专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06763048B2 Line narrowing of molecular fluorine laser emission 失效
标题翻译：分子氟激光发射线窄
公开(公告)号：US06763048B2
公开(公告)日：2004-07-13
申请号：US09883128
申请日：2001-06-15
申请人： Sergei Govorkov , Klaus Vogler , Rainer Paetzel
发明人： Sergei Govorkov , Klaus Vogler , Rainer Paetzel
IPC分类号： H01S300
CPC分类号： H01S3/22 , H01S3/036 , H01S3/038 , H01S3/08004 , H01S3/08009 , H01S3/1055 , H01S3/106 , H01S3/134 , H01S3/2258 , H01S2301/02
摘要： A molecular fluorine laser system includes a discharge tube filled with a gas mixture including molecular fluorine and at least one buffer gas and having a total pressure of less than substantially 2500 mbar, multiple electrodes within the discharge tube, a pulsed discharge circuit connected to the electrodes for energizing the gas mixture, a line-selection optic for selecting one of multiple closely-spaced lines around 157 nm emitted from the discharge tube, and a laser resonator including the line-selection optic and the discharge tube for generating a beam of laser pulses having a wavelength around 157 nm at a bandwidth of less than 0.6 pm.
摘要翻译：分子氟激光系统包括：填充有包括分子氟和至少一种缓冲气体并且总压力小于基本上2500mbar的气体混合物的放电管，放电管内的多个电极，连接到电极的脉冲放电电路用于激励气体混合物，用于选择从放电管发射的157nm附近的多个紧密间隔的线之一的线选择光学器件，以及包括用于产生激光脉冲束的线选择光学器件和放电管的激光谐振器在小于0.6μm的带宽下具有约157nm的波长。

2. 发明申请

US20070115535A1 Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime 有权
标题翻译：具有长光学寿命的主振荡器功率放大器（MOPA）准分子或分子氟激光系统
公开(公告)号：US20070115535A1
公开(公告)日：2007-05-24
申请号：US11654780
申请日：2007-01-18
申请人： Sergei Govorkov , Gongxue Hua , Timur Misuryaev , Alexander Wiessner , Thomas Schmidt , Rainer Paetzel
发明人： Sergei Govorkov , Gongxue Hua , Timur Misuryaev , Alexander Wiessner , Thomas Schmidt , Rainer Paetzel
IPC分类号： H01S3/00
CPC分类号： G03F7/7055 , H01S3/0057 , H01S3/0835 , H01S3/235
摘要： The lifetime of optical components used in deep-UV (DUV) excimer laser systems, including systems in a MOPA configuration, can be increased by reducing the intensity of pulses incident upon these components. In one approach, an output pulse can be “stretched” in order to reduce the peak power of the pulse. A pulse stretching component can be used, which can be mounted outside the laser enclosure with a horizontal beam path in order to provide a delay line with a minimum impact on the laser system footprint. The horizontal beam path also can minimize the number of optical components in the arm containing the high power beam. A beamsplitting prism can be used with the delay line to avoid the rapid degradation of coatings otherwise exposed to intense UV beams. The prism can expand the beam in the delay line in order to minimize beam intensity and losses due to reflection.
摘要翻译：包括在MOPA配置中的系统的深UV（DUV）准分子激光系统中使用的光学部件的寿命可以通过降低入射在这些部件上的脉冲的强度来增加。在一种方法中，输出脉冲可以被“拉伸”，以便降低脉冲的峰值功率。可以使用脉冲拉伸部件，其可以安装在具有水平光束路径的激光外壳外部，以便提供对激光系统占地面积具有最小影响的延迟线。水平光束路径还可以使包含高功率光束的臂中的光学部件的数量最小化。分束棱镜可以与延迟线一起使用，以避免涂层的快速退化，否则暴露于强烈的UV光束。棱镜可以在延迟线中扩展光束，以便最小化光束强度和由于反射引起的损耗。

