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1. 发明申请

US20090033898A1 DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：开发设备，开发方法和存储介质
公开(公告)号：US20090033898A1
公开(公告)日：2009-02-05
申请号：US12173262
申请日：2008-07-15
申请人： Taro Yamamoto , Hirofumi Takeguchi , Shuichi Nagamine
发明人： Taro Yamamoto , Hirofumi Takeguchi , Shuichi Nagamine
IPC分类号： G03B27/42 , G03F7/22
CPC分类号： G03B27/42 , G03F7/3021 , H01L21/6715 , H01L21/67178
摘要： A developing apparatus includes, to process substrates each coated with a resist and processed by an exposure process by a developing process, includes: plural developing units each provided with a substrate holding device for stably pouring a developer onto the substrate, a first developer nozzle to be used in common by the plural developing units to pour the developer in a band-shaped flow onto the substrates held by each of the substrate holding devices, a nozzle driving mechanism for carrying the first developer nozzle from one to another of the developing units, and moving the first developer nozzle with one end of a band-shaped area into which the developer is to be poured through the first developer nozzle directed toward the center of the substrate in each of the developing units such that a part in a surface of the substrate onto which the developer is poured moves from a central part toward a peripheral part or from a peripheral part toward a central part in the surface of the substrate to coat the surface of the substrate entirely with a developer film, and second developer nozzles for pouring the developer into a circular area or a band-shaped area of a short length shorter than that of the band-shaped area into which the first developer nozzle pours the developer in a central part of the substrate on which the developer film has been formed by the first developer nozzle. The nozzles are used selectively for developing steps.
摘要翻译：显影装置包括：处理各自涂覆有抗蚀剂并通过显影处理曝光处理的基板的显影装置包括：多个显影单元，每个显影单元设置有用于将显影剂稳定地浇注到基板上的基板保持装置，第一显影剂喷嘴通过多个显影单元共同使用将显影剂倾倒在由每个基板保持装置保持的基板上的带状流中，用于将第一显影剂喷嘴从另一个承载到显影单元的喷嘴驱动机构，并且移动第一显影剂喷嘴，其中一个带状区域的一端，显影剂将通过第一显影剂喷嘴注入到每个显影单元中的基板的中心，使得其中的部分在显影剂注入的基板从中心部分向周边部分移动，或从周边部分朝向表面的中心部分移动 e基板，其全部用显影剂膜涂覆基板的表面;以及第二显影剂喷嘴，用于将显影剂倾倒成比带状区域的短的短的短的长度的圆形区域或带状区域，第一显影剂喷嘴将显影剂倾倒在其上已由第一显影剂喷嘴形成有显影剂膜的基板的中心部分。喷嘴被选择性地用于显影步骤。

2. 发明授权

US07665918B2 Developing apparatus, developing method and storage medium 有权
标题翻译：显影装置，显影方法和存储介质
公开(公告)号：US07665918B2
公开(公告)日：2010-02-23
申请号：US12173262
申请日：2008-07-15
申请人： Taro Yamamoto , Hirofumi Takeguchi , Shuichi Nagamine
发明人： Taro Yamamoto , Hirofumi Takeguchi , Shuichi Nagamine
IPC分类号： G03D5/00 , G03B27/32 , B05C11/02
CPC分类号： G03B27/42 , G03F7/3021 , H01L21/6715 , H01L21/67178
摘要： A developing apparatus includes, to process substrates each coated with a resist and processed by an exposure process by a developing process, includes: plural developing units each provided with a substrate holding device for stably pouring a developer onto the substrate, a first developer nozzle to be used in common by the plural developing units to pour the developer in a band-shaped flow onto the substrates held by each of the substrate holding devices, a nozzle driving mechanism for carrying the first developer nozzle from one to another of the developing units, and moving the first developer nozzle with one end of a band-shaped area into which the developer is to be poured through the first developer nozzle directed toward the center of the substrate in each of the developing units such that a part in a surface of the substrate onto which the developer is poured moves from a central part toward a peripheral part or from a peripheral part toward a central part in the surface of the substrate to coat the surface of the substrate entirely with a developer film, and second developer nozzles for pouring the developer into a circular area or a band-shaped area of a short length shorter than that of the band-shaped area into which the first developer nozzle pours the developer in a central part of the substrate on which the developer film has been formed by the first developer nozzle. The nozzles are used selectively for developing steps.
摘要翻译：显影装置包括：处理各自涂覆有抗蚀剂并通过显影处理曝光处理的基板的显影装置包括：多个显影单元，每个显影单元设置有用于将显影剂稳定地浇注到基板上的基板保持装置，第一显影剂喷嘴通过多个显影单元共同使用将显影剂倾倒在由每个基板保持装置保持的基板上的带状流中，用于将第一显影剂喷嘴从另一个承载到显影单元的喷嘴驱动机构，并且移动第一显影剂喷嘴，其中一个带状区域的一端，显影剂将通过第一显影剂喷嘴注入到每个显影单元中的基板的中心，使得其中的部分在显影剂注入的基板从中心部分向周边部分移动，或从周边部分朝向表面的中心部分移动 e基板，用显影剂膜整体地涂覆基板的表面;以及第二显影剂喷嘴，用于将显影剂倾倒到比带状区域的短的短的长度的圆形区域或带状区域中，显影剂喷嘴将显影剂倾倒在其上已由第一显影剂喷嘴形成有显影剂膜的基板的中心部分。喷嘴被选择性地用于显影步骤。

