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1. 发明申请

WO2012030500A1 SYSTEM, METHOD AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION 审中-公开
标题翻译：用于控制离子能量分布的系统，方法和装置
公开(公告)号：WO2012030500A1
公开(公告)日：2012-03-08
申请号：PCT/US2011/047467
申请日：2011-08-11
申请人： ADVANCED ENERGY INDUSTRIES, INC. , BROUK, Victor , HECKMAN, Randy , HOFFMAN, Daniel, J.
发明人： BROUK, Victor , HECKMAN, Randy , HOFFMAN, Daniel, J.
IPC分类号： H05H1/36 , C23C16/52 , H01L21/3065 , C23C14/54 , C23F1/08
CPC分类号： H01J37/24 , C23C14/345 , C23C16/50 , H01J37/32009 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.
摘要翻译：公开了用于调节等离子体室中的离子能量的系统，方法和装置。一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压功能，并且在周期性电压函数的多个周期内进行调制，所述周期性电压功能响应于所述衬底表面处的离子能量的期望分布，以便以时间平均的方式实现所需的离子能量分布。

2. 发明申请

WO2013016619A1 ION ENERGY CONTROL SYSTEM FOR ADVANCED PLASMA ENERGY PROCESSING SYSTEMS 审中-公开
标题翻译：用于先进等离子体能量处理系统的离子能量控制系统
公开(公告)号：WO2013016619A1
公开(公告)日：2013-01-31
申请号：PCT/US2012/048504
申请日：2012-07-27
申请人： ADVANCED ENERGY INDUSTRIES, INC. , BROUK, Victor , HOFFMAN, Daniel, J.
发明人： BROUK, Victor , HOFFMAN, Daniel, J.
IPC分类号： H01J37/30 , H01J37/302 , H01J37/305 , H01L21/3065 , H01L21/02 , H05H1/24
CPC分类号： C23C16/50 , C23C14/345 , H01J37/32009 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.
摘要翻译：公开了用于调节等离子体室中的离子能并将衬底夹持到衬底支撑件的系统，方法和装置。一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压功能，并且在周期性电压函数的多个周期内进行调制，所述周期性电压功能响应于所述衬底表面处的离子能量的期望分布，以便以时间平均的方式实现所需的离子能量分布。

3. 发明申请

WO2012103101A1 ELECTROSTATIC REMOTE PLASMA SOURCE 审中-公开
标题翻译：静电等离子体源
公开(公告)号：WO2012103101A1
公开(公告)日：2012-08-02
申请号：PCT/US2012/022380
申请日：2012-01-24
申请人： ADVANCED ENERGY INDUSTRIES, INC. , HOFFMAN, Daniel, J. , CARTER, Daniel , BROUK, Victor , PETERSON, Karen , GRILLEY, Randy
发明人： HOFFMAN, Daniel, J. , CARTER, Daniel , BROUK, Victor , PETERSON, Karen , GRILLEY, Randy
IPC分类号： H05H1/00 , H05H1/03 , H05H1/24
CPC分类号： H01J37/32541 , H01J37/32091 , H01J37/32183 , H01J37/32357 , H01J37/3244 , H01J37/32568 , H01J2237/327 , H05H1/46 , H05H2001/4675
摘要： This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.
摘要翻译：本公开描述了用于将能量电容耦合到等离子体中以点燃和维持远程等离子体源内的等离子体的系统，方法和装置。功率由至少部分地围绕或被第二电极围绕的第一电极提供。第二个电极可以接地或浮动。可以布置第一和第二介电部件以将电极中的一个或两个与等离子体分开，从而将等离子体与一个或两个电极隔离。

4. 发明申请

WO2010126893A2 METHOD AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION 审中-公开
标题翻译：用于控制离子能量分布的方法和装置
公开(公告)号：WO2010126893A2
公开(公告)日：2010-11-04
申请号：PCT/US2010/032582
申请日：2010-04-27
申请人： ADVANCED ENERGY INDUSTRIES, INC. , HECKMAN, Randy , BROUK, Victor
发明人： HECKMAN, Randy , BROUK, Victor
CPC分类号： H01J37/32045 , C23C14/54 , H01J37/32009 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary system includes an ion-energy control portion, and the ion- energy control portion provides at least one ion-energy control signal responsive to at least one ion-energy setting that is indicative of a desired distribution of energies of ions bombarding a surface of a substrate. A controller is coupled to the switch-mode power supply, and the controller provides at least two drive-control signals. In addition, a switch-mode power supply is coupled to the substrate support, the ion-energy control portion and the controller. The switch-mode power supply includes switching components configured to apply power to the substrate responsive to the drive signals and the ion-energy control signal so as to effectuate the desired distribution of the energies of ions bombarding the surface of the substrate.
摘要翻译：公开了用于调节等离子体室中的离子能量的系统，方法和装置。示例性系统包括离子能量控制部分，并且离子能量控制部分响应于至少一个离子能量设定提供至少一个离子能量控制信号，该至少一个离子能量设定指示轰击表面的离子的所需能量分布的基底。控制器耦合到开关模式电源，并且控制器提供至少两个驱动控制信号。此外，开关模式电源耦合到衬底支撑件，离子能量控制部分和控制器。开关电源包括响应于驱动信号和离子能量控制信号而被配置为向基板施加功率的开关部件，以实现轰击基板表面的离子的能量的期望分布。

