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1. 发明授权

US4692115A Semiconductor wafer furnace door 失效
标题翻译：半导体晶圆炉门
公开(公告)号：US4692115A
公开(公告)日：1987-09-08
申请号：US880422
申请日：1986-06-30
申请人： Robert E. Aldridge , Russell Elloway , William O. Fritz , Ralph D. Goff , Michael J. Herrera
发明人： Robert E. Aldridge , Russell Elloway , William O. Fritz , Ralph D. Goff , Michael J. Herrera
IPC分类号： H01L21/00 , H01L21/677 , F27D1/18
CPC分类号： H01L21/67126 , H01L21/67742 , H01L21/67754 , Y10S414/14
摘要： A soft landing cantilever boat loader for loading semiconductor wafer carrying boats into a furnace process tube includes a loading station having one or more loading assemblies, an automatically controlled door associated with each loading assembly for selectively closing an end of the process tube and a microcomputer based control system for controlling and coordinating process operations. The loading assemblies are of a low profile configuration and each include a boat supporting, cantilevered paddle that is mounted by a quick release mechanism on a carriage which is driven along ways by a motor. A motor speed control circuit provides closed loop motor speed using a pulse width modulated motor drive. A door operating mechanism provides movement of the door along two transverse axes to assure tight sealing of the door against the tube. The control system employs a selfteaching technique that permits rapid reprogramming of the carriage travel limits which may be required when the paddle is replaced by a paddle of a different type or length.
摘要翻译：用于将半导体晶片运载船装载到炉加工管中的软着陆悬臂式装载机包括具有一个或多个装载组件的装载站，与每个装载组件相关联的自动控制的门，用于选择性地关闭处理管的端部和基于微机控制和协调过程操作的控制系统。装载组件具有低轮廓构造，并且每个包括船支撑悬臂桨，其通过快速释放机构安装在滑架上，所述滑架通过马达沿着该方向驱动。电机速度控制电路使用脉宽调制电机驱动器提供闭环电机速度。门操作机构提供门沿着两个横向轴线的运动，以确保门紧密地密封在管子上。控制系统采用自动训练技术，其允许在用不同类型或长度的桨叶代替桨叶时可能需要的滑架行程极限的快速重新编程。

2. 发明授权

US4726961A Process for low pressure chemical vapor deposition of refractory metal 失效
$Process for low pressure chemical vapor deposition of refractory metal$
标题翻译：难熔金属低压化学气相沉积工艺
公开(公告)号：US4726961A
公开(公告)日：1988-02-23
申请号：US874754
申请日：1986-06-16
申请人： Michael Diem , Michael A. Fisk , Jon C. Goldman
发明人： Michael Diem , Michael A. Fisk , Jon C. Goldman
IPC分类号： C23C16/54 , H01L21/285 , B05D5/12 , C23C16/00
CPC分类号： C23C16/54 , H01L21/28556 , Y10S438/935
摘要： A process and apparatus for the low pressure, cold wall, chemical vapor deposition of refractory metals, such as tungsten on a silicon wafer. The silicon wafer is introduced into a loading lock wherein the pressure is reduced to subatmospheric pressure. The silicon wafer is transferred to a deposition chamber where it is heated to an elevated temperature. A refractory metal carbonyl vapor is introduced into the deposition chamber and dissociates to deposit a refractory metal on the silicon wafer. The wafer is transferred to an unloading lock where it is allowed to cool and is then removed.
摘要翻译：用于在硅晶片上的诸如钨的难熔金属的低压，冷壁，化学气相沉积的方法和装置。将硅晶片引入装载锁中，其中压力降低至低于大气压。将硅晶片转移到沉积室，在其中将其加热到升高的温度。将难熔金属羰基蒸气引入沉积室中并解离以在硅晶片上沉积难熔金属。将晶片转移到卸载锁上，在其中允许其冷却，然后将其移除。

