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1. 发明授权

US07651761B2 Grinding pad and method of producing the same 有权
标题翻译：研磨垫及其制造方法
公开(公告)号：US07651761B2
公开(公告)日：2010-01-26
申请号：US10494249
申请日：2002-10-03
申请人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Takashi Masui , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura , Hiroshi Seyanagi
发明人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Takashi Masui , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura , Hiroshi Seyanagi
IPC分类号： B32B3/26 , B32B3/00
CPC分类号： C08G18/00 , B24B37/24 , B24D3/30 , B24D18/00 , C08G18/10 , C08G18/12 , C08G18/4211 , C08G18/4236 , C08G18/4808 , C08G18/4854 , C08G18/61 , C08G18/664 , C08G18/6674 , C08G18/724 , C08G2101/00 , C08G2101/0066 , C08J9/0061 , C08J2205/052 , C08J2375/04 , C08J2483/00 , C08L83/00 , C09D175/08 , H01L21/30625 , Y10T428/249953 , Y10T428/249976 , C08G18/3814 , C08G18/3243 , C08G18/5096
摘要： The invention provides a polishing pad by which optical materials such as lenses, reflecting mirrors etc., or materials requiring a high degree of surface planarity, as in the polishing of silicone wafers, glass substrates or aluminum substrates for hard disks, or general metal polishing, can be flattened with stability and high polishing efficiency. The invention also provides a polishing pad for semiconductor wafers, which is superior in planarizing characteristic, is free from scratches and can be produced at low cost. There is provided a polishing pad which is free from dechucking error so that neither damage to wafers nor decrease in operating efficiency occurs. There is provided a polishing pad which is satisfactory in planarity, within wafer uniformity, and polishing rate and produces less change in polishing rate. There is provided a polishing pad which can make planarity improvement and scratch decrease compatible.
摘要翻译：本发明提供了抛光垫，通过该抛光垫，诸如透镜，反射镜等的光学材料或需要高度表面平坦度的材料，如在硅树脂晶片，玻璃基板或用于硬盘的铝基板的抛光中，或通常的金属抛光，可平坦化，抛光效率高。本发明还提供一种平面化特性优异的半导体晶片用抛光垫，无磨损，可以低成本地制造。提供了没有脱扣误差的抛光垫，从而不会损坏晶片，也不会降低工作效率。提供了平面性良好，晶片均匀性和抛光速度均匀且抛光速度变化小的抛光垫。提供了可以使平面性改善和划痕减少兼容的抛光垫。

2. 发明申请

US20050064709A1 Grinding pad and method of producing the same 有权
标题翻译：研磨垫及其制造方法
公开(公告)号：US20050064709A1
公开(公告)日：2005-03-24
申请号：US10494249
申请日：2002-10-03
申请人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Takashi Masui , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura , Hiroshi Seyanagi
发明人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Takashi Masui , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura , Hiroshi Seyanagi
IPC分类号： B24B37/24 , B24D3/30 , C08G18/00 , C08G18/10 , C08G18/12 , C08G18/66 , C08G18/72 , H01L21/306 , H01L21/302 , H01L21/461
CPC分类号： C08G18/00 , B24B37/24 , B24D3/30 , B24D18/00 , C08G18/10 , C08G18/12 , C08G18/4211 , C08G18/4236 , C08G18/4808 , C08G18/4854 , C08G18/61 , C08G18/664 , C08G18/6674 , C08G18/724 , C08G2101/00 , C08G2101/0066 , C08J9/0061 , C08J2205/052 , C08J2375/04 , C08J2483/00 , C08L83/00 , C09D175/08 , H01L21/30625 , Y10T428/249953 , Y10T428/249976 , C08G18/3814 , C08G18/3243 , C08G18/5096
摘要： The invention provides a polishing pad by which optical materials such as lenses, reflecting mirrors etc., or materials requiring a high degree of surface planarity, as in the polishing of silicone wafers, glass substrates or aluminum substrates for hard disks, or general metal polishing, can be flattened with stability and high polishing efficiency. The invention also provides a polishing pad for semiconductor wafers, which is superior in planarizing characteristic, is free from scratches and can be produced at low cost. There is provided a polishing pad which is free from dechucking error so that neither damage to wafers nor decrease in operating efficiency occurs. There is provided a polishing pad which is satisfactory in planarity, within wafer uniformity, and polishing rate and produces less change in polishing rate. There is provided a polishing pad which can make planarity improvement and scratch decrease compatible.
摘要翻译：本发明提供了抛光垫，通过该抛光垫，诸如透镜，反射镜等的光学材料或需要高度表面平坦度的材料，如在硅树脂晶片，玻璃基板或用于硬盘的铝基板的抛光中，或通常的金属抛光，可平坦化，抛光效率高。本发明还提供一种平面化特性优异的半导体晶片用抛光垫，无磨损，可以低成本地制造。提供了没有脱扣误差的抛光垫，从而不会损坏晶片，也不会降低工作效率。提供了平面性良好，晶片均匀性和抛光速度均匀且抛光速度变化小的抛光垫。提供了可以使平面性改善和划痕减少兼容的抛光垫。

