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1. 发明申请

WO2021148224A1 LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGING A TRAJECTORY OF PARTICULATE DEBRIS 审中-公开
公开(公告)号：WO2021148224A1
公开(公告)日：2021-07-29
申请号：PCT/EP2020/087889
申请日：2020-12-24
申请人： ASML HOLDING N.V. , ASML NETHERLANDS B.V.
发明人： ALBRIGHT, Ronald, Peter , BAL, Kursat , BANINE, Vadim, Yevgenyevich , BRULS, Richard, Joseph , DE VRIES, Sjoerd, Frans , FRIJNS, Olav, Waldemar, Vladimir , HUANG, Yang-Shan , HUANG, Zhuangxiong , JACOBS, Johannes, Henricus, Wilhelmus , MOORS, Johannes, Hubertus, Josephina , NENCHEV, Georgi, Nenchev , NIKIPELOV, Andrey , RAASVELD, Thomas, Maarten , RANJAN, Manish , TE SLIGTE, Edwin , UMSTADTER, Karl, Robert , UZGÖREN, Eray , VAN DE KERKHOF, Marcus, Adrianus , YAGHOOBI, Parham
IPC分类号： G03F7/20 , H05G2/00 , G03F7/70033 , G03F7/70058 , G03F7/70916 , H05G2/008
摘要： An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

2. 发明申请

WO2020234043A1 MIRROR FOR USE IN A LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：WO2020234043A1
公开(公告)日：2020-11-26
申请号：PCT/EP2020/063164
申请日：2020-05-12
申请人： ASML NETHERLANDS B.V.
发明人： MOORS, Johannes, Hubertus, Josephina , BANINE, Vadim, Yevgenyevich , NIKIPELOV, Andrey , VAN DE KERKHOF, Marcus, Adrianus , YAGHOOBI, Parham
IPC分类号： G02B5/09 , G02B5/18 , G03F7/20 , G21K1/06
摘要： A mirror comprises a body and a surface defined by the body. The body comprises a plurality of layers. The plurality of layers are arranged to act as a multilayer Bragg reflector for radiation having a first wavelength when radiation having said first wavelength is incident on the surface. A local tangent plane of the surface is inclined at a non-zero angle relative to a local tangent plane of the plurality of layers.

3. 发明申请

WO2017108311A1 A LITHOGRAPHIC SYSTEM AND METHOD 审中-公开
标题翻译：光刻系统和方法
公开(公告)号：WO2017108311A1
公开(公告)日：2017-06-29
申请号：PCT/EP2016/078482
申请日：2016-11-23
申请人： ASML NETHERLANDS B.V.
发明人： BANINE, Vadim, Yevgenyevich , ENDENDIJK, Wilfred, Edward , NIENHUYS, Han-Kwang , DONKER, Rilpho, Ludovicus , LOOPSTRA, Erik, Roelof
IPC分类号： G03F7/20 , H01S3/09
CPC分类号： G03F7/70991 , G03F7/7005 , G03F7/70208 , H01S3/0903
摘要： A system comprises a first radiation source configured to provide a first radiation beam, at least one splitter configured to split the first radiation beam into a first plurality of sub-beams, a second radiation source configured to provide a second radiation beam, at least one further splitter configured to split the second radiation beam into a second plurality of sub-beams, and a switch assembly, wherein the switch assembly is configured to receive a first sub-beam which is one of the first plurality of sub-beams; receive a second sub-beam which is one of the second plurality of sub-beams, in a first configuration to transmit the first sub-beam along a desired path, and in a second configuration to transmit the second sub-beam along said desired path.
摘要翻译：系统包括配置成提供第一辐射束的第一辐射源，配置成将第一辐射束分成第一多个子束的第一分离器，配置成提供第二辐射束的第二辐射源，第二辐射束，被配置为将第二辐射束分成第二多个子束的至少一个另外的分束器，以及开关组件，其中开关组件被配置为接收作为第一子束之一的第一子束多个子光束; 以第一配置接收作为所述第二多个子束中的一个的第二子束，以沿期望路径传输所述第一子束，并且在第二配置中沿着所述期望路径传输所述第二子束

