专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2019201692A1 ALUMINUM PRECURSOR AND PROCESS FOR THE GENERATION OF METAL-CONTAINING FILMS 审中-公开
公开(公告)号：WO2019201692A1
公开(公告)日：2019-10-24
申请号：PCT/EP2019/059023
申请日：2019-04-10
申请人： BASF SE , WAYNE STATE UNIVERSITY
发明人： WINTER, Charles , BLAKENEY, Kyle , MAYR, Lukas , SCHWEINFURTH, David Dominique , WEIGUNY, Sabine , WALDMANN, Daniel
IPC分类号： C07F5/06 , C23C16/12 , C23C16/455
摘要： The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal-containing films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a compound of general formula (I) wherein Z is a C 2 -C 4 alkylene group, and R is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.

2. 发明申请

WO03064718A3 METHOD FOR SELECTIVELY COATING A PORTION OF A SUBSTRATE WITH A GAS-CARRIED SUBSTANCE 审中-公开
标题翻译：用于选择性地涂覆具有气体载体的基板的方法
公开(公告)号：WO03064718A3
公开(公告)日：2003-09-04
申请号：PCT/US0302662
申请日：2003-01-28
申请人： SULZER METCO US INC , MARIJNISSEN GIEL , VERGELDT E R I C , WALSWEER W , JACOBS B T F
发明人： MARIJNISSEN GIEL , VERGELDT E R I C , WALSWEER W , JACOBS B T F
IPC分类号： C23C10/04 , C23C16/04 , C23C16/455 , C23C14/04 , C23C14/16 , C23C16/12 , C23C16/20
CPC分类号： C23C16/455 , C23C10/04 , C23C16/04
摘要： A method for applying a diffusion coating of a substance to a portion of substrate comprising applying a deposition coating to a particular surface of an object by applying an active gas containing the coating substance in a form which will react with the surface to form a coating. Instead of masking portions of the object not to be coated, or applying an absorbent paste, a second neutralizing or "killer" gas is introduced in the regions where the coating gas may be present, but where no coating is desired. The neutralizing gas is of a type which will reduce the reactivity of the coating substance in the active gas. As a result, formation of a coating in undesired areas is substantially prevented.
摘要翻译：一种用于将物质的扩散涂层施加到基底的一部分的方法，包括通过以与表面反应形成涂层的形式施加含有涂层物质的活性气体，将沉积涂层施加到物体的特定表面上。代替掩盖不被涂覆的物体的一部分，或者施加吸收膏，在可能存在涂覆气体但不需要涂层的区域中引入第二中和或“杀手”气体。中和气体是降低活性气体中涂层物质的反应性的一种。结果，基本上防止了在不需要的区域中形成涂层。

3. 发明申请

WO99027155A1 METHOD FOR DEPOSITING FINE-GRAINED ALUMINA COATINGS ON CUTTING TOOLS 审中-公开
标题翻译：在切割工具上沉积细粒度的氧化铝涂层的方法
公开(公告)号：WO99027155A1
公开(公告)日：1999-06-03
申请号：PCT/SE1998/002140
申请日：1998-11-26
IPC分类号： B23B27/14 , B23P15/28 , C23C16/12 , C23C16/40 , C23C16/503 , C23C16/513 , C23C16/515 , C23C16/50
CPC分类号： C23C16/515 , C23C16/403
摘要： The present invention relates to a method for depositing refractory alumina (Al2O3) thin layers on cutting tools made of cemented carbide, cermet, ceramics or high speed steel. The invented method is a Plasma Activated Chemical Vapor Deposition (PACVD) process in which the plasma is produced by applying a bipolar pulsed DC voltage across two electrodes to which the tool substrates to be coated are fixtured and electrically connected. In contrast to prior art methods, built-up electrical charge on non-conducting surfaces is suppressed and hence, no arcing occurs on said surfaces. This will permit stable, long-term processing. With the invented method, high-quality coatings consisting of either single phase gamma -Al2O3 or of a mixture of gamma - and alpha -Al2O3 phases can be deposited on cutting tools at deposition temperatures as low as 500 DEG C. When coated cemented carbide tools according to the invention are used in the machining of steel or cast iron, several important improvements to prior art produced Al2O3- coated tools have been observed.
摘要翻译：本发明涉及一种在由硬质合金，金属陶瓷，陶瓷或高速钢制成的切削工具上沉积难熔氧化铝（Al2O3）薄层的方法。本发明的方法是等离子体活化化学气相沉积（PACVD）工艺，其中通过在两个电极上施加双极性脉冲DC电压来产生等离子体，待涂覆的工具衬底固定到其上并电连接。与现有技术的方法相比，在非导电表面上的积聚电荷被抑制，因此在所述表面上不发生电弧。这将允许稳定的长期处理。采用本发明的方法，可以在低至500℃的沉积温度下将单相γ-Al2O3或γ-α-Al2O3相的混合物组成的高品质涂层沉积在切削工具上。当涂覆硬质合金刀具根据本发明用于钢或铸铁的加工中，已经观察到对现有技术生产的Al 2 O 3涂层工具的若干重要改进。