3. 发明授权

US09484230B2 Substrate liquid processing apparatus 有权
标题翻译：基板液体处理装置
公开(公告)号：US09484230B2
公开(公告)日：2016-11-01
申请号：US13151610
申请日：2011-06-02
申请人： Nobuhiro Ogata , Shuichi Nagamine
发明人： Nobuhiro Ogata , Shuichi Nagamine
IPC分类号： B08B3/00 , H01L21/00 , H01L21/67
CPC分类号： H01L21/67051
摘要： A substrate liquid processing apparatus of the present invention includes a process-liquid supply unit selectively supplying a plurality of types of process-liquids to the substrate held by a substrate holding table, first and second guide cups which are disposed in this order from the top and are configured to respectively guide downward the process-liquid scattering from the rotating substrate while being held by the substrate holding table; and a position adjustment mechanism adjusting a positional relationship between the first and second guide cups and the substrate holding table. A first process-liquid recovery tank is provided at a lower area of the first and second guide cups and recovers the process-liquid guided by the first guide cup. A second process-liquid recovery tank is provided at the inner peripheral side of the first process-liquid recovery tank and recovers the process-liquid guided by the second guide cup.
摘要翻译：本发明的基板液体处理装置包括：处理液供给单元，其选择性地将多种类型的处理液供给到由基板保持台保持的基板;第一和第二引导杯，从顶部并且被配置为在由基板保持台保持的同时分别引导来自旋转基板的处理液体飞散; 以及位置调节机构，其调节所述第一和第二引导杯与所述基板保持台之间的位置关系。第一处理液回收罐设置在第一和第二引导杯的下部区域，并且回收由第一引导杯引导的处理液体。第二处理液回收罐设置在第一处理液回收罐的内周侧，并回收由第二引导杯引导的处理液。

4. 发明授权

US09022045B2 Substrate liquid cleaning apparatus with controlled liquid port ejection angle 有权
标题翻译：具有受控液体端口喷射角度的底物液体清洗装置
公开(公告)号：US09022045B2
公开(公告)日：2015-05-05
申请号：US13337547
申请日：2011-12-27
申请人： Jiro Higashijima , Nobuhiro Ogata , Satoshi Kaneko , Shuichi Nagamine , Yoshihiro Kai
发明人： Jiro Higashijima , Nobuhiro Ogata , Satoshi Kaneko , Shuichi Nagamine , Yoshihiro Kai
IPC分类号： H01L21/67 , H01L21/687
CPC分类号： H01L21/67051 , H01L21/68728 , H01L21/68785 , H01L21/68792
摘要： Disclosed is a liquid treatment apparatus including a nozzle positioned below the substrate retained by a substrate retaining unit. The nozzle is capable of ejecting two fluids of a mixture of a liquid and a gas. The nozzle includes a plurality of liquid-ejecting passages for ejecting a liquid and a plurality of gas-ejecting passages for ejecting a gas, and also includes a plurality of liquid-ejecting ports each corresponding to one of the liquid-ejecting passages. The liquid-ejecting ports are arrayed on a horizontal line extending inwardly from a position below a peripheral portion of the substrate. The liquid-ejecting ports are configured to eject the liquid towards the lower surface of the substrate in an ejecting direction, and the ejecting direction is inclined at an inclination angle in a rotating direction of the substrate rotated by rotational driving unit with respect to a plane including the lower surface of the substrate.
摘要翻译：公开了一种液体处理装置，其包括位于基板保持单元保持的基板下方的喷嘴。喷嘴能够喷射液体和气体的混合物的两种流体。喷嘴包括用于喷射液体的多个喷液通道和用于喷射气体的多个气体喷射通道，并且还包括各自对应于一个喷液通道的多个液体喷射口。液体喷射口排列在从基板的周边部分下方的位置向内延伸的水平线上。液体喷射口被配置为沿喷射方向朝向基板的下表面喷射液体，并且喷射方向以相对于平面旋转的旋转驱动单元旋转的基板的旋转方向以倾斜角度倾斜包括基底的下表面。