4. 发明申请

WO2010017892A1 RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：WO2010017892A1
公开(公告)日：2010-02-18
申请号：PCT/EP2009/005509
申请日：2009-07-30
申请人： ASML NETHERLANDS B.V. , BANINE, Vadim, Yevgenyevich , LOOPSTRA, Erik, Roelof , MOORS, Johannes, Hubertus, Josephina
发明人： BANINE, Vadim, Yevgenyevich , LOOPSTRA, Erik, Roelof , MOORS, Johannes, Hubertus, Josephina
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70175 , G03F7/70883 , G03F7/70908 , G03F7/70983 , H05G2/003
摘要： A lithographic apparatus (1) includes a radiation source (SO) configured to produce extreme ultraviolet radiation, the radiation source (SO) including a chamber (210) in which a plasma (225) is generated; a collector mirror (270) configured to reflect radiation emitted by the plasma (225); and a debris mitigation system (230) including a gas supply system (235) configured to supply a first gas flow (240) toward the plasma, the first gas flow (240) being selected to thermalize debris generated by the plasma (225), and a plurality of gas manifolds (247) arranged at a location proximate the collector mirror (270), the gas manifolds configured to supply a second gas flow (250) in the chamber (210), the second gas flow (250) being directed toward the plasma (225) to prevent thermalized debris from depositing on the collector mirror (270).
摘要翻译：光刻设备（1）包括被配置为产生极紫外辐射的辐射源（SO），所述辐射源（SO）包括其中产生等离子体（225）的腔室（210）被配置为反射由所述等离子体（225）发射的辐射的收集器反射镜（270）; 以及包括气体供应系统（235）的碎片减缓系统（230），所述气体供应系统（235）被配置为朝向所述等离子体供应第一气流（240），所述第一气体流（240）被选择为热等离子体（225）产生的碎片，和多个气体歧管（247），其布置在靠近收集器反射镜（270）的位置处，所述气体歧管被配置为在所述腔室（210）中提供第二气流（250），所述第二气体流（250）被引导朝向等离子体（225），以防止热碎的碎屑沉积在收集器反射镜（270）上。

5. 发明申请

WO2010017890A1 RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：WO2010017890A1
公开(公告)日：2010-02-18
申请号：PCT/EP2009/005488
申请日：2009-07-29
申请人： ASML NETHERLANDS B.V. , YAKUNIN, Andrey, Mikhailovich , BANINE, Vadim, Yevgenyevich , MOORS, Johannes, Hubertus, Josephina , SJAMENOK, Leonid, Aizikovitch
发明人： YAKUNIN, Andrey, Mikhailovich , BANINE, Vadim, Yevgenyevich , MOORS, Johannes, Hubertus, Josephina , SJAMENOK, Leonid, Aizikovitch
IPC分类号： G03F7/20 , G02B5/20
CPC分类号： G03F7/70958 , B82Y10/00 , G02B5/208 , G03F7/70033 , G03F7/70191 , G03F7/70575 , G03F7/70941 , G21K1/062 , G21K1/10
摘要： A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.
摘要翻译：光谱纯度滤光器被配置为透射极紫外（EUV）辐射并偏转或吸收非EUV次级辐射。在一个实施例中，光谱纯度滤光器包括高度透射EUV辐射的材料体和高度反射位于身体辐射入射侧的非EUV次级辐射的材料层。在一个实施例中，光谱纯度滤光器包括在EUV辐射高度透射的材料体和在身体端部上的高发射率材料层。