3. 发明授权

US08318825B2 Polishing pad and method of producing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US08318825B2
公开(公告)日：2012-11-27
申请号：US11466878
申请日：2006-08-24
申请人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Takashi Masui , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura
发明人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Takashi Masui , Shigeru Komai , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Tsuyoshi Kimura
IPC分类号： C08G18/28
CPC分类号： C08G18/00 , B24B37/24 , B24D3/30 , B24D18/00 , C08G18/10 , C08G18/12 , C08G18/4211 , C08G18/4236 , C08G18/4808 , C08G18/4854 , C08G18/61 , C08G18/664 , C08G18/6674 , C08G18/724 , C08G2101/00 , C08G2101/0066 , C08J9/0061 , C08J2205/052 , C08J2375/04 , C08J2483/00 , C08L83/00 , C09D175/08 , H01L21/30625 , Y10T428/249953 , Y10T428/249976 , C08G18/3814 , C08G18/3243 , C08G18/5096
摘要： The invention provides a polishing pad by which optical materials such as lenses, reflecting mirrors etc., or materials requiring a high degree of surface planarity, as in the polishing of silicone wafers, glass substrates or aluminum substrates for hard disks, or general metal polishing, can be flattened with stability and high polishing efficiency. The invention also provides a polishing pad for semiconductor wafers, which is superior in planarizing characteristic, is free from scratches and can be produced at low cost. There is provided a polishing pad which is free from dechucking error so that neither damage to wafers nor decrease in operating efficiency occurs. There is provided a polishing pad which is satisfactory in planarity, within wafer uniformity, and polishing rate and produces less change in polishing rate. There is provided a polishing pad which can make planarity improvement and scratch decrease compatible.
摘要翻译：本发明提供了抛光垫，通过该抛光垫，诸如透镜，反射镜等的光学材料或需要高度表面平坦度的材料，如在硅树脂晶片，玻璃基板或用于硬盘的铝基板的抛光中，或通常的金属抛光，可平坦化，抛光效率高。本发明还提供一种平面化特性优异的半导体晶片用抛光垫，无磨损，可以低成本地制造。提供了没有脱扣误差的抛光垫，从而不会损坏晶片，也不会降低工作效率。提供了平面性良好，晶片均匀性和抛光速度均匀且抛光速度变化小的抛光垫。提供了可以使平面性改善和划痕减少兼容的抛光垫。

4. 发明申请

US20060280930A1 POLISHING PAD AND METHOD OF PRODUCING THE SAME 有权
公开(公告)号：US20060280930A1
公开(公告)日：2006-12-14
申请号：US11466909
申请日：2006-08-24
申请人： Tetsuo SHIMOMURA , Masahiko NAKAMORI , Takatoshi YAMADA , Takashi Masui , Shigeru KOMAI , Koichi ONO , Kazuyuki OGAWA , Atsushi KAZUNO , Tsuyoshi KIMURA , Hiroshi Seyanagi
发明人： Tetsuo SHIMOMURA , Masahiko NAKAMORI , Takatoshi YAMADA , Takashi Masui , Shigeru KOMAI , Koichi ONO , Kazuyuki OGAWA , Atsushi KAZUNO , Tsuyoshi KIMURA , Hiroshi Seyanagi
IPC分类号： B32B3/26 , B24B9/00 , B24B7/00
CPC分类号： C08G18/00 , B24B37/24 , B24D3/30 , B24D18/00 , C08G18/10 , C08G18/12 , C08G18/4211 , C08G18/4236 , C08G18/4808 , C08G18/4854 , C08G18/61 , C08G18/664 , C08G18/6674 , C08G18/724 , C08G2101/00 , C08G2101/0066 , C08J9/0061 , C08J2205/052 , C08J2375/04 , C08J2483/00 , C08L83/00 , C09D175/08 , H01L21/30625 , Y10T428/249953 , Y10T428/249976 , C08G18/3814 , C08G18/3243 , C08G18/5096
摘要： The invention provides a polishing pad by which optical materials such as lenses, reflecting mirrors etc., or materials requiring a high degree of surface planarity, as in the polishing of silicone wafers, glass substrates or aluminum substrates for hard disks, or general metal polishing, can be flattened with stability and high polishing efficiency. The invention also provides a polishing pad for semiconductor wafers, which is superior in planarizing characteristic, is free from scratches and can be produced at low cost. There is provided a polishing pad which is free from dechucking error so that neither damage to wafers nor decrease in operating efficiency occurs. There is provided a polishing pad which is satisfactory in planarity, within wafer uniformity, and polishing rate and produces less change in polishing rate. There is provided a polishing pad which can make planarity improvement and scratch decrease compatible.

