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1. 发明授权

US5916366A Substrate spin treating apparatus 失效
标题翻译：底物旋转处理装置
公开(公告)号：US5916366A
公开(公告)日：1999-06-29
申请号：US944229
申请日：1997-10-06
申请人： Tsutomu Ueyama , Akira Izumi , Hideki Adachi
发明人： Tsutomu Ueyama , Akira Izumi , Hideki Adachi
IPC分类号： B05C11/08 , B08B11/02 , G03F7/16 , H01L21/00 , H01L21/687 , B05C5/00
CPC分类号： H01L21/68728 , B05C11/08 , B08B11/02 , G03F7/162 , H01L21/6715 , H01L21/68792 , Y10S134/902
摘要： A substrate treating apparatus for performing a predetermined treatment of a substrate in a spin, has a spin motor including a rotor having a hollow opening centrally thereof, and a stator disposed coaxially with the rotor and having a hollow opening centrally thereof. The rotor includes holders for supporting the substrate in three peripheral positions thereof. A support mechanism switches the holders between a position for supporting the substrate, and a position retracted therefrom. The opposite surfaces of the substrate supported by the holders are cleaned with a cleaning solution supplied through nozzles. The holders have a substrate supporting force derived from a weight and magnetism of the support mechanism, to support the substrate reliably. A guide is disposed in the hollow of the rotor, and connected to the rotor. The holders are arranged in a substrate treating space formed inwardly of the guide. The holders are arranged on the guide. Thus, the spin motor is protected from exposure to a treating solution atmosphere.
摘要翻译：一种用于在旋转中进行基板的预定处理的基板处理装置，具有包括其中心具有中空开口的转子的旋转马达和与该转子同轴配置并具有中心的中空开口的定子。转子包括用于在其三个周边位置支撑基板的保持器。支撑机构在支撑基板的位置和从其缩回的位置之间切换支架。由保持器支撑的基板的相对表面用通过喷嘴提供的清洁溶液进行清洁。保持器具有源自支撑机构的重量和磁力的基板支撑力，以可靠地支撑基板。引导件设置在转子的中空中并连接到转子。保持器布置在形成在引导件内部的基板处理空间中。支架安置在导轨上。因此，保护旋转马达免于暴露于处理溶液气氛中。

2. 发明授权

US5571325A Subtrate processing apparatus and device for and method of exchanging substrate in substrate processing apparatus 失效
标题翻译： Subtrate处理装置及其在衬底处理装置中的衬底交换方法
公开(公告)号：US5571325A
公开(公告)日：1996-11-05
申请号：US476052
申请日：1995-06-07
申请人： Tsutomu Ueyama , Hideki Adachi , Yoshio Matsumura , Yasuhide Tanaka
发明人： Tsutomu Ueyama , Hideki Adachi , Yoshio Matsumura , Yasuhide Tanaka
IPC分类号： G03F7/20 , H01L21/00 , H01L21/677 , H01L21/687 , B05C13/02
CPC分类号： G03F7/7075 , G03F7/70733 , H01L21/67161 , H01L21/67178 , H01L21/67742 , H01L21/67748 , H01L21/67751 , H01L21/68707 , Y10S414/135 , Y10S414/136 , Y10S414/14
摘要： A substrate processing apparatus comprises a processing part and a transferring part. In the processing part there are a plurality of stages in which a plurality of processing units are arranged in a row along a horizontal direction and the stages are arranged in a stack vertically. Thus, the processing units are arranged in matrix. The transferring part includes a plurality of horizontal transferring devices each movable in the horizontal direction and a vertical transferring device movable in the vertical direction. Hence, a substrate is movable both horizontally and vertically to be transferred to the desired processing unit.
摘要翻译：基板处理装置包括处理部和转印部。在处理部分中，存在多个处理单元沿着水平方向排列成一排的多个阶段，并且这些阶段以堆叠方式垂直排列。因此，处理单元被布置成矩阵。传送部分包括可沿水平方向移动的多个水平传送装置和可在垂直方向上移动的垂直传送装置。因此，基板可以水平和垂直地移动以被转移到期望的处理单元。

