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1. 发明申请

WO2010106432A2 DEPOSITION APPARATUS WITH HIGH TEMPERATURE ROTATABLE TARGET AND METHOD OF OPERATING THEREOF 审中-公开
标题翻译：具有高温可旋转目标的沉积装置及其操作方法
公开(公告)号：WO2010106432A2
公开(公告)日：2010-09-23
申请号：PCT/IB2010/000598
申请日：2010-03-19
申请人： APPLIED MATERIALS, INC. , MUELLER, Joachim , TRASSL, Roland , LIU, Jian
发明人： MUELLER, Joachim , TRASSL, Roland , LIU, Jian
IPC分类号： H01L21/203
CPC分类号： C23C14/34 , C23C14/3407 , C23C14/3421 , C23C14/35 , C23C14/541 , H01J37/32724 , H01J37/34 , H01J37/3405
摘要： A deposition apparatus (100) and a method for sputtering material on a substrate is provided with a substrate holder (110) for holding the substrate, a rotatable target (120) adapted for being sputtered, and a heating system including a back side heating (130) for heating the substrate from the back and a front side heating for heating the substrate from the front. The rotatable target acts as the front side heating and is adapted for heating the substrate to a temperature of at least 100°C.
摘要翻译：沉积设备（100）和在衬底上溅射材料的方法设置有用于保持衬底的衬底保持器（110），适于溅射的可旋转靶（120）和包括背侧加热（ 130），用于从背面加热基板和从前方加热基板的正面加热。可旋转的靶用作前侧加热，适于将基底加热到至少100℃的温度。

2. 发明申请

WO2010046486A1 ROTATABLE SPUTTER TARGET BACKING CYLINDER, ROTATABLE SPUTTER TARGET, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, AND COATING INSTALLATION 审中-公开
标题翻译：可旋转飞溅器目标后支撑筒，可旋转飞溅器目标，生产可旋转飞溅器目标的方法和涂层安装
公开(公告)号：WO2010046486A1
公开(公告)日：2010-04-29
申请号：PCT/EP2009/064014
申请日：2009-10-23
申请人： APPLIED MATERIALS, INC. , SCHAEFER, Michael , TRASSL, Roland , LIU, Jian
发明人： SCHAEFER, Michael , TRASSL, Roland , LIU, Jian
IPC分类号： H01J37/34 , C23C14/34
CPC分类号： H01J37/3435
摘要： A rotatable target device for sputtering installations, the rotatable target device including: a rotatable target base (4) adapted for holding a solid target cylinder (5), the solid target cylinder having an inner axial face (54), an outer axial face (55) and at least one front face (56) connecting the inner axial face with the outer axial face; wherein the rotatable target base comprises a flexible element (23; 230), a first face (3) adapted to the shape of the inner axial face of the solid target cylinder and a second face (250; 81) adapted to hold the flexible element outside of the solid target cylinder.
摘要翻译：一种用于溅射装置的可旋转目标装置，所述可转动目标装置包括：适于保持固体目标气缸（5）的可旋转靶基座（4），所述实心目标圆柱体具有内轴向面（54），外轴向面 55）和连接所述内轴向面与所述外轴向面的至少一个前面（56）其中所述可旋转靶基座包括柔性元件（23; 230），适于所述固体目标圆柱体的内轴向面的形状的第一面（3）和适于保持所述柔性元件的第二面（250; 81）在固体目标气瓶外面。

