专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2022108746A1 APPARATUS FOR ROTATING SUBSTRATES 审中-公开
公开(公告)号：WO2022108746A1
公开(公告)日：2022-05-27
申请号：PCT/US2021/057639
申请日：2021-11-02
申请人： APPLIED MATERIALS, INC.
发明人： KAMESH, Giridhar , RAMACHANDRAN, Vinodh , PRASAD, Chaitanya A. , AAMIR, Mohammad , GLOVER, Daniel C.
IPC分类号： H01L21/687 , H01L21/67 , C23C16/458
摘要： Embodiments of the present disclosure generally relate to apparatus for substrate processing, and more specifically to apparatus for rotating substrates and to uses thereof. In an embodiment, an apparatus for rotating a substrate is provided. The apparatus includes a levitatable rotor comprising a plurality of magnets embedded therein, a plurality of gas bearings positioned to levitate the levitatable rotor, and a stator magnetically coupled to the levitatable rotor, the stator for producing a rotating magnetic field. Apparatus for processing a substrate with the apparatus for rotating substrates as well as methods of use are also described.

2. 发明申请

WO2018222256A1 REMOTE PLASMA OXIDATION CHAMBER 审中-公开
公开(公告)号：WO2018222256A1
公开(公告)日：2018-12-06
申请号：PCT/US2018/024539
申请日：2018-03-27
申请人： APPLIED MATERIALS, INC.
发明人： OLSEN, Christopher S. , SHONO, Eric Kihara , HAWRYLCHAK, Lara , TJANDRA, Agus Sofian , PRASAD, Chaitanya A.
IPC分类号： H01J37/32
CPC分类号： C23C16/45587 , C23C8/10 , C23C8/36 , C23C16/50 , H01J37/32183 , H01J37/3244 , H01J37/32467 , H01J37/32477 , H01J2237/3323 , H01L21/67017 , H01L21/67115 , H01L21/6719
摘要： Embodiments of the present disclosure generally relate to a process chamber for conformal oxidation of high aspect ratio structures. The process chamber includes a liner assembly located in a first side of a chamber body and two pumping ports located in a substrate support portion adjacent a second side of the chamber body opposite the first side. The liner assembly includes a flow divider to direct fluid flow away from a center of a substrate disposed in a processing region of the process chamber. The liner assembly may be fabricated from quartz minimize interaction with process gases, such as radicals. The liner assembly is designed to reduce flow constriction of the radicals, leading to increased radical concentration and flux. The two pumping ports can be individually controlled to tune the flow of the radicals through the processing region of the process chamber.

3. 发明申请

WO2015175163A1 SHOWERHEAD DESIGN 审中-公开
标题翻译：淋浴设计
公开(公告)号：WO2015175163A1
公开(公告)日：2015-11-19
申请号：PCT/US2015/026687
申请日：2015-04-20
申请人： APPLIED MATERIALS, INC.
发明人： SHAH, Kartik , PRASAD, Chaitanya A. , BAUTISTA, Kevin J. , TOBIN, Jeffrey , KELKAR, Umesh M. , HAWRYLCHAK, Lara
IPC分类号： H01L21/02
CPC分类号： C23C16/45565 , C23C16/458 , C23C16/4584 , H01L21/67115
摘要： Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.
摘要翻译：本文所述的实施例涉及一种具有反射板的喷头，其具有用于径向分布气体的气体注射插入件。在一个实施例中，喷头组件包括反射板和气体注射插入件。反射板包括至少一个气体注入口。气体注射插入件设置在反射板中，并且包括多个孔。气体注射插入件还包括设置在气体注射插入件中的挡板，其中挡板还包括多个孔。在挡板的第一部分和反射板之间形成第一增压室，并且在挡板的第二部分和反射板之间形成第二增压室。气体注射插入物的多个孔和挡板的多个孔不轴向对齐。

4. 发明申请

WO2021025809A1 PEDESTAL WITH MULTI-ZONE HEATING 审中-公开
公开(公告)号：WO2021025809A1
公开(公告)日：2021-02-11
申请号：PCT/US2020/040220
申请日：2020-06-30
申请人： APPLIED MATERIALS, INC.
发明人： MAHAKALI, Rohit , ZHANG, Winfei , PRASAD, Chaitanya A.
IPC分类号： H01L21/687 , C23C16/458 , H01L21/67
摘要： A method and apparatus for improved temperature control of a substrate is disclosed. In one embodiment, a pedestal is disclosed that includes a top plate, and a base plate coupled to the top plate, wherein the top plate comprises a multi-zone heater and the base plate comprises a plurality of grooves formed in a bottom surface thereof.

5. 发明申请

WO2019173002A1 FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN 审中-公开
公开(公告)号：WO2019173002A1
公开(公告)日：2019-09-12
申请号：PCT/US2019/014759
申请日：2019-01-23
申请人： APPLIED MATERIALS, INC.
发明人： HAWRYLCHAK, Lara , PRASAD, Chaitanya A.
IPC分类号： H01L21/683 , H01L21/687 , H01L21/67
摘要： Implementations of the present disclosure generally relate to an improved substrate support pedestal assembly. In one implementation, the substrate support pedestal assembly includes a shaft. The substrate support pedestal assembly further includes a substrate support pedestal, mechanically coupled to the shaft. The substrate support pedestal comprises a substrate support plate coated on a top surface with a ceramic material.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式