3. 发明授权

US4711989A Diffusion furnace multizone temperature control 失效
标题翻译：扩散炉多区域温度控制
公开(公告)号：US4711989A
公开(公告)日：1987-12-08
申请号：US864676
申请日：1986-05-19
申请人： Chorng-Tao Yu
发明人： Chorng-Tao Yu
IPC分类号： C30B31/12 , C30B31/18 , H05B3/64
CPC分类号： C30B31/12 , C30B31/18
摘要： There is a substantial heat loss and drop in temperature in a hot-wall diffusion tube when a batch of wafers at room temperature is loaded into the tube. The temperature of the atmosphere in a zone in the tube is quickly recovered by sensing both the temperature of the tube atmosphere and the temperature of a heating element surrounding the zone with thermocouples, mixing the signals of the thermocouples to produce a ratio average signal and then controlling the heat input to the heating elements in response to the ratio average of the sensed temperature.
摘要翻译：当将一批在室温下的晶片装载到管中时，热壁扩散管中存在显着的热损失和温度下降。通过用热电偶感测管气氛的温度和围绕该区域的加热元件的温度，快速恢复管中区域中的气氛的温度，混合热电偶的信号以产生比率平均信号，然后响应于感测温度的平均值控制加热元件的热量输入。

4. 发明授权

US4711197A Gas scavenger 失效
标题翻译：除气剂
公开(公告)号：US4711197A
公开(公告)日：1987-12-08
申请号：US919736
申请日：1986-10-16
申请人： Jerry A. Taylor, Sr.
发明人： Jerry A. Taylor, Sr.
IPC分类号： B01J4/00 , C23C16/44 , C23C16/56 , H01L21/22 , C23C16/00
CPC分类号： C23C16/4401
摘要： A gas scavenger unit educts gases away from semiconductor wafers as they are withdrawn through a plenum in the scavenger from their processing chamber into the atmosphere. The scavenger has a peripheral wall which generally defines a plenum having two open ends. The one end of the plenum communicates with the processing chamber and the other end communicates with the atmosphere. An exhaust port in the peripheral wall communicates with a house gas exhaust system. The plenum is divided into two chambers by an apertured interior wall. The wafers travel through the first chamber, and the second chamber communicates with the house gas exhaust system. The apertures in the interior wall are disposed about the wafer travel path so that gases from the processing chamber and/or the atmosphere are educted into the house exhaust system without flowing across the wafers.
摘要翻译：气体清除器单元从半导体晶片排出气体，因为它们通过清除剂中的气室从其处理室排入大气中。清除剂具有通常限定具有两个开口端的气室的周壁。增压室的一端与处理室连通，另一端与大气连通。周壁内的排气口与房屋排气系统连通。气室由一个有孔的内壁分成两个室。晶片行进通过第一室，第二室与房屋排气系统连通。内壁中的孔围绕晶片行进路径设置，使得来自处理室和/或大气的气体被排出到房屋排气系统中而不流过晶片。

5. 发明授权

US4557950A Process for deposition of borophosphosilicate glass 失效
标题翻译：硼磷硅酸盐玻璃沉积工艺
公开(公告)号：US4557950A
公开(公告)日：1985-12-10
申请号：US611793
申请日：1984-05-18
申请人： Thomas C. Foster , Jon C. Goldman , Gary W. Hoeye
发明人： Thomas C. Foster , Jon C. Goldman , Gary W. Hoeye
IPC分类号： C03B19/14 , C23C16/40 , H01L21/316 , C23C16/30
CPC分类号： H01L21/02129 , C23C16/401 , H01L21/02271 , H01L21/31625
摘要： A process for chemical vapor deposition of borophosphosilicate glass on a silicon wafer at reduced pressure is disclosed herein. The process includes a step of placing a silicon wafer within a reactor tube. The reactor tube is evacuated to a pressure of less than 500 millitorr and is heated to a temperature of not less than 350.degree. C. and not greater than 500.degree. C. A mixture of silane, phosphine and boron trichloride gases is flowed into the reactor tube so that the mixture contacts the silicon wafer. At the same time, a quantity of oxygen is flowed into the reactor tube so that the oxygen also contacts the silicon wafer and intermixes and reacts with the silane, phosphine and boron trichloride gases to form layers of borophosphosilicate glass on the silicon wafer.
摘要翻译：本文公开了一种在减压下在硅晶片上化学气相沉积硼磷硅酸盐玻璃的方法。该方法包括将硅晶片放置在反应器管内的步骤。将反应器管抽成小于500毫托的压力，并加热至不低于350℃且不高于500℃的温度。将硅烷，磷化氢和三氯化硼气体的混合物流入反应器使得混合物接触硅晶片。同时，一定量的氧气流入反应器管，使得氧也接触硅晶片，并与硅烷，磷化氢和三氯化硼气体混合并反应，以在硅晶片上形成硼磷硅玻璃层。

