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21. 发明申请

WO2015086602A1 SUBSTRATE SPREADING DEVICE FOR VACUUM PROCESSING APPARATUS, VACUUM PROCESSING APPARATUS WITH SUBSTRATE SPREADING DEVICE AND METHOD FOR OPERATING SAME 审中-公开
标题翻译：用于真空加工装置的基板传送装置，具有基板扩展装置的真空处理装置及其操作方法
公开(公告)号：WO2015086602A1
公开(公告)日：2015-06-18
申请号：PCT/EP2014/077062
申请日：2014-12-09
申请人： APPLIED MATERIALS, INC. , RIES, Florian , SAUER, Andreas , HEIN, Stefan
发明人： RIES, Florian , SAUER, Andreas , HEIN, Stefan
IPC分类号： C23C14/56 , C23C16/54 , C23C16/46 , C23C16/48 , H01J37/32 , C23C14/50 , C23C16/458
CPC分类号： B05C9/08 , B05C1/0826 , B05C1/12 , B05C9/14 , B05C13/00 , B05C15/00 , B05D3/12 , B65G23/34 , C23C14/50 , C23C14/562 , C23C16/0209 , C23C16/458 , C23C16/46 , C23C16/481 , C23C16/545 , G11B5/85 , H01J37/3277
摘要： A processing apparatus for processing a flexible substrate, particularly a vacuum processing apparatus for processing a flexible substrate, is described. The processing apparatus includes a vacuum chamber; a processing drum within the vacuum chamber, wherein the processing drum is configured to rotate around an axis extending in a first direction; and a heating device adjacent to the processing drum, wherein the heating device is configured for spreading the substrate in the first direction or for maintaining a spread of the substrate in the first direction, and wherein the heating device has a dimension in a direction parallel to a substrate transport direction of at least 20 mm.
摘要翻译：描述了用于处理柔性基板的处理装置，特别是用于处理柔性基板的真空处理装置。处理装置包括真空室; 所述真空室内的处理滚筒，其中所述处理滚筒被构造成围绕沿第一方向延伸的轴线旋转; 以及与所述处理鼓相邻的加热装置，其中所述加热装置被配置为沿所述第一方向铺展所述基板或者用于在所述第一方向上保持所述基板的扩展，并且其中所述加热装置具有与所述加工装置的方向平行的方向的尺寸基板输送方向为至少20mm。

22. 发明申请

WO2018184690A1 SUPPLY LINE GUIDE FOR A VACUUM PROCESSING SYSTEM 审中-公开
公开(公告)号：WO2018184690A1
公开(公告)日：2018-10-11
申请号：PCT/EP2017/058373
申请日：2017-04-07
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , SAUER, Andreas
发明人： BRÜNING, Andre , SAUER, Andreas
IPC分类号： B01J3/02 , C23C14/56
摘要： A supply line guide (100) for guiding a plurality of supply lines in a vacuum chamber of a processing system is described. The supply line guide includes a guiding arrangement (110) including a plurality of connected elements (115), wherein the connected elements (115) are angle-adjustable relative to each other. Further, the supply line guide includes a flexible tube (120) provided around the guiding arrangement (110).

23. 发明申请

WO2017198296A1 APPARATUS FOR CONTINUOUS PROCESSING OF A FLEXIBLE SUBSTRATE IN A VACUUM AND METHOD THEREFOR 审中-公开
标题翻译：用于在真空中连续处理柔性基板的装置及其方法
公开(公告)号：WO2017198296A1
公开(公告)日：2017-11-23
申请号：PCT/EP2016/061136
申请日：2016-05-18
申请人： APPLIED MATERIALS, INC. , SAUER, Andreas , GERBER, Gunther , HEIN, Stefan , DEMUTH, Rainer
发明人： SAUER, Andreas , GERBER, Gunther , HEIN, Stefan , DEMUTH, Rainer
IPC分类号： B41F31/02 , B41F33/00 , B05C1/08
CPC分类号： B41F33/00 , B05B1/083 , B05C1/0813 , B05C1/0878 , B41F31/027
摘要： An apparatus (100) for continuous processing of a flexible substrate in a vacuum is provided. The apparatus includes a processing roller (110); a doctor blade assembly (120) having a doctor blade (121) extending in an axial direction of the processing roller (110); and a force transmission assembly (130) configured for moving the doctor blade assembly (120) towards a surface (111) of the processing roller (110). The force transmission assembly (130) includes a pressure unit (131) for applying a force on the doctor blade assembly (120) and a counter-pressure unit (132) for applying a counter-force on the doctor blade assembly (120).
摘要翻译：提供了一种用于在真空中连续处理柔性衬底的设备（100）。该设备包括处理辊（110）; 具有在所述处理辊（110）的轴向上延伸的刮刀（121）的刮刀组件（120）; 以及力传递组件（130），所述力传递组件（130）构造成用于朝向所述处理辊（110）的表面（111）移动所述刮刀组件（120）。力传递组件（130）包括用于在刮片组件（120）上施加力的压力单元（131）和用于在刮片组件（120）上施加反作用力的反压单元（132）。