5. 发明申请

WO2010126806A1 DETECTING AND PREVENTING INSTABILITIES IN PLASMA PROCESSES 审中-公开
标题翻译：检测和防止等离子体过程中的不稳定性
公开(公告)号：WO2010126806A1
公开(公告)日：2010-11-04
申请号：PCT/US2010/032332
申请日：2010-04-26
申请人： ADVANCED ENERGY INDUSTRIES, INC. , CARTER, Daniel , BROUK, Victor , ROBERG, Jeff
发明人： CARTER, Daniel , BROUK, Victor , ROBERG, Jeff
IPC分类号： H01J37/32 , H01J7/24 , H05H1/00
CPC分类号： H05H1/46 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for reducing instabilities in a plasma-based processing system are disclosed. An exemplary method includes applying power to a plasma with a power amplifier; determining whether low frequency instability oscillations are present or high frequency instability oscillations are present in the plasma; and altering, based upon whether high or low frequency instability oscillations are present, an impedance of a load that is experienced by the power amplifier, the load experienced by the power amplifier including at least an impedance of the plasma.
摘要翻译：公开了用于减少基于等离子体的处理系统中的不稳定性的系统，方法和装置。一种示例性方法包括用功率放大器对等离子体施加功率; 确定在等离子体中是否存在低频不稳定振荡或高频不稳定振荡; 以及基于是否存在高频或低频不稳定振荡来改变由功率放大器经历的负载的阻抗，所述功率放大器经历的负载至少包括等离子体的阻抗。

6. 发明申请

WO2022173626A1 SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS 审中-公开
公开(公告)号：WO2022173626A1
公开(公告)日：2022-08-18
申请号：PCT/US2022/014888
申请日：2022-02-02
申请人： ADVANCED ENERGY INDUSTRIES, INC.
发明人： CARTER, Daniel , FAIRBAIRN, Kevin , SHAW, Denis , BROUK, Victor
IPC分类号： H05H1/46 , H01J37/32
摘要： Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber comprising a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheaths proximate to the bias electrodes.

7. 发明申请

WO2015010001A1 SYSTEMS, METHODS, AND APPARATUS FOR MINIMIZING CROSS COUPLED WAFER SURFACE POTENTIALS 审中-公开
标题翻译：用于最小化交叉耦合波表面势的系统，方法和装置
公开(公告)号：WO2015010001A1
公开(公告)日：2015-01-22
申请号：PCT/US2014/047162
申请日：2014-07-18
申请人： ADVANCED ENERGY INDUSTRIES, INC.
发明人： HOFFMAN, Daniel, J. , BROUK, Victor
IPC分类号： H03H7/00 , G01S3/02 , H05H7/18
CPC分类号： H01J37/32082 , H01J37/32174 , H01J37/32706
摘要： This disclosure describes systems, methods, and apparatus for reducing a DC bias on a substrate surface in a plasma processing chamber due to cross coupling of RF power to an electrode coupled to the substrate. This is brought about via tuning of a resonant circuit coupled between the substrate and ground based on indirect measurements of harmonics of the RF field level at a surface of the substrate. The resulting reduction in DC bias allows a lower ion energy than possible without this resonant circuit and tuning thereof.
摘要翻译：本公开描述了由于RF功率与耦合到衬底的电极的交叉耦合而减小等离子体处理室中的衬底表面上的DC偏压的系统，方法和装置。这是通过基于在衬底表面处的RF场电平的谐波的间接测量来调谐耦合在衬底和接地之间的谐振电路而实现的。由此导致的DC偏压的减小允许比没有该谐振电路和调谐更低的离子能量。