6. 发明授权

US4934767A Semiconductor wafer carrier input/output drawer 失效
标题翻译：半导体晶圆载体输入/输出抽屉
公开(公告)号：US4934767A
公开(公告)日：1990-06-19
申请号：US863960
申请日：1986-05-16
申请人： Hazen L. Hoyt, III , Jon C. Goldman , William R. Mello
发明人： Hazen L. Hoyt, III , Jon C. Goldman , William R. Mello
IPC分类号： B65G1/02 , H01L21/673
CPC分类号： H01L21/67769 , B65G1/02
摘要： Plastic cassettes carrying semiconductor wafers are loaded into and/or unloaded from an extended open drawer. The drawer is retractable to a closed position in a frame where the cassettes may be removed from or returned to the drawer by a programmable elevator. The frame may have several drawers and cassettes may be safely loaded into or unloaded from the open drawer while cassettes are being removed from or returned to a closed drawer.
摘要翻译：携带半导体晶片的塑料盒装载到延伸的开放抽屉中和/或从其中卸载。抽屉可伸缩到框架中的关闭位置，其中盒可以通过可编程电梯从抽屉中移除或返回到抽屉。框架可以具有多个抽屉，并且盒子可以从打开的抽屉被安全地装载到或从打开的抽屉中卸载，同时盒子被从包装盒中取出或者返回到关闭的抽屉中。

7. 发明授权

US4684863A Semiconductor wafer boat loader control system 失效
标题翻译：半导体晶圆舟装载机控制系统
公开(公告)号：US4684863A
公开(公告)日：1987-08-04
申请号：US880423
申请日：1986-06-30
申请人： Robert E. Aldridge , Russell Elloway , William O. Fritz , Ralph D. Goff , Michael J. Herrera
发明人： Robert E. Aldridge , Russell Elloway , William O. Fritz , Ralph D. Goff , Michael J. Herrera
IPC分类号： H01L21/00 , H01L21/677 , G05B11/28
CPC分类号： H01L21/67126 , H01L21/67742 , H01L21/67754 , Y10S388/91 , Y10S388/915
摘要： A soft landing cantilever boat loader for loading semiconductor wafer carrying boats into a furnace process tube includes a loading station having one or more loading assemblies, an automatically controlled door associated with each loading assembly for selectively closing an end of the process tube and a microcomputer based control system for controlling and coordinating process operations. The loading assemblies are of a low profile configuration and each include a boat supporting, cantilevered paddle that is mounted by a quick release mechanism on a carriage which is driven along ways by a motor. A motor speed control circuit provides closed loop motor speed using a pulse width modulated motor drive. A door operating mechanism provides movement of the door along two transverse axes to assure tight sealing of the door against the tube. The control system employs a self-teaching technique that permits rapid reprogramming of the carriage travel limits which may be required when the paddle is replaced by a paddle of a different type or length.
摘要翻译：用于将半导体晶片运载船装载到炉加工管中的软着陆悬臂式装载机包括具有一个或多个装载组件的装载站，与每个装载组件相关联的自动控制的门，用于选择性地关闭处理管的一端和基于微机控制和协调过程操作的控制系统。装载组件具有低轮廓构造，并且每个包括船支撑悬臂桨，其通过快速释放机构安装在滑架上，所述滑架通过马达沿着该方向驱动。电机速度控制电路使用脉宽调制电机驱动器提供闭环电机速度。门操作机构提供门沿着两个横向轴线的运动，以确保门紧密地密封在管子上。控制系统采用一种自我教学技术，允许当桨由不同类型或长度的桨代替时可能需要的滑架行程极限的快速重新编程。