3. 发明申请

US20060171439A1 Master oscillator - power amplifier excimer laser system 有权
标题翻译：主振荡器 - 功率放大器准分子激光系统
公开(公告)号：US20060171439A1
公开(公告)日：2006-08-03
申请号：US11371411
申请日：2006-03-09
申请人： Sergei Govorkov , Rainer Paetzel
发明人： Sergei Govorkov , Rainer Paetzel
IPC分类号： H01S3/22
CPC分类号： H01S3/2366 , H01S3/005 , H01S3/0057 , H01S3/225 , H01S3/2325 , H01S3/2333 , H01S3/235
摘要： A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. A MOPA-based laser system can provide both high pulse energies and high spectral purity. A MOPA system can utilize a multi-pass PA, as well as a special beam path capable of reducing the amount of ASE (Amplified Spontaneous Emission) and feedback to the MO. Lithography scanner optics are primarily fused silica, such that the peak pulse power must be kept low to avoid material compaction when a MOPA system is used with lithography applications. This conflict between the demand for high average power and the low peak power requirement of the pulsed excimer laser source can be resolved by using a novel beam path to generate a sufficiently long pulse length.
摘要翻译：主振荡器（MO） - 功率放大器（PA）配置（MOPA）可以有利地用于微光刻应用的准分子激光系统，其中半导体制造商需要40W或更高的功率，以支持先进的吞吐量要求光刻扫描仪系统。基于MOPA的激光系统可以提供高脉冲能量和高光谱纯度。 MOPA系统可以利用多通道PA，以及能够减少ASE（放大自发发射）量和向MO的反馈的特殊光束路径。平版印刷扫描仪光学器件主要是熔融石英，使得峰值脉冲功率必须保持较低，以避免当MOPA系统与光刻应用一起使用时的材料压实。可以通过使用新颖的光束路径来产生足够长的脉冲长度来解决脉冲准分子激光源的高平均功率需求和低峰值功率需求之间的这种冲突。

4. 发明申请

US20060007978A1 Bandwidth-limited and long pulse master oscillator power oscillator laser systems 有权
标题翻译：带宽限制和长脉冲主振荡器功率振荡器激光系统
公开(公告)号：US20060007978A1
公开(公告)日：2006-01-12
申请号：US11142648
申请日：2005-06-01
申请人： Sergei Govorkov , Alexander Wiessner , Timur Misyuryaev , Alexander Jacobson , Gongxue Hua , Rainer Paetzel , Thomas Schroeder , Hans-Stephan Albrecht
发明人： Sergei Govorkov , Alexander Wiessner , Timur Misyuryaev , Alexander Jacobson , Gongxue Hua , Rainer Paetzel , Thomas Schroeder , Hans-Stephan Albrecht
IPC分类号： H01S3/22
CPC分类号： H01S3/10092 , H01S3/08031 , H01S3/083 , H01S3/097 , H01S3/225 , H01S2301/02
摘要： Laser systems have a line-narrowed master oscillator and a power oscillator for amplifying the output of the master oscillator. The power oscillator includes optical arrangements for limiting the bandwidth of radiation that can be amplified. The limited amplification bandwidth of the power oscillator is relatively broad compared to that of the output of the master oscillator, but narrower than would be the case without the bandwidth limiting arrangements. The bandwidth narrowing arrangements of the power oscillator function primarily to restrict the bandwidth of amplified spontaneous emission generated by the power oscillator.
摘要翻译：激光系统具有线窄的主振荡器和用于放大主振荡器的输出的功率振荡器。功率振荡器包括用于限制可放大的辐射带宽的光学装置。与主振荡器的输出相比，功率振荡器的有限放大带宽相对较宽，但比没有带宽限制布置的情况更窄。功率振荡器的带宽窄化布置主要用于限制由功率振荡器产生的放大的自发发射的带宽。

