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1. 发明申请

WO2008101713A2 HIGH THROUGHPUT SEM TOOL 审中-公开
标题翻译：高通量扫描仪刀具
公开(公告)号：WO2008101713A2
公开(公告)日：2008-08-28
申请号：PCT/EP2008001413
申请日：2008-02-22
申请人： APPLIED MATERIALS ISRAEL LTD , ALMOGY GILAD , BARTOV AVISHAI , FROSIEN JUERGEN , ADAMEC PAVEL , BANZHOF HELMUT
发明人： ALMOGY GILAD , BARTOV AVISHAI , FROSIEN JUERGEN , ADAMEC PAVEL , BANZHOF HELMUT
IPC分类号： H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28 , H01L21/66
CPC分类号： H01J37/05 , H01J37/10 , H01J37/147 , H01J37/28 , H01J2237/0635 , H01J2237/1508 , H01J2237/2449 , H01J2237/2817
摘要： A multi-beam scanning electron beam device is described. The multi-beam scanning electron beam device having a column, includes a multi-beam emitter for emitting a plurality of electron beams, at least one common electron beam optical element having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element for individually influencing the plurality of electron beams, a common objective lens assembly for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen for generation of a plurality of signal beams, and a detection assembly for individually detecting each signal beam on a corresponding detection element.
摘要翻译：描述了多光束扫描电子束装置。具有列的多光束扫描电子束装置包括用于发射多个电子束的多光束发射器，至少一个具有用于多个电子束中的至少两个的公共开口的公共电子束光学元件，并且是用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件，用于聚焦具有用于聚焦的共同激发的多个电子束的公共物镜组件多个电子束中的至少两个，并且适于将多个电子束聚焦到用于产生多个信号光束的样本上;以及检测组件，用于在相应的检测元件上单独检测每个信号光束。

2. 发明申请

WO2004044944A3 RASTER FRAME BEAM SYSTEM FOR ELECTRON BEAM LITHOGRAPHY 审中-公开
标题翻译：用于电子束光刻的光栅光束系统
公开(公告)号：WO2004044944A3
公开(公告)日：2004-08-19
申请号：PCT/US0334785
申请日：2003-10-31
申请人： APPLIED MATERIALS ISRAEL LTD , APPLIED MATERIALS INC , ALONI MEIR , FREIDMAN MULA , VISHNIPOLSKY JIMMY , ALMOGY GILAD , LITMAN ALON , LEHMAN YONATAN , MESHULACH DORON , TIROSH EHUD
发明人： ALONI MEIR , FREIDMAN MULA , VISHNIPOLSKY JIMMY , ALMOGY GILAD , LITMAN ALON , LEHMAN YONATAN , MESHULACH DORON
IPC分类号： G03F7/20 , H01J37/317
CPC分类号： G03F7/70375 , G03F7/70275
摘要： A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.
摘要翻译：用于在基底上写入主图像的方法包括将主图像分成帧矩阵，每个帧包括在主图像内的相应帧位置中定义相应帧图像的像素阵列。当电子束在相应的帧位置上扫描时，电子束在衬底上以光栅图案扫描，同时响应于每个帧的相应帧图像而对电子束进行整形，使得在每一帧中，电子束同时将多个像素写入到衬底上。

3. 发明申请

WO2004031791A3 SYSTEM AND METHOD FOR DEFECT LOCALIZATION ON ELECTRICAL TEST STRUCTURES 审中-公开
标题翻译：电气测试结构缺陷定位的系统和方法
公开(公告)号：WO2004031791A3
公开(公告)日：2004-06-24
申请号：PCT/US0331398
申请日：2003-10-03
申请人： APPLIED MATERIALS ISRAEL LTD , APPLIED MATERIALS INC , ALMOGY GILAD , TALBOT CHRIS , LEVIN LIOR
发明人： ALMOGY GILAD , TALBOT CHRIS , LEVIN LIOR
IPC分类号： G01N21/956 , G01R31/308
CPC分类号： G01R31/2812 , G01N21/956
摘要： A method and system for defect localization includes: (i) receiving a test structure (400), e.g. an integrated circuit, that includes at least one conductor (426) that is at least partially covered by an electro-optically active material (410) as to provide an indication about the electrical status of at least one or more of the conductors of the test structure; (ii) providing an electrical signal to the conductor, such as charge at least a portion of the conductor; and (iii) imaging the test structure by optical means (430) to locate a defect.
摘要翻译：用于缺陷定位的方法和系统包括：（i）接收测试结构（400），例如，集成电路，其包括至少部分地被电光活性材料（410）覆盖的至少一个导体（426），以提供关于测试的至少一个或多个导体的电状态的指示结构体; （ii）向导体提供电信号，例如对导体的至少一部分充电; 和（iii）通过光学装置（430）对测试结构进行成像以定位缺陷。

