会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明申请
    • DUV LIGHT SOURCE OPTICAL ELEMENT IMPROVEMENTS
    • DUV光源光学元件的改进
    • WO2005104311A2
    • 2005-11-03
    • PCT/US2005/006932
    • 2005-03-04
    • CYMER, INC.SANDSTROM, Richard L.ALGOTS, J. MartinBROWN, Joshua C.CYBULSKY, Raymond F.DUNLOP, JohnHOWEY, James K.MORTON, Richard G.PAN, Xiaojiang J.PARTLO, William N.PUTRIS, Firas F.WATSON, Tom A.YAGER, Thomas A.
    • SANDSTROM, Richard L.ALGOTS, J. MartinBROWN, Joshua C.CYBULSKY, Raymond F.DUNLOP, JohnHOWEY, James K.MORTON, Richard G.PAN, Xiaojiang J.PARTLO, William N.PUTRIS, Firas F.WATSON, Tom A.YAGER, Thomas A.
    • H01S3/22
    • H01S3/02G01J1/429G01J9/02G03F7/70025G03F7/70575G03F7/70933H01S3/0057H01S3/0071H01S3/036H01S3/038H01S3/0385H01S3/0401H01S3/041H01S3/08009H01S3/08036H01S3/0812H01S3/097H01S3/0971H01S3/0975H01S3/1024H01S3/104H01S3/105H01S3/1055H01S3/1305H01S3/134H01S3/139H01S3/22H01S3/2207H01S3/223H01S3/225H01S3/2251H01S3/2256H01S3/2258H01S3/2333H01S3/2366
    • A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed which may comprise a fast moving angularly positionable tuning mirror comprising: a mirror mounting frame comprising a first material and a relatively flat mounting surface area; a reflective optic comprising a second material having a coefficient of thermal expansion different from that of the first material of the mounting frame; at least two attachment points of attachment between the mounting frame and the reflective optic on the mounting frame surface; and, at least one flexure mount formed in the mounting frame that is flexible in a flexure axis corresponding to a longitudinal axis of thermal expansion of the mounting frame and the reflective optic, positioned at one of the at least two points of attachment. The flexure mount may comprise: a flexure body formed from the material of the mirror mounting frame and separated from the material of the mirror mounting frame to allow relative movement between the flexure and the mirror mounting frame; at least one flexure arm formed from the material of the mirror mounting frame and attached at one end to the mirror mounting frame and at the other end to the flexure. The apparatus and method may further comprise a flexure force mechanism made of the second material or a third material having a coefficient of thermal expansion that is essentially the same as that of the second material; the flexure force mechanism comprising an elongated rod; a flexure force mechanism slot generally aligned with the flexure axis and sized to snuggly fit the flexure force mechanism between a slot wall at one end of the flexure force mechanism slot and the flexure body at the other end of the flexure force mechanism slot. The force mechanism may pre-stress the flexure. The mirror may be a grating. The grating may have a metallic reflective surface and a protective coating over the reflective coating comprising a dense glassy material that is essentially non-porous to undesired contaminants exposure of which to the reflective coating is desired to be prevented, which may comprise an amorphous silica, a doped amorphous silica, which may be halide doped and the halide may be fluorine. The grating may be actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge.
    • 公开了一种高功率窄带,高重复率激光光源光学改进装置和方法,其可以包括快速移动的可角度定位的调谐镜,其包括:反射镜安装框架,其包括第一材料和相对平坦的安装表面区域; 反射光学元件,包括具有不同于所述安装框架的第一材料的热膨胀系数的第二材料; 在安装框架和安装框架表面上的反射光学器件之间的至少两个连接附接点; 以及形成在所述安装框架中的至少一个弯曲安装座,所述至少一个弯曲安装件在弯曲轴线上柔性,所述弯曲轴线对应于所述安装框架和所述反射式光学器件的热膨胀的纵向轴线,所述热膨胀轴线位于所述至少两个连接点中的一个上。 挠曲安装件可以包括:由反射镜安装框架的材料形成并且与镜面安装框架的材料分离的弯曲体,以允许挠曲件和反射镜安装框架之间的相对移动; 至少一个弯曲臂由反射镜安装框架的材料形成并且在一端附接到反射镜安装框架,另一端连接到弯曲部。 该装置和方法还可以包括由第二材料制成的挠曲力机构或具有与第二材料基本上相同的热膨胀系数的第三材料; 所述挠曲力机构包括细长杆; 弯曲力机构槽通常与弯曲轴线对准并且尺寸设计成使挠曲力机构紧贴在弯曲力机构槽的一端处的狭槽壁和弯曲力机构槽的另一端处的挠曲体之间。 力机构可以预应力挠曲。 镜子可能是光栅。 光栅可以具有金属反射表面并且在反射涂层上方具有保护涂层,该保护涂层包含致密的玻璃质材料,其基本上是无孔的,以期望防止对反射涂层的不期望的污染物暴露,其可以包含无定形二氧化硅, 掺杂的无定形二氧化硅,其可以是卤化物掺杂的,并且卤化物可以是氟。 可以使用电磁感应元件或磁敏元件来主动调谐光栅。 反射层中金属的氧化物可以通过氢气清除来除去。