24. 发明申请

WO2017084720A1 CARRIER FOR FLEXIBLE SUBSTRATES 审中-公开
标题翻译：载体用于柔性基板
公开(公告)号：WO2017084720A1
公开(公告)日：2017-05-26
申请号：PCT/EP2015/077249
申请日：2015-11-20
申请人： APPLIED MATERIALS, INC. , HEIN, Stefan , GERBER, Gunther , SAUER, Andreas
发明人： HEIN, Stefan , GERBER, Gunther , SAUER, Andreas
IPC分类号： C23C14/56 , C23C16/54
CPC分类号： C23C14/562 , C23C16/545
摘要： The present disclosure provides an apparatus (100) for supporting a flexible substrate (10) in a vacuum processing chamber. The apparatus (100) includes a coating drum rotatable around a rotational axis (105), wherein the coating drum has a support surface (110) configured for supporting the fiexible substrate (10), wherein the support surface (110) is symmetrical with respect to the rotational axis (105), and wherein a first distance (120) between the rotational axis (105) and a center portion (112) of the support surface (110) in a direction perpendicular to the rotational axis (105) is smaller than a second distance (122) between the rotational axis (105) and a periphery (114, 116) of the support surface (110).
摘要翻译：本公开提供了一种用于在真空处理室中支撑柔性衬底（10）的设备（100）。所述设备（100）包括可围绕旋转轴线（105）旋转的涂布鼓，其中所述涂布鼓具有构造成用于支撑所述柔性基板（10）的支撑表面（110），其中所述支撑表面（110）到旋转轴线（105），并且其中旋转轴线（105）与支撑表面（110）的中心部分（112）之间在垂直于旋转轴线（105）的方向上的第一距离（120）较小比旋转轴线（105）与支撑表面（110）的周边（114,116）之间的第二距离（122）

25. 发明申请

WO2015149849A1 VACUUM PROCESSING SYSTEM AND METHOD FOR MOUNTING A PROCESSING SYSTEM 审中-公开
标题翻译：真空加工系统和安装加工系统的方法
公开(公告)号：WO2015149849A1
公开(公告)日：2015-10-08
申请号：PCT/EP2014/056605
申请日：2014-04-02
申请人： APPLIED MATERIALS, INC. , RIES, Florian , HEIN, Stefan , HENRICH, Jürgen , SAUER, Andreas
发明人： RIES, Florian , HEIN, Stefan , HENRICH, Jürgen , SAUER, Andreas
IPC分类号： C23C14/52 , C23C14/56 , C23C16/54
CPC分类号： C23C14/24 , C23C14/52 , C23C14/56 , C23C14/562 , C23C16/54 , C23C16/545
摘要： A vacuum processing system (100) for a flexible substrate (260; 560) is provided. The processing system includes a first chamber (110) adapted for housing one of a supply roll for providing the flexible substrate and a take-up roll for storing the flexible substrate (260; 560); a second chamber (120) adapted for housing one of a supply roll for providing the flexible substrate and a take-up roll for storing the flexible substrate (260; 560); a maintenance zone (130) between the first chamber (110) and the second chamber (120; 220; 420; 520); and a first process chamber (140) for depositing material on the flexible substrate, wherein the second chamber (140) is provided between the maintenance zone (130) and the first process chamber (110). The maintenance zone (130) allows for maintenance access to at least one of the first chamber (110) and the second chamber (120).
摘要翻译：提供了一种用于柔性基板（260; 560）的真空处理系统（100）。处理系统包括适于容纳用于提供柔性基底的供应辊中的一个的第一室（110）和用于储存柔性基板（260; 560）的卷取辊。适于容纳用于提供所述柔性基板的供应辊中的一个的第二室（120）和用于存储所述柔性基板（260; 560）的卷取辊; 在所述第一室（110）和所述第二室（120; 220; 420; 520）之间的维护区（130）; 以及用于在所述柔性基板上沉积材料的第一处理室（140），其中所述第二室（140）设置在所述维护区（130）和所述第一处理室（110）之间。维护区域（130）允许维护对第一室（110）和第二室（120）中的至少一个的通路。