3. 发明授权

US06926057B2 Thin film forming apparatus and thin film forming method 有权
标题翻译：薄膜形成装置和薄膜形成方法
公开(公告)号：US06926057B2
公开(公告)日：2005-08-09
申请号：US10216002
申请日：2002-08-08
申请人： Tsutomu Ueyama , Izuru Iseki
发明人： Tsutomu Ueyama , Izuru Iseki
IPC分类号： H01L21/027 , H01L21/00 , H01L21/48 , H01L21/768 , H01L23/498 , H01L51/00 , H01L51/40 , H05K3/20 , H01L21/31 , B32B35/00 , H01L21/316
CPC分类号： H01L21/67092 , H01L21/4867 , H01L21/768 , H01L21/76877 , H01L23/49816 , H01L51/0013 , H01L2224/16 , H01L2924/01055 , H01L2924/01078 , H01L2924/15311 , H05K3/20 , Y10T29/5313 , Y10T156/1705
摘要： Apparatus for forming a thin film pattern on the surface of a substrate. This apparatus is provided with: a transfer member having a thin film carrying surface which carries a thin film pattern; and a thin film transfer mechanism for joining the transfer member to a substrate for transferring, to the substrate, the thin film pattern on the thin film carrying surface. The thin film pattern may be a wiring film pattern. A gelatinous film may previously be formed on the substrate, and the thin film pattern may be transferred as embedded in the gelatinous film.
摘要翻译：用于在基板的表面上形成薄膜图案的装置。该装置设置有：具有承载薄膜图案的薄膜承载表面的转印构件; 以及用于将转印构件接合到用于将薄膜承载表面上的薄膜图案转印到基板的薄膜转移机构。薄膜图案可以是布线膜图案。可以预先在基底上形成凝胶状膜，并且可以将薄膜图案嵌入凝胶膜中转移。

4. 发明授权

US4642701A Device of switching a scanning beam diameter 失效
标题翻译：切换扫描光束直径的装置
公开(公告)号：US4642701A
公开(公告)日：1987-02-10
申请号：US675706
申请日：1984-11-28
申请人： Kiyoshi Maeda , Tsutomu Ueyama
发明人： Kiyoshi Maeda , Tsutomu Ueyama
IPC分类号： G02B26/10 , G02B27/14 , H04N1/024 , H04N1/04 , H04N1/113 , H04N1/23 , H04N1/21 , G01D9/42
CPC分类号： G02B27/144 , G02B27/145 , H04N1/024 , H04N1/0402
摘要： A device for switching a scanning beam diameter, incorporated into a picture image scanning and recording device, which switches the diameter of the scanning beam in response to the density of number of scanning lines. The beam from a scanning light generator is branched at least into two optical paths and the diameter of at least one of the branched beams is magnified by a beam expander. The branched optical paths are unified again into a single path and, in order to pass the beam through one desired optical path a shutter device is provided.
摘要翻译：用于切换扫描光束直径的装置，其结合到图像扫描和记录装置中，其响应于扫描线数量的密度来切换扫描光束的直径。来自扫描光发生器的光束至少分支成两个光路，并且至少一个分支光束的直径由光束扩展器放大。分支的光路再次被统一为单个路径，并且为了使光束通过一个期望的光路，提供了快门装置。

5. 发明申请

US20050139313A1 Thin film forming apparatus and thin film forming method 审中-公开
公开(公告)号：US20050139313A1
公开(公告)日：2005-06-30
申请号：US11056795
申请日：2005-02-11
申请人： Tsutomu Ueyama , Izuru Iseki
发明人： Tsutomu Ueyama , Izuru Iseki
IPC分类号： H01L21/31 , B32B38/10 , H01L21/20 , H01L21/316 , B44C1/165
CPC分类号： B32B38/10 , B32B37/025 , B32B2457/14 , Y10T156/171 , Y10T156/1744 , Y10T156/19
摘要： With a thin film bearing surface of a substrate directed toward an insulation film which is formed on a surface of a quartz plate, the substrate and the quartz plate are moved closer to each other and the insulation film is tightly adhered to the thin film bearing surface (adhering process). The quartz plate alone is then selectively peeled off, thereby completing transfer of the insulation film onto the substrate (peeling process). In this manner, the insulation film is disposed on the thin film bearing surface of the substrate, and a transportation mechanism then houses the substrate in a substrate cassette. Meanwhile, after the quartz plate is transported by the transportation mechanism to a cleaning unit and cleaned by the cleaning unit (cleaning process), the quartz plate is returned to a plate-like member cassette and waits in this cassette until reused next time.