6. 发明申请

WO2008035965A2 APPARATUS COMPRISING A ROTATING CONTAMINANT TRAP 审中-公开
标题翻译：包含旋转污染物捕获装置的装置
公开(公告)号：WO2008035965A2
公开(公告)日：2008-03-27
申请号：PCT/NL2007/050451
申请日：2007-09-17
申请人： ASML NETHERLANDS B.V. , FRANKEN, Johannes, Christiaan, Leonardus , BANINE, Vadim, Yevgenyevich , WASSINK, Arnoud, Cornelis
发明人： FRANKEN, Johannes, Christiaan, Leonardus , BANINE, Vadim, Yevgenyevich , WASSINK, Arnoud, Cornelis
CPC分类号： G03F7/70916 , B82Y10/00 , F16C32/0603 , F16C32/0685 , F16C33/02 , F16C33/72 , F16C2300/62 , G03F7/70033 , G03F7/70941
摘要： A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).
摘要翻译：公开了一种布置在辐射束的路径中的污染捕集装置，用于捕获从被配置成产生辐射束的辐射源发出的污染物。污染物捕集装置包括具有多个通道形成元件的转子，该多个通道形成元件限定了基本上平行于辐射束的传播方向布置的通道，该转子包括可充电的材料并且被布置为由于操作而导致带电辐射源; 以及构造成相对于转子承载结构可旋转地保持转子的轴承，其中所述装置被配置为（i）控制或重定向转子的放电，或（ii）抑制转子的放电或（ iii）（i）和（ii）。

7. 发明申请

WO2017032569A1 SUPPRESSION FILTER, RADIATION COLLECTOR AND RADIATION SOURCE FOR A LITHOGRAPHIC APPARATUS; METHOD OF DETERMINING A SEPARATION DISTANCE BETWEEN AT LEAST TWO REFLECTIVE SURFACE LEVELS OF A SUPPRESSION FILTER 审中-公开
标题翻译：抑制滤波器，辐射收集器和放射源用于光刻设备; 确定抑制过滤器的两个反射表面水平之间的分离距离的方法
公开(公告)号：WO2017032569A1
公开(公告)日：2017-03-02
申请号：PCT/EP2016/068445
申请日：2016-08-02
申请人： ASML NETHERLANDS B.V.
发明人： BANINE, Vadim, Yevgenyevich , NIENHUYS, Han-Kwang , SCACCABAROZZI, Luigi
IPC分类号： G03F7/20 , G02B5/20 , G02B5/28 , G02B5/18 , G02B27/42
CPC分类号： G03F7/70191 , G02B5/1861 , G02B5/208 , G02B5/281 , G02B27/4244 , G03F7/70033 , G03F7/70158 , G03F7/70175 , G03F7/70575
摘要： Disclosed is a suppression filter having a profile defining at least two reflective surface levels, each reflected surface level being separated by a separation distance. The separation distance is such that the reflective suppression filter is operable to substantially prevent specular reflection of radiation at a first wavelength and at a second wavelength incident on said reflective suppression filter. Also disclosed is a radiation collector, radiation source and lithographic apparatus comprising such a suppression filter, and to a method of determining a separation distance between at least two reflective surface levels of a suppression filter.
摘要翻译：公开了一种具有限定至少两个反射表面水平的轮廓的抑制滤波器，每个反射表面水平被间隔开距离。分离距离使得反射抑制滤光器可操作以基本上防止在入射到所述反射抑制滤光器上的第一波长和第二波长的辐射的镜面反射。还公开了一种辐射收集器，辐射源和包括这种抑制滤波器的光刻设备，以及确定抑制滤波器的至少两个反射表面电平之间的间隔距离的方法。

8. 发明申请

WO2016131569A1 IMPROVED BEAM PIPE 审中-公开
标题翻译：改进的束管
公开(公告)号：WO2016131569A1
公开(公告)日：2016-08-25
申请号：PCT/EP2016/050731
申请日：2016-01-15
申请人： ASML NETHERLANDS B.V.
发明人： NIKIPELOV, Andrey, Alexandrovich , LOOPSTRA, Erik, Roelof , BANINE, Vadim, Yevgenyevich , RENKENS, Michael, Jozef, Mathijs , NIENHUYS, Han-Kwang
IPC分类号： H05H7/14
CPC分类号： H05H7/14 , H01J2237/0268 , H05H2007/041
摘要： A beam pipe (29) for an electron beam comprising a first section having an inner surface (28a), a vacuum layer (35) provided on a portion of the inner surface, and a conductive layer (36,37a). The vacuum layer is arranged such that at least a portion of the conductive layer is exposed to an electron beam during use and the conductive layer has a lower electrical resistance than the vacuum layer.
摘要翻译：一种用于电子束的光束管（29），包括具有内表面（28a）的第一部分，设置在内表面的一部分上的真空层（35）和导电层（36,37a）。真空层布置成使得导电层的至少一部分在使用期间暴露于电子束，并且导电层具有比真空层更低的电阻。

