vacuum coating processes, particularly for coating tools and sheet substrates with functional coatings, can be controlled with this method and device.
摘要翻译：有用于控制等离子增强真空涂覆过程的公知的方法进行测量的变量，如等离子发射和蒸发速度，在等离子体或在蒸汽测量用蒸发或溅射法，在真空涂敷工艺的工艺参数来调节。因此，该传感器承受高负载，这是不利的长期操作。通过使用该放电的力的作为等离子增强真空涂覆过程是通过放电的力控制的测量变量涂层源上被检测到。涂布源设置在真空室中通过测力单元（3）的装置，根据从测力传感器的信号所恢复的例如的电力可以被控制用于在多个的涂料源加热蒸发材料，光束偏转或放电的分布，而不传感器来与等离子体或蒸汽接触。用该方法和装置可以是等离子体辅助真空沉积工艺，特别是用于涂层工具和功能层的盘状衬底，规则。

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