5. 发明授权

US07378454B2 Polyurethane composition and polishing pad 有权
标题翻译：聚氨酯组合物和抛光垫
公开(公告)号：US07378454B2
公开(公告)日：2008-05-27
申请号：US10474370
申请日：2002-04-04
申请人： Takashi Masui , Masahiko Nakamori , Takatoshi Yamada , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi
发明人： Takashi Masui , Masahiko Nakamori , Takatoshi Yamada , Koichi Ono , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi
IPC分类号： C08G18/06
CPC分类号： B24B37/24 , C08G18/10 , C08G18/12 , C08G18/6674 , C08G18/724 , C08G2101/0066 , C08L1/00 , C08L33/00 , C08L75/04 , C08G18/3876 , C08G18/3812 , C08L2666/02
摘要： A polyurethane composition containing solid beads dispersed therein, is formed of a microcellular polyurethane foam, and the composition has a storage modulus of elasticity at 40° C. of 270 MPa or more as measured by means of a dynamic elasticity measuring device. Another polyurethane composition of this invention contains solid beads dispersed therein, that are capable of swelling with or are soluble in an aqueous medium. The former composition has excellent flattening capability, and the latter composition can provide a polished surface which combines good flatness and good uniformity and can also reduce scratches on the surface.
摘要翻译：包含分散在其中的固体珠的聚氨酯组合物由微孔聚氨酯泡沫形成，并且组合物通过动态弹性测量装置测量，其在40℃下的储能弹性模量为270MPa或更大。本发明的另一种聚氨酯组合物包含分散在其中的固体珠，其能够在水性介质中溶胀或溶解。前者的组合物具有优异的压平能力，后者的组合物可以提供结合良好的平整度和均匀性的抛光表面，并且还可以减少表面上的划痕。

6. 发明授权

US07098255B2 Process for producing polyurethane foam 有权
标题翻译：生产聚氨酯泡沫的方法
公开(公告)号：US07098255B2
公开(公告)日：2006-08-29
申请号：US10881756
申请日：2004-06-30
申请人： Hiroshi Seyanagi , Kaoru Inoue , Kazuyuki Ogawa , Takashi Masui , Koichi Ono
发明人： Hiroshi Seyanagi , Kaoru Inoue , Kazuyuki Ogawa , Takashi Masui , Koichi Ono
IPC分类号： C08G18/28
CPC分类号： C08J9/30 , B24B37/24 , B24D3/28 , C08J9/0061 , C08J2375/04 , C08J2483/00
摘要： A process for producing a finely cellular polyurethane foam by mixing a first ingredient comprising an isocyanate compound and a second ingredient comprising a compound containing an active hydrogen group, characterized by comprising adding a nonionic silicone surfactant containing no hydroxyl group to at least one of the first ingredient and the second ingredient in an amount of 0.1 to 5 wt %, excluding 5 wt %, based on the total amount of the first ingredient and the second ingredient, subsequently agitating the surfactant containing ingredient together with an unreactive gas, which has no reactivity to isocyanate group or active hydrogen group, to disperse the unreactive gas as fine bubbles to prepare a bubble dispersion and then mixing the bubble dispersion with the remaining ingredient to cure the resultant mixture and forming finely cellular structure into the resultant polyurethane foam by the fine bubbles of the bubble dispersion.
摘要翻译：一种通过混合包含异氰酸酯化合物的第一成分和包含含有活性氢基团的化合物的第二成分来生产细孔聚氨酯泡沫体的方法，其特征在于将不含羟基的非离子硅氧烷表面活性剂加入到第一成分和第二成分的量为0.1至5重量％，不包括5重量％，基于第一成分和第二成分的总量，随后将表面活性剂含量与不起反应性的非反应性气体一起搅拌异氰酸酯基或活性氢基团，将非活性气体分散为细小气泡以制备气泡分散体，然后将气泡分散体与剩余的组分混合，以使所得混合物固化，并通过微小气泡形成细小结构的聚氨酯泡沫体的气泡分散。

