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    • 4. 发明申请
    • PROCESS FOR THE ELECTROLYTIC DEPOSITION OF METAL LAYERS
    • 法金属层电解分离
    • WO1997019206A1
    • 1997-05-29
    • PCT/EP1996005140
    • 1996-11-21
    • ATOTECH DEUTSCHLAND GMBHDAHMS, WolfgangMEYER, HeinrichKRETSCHMER, Stefan
    • ATOTECH DEUTSCHLAND GMBH
    • C25D05/18
    • C25D3/38C25D5/18H05K3/241Y10S205/92
    • The invention relates to a process for the electrolytic deposition of metal layers, in particular copper layers, of specific physico-mechanical and optical characteristics and of even thickness. With known processes using dissolving anodes and direct current, only an uneven metal layer distribution can be achieved on articles of complex shape. The problem of uneven layer thickness at different points on article surfaces can be alleviated by using a pulsed current or pulsed voltage process, but this does not solve the other problem of continually changing geometry during deposition as the anodes dissolve. This problem can be eliminated by using non-dissolving anodes. To ensure adequate anode stability and a high lustre of the layers even at points on the workpiece surface where the metal is deposited with high current density, compounds of an electrochemically reversible redox system must be added to the deposition solution.
    • 本发明涉及一种用于金属层,特别是铜层,具有均匀的层厚度一定的物理 - 机械性能和光学性能的电解沉积的方法。 根据使用可溶性阳极和施加直流知的方法,金属分布的唯一的非均匀层可在复杂形状的工件来实现。 使用脉冲电流或脉冲电压的方法,虽然该问题可以减少在这些层在材料表面的不同位置具有不同的厚度。 但没有进一步的问题是由连续阳极的溶解沉积过程中变化的几何关系来解决。 这可以通过使用不溶性阳极被消除。 为了确保亦在其中金属沉积有高的电流密度的工件表面的位置处的膜的阳极和高光泽度的足够的稳定性,有必要添加一种电化学可逆的氧化还原系统的沉积化合物。
    • 7. 发明申请
    • PROCESS FOR MANUFACTURING ELECTRICAL CIRCUIT BASES
    • 制造方法电气电路载体
    • WO1996012392A1
    • 1996-04-25
    • PCT/DE1995001500
    • 1995-10-18
    • ATOTECH DEUTSCHLAND GMBHMEYER, Heinrich
    • ATOTECH DEUTSCHLAND GMBH
    • H05K03/00
    • H05K3/388C23C16/18C23C18/30
    • To manufacture electrical circuit bases with extremely fine conducting paths, laminates without metal foil coverings are used as the initial materials; to produce the holes, a temporary metal layer is applied to the laminate surfaces, that metal layer is structured and etched and removed from the laminate surfaces once the holes have been etched in the laminate. A foundation metal layer is then deposited on the laminate surfaces, including the hole walls, to create the conducting paths; this is done by the glow discharge decomposition of volatile metal compounds. Further metal layers are applied to those layers without current and/or electrolytically. The metal layers are structured using photomask techniques.
    • 未设置金属箔层压板用作起始材料具有非常细的导线的制造电路的载体,暂时施加金属层施加到所述层叠体的表面,以产生孔,这些图案化,蚀刻,并且在层压体背面的叠层体表面的孔的蚀刻之后去除。 随后,基底金属层是通过层压板表面包括孔壁,以形成导电迹线对辉光放电的装置分解的挥发性金属化合物沉积。 在这些层中更多个金属层被通电和/或电解施加。 金属层通过光掩模技术构成。
    • 9. 发明申请
    • PROCESS AND DEVICE FOR TREATING HOLES OR RECESSES IN WORKPIECES WITH LIQUID TREATMENT AGENTS
    • 方法和装置用于治疗延长孔工件或很好地液体处理基金
    • WO1997011209A2
    • 1997-03-27
    • PCT/DE1996001716
    • 1996-09-06
    • ATOTECH DEUTSCHLAND GMBHDURST, FranzBRENN, GünterSCHÄFER, MichaelMEYER, HeinrichSTREUP, Heribert
    • ATOTECH DEUTSCHLAND GMBH
    • C25D00/00
    • C25D5/08B08B3/02B08B3/022H05K3/0088
    • Treating, for example cleaning, holes or recesses in workpieces is problematic when the holes or recesses are less than 0.5 mm wide, and in particular when they do not extend through the workpiece (blind holes). Known processes do not allow gas bubbles that adhere to the side walls of such holes to be removed nor liquids inside the holes to be effectively exchanged. The disclosed process allows the liquid inside the hole to be effectively exchanged by the liquid outside the holes. For that purpose, the liquid treatment medium is injected into the holes as a jet with a smaller diameter than the holes. Also disclosed is a device for carrying out this process with a nozzle with one or more outlets of less than 0.5 mm diameter, a liquid supply unit for pumping liquid treatment medium through the nozzle outlets, and a filtering unit in communication with the outlets and the supply unit for removing particles from the treatment medium.
