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1. 发明申请

WO2008101713A2 HIGH THROUGHPUT SEM TOOL 审中-公开
标题翻译：高通量扫描仪刀具
公开(公告)号：WO2008101713A2
公开(公告)日：2008-08-28
申请号：PCT/EP2008001413
申请日：2008-02-22
申请人： APPLIED MATERIALS ISRAEL LTD , ALMOGY GILAD , BARTOV AVISHAI , FROSIEN JUERGEN , ADAMEC PAVEL , BANZHOF HELMUT
发明人： ALMOGY GILAD , BARTOV AVISHAI , FROSIEN JUERGEN , ADAMEC PAVEL , BANZHOF HELMUT
IPC分类号： H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28 , H01L21/66
CPC分类号： H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28 , H01J2237/0635 , H01J2237/1508 , H01J2237/2449 , H01J2237/2817
摘要： A multi-beam scanning electron beam device is described. The multi-beam scanning electron beam device having a column, includes a multi-beam emitter for emitting a plurality of electron beams, at least one common electron beam optical element having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element for individually influencing the plurality of electron beams, a common objective lens assembly for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen for generation of a plurality of signal beams, and a detection assembly for individually detecting each signal beam on a corresponding detection element.
摘要翻译：描述了多光束扫描电子束装置。具有列的多光束扫描电子束装置包括用于发射多个电子束的多光束发射器，至少一个具有用于多个电子束中的至少两个的公共开口的公共电子束光学元件，并且是用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件，用于聚焦具有用于聚焦的共同激发的多个电子束的公共物镜组件多个电子束中的至少两个，并且适于将多个电子束聚焦到用于产生多个信号光束的样本上;以及检测组件，用于在相应的检测元件上单独检测每个信号光束。

2. 发明申请

WO2008101714A3 HIGH THROUGHPUT SEM TOOL 审中-公开
标题翻译：高通量扫描仪刀具
公开(公告)号：WO2008101714A3
公开(公告)日：2008-11-27
申请号：PCT/EP2008001414
申请日：2008-02-22
申请人： APPLIED MATERIALS ISRAEL LTD , FROSIEN JUERGEN , BANZHOF HELMUT , ADAMEC PAVEL
发明人： FROSIEN JUERGEN , BANZHOF HELMUT , ADAMEC PAVEL
IPC分类号： H01J37/05 , H01J37/147 , H01J37/28 , H01L21/66
CPC分类号： H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28 , H01J2237/0635 , H01J2237/1508 , H01J2237/2449 , H01J2237/2817
摘要： A scanning charged particle beam device (100) is described. The scanning charged particle beam device includes a beam emitter (102) for emitting a primary electron beam, a first scan stage for scanning the beam over a specimen, an achromatic beam separator (130) adapted for separating a signal electron beam from the primary electron beam, and a detection unit (172,174,178) for detecting signal electrons.
摘要翻译：描述扫描带电粒子束装置（100）。扫描带电粒子束装置包括用于发射一次电子束的射束发射器（102），用于扫描试样上的束的第一扫描级，适于从一次电子分离信号电子束的消色束分离器（130）以及用于检测信号电子的检测单元（172,174,178）。

3. 发明申请

WO2004055856A3 MULTI-AXIS COMPOUND LENS, BEAM SYSTEM MAKING USE OF THE COMPOUND LENS, AND METHOD USING THE COMPOUND LENS 审中-公开
标题翻译：多轴复合透镜，使用复合透镜的光束系统以及使用该复合透镜的方法
公开(公告)号：WO2004055856A3
公开(公告)日：2004-08-12
申请号：PCT/EP0314140
申请日：2003-12-12
申请人： INTEGRATED CIRCUIT TESTING , FROSIEN JUERGEN , ADAMEC PAVEL
发明人： FROSIEN JUERGEN , ADAMEC PAVEL
IPC分类号： H01J37/145 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/145 , H01J37/3177
摘要： The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are used to focus a plurality of charged particle beams in a separate opening for each of at least a plurality a charged particle beams traveling through the optical system.
摘要翻译：本发明提供了用于带电粒子多光束系统的光学系统。该光学系统包括静电透镜组件和磁性透镜组件。这些部件用于将多个带电粒子束聚焦在至少多个行进通过光学系统的带电粒子束中的每一个的单独开口中。