4. 发明申请

WO2022177884A1 REDUCING AGENTS FOR ATOMIC LAYER DEPOSITION 审中-公开
公开(公告)号：WO2022177884A1
公开(公告)日：2022-08-25
申请号：PCT/US2022/016412
申请日：2022-02-15
申请人： APPLIED MATERIALS, INC.
发明人： BHUYAN, Bhaskar Jyoti , SALY, Mark , KALUTARAGE, Lakmal C. , KNISLEY, Thomas
IPC分类号： C23C16/455 , C23C16/14 , C23C16/12 , C23C16/30 , C23C16/56
摘要： Methods of forming a metal film having a metal halide with a reducing agent are disclosed. The reducing agent, the reducing agent includes a group IV element containing heterocyclic compound, a radical initiator, an alkly alane, a diborene species and/or a Sn(II) compound.

5. 发明申请

WO2012165696A1 절삭공구용 코팅층 审中-公开
标题翻译：切割工具涂层
公开(公告)号：WO2012165696A1
公开(公告)日：2012-12-06
申请号：PCT/KR2011/005014
申请日：2011-07-08
申请人： 한국야금 주식회사 , 조성우 , 김한성 , 이동열 , 한대석 , 서영호 , 안선용 , 박동복
发明人： 조성우 , 김한성 , 이동열 , 한대석 , 서영호 , 안선용 , 박동복
IPC分类号： C23C16/12 , B23B27/14 , C23C16/44
CPC分类号： B26D7/00 , C23C16/34 , C23C16/403 , C23C28/042 , C23C28/044 , C23C30/005 , Y10T428/265
摘要： 본 발명은 모재 위에 CVD법으로 하부에서부터 TiN층, TiCN층, 결합층, 알루미나(Al 2 O 3 )층, 커버층의 순으로 적층 형성한 경질 코팅층으로서 커버층의 조성을 조절함으로써 블라스팅 작업과 같은 별도의 추가 공정을 적용하거나 CVD와 PVD의 혼용공정을 사용하지 않고도 코팅층의 표면잔류응력을 압축응력으로 유지할 수 있고 동시에 커버층을 내마모층으로도 활용할 수 있어, 절삭성능을 개선할 수 있는 절삭공구용 코팅층에 관한 것이다. 본 발명에 따른 코팅층은 모재의 표면에 화학기상증착(CVD)법으로 형성되는 코팅층으로서, 상기 모재의 상부에 형성되고 α상(phase)으로 이루어지며, 주상정(columnar crystal) 조직과 등축정(equiaxed cryatal) 조직이 혼합된 복합조직으로 이루어진 알루미나층과, 상기 알루미나층의 상부에 형성되며, Al x Ti y Si z Cr w N (여기서, x+y+z+w=1, x≥0.75, y≥0.2, 0≤z≤0.06, 0≤w≤0.08)으로 이루어지는 커버층을 포함하는 것을 특징으로 한다.
摘要翻译：本发明涉及一种硬质涂层，其中TiN层，TiCN层，耦合层，氧化铝（Al2O3）层和覆盖层根据化学物质从底部依次堆叠起来蒸汽配置（CVD）方法，其中通过调节上层的组成，可以将涂层的表面残余应力保持为压应力，即使不施加单独的附加步骤，例如喷砂或使用组合的CVD和PVD 并且覆盖层也可以用作耐磨层，从而提高切割性能。根据本发明的涂层是通过将CVD法施加到基材的表面而形成的涂层，包括：在基材上形成一相的氧化铝层，并且具有复合材料柱状晶体结构和等轴晶体结构的结构; 并且形成在氧化铝层上的覆盖层包含Al x Ti y Si z Cr w N（其中x + y + z + w = 1，x = 0.75，y = 0.2,0 = z = 0.06,0 = w = 0.08）。