8. 发明申请

WO2019148010A1 IMPEDANCE MATCHING SYSTEM AND METHOD OF OPERATING THE SAME 审中-公开
公开(公告)号：WO2019148010A1
公开(公告)日：2019-08-01
申请号：PCT/US2019/015256
申请日：2019-01-25
申请人： ADVANCED ENERGY INDUSTRIES, INC.
发明人： CARTER, Daniel , BROUK, Victor
IPC分类号： H01J37/32
CPC分类号： H01J37/32183 , H01J37/32091 , H01J37/32146 , H01J37/32192 , H01J2237/3321 , H03H11/28
摘要： An impedance matching system includes an impedance matching network coupled between an alternating current (AC) generator and electrodes of a plasma chamber. The AC generator generates a multi-level pulse signal of cyclically recurring pulse intervals with differing amplitude levels. A controller identifies each recurring pulse interval, and for each pulse interval, determines an impedance mis-match level between the AC generator and the electrodes, adjusts a configuration of the impedance matching network according to the determined impedance mis-match level, and stores information associated with the adjusted configuration. When an ensuing pulse interval occurs, the controller obtains the stored information from memory, adjusts the configuration of the impedance matching network according to the stored information, determines another impedance mis-match level between the AC generator and the electrodes, and adjusts the configuration of the impedance matching network to iteratively reduce the impedance mismatch level.

9. 发明申请

WO2014035894A1 SYSTEMS AND METHODS FOR CALIBRATING A SWITCHED MODE ION ENERGY DISTRIBUTION SYSTEM 审中-公开
标题翻译：用于校准切换模式离子能量分配系统的系统和方法
公开(公告)号：WO2014035894A1
公开(公告)日：2014-03-06
申请号：PCT/US2013/056647
申请日：2013-08-26
申请人： ADVANCED ENERGY INDUSTRIES, INC.
发明人： HOFFMAN, Daniel J. , CARTER, Daniel , BROUK, Victor
IPC分类号： H01L21/02
CPC分类号： H05H1/46 , C23C14/345 , H01J37/32082 , H01J37/32422 , H01J37/32706 , H01J37/32926 , H01J37/32935 , H01J37/3299 , H05H1/0081
摘要： Systems, methods and apparatus for regulating ion energies and ion energy distributions along with calibrating a bias source and a plasma processing chamber are disclosed. An exemplary method includes applying a periodic voltage function to a load emulator, which emulates electrical characteristics of a plasma load and associated electronics such as an e-chuck. The load emulator can be measured for various electrical parameters and compared to expected parameters generated by the bias source. Differences between measured and expected values can be used to identify and correct faults and abnormalities in the bias supply, the chamber, or a power source used to ignite and sustain the plasma. Once the bias supply is calibrated, the chamber can be calibrated by measuring and calculating an effective capacitance comprising a series and parallel capacitance of the substrate support and optionally the substrate.
摘要翻译：公开了用于调节离子能量和离子能量分布以及校准偏压源和等离子体处理室的系统，方法和装置。一种示例性方法包括将周期性电压函数应用于负载仿真器，负载仿真器模拟等离子体负载的电特性和相关联的电子设备例如电动卡盘。可以测量负载仿真器的各种电气参数，并与偏置源产生的预期参数进行比较。测量值和预期值之间的差异可用于识别和纠正偏置电源，腔室或用于点燃和维持等离子体的电源的故障和异常。一旦偏置电源被校准，可以通过测量和计算包括衬底支撑件和任选的衬底的串联和并联电容的有效电容来校准腔室。

10. 发明申请

WO2014035889A1 SYSTEMS AND METHODS FOR MONITORING FAULTS, ANOMALIES, AND OTHER CHARACTERISTICS OF A SWITCHED MODE ION ENERGY DISTRIBUTION SYSTEM 审中-公开
标题翻译：用于监控开关模式离子能量分配系统的故障，异常和其他特性的系统和方法
公开(公告)号：WO2014035889A1
公开(公告)日：2014-03-06
申请号：PCT/US2013/056634
申请日：2013-08-26
申请人： ADVANCED ENERGY INDUSTRIES, INC.
发明人： CARTER, Daniel , BROUK, Victor , HOFFMAN, Daniel, J.
IPC分类号： H01L21/66
CPC分类号： H01J37/08 , G01N27/06 , H01J37/32944 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.
摘要翻译：公开了用于调节等离子体室中的离子能并将衬底夹持到衬底支撑件的系统，方法和装置。一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压函数（或修改的周期性电压函数），并且对衬底进行调制周期性电压功能的多个周期，周期性电压函数响应于衬底表面处的离子能量的限定分布，以便以时间平均的方式实现定义的离子能量分布。

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