26. 发明申请

WO2009144255A1 BACKSIDE COATING PREVENTION DEVICE AND METHOD 审中-公开
标题翻译：背面涂层防护装置和方法
公开(公告)号：WO2009144255A1
公开(公告)日：2009-12-03
申请号：PCT/EP2009/056480
申请日：2009-05-27
申请人： APPLIED MATERIALS, INC. , SAUER, Andreas , HENRICH, Juergen , MUELLER, Joachim
发明人： SAUER, Andreas , HENRICH, Juergen , MUELLER, Joachim
IPC分类号： C23C14/00 , C23C14/04 , C23C14/56
CPC分类号： C23C16/45519 , C23C14/042 , C23C14/56 , C23C14/564 , H01J37/32477 , H01J37/32623
摘要： A backside coating prevention device (200) adapted for a coating chamber (10) for coating plate-shaped substrates (100), said coating chamber comprising a plurality of walls, a coating material source for dispensing coating material into the coating chamber, a substrate support (20, 22), a front side of the substrate support facing the coating material source, the substrate support being adapted for supporting on the front side one or more plate-shaped substrates each having a substrate front side and thereby defining a substrate front plane, wherein said backside coating prevention device comprises two or more screens, the screens being provided at at least two of the walls of the coating chamber, each screen having a protruding member protruding from the respective wall.
摘要翻译：一种适用于涂覆板状基材（100）的涂布室（10）的背面涂层防止装置（200），所述涂布室包括多个壁，用于将涂料分散到涂布室中的涂料源，支撑件（20,22），面向涂料源的基板支撑件的前侧，基板支撑件适于在前侧上支撑一个或多个板状基板，每个板状基板具有基板前侧，从而限定基板正面平面，其中所述背面涂层防止装置包括两个或更多个屏幕，所述屏幕设置在所述涂覆室的至少两个壁处，每个屏幕具有从相应壁突出的突出构件。

27. 发明申请

WO2018153480A1 POSITIONING ARRANGEMENT FOR A SUBSTRATE CARRIER AND A MASK CARRIER, TRANSPORTATION SYSTEM FOR A SUBSTRATE CARRIER AND A MASK CARRIER, AND METHODS THEREFOR 审中-公开
公开(公告)号：WO2018153480A1
公开(公告)日：2018-08-30
申请号：PCT/EP2017/054356
申请日：2017-02-24
申请人： APPLIED MATERIALS, INC. , HEYMANNS, Matthias , HEIMEL, Oliver , BANGERT, Stefan , HENRICH, Jürgen , SAUER, Andreas
发明人： HEYMANNS, Matthias , HEIMEL, Oliver , BANGERT, Stefan , HENRICH, Jürgen , SAUER, Andreas , VERCESI, Tommaso
IPC分类号： C23C14/04 , C23C14/50 , C23C14/56 , H01L21/67 , H01L21/677
摘要： A positioning arrangement (100) for positioning a substrate carrier (150) and a mask carrier (160) in a vacuum chamber is described. The positioning arrangement (100) comprising a first track (110) extending in a first direction and configured transportation of the substrate carrier (150) configured for holding a substrate having a substrate surface, a second track (120) extending in the first direction and configured for transportation of the mask carrier (160), wherein the first track (110) and the second track (120) are offset by an offset distance (D) in a plane coplanar with the substrate surface, and a holding arrangement (130) configured for holding the mask carrier (160), wherein the holding arrangement (130) is arranged between the first track (110) and the second track (120)..

28. 发明申请

WO2016128560A2 VACUUM PROCESSING SYSTEM AND METHODS THEREFOR 审中-公开
标题翻译：真空处理系统及其方法
公开(公告)号：WO2016128560A2
公开(公告)日：2016-08-18
申请号：PCT/EP2016/053060
申请日：2016-02-12
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , HENRICH, Jürgen , RIES, Florian , STOLLEY, Tobias , SAUER, Andreas , BUSCHBECK, Wolfgang
发明人： MORRISON, Neil , HENRICH, Jürgen , RIES, Florian , STOLLEY, Tobias , SAUER, Andreas , BUSCHBECK, Wolfgang
CPC分类号： C23C14/562 , C23C16/345 , C23C16/401 , C23C16/45589 , C23C16/511 , C23C16/545
摘要： A vacuum processing system (100) for a flexible substrate is provided. The vacuum processing system (100) includes a first chamber (110) adapted for housing a supply roll (111) for providing the flexible substrate; a second chamber (120) adapted for housing a take-up roll (121) for storing the flexible substrate (160) after processing; a substrate transport arrangement including one or more guide rollers (104) for guiding the flexible substrate from the first chamber (110) to the second chamber (120); a maintenance zone (130) between the first chamber (110) and the second chamber (120) wherein the maintenance zone (130) allows for maintenance access to or of at least one of the first chamber (110) and the second chamber (120); and a first process chamber (140) for processing the flexible substrate (10).
摘要翻译：提供了一种用于柔性基板的真空处理系统（100）。真空处理系统（100）包括适于容纳供应辊（111）以提供柔性基板的第一腔室（110）第二室（120），其适于容纳用于在处理之后存储柔性衬底（160）的卷取辊（121）; 基板传送装置，其包括用于将所述柔性基板从所述第一腔室（110）引导到所述第二腔室（120）的一个或多个引导辊（104）; 在第一室（110）和第二室（120）之间的维护区（130），其中维护区（130）允许维护进入第一室（110）和第二室（120）中的至少一个或从第一室）; 和用于处理柔性衬底（10）的第一处理室（140）。