4. 发明申请

WO2005076081A2 RETICLE FABRICATION USING A REMOVABLE HARD MASK 审中-公开
标题翻译：使用可移除的硬掩模进行制造
公开(公告)号：WO2005076081A2
公开(公告)日：2005-08-18
申请号：PCT/US2005002563
申请日：2005-01-27
申请人： APPLIED MATERIALS INC , BENCHER CHRISTOPHER DENNIS , MONTGOMERY MELVIN WARREN , BUXBAUM ALEXANDER , LEE YUNG-HEE YVETTE , DING JIAN , ALMOGY GILAD , YEH WENDY H
发明人： BENCHER CHRISTOPHER DENNIS , MONTGOMERY MELVIN WARREN , BUXBAUM ALEXANDER , LEE YUNG-HEE YVETTE , DING JIAN , ALMOGY GILAD , YEH WENDY H
IPC分类号： G03F1/08 , G03F7/09
CPC分类号： G03F1/68 , G03F1/46 , G03F1/80
摘要： We have reduced the critical dimension bias for reticle fabrication. Pattern transfer to the radiation-blocking layer of the reticle substrate essentially depends upon use of a hard mask to which the pattern is transferred from a photoresist. The photoresist pull back which occurs during pattern transfer to the hard mask is minimalized. In addition, a hard mask material having anti-reflective properties which are matched to the reflective characteristics of the radiation-blocking layer enables a reduction in critical dimension size and an improvement in the pattern feature integrity in the hard mask itself. An anti-reflective hard mask layer left on the radiation-blocking layer provides functionality when the reticle is used in a semiconductor device manufacturing process.
摘要翻译：我们已经降低了光罩制造的临界尺寸偏差。图案转移到掩模版衬底的辐射阻挡层基本上取决于使用图案从光致抗蚀剂转移到的硬掩模。在图案转移到硬掩模期间发生的光致抗蚀剂拉回被最小化。另外，具有与辐射阻挡层的反射特性相匹配的抗反射特性的硬掩模材料使得能够减小临界尺寸尺寸并且改善硬掩模本身中的图案特征完整性。当掩模版用于半导体器件制造工艺时，留在辐射阻挡层上的抗反射硬掩模层提供了功能。

5. 发明申请

WO2004057404A3 ELIMINATING COHERENCE EFFECTS IN BRIGHT-FIELD LASER IMAGING 审中-公开
标题翻译：消除光场激光成像中的相干效应
公开(公告)号：WO2004057404A3
公开(公告)日：2004-12-09
申请号：PCT/US0340597
申请日：2003-12-19
申请人： APPLIED MATERIALS ISRAEL LTD , APPLIED MATERIALS INC
发明人： ALMOGY GILAD , FELDMAN HAIM
IPC分类号： G01N21/88 , G02B26/10 , G02B27/09
CPC分类号： G01N21/8806 , G02B26/10
摘要： A method for imaging and an imaging system, the system includes the steps of: (i) scanning a beam of coherent radiation over a surface along a scan axis; (ii) focusing the beam to a spot on the surface, so that the spot has a predetermined dimension along the scan axis; (iii) spreading the beam laterally while scanning the beam, so that the beam covers an area substantially wider than the predetermined dimension in a direction transverse to the scan axis; and (iii) capturing the radiation scattered from the surface while scanning the beam, so as to form an image of the surface.
摘要翻译：一种用于成像和成像系统的方法，该系统包括以下步骤：（i）沿着扫描轴在表面上扫描相干辐射束; （ii）将光束聚焦到表面上的一个点上，使得该点沿着扫描轴具有预定尺寸; （iii）在扫描光束的同时横向扩展光束，使得光束在横向于扫描轴线的方向上覆盖比预定尺寸宽得多的区域; 和（iii）在扫描光束的同时捕获从表面散射的辐射，以形成表面的图像。

