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1. 发明授权

US06533864B1 Solution processing apparatus and method 有权
标题翻译：解决方案处理装置和方法
公开(公告)号：US06533864B1
公开(公告)日：2003-03-18
申请号：US09639172
申请日：2000-08-16
申请人： Yuji Matsuyama , Shuichi Nagamine
发明人： Yuji Matsuyama , Shuichi Nagamine
IPC分类号： B05C1110
CPC分类号： H01L21/6715 , B05C11/08
摘要： An upper side of a cup provided around a wafer is formed in a rectangular shape and a lower side thereof is formed in a cylindrical shape. The cup is formed such that, when seen from above, the portion forming the cylindrical shape is positioned within the portion forming the rectangular shape. The cup has a raising and lowering mechanism and is controlled by a control section. The upper side of the cup is placed by the side of the wafer during a scan by a supply nozzle. The lower side of the cup is placed over an upper level and a lower level of the wafer while a rinse liquid and a developing solution are shaken off. The scan by the supply nozzle is performed with the supply nozzle positioned in the upper cup portion.
摘要翻译：设置在晶片周围的杯的上侧形成为矩形，其下侧形成为圆筒状。杯形成为从上方观察，形成圆筒形状的部分位于形成矩形形状的部分内。杯具有升降机构，由控制部控制。杯子的上侧在扫描期间被供给喷嘴放置在晶片的侧面。将杯的下侧放置在晶片的上层和下层上，同时冲洗液体和显影液被摇动。由供给喷嘴进行的扫描由位于上杯部的供给喷嘴进行。

2. 发明授权

US06514570B1 Solution processing apparatus and method 失效
标题翻译：解决方案处理装置和方法
公开(公告)号：US06514570B1
公开(公告)日：2003-02-04
申请号：US09678705
申请日：2000-10-03
申请人： Yuji Matsuyama , Shuichi Nagamine
发明人： Yuji Matsuyama , Shuichi Nagamine
IPC分类号： B05D102
CPC分类号： H01L21/6715 , B05D1/005 , G03F7/162 , G03F7/3021
摘要： A solution separation ring made of a material with adhesion to a processing solution stronger than that of a rear face of a wafer is provided to surround the periphery of a substrate horizontally held by a spin chuck with a slight clearance therebetween. A supply nozzle is moved from one end side to the other end side of the substrate while supplying the processing solution, and discharge ports of the supply nozzle are allowed to get closer to a summit portion of the solution separation ring near the other end side of the substrate. At this time, the processing solutions on the discharge ports and the front face of the substrate which are contiguous with each other by surface tension are separated caused so as to flow toward the solution separation ring side, thereby preventing an excessive processing solution from returning onto the front face of the substrate.
摘要翻译：提供一种由粘合到比晶片背面强度更高的处理液的材料制成的溶液分离环，以围绕由旋转卡盘水平保持的基板的周边，其间具有微小的间隙。在供给处理液的同时，供给喷嘴从基板的一端侧向另一端侧移动，允许供给喷嘴的排出口靠近靠近另一端侧的溶液分离环的顶端部底物。此时，通过表面张力彼此邻接的排出口和基板的前表面上的处理溶液被分离，以便朝向溶液分离环侧流动，从而防止过量的处理溶液返回到基板的正面。

