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1. 发明申请

WO2010126893A2 METHOD AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION 审中-公开
标题翻译：用于控制离子能量分布的方法和装置
公开(公告)号：WO2010126893A2
公开(公告)日：2010-11-04
申请号：PCT/US2010/032582
申请日：2010-04-27
申请人： ADVANCED ENERGY INDUSTRIES, INC. , HECKMAN, Randy , BROUK, Victor
发明人： HECKMAN, Randy , BROUK, Victor
CPC分类号： H01J37/32045 , C23C14/54 , H01J37/32009 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary system includes an ion-energy control portion, and the ion- energy control portion provides at least one ion-energy control signal responsive to at least one ion-energy setting that is indicative of a desired distribution of energies of ions bombarding a surface of a substrate. A controller is coupled to the switch-mode power supply, and the controller provides at least two drive-control signals. In addition, a switch-mode power supply is coupled to the substrate support, the ion-energy control portion and the controller. The switch-mode power supply includes switching components configured to apply power to the substrate responsive to the drive signals and the ion-energy control signal so as to effectuate the desired distribution of the energies of ions bombarding the surface of the substrate.
摘要翻译：公开了用于调节等离子体室中的离子能量的系统，方法和装置。示例性系统包括离子能量控制部分，并且离子能量控制部分响应于至少一个离子能量设定提供至少一个离子能量控制信号，该至少一个离子能量设定指示轰击表面的离子的所需能量分布的基底。控制器耦合到开关模式电源，并且控制器提供至少两个驱动控制信号。此外，开关模式电源耦合到衬底支撑件，离子能量控制部分和控制器。开关电源包括响应于驱动信号和离子能量控制信号而被配置为向基板施加功率的开关部件，以实现轰击基板表面的离子的能量的期望分布。

2. 发明申请

WO2009146003A1 PREDICTIVE DIAGNOSTICS SYSTEM, APPARATUS AND METHOD FOR IMPROVED RELIABILITY 审中-公开
标题翻译：预测诊断系统，改进的可靠性的装置和方法
公开(公告)号：WO2009146003A1
公开(公告)日：2009-12-03
申请号：PCT/US2009/038641
申请日：2009-03-27
申请人： ADVANCED ENERGY INDUSTRIES, INC , HECKMAN, Randy, L. , CARTER, Daniel, C. , BROUK, Victor, L.
发明人： HECKMAN, Randy, L. , CARTER, Daniel, C. , BROUK, Victor, L.
IPC分类号： H05H1/36 , H01L21/00
CPC分类号： G06F11/008 , G05B23/0283 , G05B2219/32234 , G05B2219/37252 , G05B2219/45031
摘要： A system for managing a processing system and/or a processing system component is described. The system may include a wear-out module configured to provide a wear-out signal, the wear-out signal indicating a remaining amount of useful life of the component; a health module configured to provide a health signal, the health signal indicating an extent to which operational and environmental factors affect a failure rate of the component during a useful life of the component; and a mission module configured to provide a mission signal, the mission signal indicative of whether an operating condition is approaching a threshold that would adversely affect the system's ability to meet at least one performance objective.
摘要翻译：描述了一种用于管理处理系统和/或处理系统组件的系统。该系统可以包括被配置为提供磨损信号的磨损模块，所述磨损信号指示所述部件的剩余使用寿命量; 健康模块被配置为提供健康信号，健康信号指示在组件的使用寿命期间操作和环境因素影响组件的故障率的程度; 以及任务模块，被配置为提供任务信号，所述任务信号指示操作条件是否接近将对系统满足至少一个性能目标的能力产生不利影响的阈值。