6. 发明申请

WO2010138606A3 CONCENTRATING SOLAR PHOTOVOLTAIC-THERMAL SYSTEM 审中-公开
标题翻译：浓缩太阳能光伏系统
公开(公告)号：WO2010138606A3
公开(公告)日：2011-08-11
申请号：PCT/US2010036220
申请日：2010-05-26
申请人： COGENRA SOLAR INC , ALMOGY GILAD , MORAD RATSON , ROSENFELD GAD , BAR AMIR , RADUTA RADU
发明人： ALMOGY GILAD , MORAD RATSON , ROSENFELD GAD , BAR AMIR , RADUTA RADU
IPC分类号： H01L31/052
CPC分类号： F24D19/1042 , F24D11/003 , F24J2/07 , F24J2/1047 , F24J2/14 , F24J2/42 , F24J2/541 , F24J2002/1019 , F24J2002/5493 , F28D15/00 , F28D20/0034 , H01L31/0521 , H01L31/0547 , H02S40/44 , Y02B10/20 , Y02E10/52 , Y02E10/60
摘要： Systems, methods, and apparatus by which solar energy may be collected to provide heat, electricity, or a combination of heat and electricity are disclosed herein.
摘要翻译：本文公开了可以收集太阳能以提供热，电或热和电力的组合的系统，方法和装置。

7. 发明申请

WO2004010227A3 RECORDING AN IMAGE WITH MULTIPLE INTENSITY LEVELS 审中-公开
标题翻译：记录具有多个强度水平的图像
公开(公告)号：WO2004010227A3
公开(公告)日：2005-01-27
申请号：PCT/US0321670
申请日：2003-07-11
申请人： APPLIED MATERIALS INC , APPLIED MATERIALS ISRAEL LTD
发明人： ALMOGY GILAD , FELDMAN HAIM , ALONI MEIR
IPC分类号： G03F7/20
CPC分类号： G03F7/70208 , G03F7/70275 , G03F7/70291 , G03F7/70358
摘要： A printer and method for recording a predefined multiple intensity level image on a substrate, the method includes the steps of: converting the predetermined image to multiple intensity level associated images; converting a light beam to multiple light beam arrays; modulating each light beam array to provide modulated light beam arrays, in response to a corresponding intensity level associated image to be recorded on the substrate; directing each modulated light beam array to impinge on the substrate; and repeating the steps of converting, modulating and directing while moving the substrate until the predefined image is imaged on the substrate. The printer includes a programmable optical radiation source for providing multiple modulated light beam arrays and for directing the modulated light beam arrays to impinge on the substrate, each modulated light beam array being modulated in response to an input signal corresponding to a corresponding intensity level associated image to be recorded on the substrate; whereas a superposition of the intensity level associated images forms the predefined image on the substrate, and a movable stage for moving the substrate until the predefined image is imaged on the substrate.
摘要翻译：一种用于在基板上记录预定多重强度级图像的打印机和方法，所述方法包括以下步骤：将预定图像转换成多个强度级相关图像; 将光束转换成多个光束阵列; 调制每个光束阵列以响应于要记录在所述衬底上的对应的强度级相关图像来提供调制的光束阵列; 引导每个调制的光束阵列撞击在基底上; 并且重复在移动衬底的同时转换，调制和引导步骤，直到预定图像被成像在衬底上。打印机包括可编程光辐射源，用于提供多个调制光束阵列并用于引导调制的光束阵列撞击在衬底上，每个被调制的光束阵列响应于对应于对应的强度级相关图像的输入信号被调制被记录在基板上; 而强度级相关图像的叠加在衬底上形成预定义的图像，以及用于移动衬底的可移动台，直到预定图像在衬底上成像为止。

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