4. 发明申请

WO2005006385A3 CHARGED PARTICLE BEAM DEVICE WITH MULTI-SOURCE ARRAY 审中-公开
标题翻译：带有多源阵列的充电颗粒光束装置
公开(公告)号：WO2005006385A3
公开(公告)日：2005-04-14
申请号：PCT/EP2004005288
申请日：2004-05-17
申请人： INTEGRATED CIRCUIT TESTING , FEUERBAUM HANS-PETER , FROSIEN JUERGEN , HOFFMANN ULI , WINKLER DIETER , ADAMEC PAVEL
发明人： FEUERBAUM HANS-PETER , FROSIEN JUERGEN , HOFFMANN ULI , WINKLER DIETER , ADAMEC PAVEL
IPC分类号： H01J37/317 , H01J37/04 , H01J37/30
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/047 , H01J2237/0635
摘要： The present invention provides a charged particle beam device. The device comprises an emitter array (22) for emitting a plurality of charged particle beams (8). The plurality of charged particle beams are imaged with a lens (12). An electrode unit (14) is provided for accelerating the plurality of charged particle beams. The potential differences between a first potential of the emitter array, a second potential of the electrode unit, and a third potential of a specimen, are controlled by a first control unit (11) and a second control unit. Thereby, the second potential is capable of accelerating the plurality of charged particle beams with respect to the first potential, and the third potential is capable of decelerating the plurality of charged particle beams with respect to the second potential.
摘要翻译：本发明提供一种带电粒子束装置。该装置包括用于发射多个带电粒子束（8）的发射极阵列（22）。多个带电粒子束用透镜（12）成像。设置有用于加速多个带电粒子束的电极单元（14）。第一控制单元（11）和第二控制单元控制发射极阵列的第一电位，电极单元的第二电位和试样的第三电位之间的电位差。因此，第二电位能够相对于第一电位加速多个带电粒子束，并且第三电位能够使多个带电粒子束相对于第二电位减速。

5. 发明申请

WO2007041444A3 ELECTRON BEAM COLUMN FOR WRITING SHAPED ELECTRON BEAMS 审中-公开
标题翻译：用于书写形状电子束的电子束柱
公开(公告)号：WO2007041444A3
公开(公告)日：2007-11-08
申请号：PCT/US2006038332
申请日：2006-10-02
申请人： APPLIED MATERIALS INC , BULLER BENYAMIN , DE VORE WILLIAM J , FROSIEN JUERGEN , JIANG XINRONG , LOZES RICHARD L , PEARCE-PERCY HENRY THOMAS , WINKLER DIETER , COYLE STEVEN T , BANZHOF HELMUT
发明人： BULLER BENYAMIN , DE VORE WILLIAM J , FROSIEN JUERGEN , JIANG XINRONG , LOZES RICHARD L , PEARCE-PERCY HENRY THOMAS , WINKLER DIETER , COYLE STEVEN T , BANZHOF HELMUT
IPC分类号： H01J37/317
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31754
摘要： An electron beam column comprises a thermal field emission electron source (15) to generate an electron beam (112), an electron beam blanker, a beam shaping module (128), and electron beam optics comprising a plurality of electron beam lenses (154, 160). In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle ß of from about 1/4 to about 3 mrads, where the acceptance semi-angle ß is the half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.
摘要翻译：电子束柱包括产生电子束（112）的热场发射电子源（15），电子束消隐器，光束整形模块（128）和包括多个电子束透镜的电子束光学元件， 160）。在一个版本中，电子束消除器，光束整形模块和电子束光学器件的光学参数被设置为实现约1/4至约3mrads的接受半角β，其中接受半角β 在写平面处电子束对着的角度的一半。光束成形模块也可以使用上下投影透镜作为单个透镜进行操作。还描述了用于电子束柱的多功能模块。

6. 发明申请

WO2007041057B1 ELECTROSTATIC DEFLECTION SYSTEM WITH IMPEDANCE MATCHING FOR HIGH POSITIONING ACCURACY 审中-公开
标题翻译：具有阻抗匹配的静电偏转系统用于高定位精度
公开(公告)号：WO2007041057B1
公开(公告)日：2007-07-19
申请号：PCT/US2006037218
申请日：2006-09-26
申请人： APPLIED MATERIALS INC , BULLER BENYAMIN , DEVORE WILLIAM J , FROSIEN JUERGEN , MIRRO JR EUGENE , PEARCE-PERCY HENRY , WINKLER DIETER
发明人： BULLER BENYAMIN , DEVORE WILLIAM J , FROSIEN JUERGEN , MIRRO JR EUGENE , PEARCE-PERCY HENRY , WINKLER DIETER
IPC分类号： H01J37/147
CPC分类号： H01J37/147 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/24 , H01J37/3174 , H01J2237/0432 , H01J2237/1504 , H01J2237/28
摘要： An apparatus and method for deflecting electron beams (301) with high precision and high throughput. At least one electrode (302, 312) of a deflecting capacitor is connected to a signal source (303, 313) via a coaxial cable (304, 314). A termination resistor (306, 316 is further connected to the coaxial cable and the electrode at the joint (307, 317) of the coaxial cable and the electrode. The termination resistor has a resistance matched to the impedance of the coaxial cable and the electrode has an impedance matched to half of the impedance of the coaxial. The deflecting capacitors of the present invention have a minimized loss of precision due to eddy current. The spacing of electrodes in the deflecting capacitors is reduced by a factor of approximately two compared to the state-the-art system.
摘要翻译：一种用于以高精度和高生产量偏转电子束（301）的装置和方法。偏转电容器的至少一个电极（302,312）经由同轴电缆（304,314）连接到信号源（303,313）。终端电阻器（306,316）在同轴电缆和电极的接头（307,317）处进一步连接到同轴电缆和电极，终端电阻器具有与同轴电缆的阻抗匹配的电阻，并且电极具有与同轴阻抗的一半相匹配的阻抗，本发明的偏转电容器由于涡流而具有最小的精度损失，与偏转电容器相比，偏转电容器中的电极间距减小了大约两倍国家最先进的系统。