3. 发明授权

US06602382B1 Solution processing apparatus 有权
标题翻译：解决方案处理设备
公开(公告)号：US06602382B1
公开(公告)日：2003-08-05
申请号：US09694888
申请日：2000-10-25
申请人： Yuji Matsuyama , Shuichi Nagamine
发明人： Yuji Matsuyama , Shuichi Nagamine
IPC分类号： C23F100
CPC分类号： H01L21/6715 , G03F7/3021 , Y10S118/04
摘要： A developing processing apparatus for supplying a developing solution to a wafer on which a photoresist film has been formed to thereby perform developing processing includes a wafer holding portion for horizontally holding the wafer, a linear nozzle held above the wafer holding portion for supplying the developing solution onto the wafer while moving in a predetermined horizontal direction, and a resistance bar for imparting discharge resistance to the developing solution discharged from the linear nozzle. This allows all discharge ports to discharge the developing solution uniformly, especially even when discharge pressure for the developing solution to be supplied is low in development of a scan method using a linear nozzle or a slit nozzle.
摘要翻译：将显影液供给到已经形成有光致抗蚀剂膜的晶片从而进行显影处理的显影处理装置包括用于水平保持晶片的晶片保持部分，保持在晶片保持部分上方的用于供应显影液的线性喷嘴在沿预定水平方向移动的同时在晶片上，以及用于对从线性喷嘴排出的显影液赋予放电电阻的电阻棒。这使得所有排出口均匀地排出显影溶液，特别是即使在使用线性喷嘴或狭缝喷嘴的扫描方法的显影中，供给显影液的排出压力低的情况下也是如此。

4. 发明授权

US06384894B2 Developing method and developing unit 有权
标题翻译：开发方法和开发单位
公开(公告)号：US06384894B2
公开(公告)日：2002-05-07
申请号：US09761741
申请日：2001-01-18
申请人： Yuji Matsuyama , Shuichi Nagamine
发明人： Yuji Matsuyama , Shuichi Nagamine
IPC分类号： G03B2732
CPC分类号： G03F7/3021
摘要： The present invention is a method for developing a substrate by supplying a developing solution from a developing solution supply nozzle onto a surface of the substrate mounted on a predetermined position, and comprises the steps of moving the developing solution supply nozzle from a standby position of the developing solution supply nozzle outside one end of the substrate to at least the other end of the substrate without supplying the developing solution, and thereafter, moving the developing solution supply nozzle from the other end to at least the one end while supplying the developing solution. Therefore, the developing solution supply nozzle which is used once and has a possibility of a drip of the developing solution does not pass above the substrate, so that the developing solution never drips from the developing solution supply nozzle onto the substrate before and after supplying the developing solution for some reason or other. Therefore, developing defect due to the drip of the developing solution can be prevented.
摘要翻译：本发明是一种通过从显影液供给喷嘴将显影液供给到安装在预定位置上的基板的表面来显影基板的方法，包括以下步骤：使显影液供给喷嘴从待机位置移动将显影液供给喷嘴从衬底的一端向基材的至少另一端喷射而不供给显影液，然后在显影液供给的同时将显影液供给喷嘴从另一端移动到至少一端。因此，使用一次并具有显影液滴下的可能性的显影液供给喷嘴不会通过基板的上方，因此显影液在供给前后不会从显影液供给喷嘴向基板上滴落由于某种原因或其他原因开发解决方案。因此，可以防止由于显影液的滴落引起的显影缺陷。

5. 发明授权

US06364547B1 Solution processing apparatus 失效
标题翻译：解决方案处理设备
公开(公告)号：US06364547B1
公开(公告)日：2002-04-02
申请号：US09694198
申请日：2000-10-23
申请人： Yuji Matsuyama , Shuichi Nagamine
发明人： Yuji Matsuyama , Shuichi Nagamine
IPC分类号： G03D302
CPC分类号： G03D3/02
摘要： Discharge ports of a supply nozzle are structured to be able to discharge a processing solution in a horizontal direction, and a guide plate for reducing the discharge pressure of the processing solution and guiding the processing solution to an under substrate is provided at a position facing the discharge ports. Thus, the appearance of micro bubbles at the time of the supply of the processing solution to the surface of the substrate can be inhibited, thereby reducing poor developing.
摘要翻译：将供给喷嘴的排出口构造成能够在水平方向上排出处理液，并且在面向该处理液的位置设置有用于降低处理液的排出压力并将处理液引导到下基板的引导板排放口。因此，可以抑制在将处理液供给到基板的表面时的微小气泡的出现，从而减少显影不良。