7. 发明授权

US06777455B2 Process for producing polyurethane foam 有权
公开(公告)号：US06777455B2
公开(公告)日：2004-08-17
申请号：US10111738
申请日：2002-04-25
申请人： Hiroshi Seyanagi , Kaoru Inoue , Kazuyuki Ogawa , Takashi Masui , Koichi Ono
发明人： Hiroshi Seyanagi , Kaoru Inoue , Kazuyuki Ogawa , Takashi Masui , Koichi Ono
IPC分类号： C08J900
CPC分类号： C08J9/30 , B24B37/24 , B24D3/28 , C08J9/0061 , C08J2375/04 , C08J2483/00
摘要： A process for producing a finely cellular polyurethane foam by mixing a first ingredient comprising an isocyanate compound and a second ingredient comprising a compound containing an active hydrogen group, characterized by comprising adding a nonionic silicone surfactant containing no hydroxyl group to at least one of the first ingredient and the second ingredient in an amount of 0.1 to 5 wt %, excluding 5 wt %, based on the total amount of the first ingredient and the second ingredient, subsequently agitating the surfactant containing ingredient together with an unreactive gas, which has no reactivity to isocyanate group or active hydrogen group, to disperse the unreactive gas as fine bubbles to prepare a bubble dispersion and then mixing the bubble dispersion with the remaining ingredient to cure the resultant mixture and forming finely cellular structure into the resultant polyurethane foam by the fine bubbles of the bubble dispersion.

8. 发明申请

US20140202484A1 SKIN CLEANSING COMPOSITION 有权
标题翻译：皮肤清洁组合物
公开(公告)号：US20140202484A1
公开(公告)日：2014-07-24
申请号：US14342290
申请日：2012-08-30
申请人： Takashi Masui , Hiroki Takeuchi
发明人： Takashi Masui , Hiroki Takeuchi
IPC分类号： A61K8/46 , A61K8/44 , A61K8/37 , A61Q19/10 , A61K8/36
CPC分类号： A61K8/466 , A61K8/36 , A61K8/37 , A61K8/39 , A61K8/44 , A61K8/463 , A61Q19/10
摘要： A skin cleansing composition, comprising(A) an alkyl ether carboxylic acid or a salt thereof represented by formula (1): wherein, R1 represents an alkyl group having 8 to 18 carbon atoms, n represents a number of from 0 to 20, and M represents a hydrogen atom, alkali metal, alkaline earth metal, ammonium, or organic ammonium, wherein, R1 has an average carbon number of from 10.8 to 12.8 and the average value of n is from 2.5 to 3.4, and wherein, the alkyl ether carboxylic acid or a salt thereof contains a component in which n=0 in an amount of from 9.9 to 27% by mass, and contains a component in which n=1 and a component in which n=2 in a total amount of less than 40% by mass, and (B) an alkyl sulfate or polyoxyethylene alkyl sulfate represented by formula (2): wherein, R2 represents an alkyl group or an alkenyl group having 8 to 22 carbon atoms, m represents a number of from 0 to 20 and the average of m is less than 2, and Y represents a hydrogen atom or a cation selected from alkali metal, alkaline earth metal, ammonium, alkyl ammonium, alkanol ammonium, and glucammonium. R1—O—(CH2CH2O)n—CH2—COOM (1) R2—O—(CH2CH2O)m—SO3Y (2)
摘要翻译：一种皮肤清洁组合物，其包含（A）由式（1）表示的烷基醚羧酸或其盐：其中，R 1表示碳原子数为8〜18的烷基，n表示0〜20的数， M表示氢原子，碱金属，碱土金属，铵或有机铵，其中，R1的平均碳数为10.8〜12.8，n的平均值为2.5〜3.4，其中，烷基醚羧酸或其盐含有其中n = 0的组分，其量为9.9至27质量％，并且包含其中n = 1的组分和n = 2的组分，其总量小于 40质量％，（B）由式（2）表示的烷基硫酸盐或聚氧乙烯烷基硫酸盐：其中，R2表示碳原子数为8〜22的烷基或烯基，m表示0〜20的数 m的平均值小于2，Y表示氢原子或选自碱的阳离子金属，碱土金属，铵，烷基铵，链烷醇铵和葡萄糖铵。 R1-O-（CH2CH2O）n-CH2-COOM（1）R2-O-（CH2CH2O）m-SO3Y（2）