7. 发明申请

WO2005071709A3 BEAM OPTICAL COMPONENT HAVING A CHARGED PARTICLE LENS 审中-公开
标题翻译：具有带电粒子透镜的光束组件
公开(公告)号：WO2005071709A3
公开(公告)日：2005-12-15
申请号：PCT/EP2004014180
申请日：2004-12-13
申请人： INTEGRATED CIRCUIT TESTING , FROSIEN JUERGEN
发明人： FROSIEN JUERGEN
IPC分类号： H01J37/12 , H01J37/14 , H01J37/15 , H01J37/10
CPC分类号： H01J37/14 , H01J37/12 , H01J37/15 , H01J2237/1501
摘要： The present invention relates to a beam optical component including a charged particle lens (1; 1000) for focusing a charged particle beam (3), the charged particle lens (1; 1000) comprising a first element (5; 1005) having a first opening (7) for focusing the charged particle beam (3); a second element (9; 1009) having a second opening (11) for focusing the charged particle beam (3); and first driving means (13) connected with at least one of the first element (5; 1005) and the second element (9; 1009) for aligning the first opening (7) with respect to the second opening (11). With the first driving means, the first opening (7) and the second opening (11) can be aligned with respect to each other during beam operation to provide a superior alignment of the beam optical component for a better beam focussing. The present invention also relates to a charged particle beam device that uses said beam optical component for focussing the charged particle beam (3), and a method to align first opening (7) and second opening (11) with respect to each other.
摘要翻译：本发明涉及包括用于聚焦带电粒子束（3）的带电粒子透镜（1; 1000）的束光学组件，带电粒子透镜（1; 1000）包括具有第一元件（5; 1005）用于聚焦带电粒子束（3）的开口（7）; 具有用于聚焦所述带电粒子束（3）的第二开口（11）的第二元件（9; 1009）; 和与第一元件（5; 1005）和第二元件（9; 1009）中的至少一个连接的第一驱动装置（13），用于使第一开口（7）相对于第二开口（11）对准。利用第一驱动装置，在光束操作期间，第一开口（7）和第二开口（11）可以相对于彼此对准，以提供光束光学部件的优良对准以实现更好的光束聚焦。本发明还涉及一种使用所述光束光学部件来聚焦带电粒子束（3）的带电粒子束装置以及一种使第一开口（7）和第二开口（11）相对于彼此对准的方法。

8. 发明申请

WO2005024888A3 DOUBLE STAGE CHARGED PARTICLE BEAM ENERGY WIDTH REDUCTION SYSTEM FOR CHARGED PARTICLE BEAM SYSTEM 审中-公开
标题翻译：带电粒子束系统的双级带电粒子束能量宽度减小系统
公开(公告)号：WO2005024888A3
公开(公告)日：2005-04-28
申请号：PCT/EP2004009801
申请日：2004-09-02
申请人： INTEGRATED CIRCUIT TESTING , FROSIEN JUERGEN , DEGENHARDT RALF , LANIO STEFAN
发明人： FROSIEN JUERGEN , DEGENHARDT RALF , LANIO STEFAN
IPC分类号： H01J37/05 , H01J37/153 , H01J37/28 , H01J49/28 , H01J49/46 , H01J49/48
CPC分类号： H01J37/26 , B82Y10/00 , B82Y40/00 , H01J37/05 , H01J37/153 , H01J37/3174 , H01J2237/057 , H01J2237/1534 , H01J2237/1538
摘要： The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element (110) acting in a focusing and dispersive manner, a second element (112) acting in a focusing and dispersive manner, a first quadrupole element (410) being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element (412) being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element (618) being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element (616;716) being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.
摘要翻译：本发明涉及例如具有沿着光轴的z轴以及第一和第二平面的带电粒子束的带电粒子束能量宽度减小系统，包括：以聚焦和色散方式作用的第一元件（110），第二元件（ 112）以聚焦和散射方式作用，第一四极元件（410）被定位成使得在操作中第一四极元件的场与第一元件的聚焦和散射方式的场重叠，第二四极元件（412）被定位成使得在操作中，第二四极元件的场与以聚焦和色散方式作用的第二元件的场重叠，第一带电粒子选择元件（618）以束在第一元件以聚焦和色散方式作用之前，以及第二带电粒子选择元件（616; 716）在光束方向上定位在第一元件作用于聚焦和分散方式之后 d分散的方式。由此，可以实现没有固有色散限制的虚拟色散源位置。