6. 发明授权

US06332723B1 Substrate processing apparatus and method 失效
标题翻译：基板加工装置及方法
公开(公告)号：US06332723B1
公开(公告)日：2001-12-25
申请号：US09627113
申请日：2000-07-27
申请人： Yuji Matsuyama , Shuichi Nagamine , Koichi Asaka
发明人： Yuji Matsuyama , Shuichi Nagamine , Koichi Asaka
IPC分类号： G03F730
CPC分类号： H01L21/6715 , G03F7/3021 , H01L21/67103 , Y10S134/902
摘要： In a state where a wafer is held by a wafer holding section and a temperature controlled liquid is discharged to a rim area on a rear face of the wafer from flow channels, a developing solution is heaped on a front face of the wafer. Thereafter, the wafer is rotated for a predetermined period of time in a state where the temperature controlled liquid is discharged to the rim area on the rear face of the wafer from the flow channels, whereby developing is performed. The wafer is heated by the wafer holding section with a large heat capacity in an area close to a center of the wafer, and a liquid film of the temperature controlled liquid is formed in the rim area of the wafer, whereby the wafer is heated. At this time, the wafer is rotated, so that the developing solution is stirred.
摘要翻译：在晶片由晶片保持部保持并且温度控制液体从流路向晶片背面的边缘区域排出的状态下，在晶片的正面上堆积显影液。此后，在温度受控液体从流路向晶片背面的边缘区域排出的状态下，将晶片旋转预定时间，由此进行显影。在靠近晶片的中心的区域中，晶片被晶片保持部分加热，并且在晶片的边缘区域形成温度控制液体的液膜，由此加热晶片。此时，晶片旋转，从而搅拌显影液。

7. 发明授权

US08641202B2 Projection display device 有权
标题翻译：投影显示设备
公开(公告)号：US08641202B2
公开(公告)日：2014-02-04
申请号：US12551833
申请日：2009-09-01
申请人： Hisashi Okada , Kazuya Minami , Yosuke Nishihata , Yuji Matsuyama
发明人： Hisashi Okada , Kazuya Minami , Yosuke Nishihata , Yuji Matsuyama
IPC分类号： G03B21/18 , G03B21/16 , G02F1/1333
CPC分类号： G03B21/26
摘要： A projection display device includes: a light modulator for modulating light from a light source; a polarizer disposed at a position facing the light modulator; a cooling section for allowing an air to flow in a space between the light modulator and the polarizer; and an air deflector for deflecting the air flowing in the space between the light modulator and the polarizer toward the polarizer.
摘要翻译：投影显示装置包括：调制器，用于调制来自光源的光; 设置在面向所述光调制器的位置处的偏振器; 用于允许空气在所述光调制器和所述偏振器之间的空间中流动的冷却部分; 以及用于使在光调制器和偏振器之间的空间中流动的空气偏向偏振器的空气导流板。

8. 发明授权

US06312171B1 Developing apparatus and method thereof 失效
标题翻译：显影装置及其制造方法
公开(公告)号：US06312171B1
公开(公告)日：2001-11-06
申请号：US09635196
申请日：2000-08-09
申请人： Yuji Matsuyama , Masahito Hamada
发明人： Yuji Matsuyama , Masahito Hamada
IPC分类号： G03D500
CPC分类号： G03F7/3021
摘要： A current member is disposed above a wafer holding section for holding a wafer and a top plate and a bottom plate of the current member are positioned so that respective air holes are overlapped each other in a vertical direction, and a developing solution is heaped on a front face of the wafer. Thereafter, the developing is performed with the bottom plate of the current member slid in a lateral direction so that the air holes are not overlapped each other in the vertical direction. In this configuration, air streams to the wafer are obstructed during the developing because the air holes in the current member are obstructed in the vertical direction, whereby occurrence of temperature distribution of the developing solution within the plane of the wafer caused by flows of air currents to the wafer is prevented and uniform developing processing can be performed.
摘要翻译：电流部件设置在用于保持晶片的晶片保持部分上方，并且当前部件的顶板和底板被定位成使得相应的气孔在垂直方向上彼此重叠，并且显影液堆积在晶片前面。此后，当前构件的底板沿横向方向滑动，使得气孔在垂直方向上不重叠时进行显影。在这种构造中，由于当前构件中的空气孔在垂直方向上被阻塞，所以在显影期间阻挡了流到晶片的空气流，从而由于气流的流动而导致显影液在晶片平面内的温度分布的发生防止了晶片，并且可以进行均匀的显影处理。

