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1. 发明授权

US4886954A Hot wall diffusion furnace and method for operating the furnace 失效
标题翻译：热壁扩散炉及其操作方法
公开(公告)号：US4886954A
公开(公告)日：1989-12-12
申请号：US181787
申请日：1988-04-15
申请人： Chorng-Tao Yu , Michael A. Fisk , Alan Emami
发明人： Chorng-Tao Yu , Michael A. Fisk , Alan Emami
IPC分类号： C30B31/12 , F27D19/00 , G05D23/22
CPC分类号： C30B31/12 , F27D19/00 , G05D23/1934 , G05D23/22 , F27D2019/0037
摘要： A diffusion furnace and method for processing semiconductor wafers standing on edge wherein the furnace has vertically adjacent electrical resistance heating elements wired in parallel and disposed above the wafers. This arrangement enables the heat input to the furnace by the heating elements to be varied. In a preferred embodiment, the heating elements in the upper section of the tube are connected in one circuit and the heating elements in the lower section of the tube are connected in a second circuit and each circuit is controlled in response to the temperature in that section.
摘要翻译：一种用于处理位于边缘的半导体晶片的扩散炉和方法，其中炉具有垂直相邻的电阻加热元件并联布置并设置在晶片之上。这种布置使得能够改变由加热元件输入到炉的热量。在优选实施例中，管的上部中的加热元件连接在一个电路中，并且管的下部中的加热元件在第二电路中连接，并且响应于该部分中的温度来控制每个电路。

2. 发明授权

US5131752A Method for film thickness endpoint control 失效
标题翻译：薄膜厚度终点控制方法
公开(公告)号：US5131752A
公开(公告)日：1992-07-21
申请号：US545997
申请日：1990-06-28
申请人： Chorng-Tao Yu , Kenneth H. Isaak
发明人： Chorng-Tao Yu , Kenneth H. Isaak
IPC分类号： G01B11/06 , G01N21/21 , H01L21/66
CPC分类号： B24B37/013 , G01B11/0683 , G01N21/211 , H01L22/26
摘要： Endpoint control of thickness of a film being deposited or etched is achieved by use of an ellipsometer that derives delta and psi coordinates of a polarized light beam reflected from the work piece during the course of processing. Measured film thickness is a function of the delta and psi coordinates and other parameters. Delta and psi coordinates of a selected end point (final film thickness) of the process are calculated, and an unbounded line through the endpoint perpendicular to the direction of a plot of delta and psi coordinates adjacent the endpoint is defined. As the processing continues, an ERROR is generated that becomes zero when measured delta and psi coordinates are on the line. When this error changes sign, in the appropriate cycle and within a reasonable range of the endpoint, the desired thickness has been attained, and the process is stopped. The improved film thickness endpoint control is used in a rapid thermal processing system wherein temperatures are changed at a rate of 100.degree. C. or more to deposit or etch film on a substrate. Instead of using a fixed time and other fixed parameters to control film thickness, the described precision endpoint control is employed to obtain increased accuracy of control of the rapid thermal processing system.
摘要翻译：通过使用椭圆偏振仪来实现沉积或蚀刻的膜的厚度的端点控制，所述椭偏仪在处理过程中导出从工件反射的偏振光束的δ和psi坐标。测量的膜厚度是Δ和psi坐标等参数的函数。计算过程的选定终点（最终膜厚度）的Δ和psi坐标，并且定义通过垂直于邻近该端点的Δ和psi坐标图的方向的端点的无界线。随着处理的进行，产生一个ERROR，当测量的delta和psi坐标在线上时，该值将变为零。当该错误改变符号时，在适当的循环中并且在端点的合理范围内，已经达到所需的厚度，并且该过程被停止。改进的膜厚度终点控制用于快速热处理系统，其中以100℃或更高的速率改变温度以在衬底上沉积或蚀刻膜。代替使用固定时间和其他固定参数来控制膜厚度，采用所描述的精确端点控制来获得快速热处理系统的控制精度。

3. 发明授权

US4711989A Diffusion furnace multizone temperature control 失效
标题翻译：扩散炉多区域温度控制
公开(公告)号：US4711989A
公开(公告)日：1987-12-08
申请号：US864676
申请日：1986-05-19
申请人： Chorng-Tao Yu
发明人： Chorng-Tao Yu
IPC分类号： C30B31/12 , C30B31/18 , H05B3/64
CPC分类号： C30B31/12 , C30B31/18
摘要： There is a substantial heat loss and drop in temperature in a hot-wall diffusion tube when a batch of wafers at room temperature is loaded into the tube. The temperature of the atmosphere in a zone in the tube is quickly recovered by sensing both the temperature of the tube atmosphere and the temperature of a heating element surrounding the zone with thermocouples, mixing the signals of the thermocouples to produce a ratio average signal and then controlling the heat input to the heating elements in response to the ratio average of the sensed temperature.
摘要翻译：当将一批在室温下的晶片装载到管中时，热壁扩散管中存在显着的热损失和温度下降。通过用热电偶感测管气氛的温度和围绕该区域的加热元件的温度，快速恢复管中区域中的气氛的温度，混合热电偶的信号以产生比率平均信号，然后响应于感测温度的平均值控制加热元件的热量输入。

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