    • 的处理,例如孔或凹部的在工件的清洗是有问题的,如果孔或凹陷具有小于0.5mm的开口宽度,特别是如果它不穿过所述工件(盲孔)。 通过已知的方法附着于这样的孔的侧壁,气泡可以不被去除或孔利用Dende液体内不能有效地交换。 本发明的方法中,包含在孔和位于所述孔的外侧的液体的有效交换是可能的。 为了这个目的,所述液体处理剂被注射作为射流成直径比该孔的较小的孔。 用于执行该方法的装置,它进一步描述了通过喷嘴具有直径低于0.5mm,液体供给部,通过该液体处理剂通过喷嘴出口孔泵送装置的一个或多个喷嘴出口孔,并与所述孔和所述供给部 用于从处理剂中除去粒子的过滤器相关单元的特征。
    • 10. 发明申请
    • PROCESS FOR SEPARATING METAL COATINGS
    • 用于金属层的分离
    • WO1996012051A1
    • 1996-04-25
    • PCT/DE1995001501
    • 1995-10-18
    • ATOTECH DEUTSCHLAND GMBHMEYER, HeinrichSCHULZ, Ralf
    • ATOTECH DEUTSCHLAND GMBH
    • C23C18/30
    • C23C16/18C23C18/30H05K3/388
    • The electronic industry makes use of polyimide substrates with copper coatings which are produced by the decomposition of metal organic compounds by means of a glow discharge process followed by the currentless metallisation of the metal film produced. When the first metal coating is separated, carbon-containing coatings are produced without the addition of oxygen which have low conductivity and little catalytic activity. If only alkaline metallising baths are used, adherent metal coatings are indeed initially deposited on the polyimide surfaces but the adhesion of the metal coating on the polyimide is seriously degraded on contact between the metal and aqueous alkaline solutions. If work is conducted in an oxygen atmosphere, palladium coatings are produced which must subsequently be reduced. Such coatings provide little or no adhesion if they are exposed to chemical or electrochemical process solutions. When mixtures of oxygen-containing compounds and inert gas are used in metal separation in the glow discharge, low-oxygen and carbon coatings are produced. In addition, the reduction in the adhesion on contact between the metallised substrate and aqueous-alkaline solutions can be avoided by the use of acid or neutral currentless metallising baths to produce the second metal coating. This process makes it possible for the first time to produce high-density circuit carriers from unmetallised polyimide foils.
    • 对于与铜层的电子工业聚酰亚胺基材的用途是已知的通过由辉光放电,将所得的金属膜的随后的无电解镀敷的手段分解有机金属化合物产生的。 在出现沉积具有低导电性和低的催化活性,第一金属层的含碳层不加氧气在这种情况下。 是专门用于金属化的碱性浴,虽然最初粘附金属层在聚酰亚胺表面上沉积金属层到聚酰亚胺的粘接强度,但是,在与水性碱溶液的金属的接触相当损害。 在氧气氛中工作时,引起了需要随后还原钯层。 这样的层在暴露于化学或电化学处理解决方案提供很少或没有粘合性。 通过使用含氧化合物的混合物,和惰性气体中,在氧和碳层中的辉光放电金属沉积中产生。 此外,可避免在当与通过使用酸性或中性电金属化的,以产生所述第二金属层中的含水碱性溶液中金属化基板的接触的粘合强度的降低。 该过程打开了首次生产基于未金属化的聚酰亚胺膜的高密度互连的设备。