6. 发明申请

WO2006052277A3 GAS TURBINE ENGINE COMPONENTS WITH ALUMINIDE COATINGS AND METHOD OF FORMING SUCH ALUMINIDE COATINGS ON GAS TURBINE ENGINE COMPONENTS 审中-公开
标题翻译：具有铝氧化物涂层的气体涡轮发动机部件和在气体涡轮发动机部件上形成这种铝酸盐涂层的方法
公开(公告)号：WO2006052277A3
公开(公告)日：2007-02-15
申请号：PCT/US2005012527
申请日：2005-04-13
申请人： AEROMET TECHNOLOGIES INC , FAIRBOURN DAVID C
发明人： FAIRBOURN DAVID C
IPC分类号： C23C10/02 , C23C10/58 , C23C16/12 , C23C16/56 , C23C28/00
CPC分类号： C23C18/06 , C23C10/02 , C23C10/58 , C23C16/06 , C23C18/1204 , C23C18/1216 , C23C18/1225 , C23C18/1279 , C23C18/1295 , C23C28/021 , C23C28/028 , C23C28/321 , C23C28/325 , C23C28/3455 , Y02T50/67
摘要： A turbine engine component (10) with a protective aluminide coating (14) that include additions of silicon and a dopant, such as yttrium and/or hafnium, in an amount effective to reduce sulfidation and a deposition process for forming such aluminide coatings (14). A silicon-containing layer (30) may be applied to the superalloy substrate (12) of the component (10) and the aluminide coating (14) formed by exposing component (10) and layer (30) to a vapor phase reactant containing the dopant. The aluminide coating (14), which contains dopant from the layer (30), may operate as a standalone environmental coating or as a bond coating for an optional ceramic thermal barrier layer (24). An optional zirconia layer (26) maybe provided between the aluminide coating (14) and the ceramic thermal barrier layer (24). Atlernatively, the dopant may be included in the silicon-containing layer (30) applied to the component (10) before the aluminide coating (14) is formed and no vapor phase reactant containing the dopant is required.
摘要翻译：具有保护性铝化物涂层（14）的涡轮发动机部件（10），其包括以有效减少硫化的量的硅和掺杂剂（例如钇和/或铪）的添加量和用于形成这种铝化物涂层的沉积工艺（14））。可以将含硅层（30）施加到组分（10）的超级合金基材（12）和通过将组分（10）和层（30）暴露于含有掺杂剂。含有来自层（30）的掺杂剂的铝化物涂层（14）可以作为独立的环境涂层或用作任选的陶瓷热障层（24）的粘结涂层。可以在铝化物涂层（14）和陶瓷热障层（24）之间设置任选的氧化锆层（26）。有时，在形成铝化物涂层（14）之前，掺杂剂可以包含在施加到组分（10）的含硅层（30）中，并且不需要含有掺杂剂的气相反应物。

