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1. 发明申请

WO2006114369A3 MEANS FOR TRANSFERRING A PATTERN TO AN OBJECT 审中-公开
公开(公告)号：WO2006114369A3
公开(公告)日：2006-11-02
申请号：PCT/EP2006/061571
申请日：2006-04-13
申请人： OBDUCAT AB , BECK, Marc
发明人： BECK, Marc
IPC分类号： G03F7/20 , G03F7/00
摘要： A template (10) having a first surface (13, 14), usable for transferring a pattern of the first surface to an object (20) having a second surface (23) covered by a light-sensitive coating (22), by contacting the patterned first surface with the coating, wherein the template comprises a carrier base (11) of e.g. nickel, and a waveguide (14) is disposed on the carrier base at the first surface. The waveguide is devised to lead light therein, introduced at a radiation input, and to leak evanescent waves to portions (24) of the coating corresponding to said pattern. The template may also be devised with an opaque shield (15), disposed at the first surface over selected portions of the waveguide, which serves to define where the evanescent waves can leak to the coating. The invention also relates to a method and an apparatus for using the template, and a method for manufacturing it.

2. 发明申请

WO2005109095A2 METHOD FOR IMPRINT LITHOGRAPHY AT CONSTANT TEMPERATURE 审中-公开
标题翻译：用于在恒定温度下绘制平版印刷的方法
公开(公告)号：WO2005109095A2
公开(公告)日：2005-11-17
申请号：PCT/EP2004/053106
申请日：2004-11-25
申请人： OBDUCAT AB , BECK, Marc , HEIDARI, Babak , BOLMSJÖ, Erik , THEANDER, Erik
发明人： BECK, Marc , HEIDARI, Babak , BOLMSJÖ, Erik , THEANDER, Erik
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B29C35/0888 , B29C43/003 , B29C43/021 , B29C43/10 , B29C59/022 , B29C2035/0827 , B29C2043/025 , B29C2043/3647 , B29C2059/023 , B82Y10/00 , B82Y40/00
摘要： Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature T p by means of a heater device (20); and while maintaining said temperature T p , performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and - postbaking the layer.
摘要翻译：用于将图案从具有结构化表面（11）的模板（10）转移到承载设计为5的材料的表面层（14）的基底（12）的方法，其在暴露于辐射时固化，包括：布置所述模板和基底在压印装置中相互平行，所述结构化表面面向所述表面层; 通过加热器装置（20）将模板和衬底加热至温度Tp; 并且在保持所述温度Tp的同时，执行以下步骤：将模板压向基板以将所述图案压印到所述层中; 将所述层暴露于辐射（19）以固化该层，以及 - 对该层进行后烘烤。

3. 发明申请

WO2005054948A2 DEVICE AND METHOD FOR LARGE AREA LITHOGRAPHY 审中-公开
标题翻译：用于大面积地平线的装置和方法
公开(公告)号：WO2005054948A2
公开(公告)日：2005-06-16
申请号：PCT/EP2004/052769
申请日：2004-11-03
申请人： OBDUCAT AB , HEIDARI, Babak , BECK, Marc
发明人： HEIDARI, Babak , BECK, Marc
IPC分类号： G03F
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/2012 , H05K3/0014 , H05K3/0023 , H05K3/107 , H05K2201/0108 , H05K2203/0108
摘要： Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104;105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114; 116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template.
摘要翻译：用于将图案从具有结构化表面的模板（10）传送到承载可辐射聚合流体（14）的表面层的基底（12）的装置和方法。该设备包括具有相对表面（104; 105）的第一主要部分（101）和第二主要部分（102），用于调节所述主要部分之间的间距（115），用于支撑所述模板的支撑装置（106）在与所述结构化表面相对于所述表面层的所述间隔中相互平行接合的衬底，设计成将辐射发射到所述间隔中的辐射源（110）。空腔（115）具有第一壁，该第一壁包括被设计为接合所述模板或基底的柔性膜（113），并且提供装置（114; 116），用于将可调节的超压施加到存在于所述空腔中的介质，由此均匀分布在基板和模板之间的整个接触表面上获得力。