8. 发明授权

US4886954A Hot wall diffusion furnace and method for operating the furnace 失效
标题翻译：热壁扩散炉及其操作方法
公开(公告)号：US4886954A
公开(公告)日：1989-12-12
申请号：US181787
申请日：1988-04-15
申请人： Chorng-Tao Yu , Michael A. Fisk , Alan Emami
发明人： Chorng-Tao Yu , Michael A. Fisk , Alan Emami
IPC分类号： C30B31/12 , F27D19/00 , G05D23/22
CPC分类号： C30B31/12 , F27D19/00 , G05D23/1934 , G05D23/22 , F27D2019/0037
摘要： A diffusion furnace and method for processing semiconductor wafers standing on edge wherein the furnace has vertically adjacent electrical resistance heating elements wired in parallel and disposed above the wafers. This arrangement enables the heat input to the furnace by the heating elements to be varied. In a preferred embodiment, the heating elements in the upper section of the tube are connected in one circuit and the heating elements in the lower section of the tube are connected in a second circuit and each circuit is controlled in response to the temperature in that section.
摘要翻译：一种用于处理位于边缘的半导体晶片的扩散炉和方法，其中炉具有垂直相邻的电阻加热元件并联布置并设置在晶片之上。这种布置使得能够改变由加热元件输入到炉的热量。在优选实施例中，管的上部中的加热元件连接在一个电路中，并且管的下部中的加热元件在第二电路中连接，并且响应于该部分中的温度来控制每个电路。

9. 发明授权

US4728246A Wafer boat transfer tool 失效
标题翻译：晶圆船转移工具
公开(公告)号：US4728246A
公开(公告)日：1988-03-01
申请号：US863963
申请日：1986-05-16
申请人： William R. Mello
发明人： William R. Mello
IPC分类号： H01L21/677 , B65G1/10
CPC分类号： H01L21/67781 , Y10S206/833 , Y10S414/14
摘要： A wafer boat transfer tool has an upper fork and a lower fork which may be differently configured for supporting wafer boats in different ways. The same tool may be used to transfer boats in one or more steps from locations where they are supported in one way to other locations where they are supported in the same or a different way. Also, the tool may be used to transfer more than one boat at a time without excessive travel in a direction parallel to the boat loader axis.A versatile wafer designed for use with two different forks of the tool may be utilized with different boat loaders and a common wafer transfer machine and in-process storage nests.
摘要翻译：晶片舟转移工具具有上叉和下叉，其可以不同地构造用于以不同的方式支撑晶片舟。相同的工具可以用于以一个或多个步骤的方式将船舶以一种方式支撑在其他位置，以相同或不同的方式支撑船只。此外，该工具可以用于一次传送多于一个船，而不会在平行于船装载机轴线的方向上过度行驶。设计用于工具的两个不同叉的通用晶片可以与不同的装载机和普通的晶片传送机以及进程中的存储巢一起使用。

10. 发明授权

US4619840A Process and apparatus for low pressure chemical vapor deposition of refractory metal 失效
$Process and apparatus for low pressure chemical vapor deposition of refractory metal$
标题翻译：难熔金属低压化学气相沉积工艺及装置
公开(公告)号：US4619840A
公开(公告)日：1986-10-28
申请号：US497321
申请日：1983-05-23
申请人： Jon C. Goldman , Michael A. Fisk , Michael Diem
发明人： Jon C. Goldman , Michael A. Fisk , Michael Diem
IPC分类号： C23C16/16 , C23C16/54 , H01L21/285
CPC分类号： C23C16/54 , H01L21/28556 , Y10S438/935
摘要： A process and apparatus for the low pressure, cold wall, chemical vapor deposition of refractory metals, such as tungsten on a silicon wafer. The silicon wafer is introduced into a loading lock wherein the pressure is reduced to subatmospheric pressure. The silicon wafer is transferred to a deposition chamber where it is heated to an elevated temperature. A refractory metal carbonyl vapor is introduced into the deposition chamber and dissociates to deposit a refractory metal on the silicon wafer. The wafer is transferred to an unloading lock where it is allowed to cool and is then removed.
摘要翻译：用于在硅晶片上的诸如钨的难熔金属的低压，冷壁，化学气相沉积的方法和装置。将硅晶片引入装载锁中，其中压力降低至低于大气压。将硅晶片转移到沉积室，在其中将其加热到升高的温度。将难熔金属羰基蒸气引入沉积室中并解离以在硅晶片上沉积难熔金属。将晶片转移到卸载锁上，在其中允许其冷却，然后将其移除。

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