9. 发明申请

US20130239985A1 CLEANSING COMPOSITION 有权
标题翻译：清洁组合物
公开(公告)号：US20130239985A1
公开(公告)日：2013-09-19
申请号：US13877969
申请日：2011-10-05
申请人： Pilar Castan Barberan , Michael Stapels , Takashi Masui , Hiroki Takeuchi , Masahiro Miyaki
发明人： Pilar Castan Barberan , Michael Stapels , Takashi Masui , Hiroki Takeuchi , Masahiro Miyaki
IPC分类号： A61K8/39 , A61Q19/10
CPC分类号： A61K8/39 , A61K8/463 , A61K2800/592 , A61Q19/10
摘要： A cleansing composition containing the following components (A) and (B): (A) an ether carboxylate of Formula (1) R1—O—(CH2CH2O)n—CH2—COOX (1) wherein R1 represents a linear or branched C4-C10 alkyl or alkenyl group, n represents a number from 0.5 to 20, and X represents a hydrogen atom or a cation selected from the group consisting of an alkali metal, an alkaline earth metal, ammonium, an alkylammonium, an alkanolammonium, and a glucammonium; and (B) an ether carboxylate of Formula (2) R2—O—(CH2CH2O)m-CH2—COOY (2) wherein R2 represents a linear or branched C12-C22 alkyl or alkenyl group, m represents a number from 0.5 to 20, and Y represents a hydrogen atom or a cation, selected from the group consisting of an alkali metal, an alkaline earth metal, ammonium, an alkylammonium, an alkanolammonium, and a glucammonium. R1—O—(CH2CH2O)n—CH2—COOX (1) R2—O—(CH2CH2O)m—CH2—COOY (2)
摘要翻译：含有下列组分（A）和（B）的清洁组合物：（A）式（1）的醚羧酸盐R1-O-（CH2CH2O）n-CH2-COOX（1）其中R1表示直链或支链的C4- C10烷基或烯基，n表示0.5至20的数，X表示氢原子或选自碱金属，碱土金属，铵，烷基铵，链烷醇铵和葡萄糖铵的阳离子 ; 和（B）式（2）的醚羧酸盐R2-O-（CH2CH2O）m-CH2-COOY（2）其中R2表示直链或支链C 12 -C 22烷基或烯基，m表示0.5至20的数 Y表示选自碱金属，碱土金属，铵，烷基铵，链烷醇铵和葡萄糖铵的氢原子或阳离子。 R1-O-（CH2CH2O）n-CH2-COOX（1）R2-O-（CH2CH2O）m-CH2-COOY（2）

10. 发明授权

US09522105B2 Skin cleansing composition 有权
标题翻译：皮肤清洁组合物
公开(公告)号：US09522105B2
公开(公告)日：2016-12-20
申请号：US14342290
申请日：2012-08-30
申请人： Takashi Masui , Hiroki Takeuchi
发明人： Takashi Masui , Hiroki Takeuchi
IPC分类号： A61K8/46 , A61K8/44 , A61K8/37 , A61Q19/10 , A61K8/36 , A61K8/39
CPC分类号： A61K8/466 , A61K8/36 , A61K8/37 , A61K8/39 , A61K8/44 , A61K8/463 , A61Q19/10
摘要： A skin cleansing composition, comprising (A) an alkyl ether carboxylic acid or a salt thereof represented by formula (1): wherein, R1 represents an alkyl group having 8 to 18 carbon atoms, n represents a number of from 0 to 20, and M represents a hydrogen atom, alkali metal, alkaline earth metal, ammonium, or organic ammonium, wherein, R1 has an average carbon number of from 10.8 to 12.8 and the average value of n is from 2.5 to 3.4, and wherein, the alkyl ether carboxylic acid or a salt thereof contains a component in which n=0 in an amount of from 9.9 to 27% by mass, and contains a component in which n=1 and a component in which n=2 in a total amount of less than 40% by mass, and (B) an alkyl sulfate or polyoxyethylene alkyl sulfate represented by formula (2): wherein, R2 represents an alkyl group or an alkenyl group having 8 to 22 carbon atoms, m represents a number of from 0 to 20 and the average of m is less than 2, and Y represents a hydrogen atom or a cation selected from alkali metal, alkaline earth metal, ammonium, alkyl ammonium, alkanol ammonium, and glucammonium. R1—O—(CH2CH2O)n—CH2—COOM (1) R2—O—(CH2CH2O)m—SO3Y (2)

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