5. 发明授权

US06514570B1 Solution processing apparatus and method 失效
标题翻译：解决方案处理装置和方法
公开(公告)号：US06514570B1
公开(公告)日：2003-02-04
申请号：US09678705
申请日：2000-10-03
申请人： Yuji Matsuyama , Shuichi Nagamine
发明人： Yuji Matsuyama , Shuichi Nagamine
IPC分类号： B05D102
CPC分类号： H01L21/6715 , B05D1/005 , G03F7/162 , G03F7/3021
摘要： A solution separation ring made of a material with adhesion to a processing solution stronger than that of a rear face of a wafer is provided to surround the periphery of a substrate horizontally held by a spin chuck with a slight clearance therebetween. A supply nozzle is moved from one end side to the other end side of the substrate while supplying the processing solution, and discharge ports of the supply nozzle are allowed to get closer to a summit portion of the solution separation ring near the other end side of the substrate. At this time, the processing solutions on the discharge ports and the front face of the substrate which are contiguous with each other by surface tension are separated caused so as to flow toward the solution separation ring side, thereby preventing an excessive processing solution from returning onto the front face of the substrate.
摘要翻译：提供一种由粘合到比晶片背面强度更高的处理液的材料制成的溶液分离环，以围绕由旋转卡盘水平保持的基板的周边，其间具有微小的间隙。在供给处理液的同时，供给喷嘴从基板的一端侧向另一端侧移动，允许供给喷嘴的排出口靠近靠近另一端侧的溶液分离环的顶端部底物。此时，通过表面张力彼此邻接的排出口和基板的前表面上的处理溶液被分离，以便朝向溶液分离环侧流动，从而防止过量的处理溶液返回到基板的正面。

6. 发明申请

US20120153044A1 SUBSTRATE LIQUID PROCESSING APPARATUS 有权
标题翻译：基板液体加工设备
公开(公告)号：US20120153044A1
公开(公告)日：2012-06-21
申请号：US13151665
申请日：2011-06-02
申请人： Nobuhiro Ogata , Shuichi Nagamine
发明人： Nobuhiro Ogata , Shuichi Nagamine
IPC分类号： B05B3/02
CPC分类号： H01L21/67051 , H01L21/6708
摘要： A substrate liquid processing apparatus of the present invention includes a guide rotary cup configured to guide a process-liquid scattering from a substrate rotating and being held by a substrate holding table and a guide cup configured to guide downward the process-liquid guided by the guide rotary cup. The guide cup includes a downward extension portion extending downward from an inner peripheral end portion of a guide cup body and an inner peripheral extension portion extending inward from the inner peripheral end portion more than the downward extension portion. The inner peripheral extension portion is configured to form a gas guide space together with the guide rotary cup and the downward extension portion so that a gas turning by the rotation of the guide rotary cup can be guided downward.
摘要翻译：本发明的基板液体处理装置包括：引导旋转杯，其构造成引导来自旋转并由基板保持台保持的基板的处理液体散射;以及引导杯，其构造成向下引导由引导件引导的处理液旋转杯引导杯包括从引导杯体的内周端部向下延伸的向下延伸部分和从内周端部向内延伸的内延伸部分，而不是向下延伸部分。内周延伸部构造成与导向旋转杯和向下延伸部一起形成气体导向空间，从而可以将导向旋转杯的旋转转动的气体向下引导。

7. 外观设计

USD610176S1 Coater cup 有权
标题翻译：涂层杯
公开(公告)号：USD610176S1
公开(公告)日：2010-02-16
申请号：US29332207
申请日：2009-02-11
申请人： Shuichi Nagamine , Naofumi Kishita , Koji Takayanagi , Yuichiro Miyata , Yasushi Takiguchi
设计人： Shuichi Nagamine , Naofumi Kishita , Koji Takayanagi , Yuichiro Miyata , Yasushi Takiguchi