3. 发明申请

WO2009030374A1 VERFAHREN ZUR ERZEUGUNG EINES METALLISCHEN RÜCKKONTAKTES EINES HALBLEITERBAUELEMENTS, INSBESONDERE EINER SOLARZELLE 审中-公开
标题翻译：方法的半导体元件的金属背曝光，特别是太阳能电池
公开(公告)号：WO2009030374A1
公开(公告)日：2009-03-12
申请号：PCT/EP2008/006861
申请日：2008-08-20
申请人： APPLIED MATERIALS, INC. , TRASSL, Roland , WIEDER, Stephan , LIU, Jian , HEINRICH, Jürgen , RIST, Gerhard
发明人： TRASSL, Roland , WIEDER, Stephan , LIU, Jian , HEINRICH, Jürgen , RIST, Gerhard
IPC分类号： H01L31/0224 , H01L31/18 , C23C14/56
CPC分类号： H01L31/022425 , Y02E10/50
摘要： Die vorliegende Erfindung betrifft ein Verfahren zur Herstellung eines Rückkontakts (21) eines Halbleiterbauelements, insbesondere einer Solarzelle (20), umfassend eine metallische Schicht (24) auf der Rückseite eines Substrats (22) in einer Vakuumbehandlungskammer und die Verwendung einer Vakuumbehandlungsanlage zur Durchführung dieses Verfahrens. Mit Hilfe dieses Verfahrens und der Verwendung lassen sich insbesondere Solarzellen (20) auf Siliziumbasis auf einfache Weise in kontinuierlicher Prozessführung mit einem Rückkontakt (21) versehen, wobei die Prozessführung besonders effizient und kostengünstig gestaltet werden kann, da keine Handlingsysteme zum Drehen des Substrats (22) erforderlich sind und insbesondere auf Siebdruckschritte verzichtet werden kann.
摘要翻译：本发明涉及一种在基板（22）的真空处理室背面的金属层（24）和用于实施该方法使用真空处理装置的太阳能电池（20）一种制造半导体器件的背接触（21），特别的方法，使用基于硅此方法和用途，特别是，太阳能电池（20）可以以简单的方式与背接触（21），则处理可以进行控制特别有效和具有成本效益，由于用于基板旋转没有处理系统的连续过程控制来提供（22 ）是必需的，并且可以特别地丝网印刷步骤被省略。

4. 发明申请

WO2022083857A1 DRUM DEVICE FOR USE IN A WEB COATING PROCESS, WEB COATING APPARATUS AND METHOD FOR CONTROLLING THE TEMPERATURE OF A WEB IN A WEB COATING PROCESS 审中-公开
公开(公告)号：WO2022083857A1
公开(公告)日：2022-04-28
申请号：PCT/EP2020/079646
申请日：2020-10-21
申请人： APPLIED MATERIALS, INC. , HOFFMANN, Gerd , DIETER, Torsten Bruno , DEPPISCH, Thomas , TRASSL, Roland
发明人： HOFFMANN, Gerd , DIETER, Torsten Bruno , DEPPISCH, Thomas , TRASSL, Roland
IPC分类号： C23C14/56 , C23C14/54 , B65H18/10 , C23C16/54 , C23C16/52
摘要： A drum device (10) for guiding a web (12) in a web coating process under vacuum conditions, a web coating apparatus (14) comprising a vacuum chamber (16) including the drum device (10), and a method for controlling the temperature of a web (12) in a web coating process under vacuum conditions. The drum device (10) comprises: - a rotatable drum (100) with a web facing surface (102) comprising a first web facing surface portion (104); - a gas distribution system (400) for providing a gas flow (115) including a gas composition into an interspace between the web (12) and the first web facing surface portion (104) denoted as a first interspace (110), the gas composition comprising a gas and/or a vapor of a liquid; and - a temperature adjusting system (300) adapted for controlling the temperature of the first web facing surface portion (104) such that the gas composition is cooled in a manner that the gas and/or the liquid changes the aggregate state, thus forming a non-gaseous cushion (116) in the first interspace (110).

5. 发明申请

WO2019057273A1 METHOD OF FORMING ALUMINA FOR A ELECTROCHEMICAL CELL USING A PLASMA IONISING PROCESS 审中-公开
公开(公告)号：WO2019057273A1
公开(公告)日：2019-03-28
申请号：PCT/EP2017/073780
申请日：2017-09-20
申请人： APPLIED MATERIALS, INC. , TRASSL, Roland , DIETER, Torsten Bruno , DEPPISCH, Thomas , HERLE, Subramanya , ZHAO, Kent
发明人： TRASSL, Roland , DIETER, Torsten Bruno , DEPPISCH, Thomas , HERLE, Subramanya , ZHAO, Kent
IPC分类号： H01M2/14 , C23C14/00 , C23C14/24 , C23C16/448 , H01M4/04 , H01M4/139 , H01M10/052 , C23C14/22 , C23C14/32 , C23C14/56
摘要： An evaporation source (102) for forming a ceramic layer of a component of an electrochemical energy storage device is provided. The evaporation source (102) includes a material source configured to evaporate a material, a gas supply configured to supply process gas, and a plasma source (108) configured to at least partially ionize the process gas, the ceramic layer (52) being formed by at least the evaporated material and the at least partially ionized process gas.