6. 发明授权

US4757223A Linear actuator 失效
标题翻译：线性执行机构
公开(公告)号：US4757223A
公开(公告)日：1988-07-12
申请号：US004587
申请日：1987-01-20
申请人： Tsutomu Ueyama
发明人： Tsutomu Ueyama
IPC分类号： H02K41/06 , H01L41/09 , H02N2/00 , H02K7/06
CPC分类号： H02N2/02
摘要： A linear actuator constructed so as to convert deformation movements of a plurality of electrostrictive elements to a reciprocating movement of an output shaft thereof. The linear actuator comprises a planetary driving unit adapted to be driven by a plurality of electrostrictive elements in a casing body thereof, a precessional driving unit adapted to be driven by a plurality of electrostrictive elements therein a contact ring connected interlockingly to both the planetary driving unit and the precessional driving unit therein and the output shaft engaged loosely to the interior surface of the contact ring and supported reciprocatively by the casing body. The voltages applied to the electrostrictive elements are controlled so as for the contact ring to be driven to perform a planetary movement with being pressed onto the output shaft and to be driven to perform a precessional movement by the precessional driving unit. The contact point between the contact ring and the output shaft results in being driven to perform a relative movement with describing a spiral path by those planetary and precessional movements.
摘要翻译：线性致动器，其被构造成将多个电致伸缩元件的变形运动转换成其输出轴的往复运动。线性致动器包括适于由其壳体内的多个电致伸缩元件驱动的行星驱动单元，适于由多个电致伸缩元件驱动的进动驱动单元，该接触环与行星驱动单元互锁地连接并且其中的进动驱动单元和输出轴松动地接合到接触环的内表面并且由壳体主体往复运动。控制施加到电致伸缩元件的电压，使得接触环被驱动以通过被按压到输出轴上而进行行星运动，并被驱动以由进动驱动单元执行进动运动。接触环和输出轴之间的接触点导致被驱动以通过这些行星和进动运动描述螺旋路径进行相对运动。

7. 发明授权

US4707123A Film end holding device 失效
标题翻译：胶片保持装置
公开(公告)号：US4707123A
公开(公告)日：1987-11-17
申请号：US869654
申请日：1986-06-02
申请人： Tsutomu Ueyama
发明人： Tsutomu Ueyama
IPC分类号： B41J13/22 , G03B1/48 , G03B27/58 , G03B27/60 , G03G15/00 , H04N1/08
CPC分类号： G03G15/752 , G03B27/60 , H04N1/08
摘要： A film end holding device comprises a film holding plate, an operating plate, guide bushes and a contact member, in which the operating plate moves obliquely when pushed in the axial direction of a drum on which a film is to be fixed. The holding plate moves in the circumferential direction of the drum, and the operating plate (17) runs on an angle portion of the holding plate so that an end of a film may be held by the contact member of the holding plate on the drum.
摘要翻译：胶片保持装置包括胶片保持板，操作板，导向衬套和接触构件，其中当沿着要固定胶片的滚筒的轴向方向被推动时，操作板倾斜移动。保持板沿着滚筒的圆周方向移动，并且操作板（17）在保持板的角度部分上延伸，使得薄膜的端部可以被保持板的接触构件保持在滚筒上。

8. 发明授权

US06918421B2 Thin film forming apparatus and thin film forming method 失效
标题翻译：薄膜形成装置和薄膜形成方法
公开(公告)号：US06918421B2
公开(公告)日：2005-07-19
申请号：US10263513
申请日：2002-10-01
申请人： Tsutomu Ueyama , Izuru Iseki
发明人： Tsutomu Ueyama , Izuru Iseki
IPC分类号： H01L21/31 , B32B38/10 , H01L21/20 , H01L21/316 , B23K37/00 , B32B31/04 , B32B31/20 , H01L21/28 , H01L21/46
CPC分类号： B32B38/10 , B32B37/025 , B32B2457/14 , Y10T156/171 , Y10T156/1744 , Y10T156/19
摘要： With a thin film bearing surface of a substrate directed toward an insulation film which is formed on a surface of a quartz plate, the substrate and the quartz plate are moved closer to each other and the insulation film is tightly adhered to the thin film bearing surface (adhering process). The quartz plate alone is then selectively peeled off, thereby completing transfer of the insulation film onto the substrate (peeling process). In this manner, the insulation film is disposed on the thin film bearing surface of the substrate, and a transportation mechanism then houses the substrate in a substrate cassette. Meanwhile, after the quartz plate is transported by the transportation mechanism to a cleaning unit and cleaned by the cleaning unit (cleaning process), the quartz plate is returned to a plate-like member cassette and waits in this cassette until reused next time.
摘要翻译：利用形成在石英板表面上的朝向绝缘膜的基板的薄膜承载面，基板和石英板彼此靠近移动，并且绝缘膜紧密地附着在薄膜承载表面上（附着工序）。然后选择性地剥离石英板，从而完成将绝缘膜转移到基板上（剥离过程）。以这种方式，绝缘膜设置在基板的薄膜承载表面上，并且输送机构然后将基板容纳在基板盒中。同时，在将石英板由输送机构输送到清洁单元并通过清洁单元进行清洁（清洗处理）之后，将石英板返回到板状构件盒中，并在该盒中等待直到重新使用。