9. 发明申请

WO2016124269A1 AN UNDULATOR 审中-公开
标题翻译：一个解决方案
公开(公告)号：WO2016124269A1
公开(公告)日：2016-08-11
申请号：PCT/EP2015/076962
申请日：2015-11-18
申请人： ASML NETHERLANDS B.V.
发明人： NIKIPELOV, Andrey, Alexandrovich , BANINE, Vadim, Yevgenyevich , KELGTERMANS, Alphonsus, Michaël, Aldegonda , LOOPSTRA, Erik, Roelof
IPC分类号： H05H7/04
CPC分类号： H05H7/04 , H05H2007/041
摘要： Apparatus and associated methods for determining a magnetic field strength of an undulator module are disclosed. One such apparatus comprises an undulator module and a magnetic field sensor. The magnetic field sensor comprises a body and a sensing element operable to measure a magnetic field. The undulator module comprises a support structure and a plurality of periodic magnetic structures. The periodic structures are supported by the support structure and being arranged around and extending parallel to a central axis. The undulator module is provided with at least one opening for receiving the sensing element of the magnetic field sensor. The undulator module and the magnetic field sensor comprise complementary alignment features that provide releasable engagement between the magnetic field sensor and the undulator module such that the sensing element of the magnetic field sensor can be repeatably positioned within the undulator module in substantially the same position relative to the central axis undulator module.
摘要翻译：公开了用于确定波动器模块的磁场强度的装置和相关方法。一种这样的装置包括波动器模块和磁场传感器。磁场传感器包括可操作以测量磁场的主体和感测元件。波动器模块包括支撑结构和多个周期性磁性结构。周期性结构由支撑结构支撑并且布置成平行于中心轴线并且平行于其延伸。波动器模块设置有用于接收磁场传感器的感测元件的至少一个开口。波动器模块和磁场传感器包括互补对准特征，其提供磁场传感器和波动器模块之间的可释放接合，使得磁场传感器的感测元件可以重复地位于波动器模块内相对于相对于中心轴起伏模块。

10. 发明申请

WO2005064401A2 LITHOGRAPHIC APPARATUS HAVING A DEBRIS-MITIGATION SYSTEM, A SOURCE FOR PRODUCING EUV RADIATION HAVING A DEBRIS MITIGATION SYSTEM AND A METHOD FOR MITIGATING DEBRIS 审中-公开
标题翻译：具有碎石沉降系统的光刻设备，用于产生具有碎石缓和系统的EUV辐射的源以及用于减少碎石的方法
公开(公告)号：WO2005064401A2
公开(公告)日：2005-07-14
申请号：PCT/NL2004/000928
申请日：2004-12-31
申请人： ASML NETHERLANDS B.V. , BANINE, Vadim, Yevgenyevich , BAKKER, Levinus, Pieter , MOORS, Johannes, Hubertus, Josephina , IVANOV, Vladimir, Vitalevitch , ZUKAVISHVILI, Givi, Georgievitch , VEEFKIND, Abraham
发明人： BANINE, Vadim, Yevgenyevich , BAKKER, Levinus, Pieter , MOORS, Johannes, Hubertus, Josephina , IVANOV, Vladimir, Vitalevitch , ZUKAVISHVILI, Givi, Georgievitch , VEEFKIND, Abraham
IPC分类号： G03F7/00
CPC分类号： G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.
摘要翻译：公开了一种光刻设备。该设备包括提供辐射束的照明系统和支撑图案化结构的支撑结构。构图结构被构造成在其横截面中赋予辐射束图案。该设备还包括支撑衬底的衬底支撑件，将图案化的束投影到衬底的目标部分上的投影系统，以及缓解在使用该衬底的至少一部分期间形成的碎片颗粒的碎片缓解系统光刻设备。碎片缓解系统被布置成施加磁场，以至少减少带电碎片颗粒。

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