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    • 51. 发明申请
    • GAS CONTROL IN A REACTOR
    • 反应器中的气体控制
    • WO2005121307A9
    • 2006-04-27
    • PCT/US2005019969
    • 2005-06-07
    • BIOPROCESSOR CORPRODGERS SETH TRUSSO A PETERJOHNSON TIMOTHY JLEBLANC SEAN J
    • RODGERS SETH TRUSSO A PETERJOHNSON TIMOTHY JLEBLANC SEAN J
    • B01J19/00B01L3/00C12M20060101C12M
    • B01J19/0093B01J2219/00837B01J2219/00862B01J2219/00869B01J2219/00907B01J2219/00952B01J2219/00963B01J2219/0097B01L3/5025B01L3/502715B01L3/502746B01L2200/027B01L2200/0668B01L2200/0684B01L2300/0816B01L2300/0825B01L2300/0877B01L2300/0887B01L2300/10B01L2400/0457B01L2400/0688B01L2400/086
    • Chemical, biological, and/or biochemical reaction systems, including chips or reactors, may be configured so as to restrain immiscible materials such as gas bubbles from interfering with the determination of environmental factors associated with the chip according to one aspect of the invention. In another aspect, a chip or other reaction system may be configured to maintain a gas headspace in the chip or other reaction system. In certain embodiments, impediments such as physical barriers may be used to contain gas bubbles within a gas containing region, or otherwise away from a detection region. In other embodiments, surface tension properties may be used to control the location of gas bubbles. The chip or other reaction systems may include reaction site containers that can be very small, for example, having a volume of less than about 2 ml. In certain embodiments, chips or other reaction systems of the invention include one or more reaction sites, which, in some cases, may be defined by reaction site containers. According to another aspect of the invention, a reaction site container may be shaped to limit the formation of gas bubbles during the filling of the reaction site container with liquid by providing reaction site container shapes that do not include sharp angles or abrupt changes in reaction site container width.
    • 包括芯片或反应器的化学,生物和/或生物化学反应系统可以被配置为根据本发明的一个方面来抑制诸如气泡的不混溶材料干扰与芯片相关联的环境因素的确定。 在另一方面,芯片或其它反应系统可以被配置为在芯片或其他反应系统中保持气体顶部空间。 在某些实施方案中,阻挡物例如物理屏障可以用于在含气体区域内或以其他方式远离检测区域容纳气泡。 在其它实施例中,可以使用表面张力特性来控制气泡的位置。 芯片或其他反应系统可以包括可以非常小的反应位点容器,例如具有小于约2ml的体积。 在某些实施方案中,本发明的芯片或其它反应体系包括一个或多个反应位点,在某些情况下,反应位点可以由反应位点容器限定。 根据本发明的另一方面,反应部位容器可以成形为通过提供不包括尖锐角度的反应部位容器形状或反应部位的突然变化来限制在用液体填充反应部位容器期间产生气泡的形成 容器宽度。