9. 发明授权

US07208066B2 Substrate processing apparatus and substrate processing method 失效
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US07208066B2
公开(公告)日：2007-04-24
申请号：US10649780
申请日：2003-08-28
申请人： Junichi Kitano , Yuji Matsuyama , Takahiro Kitano , Takayuki Katano , Hidefumi Matsui , Yo Suzuki , Masami Yamashita , Toru Aoyama , Hiroyuki Iwaki , Satoru Shimura , Masatoshi Deguchi , Kousuke Yoshihara , Naruaki Iida
发明人： Junichi Kitano , Yuji Matsuyama , Takahiro Kitano , Takayuki Katano , Hidefumi Matsui , Yo Suzuki , Masami Yamashita , Toru Aoyama , Hiroyuki Iwaki , Satoru Shimura , Masatoshi Deguchi , Kousuke Yoshihara , Naruaki Iida
IPC分类号： C23F1/00 , H01L21/306 , B05C11/00
CPC分类号： H01L21/67178 , G03F7/70991 , H01L21/67017 , H01L21/6715 , H01L21/67161 , H01L21/67184 , H01L21/67742 , H01L21/67778 , Y10T29/41
摘要： On top of respective areas divided by partition plates, that is, a cassette station, a processing station, and an interface section in a coating and developing processing system, gas supply sections for supplying an inert gas into the respective areas are provided. Exhaust pipes for exhausting atmospheres in the respective areas are provided at the bottom of the respective areas. The atmospheres in the respective areas are maintained in a clean condition by supplying the inert gas not containing impurities such as oxygen and fine particles from the respective gas supply sections into the respective areas and exhausting the atmospheres in the respective areas from the exhaust pipes.
摘要翻译：在涂覆和显影处理系统中由分隔板，即盒式磁带站，加工站和界面部分划分的各个区域之上，提供用于向各个区域供应惰性气体的气体供应部分。在各个区域的底部设置用于各区域的排气的排气管。通过将不含杂质的惰性气体（例如氧气和细颗粒）从各个气体供应区域供应到各个区域中并且从排气管排出各个区域中的气氛，将各个区域中的气氛保持在清洁状态。

10. 发明授权

US07022190B2 Substrate coating unit and substrate coating method 失效
公开(公告)号：US07022190B2
公开(公告)日：2006-04-04
申请号：US10146799
申请日：2002-05-17
申请人： Yuji Matsuyama
发明人： Yuji Matsuyama
IPC分类号： B05C11/00
CPC分类号： H01L21/6715 , B05C11/08 , B05D1/005 , B05D3/10
摘要： The present invention is a coating unit for coating a substrate with a coating solution, comprising a coating solution discharge member for discharging the coating solution to the substrate which is positioned in a downward part. A lower surface of the coating solution discharge member is in a shape having a length longer, at least, than the radius of the substrate and having a narrow width. A coating solution discharge port is disposed in a portion of the coating solution discharge member, facing the center of the substrate, while a solvent mist discharge port for discharging a solvent mist of the coating solution is disposed in a portion facing a peripheral portion including an outer edge potion of the substrate, when the coating solution discharge member is positioned above the radius of the substrate.

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