9. 发明申请

WO2007041139A3 ELECTROSTATIC DEFLECTION SYSTEM WITH LOW ABERRATIONS AND VERTICAL BEAM INCIDENCE 审中-公开
标题翻译：具有低波纹和垂直波入射的静电偏转系统
公开(公告)号：WO2007041139A3
公开(公告)日：2007-06-14
申请号：PCT/US2006037624
申请日：2006-09-26
申请人： APPLIED MATERIALS INC , WINKLER DIETER , PEARCE-PERCY HENRY , FROSIEN JUERGEN , DEVORE WILLIAM J
发明人： WINKLER DIETER , PEARCE-PERCY HENRY , FROSIEN JUERGEN , DEVORE WILLIAM J
IPC分类号： H01J3/14 , H01J37/317
CPC分类号： H01J37/1477 , H01J2237/1518 , H01J2237/28 , H01J2237/3175
摘要： Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.
摘要翻译：本发明的实施例可以用于改善电子束偏转。一个实施例提供了一种静电偏转系统，其具有使像差最小化并同时实现垂直入射的电极。通过对偏转方向使用至少两级偏转，本发明允许偏转的电子束通过物镜的后焦面，而偏转电容器不设置在后焦面上。结果，偏转电极可以具有120°的角度以最小化像差，并且同时实现目标上的电子束的垂直入射，以避免由于目标或焦点变化的高度变化而导致的畸变或放大率变化。

10. 发明申请

WO2007041057A3 ELECTROSTATIC DEFLECTION SYSTEM WITH IMPEDANCE MATCHING FOR HIGH POSITIONING ACCURACY 审中-公开
标题翻译：具有高位置精度阻尼匹配的静电偏转系统
公开(公告)号：WO2007041057A3
公开(公告)日：2007-06-07
申请号：PCT/US2006037218
申请日：2006-09-26
申请人： APPLIED MATERIALS INC , BULLER BENYAMIN , DEVORE WILLIAM J , FROSIEN JUERGEN , MIRRO JR EUGENE , PEARCE-PERCY HENRY , WINKLER DIETER
发明人： BULLER BENYAMIN , DEVORE WILLIAM J , FROSIEN JUERGEN , MIRRO JR EUGENE , PEARCE-PERCY HENRY , WINKLER DIETER
IPC分类号： H01J37/147
CPC分类号： H01J37/147 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/24 , H01J37/3174 , H01J2237/0432 , H01J2237/1504 , H01J2237/28
摘要： An apparatus and method for deflecting electron beams (301) with high precision and high throughput. At least one electrode (302, 312) of a deflecting capacitor is connected to a signal source (303, 313) via a coaxial cable (304, 314). A termination resistor (306, 316 is further connected to the coaxial cable and the electrode at the joint (307, 317) of the coaxial cable and the electrode. The termination resistor has a resistance matched to the impedance of the coaxial cable and the electrode has an impedance matched to half of the impedance of the coaxial. The deflecting capacitors of the present invention have a minimized loss of precision due to eddy current. The spacing of electrodes in the deflecting capacitors is reduced by a factor of approximately two compared to the state-the-art system.
摘要翻译：一种用于以高精度和高产量偏转电子束（301）的装置和方法。偏转电容器的至少一个电极（302,312）经由同轴电缆（304,314）连接到信号源（303,313）。终端电阻器（306,316）进一步连接到同轴电缆，并且在同轴电缆和电极的接头（307,317）处的电极，终端电阻器具有与同轴电缆和电极的阻抗匹配的电阻具有与同轴电阻的一半阻抗匹配的阻抗，本发明的偏转电容器由于涡电流而具有最小的精度损失，偏转电容器中的电极间距相对于最先进的系统。

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