4. 发明申请

WO2004000567A1 MOLD TOOL METHOD OF MANUFACTURING A MOLD TOOL AND STORAGE MEDIUM FORMED BY USE OF THE MOLD TOOL 审中-公开
标题翻译：模具工具的制造方法和使用模具工具形成的模具和存储介质
公开(公告)号：WO2004000567A1
公开(公告)日：2003-12-31
申请号：PCT/SE2003/001004
申请日：2003-06-16
申请人： OBDUCAT AB , LING, Torbjörn , MONTELIUS, Lars , KEIL, Matthias , BECK, Marc
发明人： LING, Torbjörn , MONTELIUS, Lars , KEIL, Matthias , BECK, Marc
IPC分类号： B41M1/06
CPC分类号： B29C33/56 , B29C33/424 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G11B5/855
摘要： Method for manufacturing a mold tool (1), devised for forming a structured nanoscale pattern on an object (24) and having a layer (16) which is anti-adhesive with regard to the object (24). A stamp blank (2) is provided with a structured pattern (4) on a surface (8). The patterned surface (8) is coated with a layer (6)of a metal, which has a stable oxidation number and can form a mechanically stable oxide film. The metal layer (6) is oxidized for forming of an oxide film (10). The oxide film (10) is exposed to a reagent comprising molecule chains (18), each of which has a linkage group (20) which bonds to the oxide film (10) by chemical bonding, wherein the molecule chains (18) either at the outset comprise at least a group (22) comprising fluorine, or in a subsequent step is provided with at least one such group (22).
摘要翻译：一种用于制造模具（1）的方法，其用于在物体（24）上形成结构化的纳米级图案，并且具有关于所述物体（24）是防粘合的层（16）。印模坯料（2）在表面（8）上设置有结构图案（4）。图案化表面（8）涂覆有金属层（6），其具有稳定的氧化数，并且可以形成机械稳定的氧化物膜。金属层（6）被氧化以形成氧化膜（10）。氧化膜（10）暴露于包含分子链（18）的试剂，每个分子链具有通过化学键合与氧化膜（10）键合的连接基团（20），其中分子链（18）一开始包括至少一个包含氟的基团（22），或者在随后的步骤中设置有至少一个这样的基团（22）。

5. 发明申请

WO2005119360A1 MODIFIED METAL MOLD FOR USE IN IMPRINTING PROCESSES 审中-公开
标题翻译：改进的金属模具用于加工工艺
公开(公告)号：WO2005119360A1
公开(公告)日：2005-12-15
申请号：PCT/EP2005/052423
申请日：2005-05-27
申请人： OBDUCAT AB , KEIL, Matthias , FRENNESSON, Göran , BECK, Marc , HEIDARI, Babak
发明人： KEIL, Matthias , FRENNESSON, Göran , BECK, Marc , HEIDARI, Babak
IPC分类号： G03F7/00
CPC分类号： B05D1/60 , B05D1/185 , B29C33/56 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , Y10T428/31678
摘要： The invention relates to a novel metal mold having anti-adhesive properties comprising a base metal mold and an anti-adhesive layer comprising a fluorinated alkyl phosphoric acid derivative or a fluorinated alkyl poly-phosphoric acid derivative, including a phosphorous atom and an alkyl chain. The anti-adhesive layer is bonded directly onto a surface of the base metal mold. The base metal mold may be e.g. Nickel, and said fluorinated alkyl phosphoric acid derivative or said fluorinated alkyl poly-phosphoric acid derivative may be selected from the group consisting of phosphonic acids, phosphinic acids, phosphonates and phosphonate salts, phosphinates and phosphinate salts, or their respective oligomers, such that the phosphorous atom is coupled directly to the alkyl chain, such that the phosphorous atom is coupled directly to the alkyl chain.
摘要翻译：本发明涉及一种具有抗粘性的新型金属模具，其特征在于包括贱金属模和包含磷原子和烷基链的氟化烷基磷酸衍生物或氟化烷基聚磷酸衍生物的防粘层。抗粘剂层直接粘结在母模金属模的表面上。贱金属模可以是例如。镍和所述氟化烷基磷酸衍生物或所述氟化烷基聚磷酸衍生物可以选自膦酸，次膦酸，膦酸盐和膦酸盐，次膦酸盐和次膦酸盐或它们各自的低聚物，使得磷原子直接与烷基链结合，使得磷原子直接与烷基链结合。