29. 发明申请

WO2015055828A1 ROLLER DEVICE FOR VACUUM DEPOSITION ARRANGEMENT, VACUUM DEPOSITION ARRANGEMENT WITH ROLLER AND METHOD FOR OPERATING A ROLLER 审中-公开
标题翻译：用于真空沉积装置的滚筒装置，带滚筒的真空沉积装置和操作滚筒的方法
公开(公告)号：WO2015055828A1
公开(公告)日：2015-04-23
申请号：PCT/EP2014/072346
申请日：2014-10-17
申请人： APPLIED MATERIALS, INC. , SAUER, Andreas , HENRICH, Jürgen , DEPPISCH, Thomas , WAGNER, Dirk
发明人： SAUER, Andreas , HENRICH, Jürgen , DEPPISCH, Thomas , WAGNER, Dirk
IPC分类号： C23C16/46 , C23C16/48 , C23C16/54
CPC分类号： B05D1/60 , B05C1/003 , C23C16/46 , C23C16/481 , C23C16/54 , H01L21/67739
摘要： A deposition arrangement (100; 600) for depositing a material on a substrate (110; 640) is described. The deposition arrangement includes a vacuum chamber (120); a roller device (200; 300; 400; 500; 604) within the vacuum chamber (120); and an electrical heating device (61; 220; 320; 420; 520) within the roller device (200; 300; 400; 500; 604), wherein the heating device comprises a first end (250) and a second end (260), and wherein the heating device is held at the first end and at the second end. Also, a method for heating a substrate in a vacuum deposition arrangement is described.
摘要翻译：描述了用于在衬底（110; 640）上沉积材料的沉积装置（100; 600）。沉积装置包括真空室（120）; 真空室（120）内的辊装置（200; 300; 400; 500; 604）; 以及在所述辊装置（200; 300; 400; 500; 604）内的电加热装置（61; 220; 320; 420; 520），其中所述加热装置包括第一端（250）和第二端（260），并且其中所述加热装置保持在所述第一端和所述第二端。另外，描述了一种在真空沉积装置中加热衬底的方法。

30. 发明申请

WO2011051352A1 SUBSTRATE TRANSPORT SYSTEM AND METHOD 审中-公开
标题翻译：基板运输系统和方法
公开(公告)号：WO2011051352A1
公开(公告)日：2011-05-05
申请号：PCT/EP2010/066280
申请日：2010-10-27
申请人： APPLIED MATERIALS, INC. , SCHÄFER, Michael , BERGMANN, Tobias , HOFFMANN, Josef , SAUER, Andreas , HENRICH, Jürgen , GEISS, Andreas
发明人： SCHÄFER, Michael , BERGMANN, Tobias , HOFFMANN, Josef , SAUER, Andreas , HENRICH, Jürgen , GEISS, Andreas
IPC分类号： H01L21/67 , B65G49/00
CPC分类号： H01L21/67706 , C03B35/183 , C03B35/184 , C03B35/189
摘要： A substrate transport system adapted for transporting a substrate moving in a substrate transport direction in a processing chamber is provided. The substrate transport system includes a plurality of transport rollers each having a transport shaft and a transport wheel. The transport shaft and the transport wheel are adapted for supporting the moving substrate. A heating means is arranged between the position of the moving substrate and the transport shaft and is adapted for heating the moving substrate.
摘要翻译：提供了一种适于传送在处理室中沿基板输送方向移动的基板的基板输送系统。基板输送系统包括多个输送辊，每个输送辊具有输送轴和输送轮。传送轴和传送轮适于支撑移动的基板。在移动基板的位置和传送轴之间设置有加热装置，并适于加热移动的基板。

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