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    • 1. 发明授权
    • Substrate spin treating apparatus
    • 底物旋转处理装置
    • US5916366A
    • 1999-06-29
    • US944229
    • 1997-10-06
    • Tsutomu UeyamaAkira IzumiHideki Adachi
    • Tsutomu UeyamaAkira IzumiHideki Adachi
    • B05C11/08B08B11/02G03F7/16H01L21/00H01L21/687B05C5/00
    • H01L21/68728B05C11/08B08B11/02G03F7/162H01L21/6715H01L21/68792Y10S134/902
    • A substrate treating apparatus for performing a predetermined treatment of a substrate in a spin, has a spin motor including a rotor having a hollow opening centrally thereof, and a stator disposed coaxially with the rotor and having a hollow opening centrally thereof. The rotor includes holders for supporting the substrate in three peripheral positions thereof. A support mechanism switches the holders between a position for supporting the substrate, and a position retracted therefrom. The opposite surfaces of the substrate supported by the holders are cleaned with a cleaning solution supplied through nozzles. The holders have a substrate supporting force derived from a weight and magnetism of the support mechanism, to support the substrate reliably. A guide is disposed in the hollow of the rotor, and connected to the rotor. The holders are arranged in a substrate treating space formed inwardly of the guide. The holders are arranged on the guide. Thus, the spin motor is protected from exposure to a treating solution atmosphere.
    • 一种用于在旋转中进行基板的预定处理的基板处理装置,具有包括其中心具有中空开口的转子的旋转马达和与该转子同轴配置并具有中心的中空开口的定子。 转子包括用于在其三个周边位置支撑基板的保持器。 支撑机构在支撑基板的位置和从其缩回的位置之间切换支架。 由保持器支撑的基板的相对表面用通过喷嘴提供的清洁溶液进行清洁。 保持器具有源自支撑机构的重量和磁力的基板支撑力,以可靠地支撑基板。 引导件设置在转子的中空中并连接到转子。 保持器布置在形成在引导件内部的基板处理空间中。 支架安置在导轨上。 因此,保护​​旋转马达免于暴露于处理溶液气氛中。