6. 发明申请

WO2006131153A1 PATTERN REPLICATION WITH INTERMEDIATE STAMP 审中-公开
标题翻译：图案复印与中间印章
公开(公告)号：WO2006131153A1
公开(公告)日：2006-12-14
申请号：PCT/EP2005/055729
申请日：2005-11-03
申请人： OBDUCAT AB , HEIDARI, Babak , LÖFSTRAND, Anette , BOLMSJÖ, Erik , THEANDER, Erik , BECK, Marc
发明人： HEIDARI, Babak , LÖFSTRAND, Anette , BOLMSJÖ, Erik , THEANDER, Erik , BECK, Marc
IPC分类号： G03F7/00 , B29C39/26
CPC分类号： B29C33/3857 , B29C35/0888 , B29C59/022 , B29C59/026 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The invention relates to a two-step process for transferring a pattern from a template (1) to a target surface of a substrate, by creating an intermediate flexible polymer stamp (5) from the template in a primary step, and then using the polymer stamp to make an imprint in a radiation-sensitive moldable layer on the target surface in a secondary step. In the secondary step, the process steps of pressing the polymer stamp and the substrate against each other, UV exposure of the moldable layer through the polymer stamp, and postbaking of the radiated moldable layer, are all performed at a control constant temperature, in order to eliminate damages to the pattern created in the moldable layer caused by thermal expansion effects.
摘要翻译：本发明涉及通过在初级步骤中从模板中生成中间柔性聚合物印模（5），然后使用聚合物（2），将图案从模板（1）转移到基材的目标表面的两步法在第二步骤中对目标表面上的辐射敏感的可成型层进行压印。在第二步骤中，将聚合物印模和基板彼此挤压，通过聚合物印模的可模制层的UV曝光和辐射的可模塑层的后烘烤的工艺步骤全部按照控制恒温进行以消除由热膨胀效应引起的在可模塑层中产生的图案的损坏。

7. 发明申请

WO2006114369A2 MEANS FOR TRANSFERRING A PATTERN TO AN OBJECT 审中-公开
标题翻译：将图案传送到对象的手段
公开(公告)号：WO2006114369A2
公开(公告)日：2006-11-02
申请号：PCT/EP2006061571
申请日：2006-04-13
申请人： OBDUCAT AB , BECK MARC
发明人： BECK MARC
IPC分类号： G03F7/00 , G03F1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F1/50 , G03F7/2014
摘要： A template (10) having a first surface (13, 14), usable for transferring a pattern of the first surface to an object (20) having a second surface (23) covered by a light-sensitive coating (22), by contacting the patterned first surface with the coating, wherein the template comprises a carrier base (11) of e.g. nickel, and a waveguide (14) is disposed on the carrier base at the first surface. The waveguide is devised to lead light therein, introduced at a radiation input, and to leak evanescent waves to portions (24) of the coating corresponding to said pattern. The template may also be devised with an opaque shield (15), disposed at the first surface over selected portions of the waveguide, which serves to define where the evanescent waves can leak to the coating. The invention also relates to a method and an apparatus for using the template, and a method for manufacturing it.
摘要翻译：具有第一表面（13,14）的模板（10,14），其可用于将第一表面的图案转印到具有被感光涂层（22）覆盖的第二表面（23）的物体（20）上，通过接触所述图案化的第一表面具有所述涂层，其中所述模板包括载体基底（11）镍，并且波导（14）在第一表面处设置在载体基座上。波导被设计成在其中引入光，在辐射输入处引入，并且将ev逝波泄漏到对应于所述图案的涂层的部分（24）。模板也可以用不透明屏蔽（15）设计，该屏蔽层设置在波导的选定部分上的第一表面处，其用于限定ev逝波可以泄漏到涂层的位置。本发明还涉及一种使用该模板的方法和装置及其制造方法。