8. 发明授权

US06730599B2 Film forming method and film forming apparatus 失效
标题翻译：成膜方法和成膜装置
公开(公告)号：US06730599B2
公开(公告)日：2004-05-04
申请号：US10339396
申请日：2003-01-10
申请人： Hiroichi Inada , Shuichi Nagamine
发明人： Hiroichi Inada , Shuichi Nagamine
IPC分类号： H01L2144
CPC分类号： H01L21/6715 , G03F7/162 , H01L21/67109
摘要： The present invention is a film forming method of forming a film of a treatment solution on the front face of a substrate in a treatment chamber including the steps of: supplying the treatment solution to the substrate mounted on a holding member in the treatment chamber in states of gas being supplied into the treatment chamber and of an atmosphere in the treatment chamber being exhausted; and measuring the temperature of the front face of the substrate before the supply of the treatment solution. The measurement of the temperature of the front face of the substrate before the supply of the treatment solution enables the check of the temperature of the front face of the substrate and the temperature distribution. Then, the measured result is compared with a previously obtained ideal temperature distribution for the formation of a film with a uniform thickness, thereby predicting the film thickness of the film which will be formed in the following processing. Further, the treatment film is formed after the temperature measurement and the film thickness of the treatment film is evaluated, thereby storing the data to find and set so-called optimal conditions. Consequently, the temperature or the like of the treatment solution or the like can be adjusted based on the measured results and corrected to make the film thickness uniform.
摘要翻译：本发明是一种在处理室中在基板的正面上形成处理液的膜的成膜方法，其特征在于，包括以下状态：将处理液供给到处理室内的保持部件上的状态的气体被供应到处理室中并且处理室中的气氛被排出; 并且在供给处理溶液之前测量衬底的正面的温度。在提供处理溶液之前对基板的正面的温度的测量使得能够检查基板的正面的温度和温度分布。然后，将测量结果与先前获得的用于形成具有均匀厚度的膜的理想温度分布进行比较，从而预测在随后的处理中将形成的膜的膜厚度。此外，在温度测量之后形成处理膜，并且评估处理膜的膜厚度，从而存储数据以找到并设置所谓的最佳条件。因此，可以根据测定结果调整处理液等的温度等，进行校正，使膜厚均匀。

9. 发明授权

US06364547B1 Solution processing apparatus 失效
标题翻译：解决方案处理设备
公开(公告)号：US06364547B1
公开(公告)日：2002-04-02
申请号：US09694198
申请日：2000-10-23
申请人： Yuji Matsuyama , Shuichi Nagamine
发明人： Yuji Matsuyama , Shuichi Nagamine
IPC分类号： G03D302
CPC分类号： G03D3/02
摘要： Discharge ports of a supply nozzle are structured to be able to discharge a processing solution in a horizontal direction, and a guide plate for reducing the discharge pressure of the processing solution and guiding the processing solution to an under substrate is provided at a position facing the discharge ports. Thus, the appearance of micro bubbles at the time of the supply of the processing solution to the surface of the substrate can be inhibited, thereby reducing poor developing.
摘要翻译：将供给喷嘴的排出口构造成能够在水平方向上排出处理液，并且在面向该处理液的位置设置有用于降低处理液的排出压力并将处理液引导到下基板的引导板排放口。因此，可以抑制在将处理液供给到基板的表面时的微小气泡的出现，从而减少显影不良。

10. 发明授权

US06332723B1 Substrate processing apparatus and method 失效
标题翻译：基板加工装置及方法
公开(公告)号：US06332723B1
公开(公告)日：2001-12-25
申请号：US09627113
申请日：2000-07-27
申请人： Yuji Matsuyama , Shuichi Nagamine , Koichi Asaka
发明人： Yuji Matsuyama , Shuichi Nagamine , Koichi Asaka
IPC分类号： G03F730
CPC分类号： H01L21/6715 , G03F7/3021 , H01L21/67103 , Y10S134/902
摘要： In a state where a wafer is held by a wafer holding section and a temperature controlled liquid is discharged to a rim area on a rear face of the wafer from flow channels, a developing solution is heaped on a front face of the wafer. Thereafter, the wafer is rotated for a predetermined period of time in a state where the temperature controlled liquid is discharged to the rim area on the rear face of the wafer from the flow channels, whereby developing is performed. The wafer is heated by the wafer holding section with a large heat capacity in an area close to a center of the wafer, and a liquid film of the temperature controlled liquid is formed in the rim area of the wafer, whereby the wafer is heated. At this time, the wafer is rotated, so that the developing solution is stirred.
摘要翻译：在晶片由晶片保持部保持并且温度控制液体从流路向晶片背面的边缘区域排出的状态下，在晶片的正面上堆积显影液。此后，在温度受控液体从流路向晶片背面的边缘区域排出的状态下，将晶片旋转预定时间，由此进行显影。在靠近晶片的中心的区域中，晶片被晶片保持部分加热，并且在晶片的边缘区域形成温度控制液体的液膜，由此加热晶片。此时，晶片旋转，从而搅拌显影液。

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