3. 发明申请

WO1993019571A1 SYSTEM FOR CHARACTERIZING AC PROPERTIES OF A PROCESSING PLASMA 审中-公开
标题翻译：用于表征加工等离子体的AC特性的系统
公开(公告)号：WO1993019571A1
公开(公告)日：1993-09-30
申请号：PCT/US1993002444
申请日：1993-03-18
申请人： ADVANCED ENERGY INDUSTRIES, INC. , HECKMAN, Randy, L.
发明人： ADVANCED ENERGY INDUSTRIES, INC.
IPC分类号： H05H01/00
CPC分类号： H01J37/32935 , H01J37/32082 , H01J37/32963 , H01J37/3299 , H01J2237/334 , H05H1/0081
摘要： Probe (5) to be inserted in-line in an AC plasma processing system (3) allows accurate, real time determination of plasma parameters such as power and complex impedance over a broad dynamic range. Any need to know power output from a source is avoided and signals are selected to optimize accuracy such that only two alternating signals need be sensed for many applications. Signals are selected such that magnitudes of simple alternating signals can be easily measured as scalar values in a fashion that affords the use of these values to completely characterize the power actually delivered to the processing plasma (2) and its complex impedance in real time. Plasma characterization can be limited to only specific frequencies for more accurate determination. Microstrip directional couplers are used to sense signals from the power transmission. These signals are then utilized to derive simple alternating signals representative of power or voltage. Three or more scalar values representative of the magnitude of the alternating signals and their combination serve as the variable inputs to determine complex reflection coefficient or impedance using known formulas. Use of a sign bit detector or assumptions with respect to the processing plasma (2) is disclosed for complete characterization of the plasma in an efficient manner.
摘要翻译：在AC等离子体处理系统（3）中嵌入式的探针（5）允许在宽动态范围内精确，实时地确定诸如功率和复阻抗的等离子体参数。避免从源中知道功率输出的任何需要，并且选择信号以优化精度，使得对于许多应用仅需要感测到两个交替信号。选择信号使得简单交替信号的大小可以以提供使用这些值的方式容易地作为标量值来测量，从而完全表征实际传送到处理等离子体（2）的功率及其复阻抗。等离子体表征可以仅限于特定频率以进行更准确的测定。微带方向耦合器用于感测来自电力传输的信号。然后利用这些信号来导出代表功率或电压的简单交替信号。代表交变信号的幅度的三个或更多个标量值及其组合用作可变输入，以使用已知公式确定复反射系数或阻抗。公开了使用符号位检测器或相对于处理等离子体（2）的假设，用于以有效的方式完整地表征等离子体。

4. 发明申请

WO2012030500A1 SYSTEM, METHOD AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION 审中-公开
标题翻译：用于控制离子能量分布的系统，方法和装置
公开(公告)号：WO2012030500A1
公开(公告)日：2012-03-08
申请号：PCT/US2011/047467
申请日：2011-08-11
申请人： ADVANCED ENERGY INDUSTRIES, INC. , BROUK, Victor , HECKMAN, Randy , HOFFMAN, Daniel, J.
发明人： BROUK, Victor , HECKMAN, Randy , HOFFMAN, Daniel, J.
IPC分类号： H05H1/36 , C23C16/52 , H01L21/3065 , C23C14/54 , C23F1/08
CPC分类号： H01J37/24 , C23C14/345 , C23C16/50 , H01J37/32009 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.
摘要翻译：公开了用于调节等离子体室中的离子能量的系统，方法和装置。一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压功能，并且在周期性电压函数的多个周期内进行调制，所述周期性电压功能响应于所述衬底表面处的离子能量的期望分布，以便以时间平均的方式实现所需的离子能量分布。

5. 发明申请

WO2010126893A3 METHOD AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION 审中-公开
标题翻译：用于控制离子能量分布的方法和装置
公开(公告)号：WO2010126893A3
公开(公告)日：2011-04-21
申请号：PCT/US2010032582
申请日：2010-04-27
申请人： ADVANCED ENERGY IND INC , HECKMAN RANDY , BROUK VICTOR
发明人： HECKMAN RANDY , BROUK VICTOR
IPC分类号： H01L21/3065 , C23C16/52 , H01L21/205 , H05H1/00
CPC分类号： H01J37/32045 , C23C14/54 , H01J37/32009 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary system includes an ion-energy control portion, and the ion- energy control portion provides at least one ion-energy control signal responsive to at least one ion-energy setting that is indicative of a desired distribution of energies of ions bombarding a surface of a substrate. A controller is coupled to the switch-mode power supply, and the controller provides at least two drive-control signals. In addition, a switch-mode power supply is coupled to the substrate support, the ion-energy control portion and the controller. The switch-mode power supply includes switching components configured to apply power to the substrate responsive to the drive signals and the ion-energy control signal so as to effectuate the desired distribution of the energies of ions bombarding the surface of the substrate.
摘要翻译：公开了用于调节等离子体室中的离子能量的系统，方法和装置。示例性系统包括离子能量控制部分，并且离子能量控制部分响应于至少一个离子能量设定提供至少一个离子能量控制信号，该至少一个离子能量设定指示轰击表面的离子的所需能量分布的基底。控制器耦合到开关模式电源，并且控制器提供至少两个驱动控制信号。此外，开关模式电源耦合到衬底支撑件，离子能量控制部分和控制器。开关电源包括响应于驱动信号和离子能量控制信号而被配置为向基板施加功率的开关部件，以实现轰击基板表面的离子的能量的期望分布。

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