5. 发明申请

US20050031004A1 Excimer or molecular fluorine laser system with precision timing 有权
标题翻译：准分子或分子氟激光系统具有精确时序
公开(公告)号：US20050031004A1
公开(公告)日：2005-02-10
申请号：US10699763
申请日：2003-11-03
申请人： Dirk Basting , Sergei Govorkov , Rainer Paetzel , Igor Bragin , Andreas Targsdorf
发明人： Dirk Basting , Sergei Govorkov , Rainer Paetzel , Igor Bragin , Andreas Targsdorf
IPC分类号： H01S3/00 , H01S3/0971 , H01S3/22 , H01S3/225 , H01S3/23
CPC分类号： H01S3/225 , H01S3/073 , H01S3/09702 , H01S3/09713 , H01S3/2258
摘要： A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.
摘要翻译：主振荡器（MO） - 功率放大器（PA）配置（MOPA）可以有利地用于微光刻应用的准分子激光系统，其中半导体制造商需要40W或更高的功率，以支持先进的吞吐量要求光刻扫描仪系统。可以使用公共脉冲发生器来精确地控制MO和PA的放电室中的放电定时以驱动各个室。放电的时间进一步可以通过室内预电离的定时或通过控制脉冲发生器的最终压缩级中的复位电流来控制。公共脉冲发生器或单独的脉冲发生器电路也可以使用反馈回路在时间上有效地控制，通过在每个单独的放电室中控制预电离来实现精确时序。另一个系统提供对腔室中的放电脉冲的时间延迟抖动的实时补偿。

6. 发明申请

US20050002425A1 Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime 有权
标题翻译：具有长光学寿命的主振荡器功率放大器（MOPA）准分子或分子氟激光系统
公开(公告)号：US20050002425A1
公开(公告)日：2005-01-06
申请号：US10881103
申请日：2004-06-30
申请人： Sergei Govorkov , Gongxue Hua , Timur Misuryaev , Alexander Wiessner , Thomas Schmidt , Rainer Paetzel
发明人： Sergei Govorkov , Gongxue Hua , Timur Misuryaev , Alexander Wiessner , Thomas Schmidt , Rainer Paetzel
IPC分类号： H01S3/00 , H01S3/10 , H01S3/22
CPC分类号： G03F7/7055 , H01S3/0057 , H01S3/0835 , H01S3/235
摘要： The lifetime of optical components used in deep-UV (DUV) excimer laser systems, including systems in a MOPA configuration, can be increased by reducing the intensity of pulses incident upon these components. In one approach, an output pulse can be “stretched” in order to reduce the peak power of the pulse. A pulse stretching component can be used, which can be mounted outside the laser enclosure with a horizontal beam path in order to provide a delay line with a minimum impact on the laser system footprint. The horizontal beam path also can minimize the number of optical components in the arm containing the high power beam. A beamsplitting prism can be used with the delay line to avoid the rapid degradation of coatings otherwise exposed to intense UV beams. The prism can expand the beam in the delay line in order to minimize beam intensity and losses due to reflection.
摘要翻译：包括在MOPA配置中的系统的深UV（DUV）准分子激光系统中使用的光学部件的寿命可以通过降低入射到这些部件上的脉冲的强度来增加。在一种方法中，输出脉冲可以被“拉伸”，以便降低脉冲的峰值功率。可以使用脉冲拉伸部件，其可以安装在具有水平光束路径的激光外壳外部，以便提供对激光系统占地面积具有最小影响的延迟线。水平光束路径还可以使包含高功率光束的臂中的光学部件的数量最小化。分束棱镜可以与延迟线一起使用，以避免涂层的快速退化，否则暴露于强烈的UV光束。棱镜可以在延迟线中扩展光束，以便最小化光束强度和由于反射引起的损耗。