9. 发明授权

US06911088B2 Substrate processing apparatus and slit nozzle 失效
标题翻译：基板加工装置和狭缝喷嘴
公开(公告)号：US06911088B2
公开(公告)日：2005-06-28
申请号：US10391910
申请日：2003-03-18
申请人： Hiroyuki Kitazawa , Tsutomu Ueyama
发明人： Hiroyuki Kitazawa , Tsutomu Ueyama
IPC分类号： G03F7/16 , B05B1/04 , B05C5/02 , C03C17/00 , H01L21/027 , B05C5/00
CPC分类号： C03C17/002 , B05C5/0258
摘要： A slit nozzle includes a solution feeding mechanism having an elastic element and a plurality of piezoelectric devices and embedded in a side surface of a flow passage near a slit in the slit nozzle. Control is effected so that the piezoelectric devices are vibrated to cause the elastic element to produce traveling waves toward the slit. A resist solution serving as a processing solution is pumped by the traveling waves, thereby to be discharged through the slit toward a substrate. This provides a substrate processing apparatus capable of smoothly discharging the processing solution to accomplish high discharge accuracy.
摘要翻译：狭缝喷嘴包括具有弹性元件和多个压电装置的溶液供给机构，并且嵌入在狭缝喷嘴中的狭缝附近的流动通道的侧表面中。进行控制使得压电装置振动以使弹性元件产生朝向狭缝的行波。作为处理液的抗蚀剂溶液被行波泵送，从而通过狭缝朝向基板排出。这提供了能够顺利地排出处理液以实现高放电精度的基板处理装置。

10. 发明授权

US06859616B2 Apparatus for and method of heat treatment by light irradiation 有权
标题翻译：光照射加热处理装置及方法
公开(公告)号：US06859616B2
公开(公告)日：2005-02-22
申请号：US10729460
申请日：2003-12-05
申请人： Tatsufumi Kusuda , Tsutomu Ueyama
发明人： Tatsufumi Kusuda , Tsutomu Ueyama
IPC分类号： H01L21/324 , H01L21/00 , H05B3/00 , F26B19/00
CPC分类号： H01L21/67115 , H05B3/0047
摘要： A semiconductor wafer is held by support pins horizontally. A susceptor and a heating plate are moved upwardly so that the semiconductor wafer is transferred from the support pins to the susceptor. At this time, a gas layer is sandwiched between the upper surface of the susceptor and the lower surface of the semiconductor wafer to cause the semiconductor wafer to float over the upper surface of the susceptor for about seventy seconds immediately after the semiconductor wafer is mounted on the upper surface of the susceptor. Then, flash lamps are lit up to perform flash heating while the semiconductor wafer is floating over the upper surface of the susceptor. Even when flashlight irradiation causes rapid thermal expansion of the wafer surface, the semiconductor wafer does not suffer a great stress. This can prevent the semiconductor wafer from breaking.
摘要翻译：半导体晶片由支撑销水平地保持。感受器和加热板向上移动，使得半导体晶片从支撑销转移到基座。此时，气氛层被夹在基座的上表面和半导体晶片的下表面之间，以使半导体晶片在半导体晶片安装之后立即漂浮在基座的上表面上大约七十秒感受器的上表面。然后，闪光灯点亮以进行闪光加热，同时半导体晶片浮在基座的上表面上。即使当手电筒照射导致晶片表面的快速热膨胀时，半导体晶片也不会承受很大的应力。这可以防止半导体晶片破裂。

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