6. 发明申请

WO2014207088A1 EVAPORATION APPARATUS WITH GAS SUPPLY 审中-公开
标题翻译：蒸气装置与气体供应
公开(公告)号：WO2014207088A1
公开(公告)日：2014-12-31
申请号：PCT/EP2014/063488
申请日：2014-06-26
申请人： APPLIED MATERIALS, INC. , HOFFMANN, Gerd , SCHRAMM, Sven , TRASSL, Roland
发明人： HOFFMANN, Gerd , SCHRAMM, Sven , TRASSL, Roland
IPC分类号： C23C14/00 , C23C14/24 , C23C14/56 , C23C14/08 , H01J37/32
CPC分类号： C23C16/448 , C23C14/0021 , C23C14/081 , C23C14/24 , C23C14/243 , C23C14/562
摘要： An evaporation apparatus (100) for depositing material on a substrate (160) supported by a drum (170) is described. The evaporation apparatus includes a first set of evaporation crucibles (110) aligned in a first line (120) along a first direction (121) for depositing evaporated material on the substrate; a first gas supply pipe (130) extending in the first direction (121) and being arranged between at least one of the evaporation crucibles of the first set of evaporation crucibles (110) and the drum (170); and a second gas supply pipe (140) extending in the first direction (121) for providing a gas between the first set of evaporation crucibles (110) and the drum (170) with openings (150) shaped and positioned to improve the uniformity of the deposition of the material.
摘要翻译：描述了用于将材料沉积在由滚筒（170）支撑的基底（160）上的蒸发装置（100）。蒸发装置包括沿着第一方向（121）排列在第一管线（120）中的第一组蒸发坩埚（110），用于在基板上沉积蒸发的材料; 第一气体供应管（130），其沿第一方向（121）延伸并且布置在第一组蒸发坩埚（110）和滚筒（170）的至少一个蒸发坩埚之间; 以及在所述第一方向（121）上延伸的第二气体供应管（140），用于在所述第一组蒸发坩埚（110）和所述滚筒（170）之间提供形成并定位的开口（150）的气体，以提高材料的沉积。

7. 发明申请

WO2019057274A1 METHOD OF FORMING A COMPONENT OF AN ELECTROCHEMICAL CELL BY EVAPORATION 审中-公开
公开(公告)号：WO2019057274A1
公开(公告)日：2019-03-28
申请号：PCT/EP2017/073781
申请日：2017-09-20
申请人： APPLIED MATERIALS, INC. , TRASSL, Roland , DIETER, Torsten Bruno , HERLE, Subramanya
发明人： TRASSL, Roland , DIETER, Torsten Bruno , HERLE, Subramanya
IPC分类号： H01M10/052 , C23C14/00 , C23C14/24 , C23C14/56 , C23C16/448 , H01M2/14 , H01M4/04 , H01M4/139 , C23C14/22 , C23C14/26
摘要： An evaporation source (102) for forming a ceramic layer of a component of an electrochemical energy storage device is provided. The evaporation source (102) includes a material source (140) configured to evaporate a material, a gas supply having a first gas outlet (107a) configured to supply a first process gas and a second gas outlet (107b) configured to supply a second process gas, the first process gas including oxygen and the second process gas including hydrogen, the ceramic layer (52) being formed by at least the evaporated material, the first process gas and the second process gas.

8. 发明申请

WO2018024313A1 DEPOSITION APPARATUS 审中-公开
标题翻译：沉积设备
公开(公告)号：WO2018024313A1
公开(公告)日：2018-02-08
申请号：PCT/EP2016/068327
申请日：2016-08-01
申请人： APPLIED MATERIALS, INC. , TRASSL, Roland
发明人： TRASSL, Roland
IPC分类号： C23C14/00 , C23C14/56 , C23C14/02
摘要： An evaporation apparatus (100) for depositing material on a flexible substrate (160) supported by a processing drum (170) is provided. The evaporation apparatus includes: a first set (110) of evaporation crucibles aligned in a first line (120) along a first direction for generating a cloud (151) of evaporated material to be deposited on the flexible substrate (160); and a gas supply pipe (130) extending in the first direction and being arranged between an evaporation crucible of the first set (110) of evaporation crucibles and the processing drum (170), wherein the gas supply pipe (130) includes a plurality of outlets (133) for providing a gas supply directed into the cloud of evaporated material, and wherein a position of the plurality of outlets is adjustable for changing a position of the gas supply directed into the cloud of evaporated material.
摘要翻译：提供用于将材料沉积在由处理鼓（170）支撑的柔性基板（160）上的蒸发装置（100）。蒸发设备包括：第一组（110）沿第一方向在第一线（120）中排列的蒸发坩埚，用于产生待沉积在柔性基板（160）上的蒸发材料的云（151）; 以及沿第一方向延伸且设置在第一组蒸发坩埚（110）的蒸发坩埚和处理鼓（170）之间的气体供应管（130），其中，气体供应管（130）包括多个用于提供引导到蒸发材料云中的气体供应的出口（133），并且其中所述多个出口的位置是可调节的，用于改变引导到蒸发材料云中的气体供应的位置。