7. 发明申请

WO99020809A1 DEPOSITION OF COATINGS USING AN ATMOSPHERIC PRESSURE PLASMA JET 审中-公开
标题翻译：使用大气压力等离子喷涂沉积涂料
公开(公告)号：WO99020809A1
公开(公告)日：1999-04-29
申请号：PCT/US1998/022306
申请日：1998-10-20
IPC分类号： H05H1/24 , C23C8/36 , C23C16/08 , C23C16/12 , C23C16/18 , C23C16/24 , C23C16/26 , C23C16/27 , C23C16/30 , C23C16/32 , C23C16/34 , C23C16/40 , C23C16/452 , C23C16/513 , H01L21/31 , H01L21/316 , H05H1/30 , H05H1/42 , C23C8/00 , C23C16/00
CPC分类号： H05H1/42 , C23C16/08 , C23C16/12 , C23C16/18 , C23C16/24 , C23C16/30 , C23C16/305 , C23C16/32 , C23C16/34 , C23C16/342 , C23C16/345 , C23C16/402 , C23C16/403 , C23C16/405 , C23C16/407 , C23C16/452 , C23C16/513 , H05H1/30
摘要： The use of a non-thermal source which is capable of operation at 760 torr is demonstrated. As an example of the application of the present invention, a helim/oxygen gas mixture is introduced into the annular region (20) between two coaxial electrodes (14) driven by a 13.56 MHz radio frequency (RF) source (18) at between 40 and 500 W to produce a stable plasma jet. As detected by optical emission spectroscopy (OES), a high flux of metastable oxygen and no ions are present at the exit of this plasma jet. Silicon dioxide films are deposited by introducing tetraethoxysilane (TEOS) into the effluent stream. A deposition rate of 3020 +/- 250 ANGSTROM /min. is achieved with an RF power of 400 W, 0.2 torr of TEOS, 11.1 torr of oxygen, 748.7 torr of helium, and a total gas flow rate of 41 L/m.
摘要翻译：证明了使用能够在760乇下操作的非热源。作为应用本发明的一个实例，将一个直升机/氧气混合物引入在由13.56MHz射频（RF）源（18）驱动的两个同轴电极（14）之间的环形区域（20）和500W以产生稳定的等离子体射流。如通过光发射光谱（OES）所检测的，在该等离子体射流的出口处存在高通量的亚稳态氧和无离子。通过将四乙氧基硅烷（TEOS）引入流出物流中沉积二氧化硅膜。沉积速率为3020 +/- 250安格/分。是通过400W的TEF功率，0.2Torr的TEOS，11.1Torr的氧气，748.7乇的氦气和41L / m的总气体流量实现的。

8. 发明申请

WO2021123154A1 VERFAHREN ZUM BETREIBEN EINES BESCHICHTUNGSSYSTEMS ZUR HERSTELLUNG VON SCHICHTSYSTEMEN 审中-公开
公开(公告)号：WO2021123154A1
公开(公告)日：2021-06-24
申请号：PCT/EP2020/087007
申请日：2020-12-18
申请人： RODENSTOCK GMBH
发明人： SCHERSCHLICHT, Rüdiger , RADÜNZ, Stefan
IPC分类号： G02B1/115 , B29D11/00 , C23C14/54 , C23C16/12 , G01B11/06 , G02B5/28 , G02B27/00 , B29D11/00865 , B29D11/0098 , C23C16/006 , C23C16/52 , G02B27/0012 , G02B5/285
摘要： Die Erfindung betrifft ein Verfahren zum Betreiben eines Beschichtungssystems (100) zur Herstellung von Schichtsystemen (10), umfassend (i) Beschichten (S100) eines Schichtsystems (10) in einer Beschichtungsanlage (102); (ii) Bestimmen (S102) einer spektralen Ist-Messkurve (90) des Schichtsystems (10) in einem optischen Messsystem (104); (iii) Bestimmen (S110) eines Ist-Datensatzes (Dat_ist) durch Anfitten einer Simulations-Soll-Messkurve (98) an die Ist-Messkurve (90); (iv) Bestimmen (S112) von Ist-Schichtparametern (96) als berechnete Ist- Schichtparameter (96) aus der Simulations-Soll-Messkurve (98) durch Simulation des Schichtsystems (10) mit dem Ist-Datensatz (Dat_ist); (v) Ausgabe (S114) des Ist-Datensatzes (Dat_ist) und der berechneten Ist- Schichtparameter (96) zumindest an ein Entscheidungssystem (108); (vi) Bereitstellen (S118) von Qualitätsanforderungs-Daten; (vii) Entscheiden (S120) über eine Freigabe (S122, S124) des Schichtsystems (10) in dem Entscheidungssystem (108) auf Basis eines Vergleichs von wenigstens dem Ist-Datensatz (Dat_ist), den berechneten Ist-Schichtparametern (96) und den Qualitätsanforderungs-Daten. Die Erfindung betrifft ebenso ein Beschichtungssystem (100) zur Herstellung von Schichtsystemen (10).