8. 发明申请

WO2005109095A3 METHOD FOR IMPRINT LITHOGRAPHY AT CONSTANT TEMPERATURE 审中-公开
标题翻译：用于在恒定温度下绘制平版印刷的方法
公开(公告)号：WO2005109095A3
公开(公告)日：2006-08-10
申请号：PCT/EP2004053106
申请日：2004-11-25
申请人： OBDUCAT AB , BECK MARC , HEIDARI BABAK , BOLMSJOE ERIK , THEANDER ERIK
发明人： BECK MARC , HEIDARI BABAK , BOLMSJOE ERIK , THEANDER ERIK
IPC分类号： G03F7/00 , B29C43/02 , B29C43/10 , B81C99/00 , G03F1/00 , G03F7/20 , H01L21/00
CPC分类号： G03F7/0002 , B29C35/0888 , B29C43/003 , B29C43/021 , B29C43/10 , B29C59/022 , B29C2035/0827 , B29C2043/025 , B29C2043/3647 , B29C2059/023 , B82Y10/00 , B82Y40/00
摘要： Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature T p by means of a heater device (20); and while maintaining said temperature T p , performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and - postbaking the layer.
摘要翻译：用于将图案从具有结构化表面（11）的模板（10）转移到承载设计为5的材料的表面层（14）的基底（12）的方法，其在暴露于辐射时固化，包括：布置所述模板和基底在压印装置中相互平行，所述结构化表面面向所述表面层; 通过加热器装置（20）将模板和衬底加热到温度T 。并且在保持所述温度的同时，执行以下步骤：将模板压向衬底以将所述图案压印到所述层中; 将所述层暴露于辐射（19）以固化该层，以及 - 对该层进行后烘烤。

9. 发明申请

WO2005040932A3 APPARATUS AND METHOD FOR ALIGNING SURFACES 审中-公开
公开(公告)号：WO2005040932A3
公开(公告)日：2005-05-06
申请号：PCT/EP2004/052656
申请日：2004-10-25
申请人： OBDUCAT AB , MONTELIUS, Lars , BECK, Marc , CARLBERG, Patrick , WAHLSTRÖM, Claes-Göran , PERSSON, Anders , ANDERSSON-ENGELS, Stefan
发明人： MONTELIUS, Lars , BECK, Marc , CARLBERG, Patrick , WAHLSTRÖM, Claes-Göran , PERSSON, Anders , ANDERSSON-ENGELS, Stefan
IPC分类号： G03F9/00
摘要： Method, apparatus and stamp for aligning a first surface (11) of a first object (10) with a second surface (22) of a second object (20), facing said first surface, wherein light of a predetermined wavelength is introduced into one (10) of said objects and caused to propagate by internal reflection therein. The first and second surfaces carry correlating structures (13,25) which, when arranged at close distance from each other, couple light from said one object to the other of said objects by near-field tunnelling, to a degree dependent on the overlap of said structures. A light detector (26) is devised to detect a signal which is dependent on the amount of light coupled between said objects, for producing an alignment control signal. The invention is suitable for use in nanoimprint lithography.

10. 发明申请

WO2005054948A3 DEVICE AND METHOD FOR LARGE AREA LITHOGRAPHY 审中-公开
标题翻译：用于大面积地平线的装置和方法
公开(公告)号：WO2005054948A3
公开(公告)日：2006-04-13
申请号：PCT/EP2004052769
申请日：2004-11-03
申请人： OBDUCAT AB , HEIDARI BABAK , BECK MARC
发明人： HEIDARI BABAK , BECK MARC
IPC分类号： G03F7/00 , G03F7/20 , H05K3/00 , H05K3/10
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/2012 , H05K3/0014 , H05K3/0023 , H05K3/107 , H05K2201/0108 , H05K2203/0108
摘要： Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104;105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114; 116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template.
摘要翻译：用于将图案从具有结构化表面的模板（10）传送到承载可辐射聚合流体（14）的表面层的基底（12）的装置和方法。该设备包括具有相对表面（104; 105）的第一主要部分（101）和第二主要部分（102），用于调节所述主要部分之间的间距（115），用于支撑所述模板的支撑装置（106）在与所述结构化表面相对于所述表面层的所述间隔中相互平行接合的衬底，设计成将辐射发射到所述间隔中的辐射源（110）。空腔（115）具有第一壁，该第一壁包括被设计为接合所述模板或基底的柔性膜（113），并且提供装置（114; 116），用于将可调节的超压施加到存在于所述空腔中的介质，由此均匀分布在基板和模板之间的整个接触表面上获得力。

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