9. 发明申请

WO2016070940A1 APPARATUS AND METHOD FOR TREATMENT OF FLEXIBLE SUBSTRATES HAVING A LARGE WIDTH USING AN ELECTRON BEAM 审中-公开
标题翻译：用于处理使用电子束的大幅宽度的柔性基板的装置和方法
公开(公告)号：WO2016070940A1
公开(公告)日：2016-05-12
申请号：PCT/EP2014/074087
申请日：2014-11-07
申请人： APPLIED MATERIALS, INC. , KLEMM, Günter , HACKER, Volker , TRASSL, Roland
发明人： KLEMM, Günter , HACKER, Volker , TRASSL, Roland
IPC分类号： H01J3/02 , H01J37/077 , G21K5/10
CPC分类号： H01J3/025 , G21K5/04 , G21K5/10 , H01J37/077
摘要： According to the present disclosure, a charged particle device for treatment of a substrate and method for increasing the extraction efficiency of a charged particle device are provided. The charged particle device includes: a housing providing a first electrode, the housing having a back wall and a front wall; a slit opening in the housing; and a second electrode being arranged within the housing and having a first side facing the slit opening. The second electrode includes one or more beam shaping extension that protrude from the second electrode in a direction towards the front wall of the housing for guiding the charged particle beam through the slit opening.
摘要翻译：根据本公开，提供了一种用于处理基板的带电粒子装置和用于提高带电粒子装置的提取效率的方法。所述带电粒子装置包括：提供第一电极的壳体，所述壳体具有后壁和前壁; 壳体中的狭缝开口; 并且第二电极布置在壳体内并且具有面向狭缝开口的第一侧。第二电极包括一个或多个光束成形延伸部，其沿着朝向壳体的前壁的方向从第二电极突出，用于引导带电粒子束穿过狭缝开口。

10. 发明申请

WO2011076753A1 ENHANCED PASSIVATION LAYER FOR WAFER BASED SOLAR CELLS, METHOD AND SYSTEM FOR MANUFACTURING THEREOF 审中-公开
标题翻译：用于基于波浪的太阳能电池的增强钝化层，其制造方法和系统
公开(公告)号：WO2011076753A1
公开(公告)日：2011-06-30
申请号：PCT/EP2010/070276
申请日：2010-12-20
申请人： APPLIED MATERIALS, INC. , DIETER, Torsten Bruno , TRASSL, Roland , GÖRGENS, Carsten
发明人： DIETER, Torsten Bruno , TRASSL, Roland , GÖRGENS, Carsten
IPC分类号： H01L31/18 , H01L31/0216
CPC分类号： H01L31/02167 , H01L31/1868 , Y02E10/50 , Y02P70/521
摘要： A solar cell module layer stack is described. The layer stack includes a doped silicon wafer substrate (101), a further layer (102) of the substrate or deposited on the substrate, wherein the further layer is doped for generation of a p-n-junction with the doped silicon wafer substrate; and a first sputtered passivation layer (112, 114) deposited on the doped silicon wafer substrate (101) or the further layer (102), wherein the passivation layer is selected from the group consisting of: an aluminum-containing oxide layer, an aluminum-containing oxynitride layer, and mixtures thereof; and wherein the passivation layer being plasma treated under a hydrogen-containing atmosphere and/or wherein the layer stack further comprises a hydrogen-containing cap layer (202) on the passivation layer.
摘要翻译：描述了太阳能电池模块层堆叠。层叠包括掺杂硅晶片衬底（101），衬底的另一层（102）或沉积在衬底上，其中掺杂另外的层以与掺杂的硅晶片衬底产生p-n结; 以及沉积在所述掺杂硅晶片衬底（101）或所述另一层（102）上的第一溅射钝化层（112,114），其中所述钝化层选自：含铝氧化物层，铝含氮氧化物层及其混合物; 并且其中所述钝化层在含氢气氛下进行等离子体处理和/或其中所述层堆叠还包括在所述钝化层上的含氢覆盖层（202）。

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