9. 发明申请

WO2014008365A1 DEPOSITION OF N-METAL FILMS COMPRISING ALUMINUM ALLOYS 审中-公开
标题翻译：包含铝合金的N金属膜的沉积
公开(公告)号：WO2014008365A1
公开(公告)日：2014-01-09
申请号：PCT/US2013/049266
申请日：2013-07-03
申请人： APPLIED MATERIALS, INC. , GANDIKOTA, Srinivas , LU, Xinliang , CHEN, Shih Chung , TANG, Wei , ZHOU, Jing , GANGULI, Seshadri , THOMPSON, David , ANTHIS, Jeffrey W. , NOORI, Atif , GUNGOR, Faruk , WU, Dien-Yeh , CHANG, Mei , FU, Xinyu , LEI, Yu
发明人： GANDIKOTA, Srinivas , LU, Xinliang , CHEN, Shih Chung , TANG, Wei , ZHOU, Jing , GANGULI, Seshadri , THOMPSON, David , ANTHIS, Jeffrey W. , NOORI, Atif , GUNGOR, Faruk , WU, Dien-Yeh , CHANG, Mei , FU, Xinyu , LEI, Yu
IPC分类号： C23C16/12 , C23C16/44
CPC分类号： C23C18/00 , C23C16/08 , C23C16/18 , C23C16/45527 , C23C16/45534 , C23C16/45553
摘要： Provided are methods of depositing films comprising alloys of aluminum, which may be suitable as N-metal films. Certain methods comprise exposing a substrate surface to a metal halide precursor comprising a metal halide selected from TiCl 4 , TaCl 5 and HfCl 4 to provide a metal halide at the substrate surface; purging metal halide; exposing the substrate surface to an alkyl aluminum precursor comprising one or more of dimethyaluminum hydride, diethylhydridoaluminum, methyldihydroaluminum, and an alkyl aluminum hydrides of the formula [(CxHy) 3-a AlH a ]n, wherein x has a value of 1 to 3, y has a value of 2x+2, a has a value of 1 to 2, and n has a value of 1 to 4; and exposing the substrate surface to an alane-containing precursor comprising one or more of dimethylethylamine alane, methylpyrrolidinealane, di(methylpyrolidine)alane, and trimethyl amine alane borane. Other methods comprise exposing a substrate surface to a metal precursor and trimethyl amine alane borane.
摘要翻译：提供了沉积包括铝合金的膜的方法，其可以适合作为N-金属膜。某些方法包括将衬底表面暴露于包含选自TiCl 4，TaCl 5和HfCl 4的金属卤化物的金属卤化物前体，以在衬底表面提供金属卤化物; 清洗金属卤化物; 将基材表面暴露于包含一种或多种二氢化铝氢化物，二乙基氢化铝，甲基二氢铝和式[（C x H y）3-a AlHa] n的烷基铝氢化物的烷基铝前体，其中x具有1至3的值，y 具有2x + 2的值，a具有1至2的值，并且n具有1至4的值; 并将基材表面暴露于含有二甲基乙基胺丙烷，甲基吡咯烷烃，二（甲基吡咯烷）甲烷和三甲基胺丙烷硼烷中的一种或多种的含Alane的前体。其他方法包括将基底表面暴露于金属前体和三甲基胺丙烷硼烷。

10. 发明申请

WO2009036776A1 KORROSIONSBESTÄNDIGES DRUCKBEHÄLTERSTAHLERZEUGNIS, EIN VERFAHREN ZUR HERSTELLUNG DESSELBEN UND EINE GASTURBINENKOMPONENTE 审中-公开
标题翻译：耐腐蚀压力容器用钢板产品，其制造方法和燃气涡轮部件的制造方法
公开(公告)号：WO2009036776A1
公开(公告)日：2009-03-26
申请号：PCT/EP2007/007991
申请日：2007-09-13
申请人： SIEMENS AKTIENGESELLSCHAFT , KRUSCH, Claus , STAMM, Werner
发明人： KRUSCH, Claus , STAMM, Werner
IPC分类号： C23C16/00 , C23C16/10 , C23C16/12 , C23C30/00 , C23C22/00 , C23C28/00 , F01D25/00
CPC分类号： C23C10/60 , C23C12/00 , F01D5/286 , F01D5/288 , F01D25/007 , F05D2300/121 , F05D2300/132 , F28F19/06
摘要： Druckbehälterstähle weisen oft eine geringe Korrosionsbeständigkeit auf. Der korrosionsbeständige Druckbehälterstahl entsteht durch eine Aluminisierung eines Druckbehälterstahls und einer bewussten Oxidation der so angereicherten Schicht.
摘要翻译：压力容器钢经常有耐腐蚀性较差。通过渗铝的钢压力容器和所述从而富集层的有意氧化而形成的耐腐蚀钢压力容器中。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式