7. 发明授权

US07308013B2 Excimer or molecular fluorine laser system with precision timing 有权
标题翻译：准分子或分子氟激光系统具有精确时序
公开(公告)号：US07308013B2
公开(公告)日：2007-12-11
申请号：US10699763
申请日：2003-11-03
申请人： Dirk Basting , Sergei Govorkov , Rainer Paetzel , Igor Bragin , Andreas Targsdorf
发明人： Dirk Basting , Sergei Govorkov , Rainer Paetzel , Igor Bragin , Andreas Targsdorf
IPC分类号： H01S3/22
CPC分类号： H01S3/225 , H01S3/073 , H01S3/09702 , H01S3/09713 , H01S3/2258
摘要： A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.
摘要翻译：主振荡器（MO） - 功率放大器（PA）配置（MOPA）可以有利地用于微光刻应用的准分子激光系统，其中半导体制造商需要40W或更高的功率，以支持先进的吞吐量要求光刻扫描仪系统。可以使用公共脉冲发生器来精确地控制MO和PA的放电室中的放电定时以驱动各个室。放电的时间进一步可以通过室内预电离的定时或通过控制脉冲发生器的最终压缩级中的复位电流来控制。公共脉冲发生器或单独的脉冲发生器电路也可以使用反馈回路在时间上有效地控制，通过在每个单独的放电室中控制预电离来实现精确定时。另一个系统提供对腔室中的放电脉冲的时间延迟抖动的实时补偿。

8. 发明申请

US20060056478A1 Laser gas replenishment method 有权
标题翻译：激光加气方式
公开(公告)号：US20060056478A1
公开(公告)日：2006-03-16
申请号：US11263626
申请日：2005-10-31
申请人： Hans-Stephen Albrecht , Klaus Vogler , Juergen Kleinschmidt , Thomas Schroeder , Igor Bragin , Vadim Berger , Uwe Stamm , Wolfgang Zschocke , Sergei Govorkov
发明人： Hans-Stephen Albrecht , Klaus Vogler , Juergen Kleinschmidt , Thomas Schroeder , Igor Bragin , Vadim Berger , Uwe Stamm , Wolfgang Zschocke , Sergei Govorkov
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , G02B5/1814 , G02B5/1838 , G03F7/70575 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/08045 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/225
摘要： Output beam parameters of a gas discharge laser are stabilized by maintaining a molecular fluorine component at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is subject to depletion within the discharge chamber. Gas injections including molecular fluorine can increase the partial pressure of molecular fluorine by a selected amount. The injections can be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure. The amount per injection and/or the interval between injections can be varied, based on factors such as driving voltage and a calculated amount of molecular fluorine in the discharge chamber. The driving voltage can be in one of multiple driving voltage ranges that are adjusted based on system aging. Within each range, gas injections and gas replacements can be performed based on, for example, total applied electrical energy or time/pulse count.
摘要翻译：气体放电激光器的输出光束参数通过使用气体供应单元和处理器将分子氟成分保持在预定的分压来稳定。分子氟在放电室内会耗尽。包括分子氟在内的气体注入可以将分子氟的分压提高一定量。注射可以以选定的间隔进行，以使构成气体基本保持在初始分压。基于诸如驱动电压和排放室中分子量的计算量的因素，可以改变每次注射的量和/或注射间隔。驱动电压可以是根据系统老化进行调整的多个驱动电压范围之一。在每个范围内，可以基于例如总施加的电能或时间/脉冲计数进行气体注入和气体替换。

9. 发明授权

US08611383B2 Optically-pumped surface-emitting semiconductor laser with heat-spreading compound mirror-structure 有权
标题翻译：具有散热复合镜面结构的光泵浦表面发射半导体激光器
公开(公告)号：US08611383B2
公开(公告)日：2013-12-17
申请号：US13093585
申请日：2011-04-25
申请人： Sergei Govorkov , Luis Spinelli
发明人： Sergei Govorkov , Luis Spinelli
IPC分类号： H01S5/024 , H01S5/183
CPC分类号： H01S5/02484 , B82Y20/00 , H01S3/109 , H01S5/0213 , H01S5/041 , H01S5/142 , H01S5/18361 , H01S5/18377 , H01S5/1838 , H01S5/34306
摘要： A gain-module for use in an OPS-laser includes a multilayer semiconductor gain-structure surmounting a multilayer compound mirror-structure. Within the multilayer compound mirror-structure is a relatively thick layer of diamond which serves as a heat-spreader.
摘要翻译：用于OPS激光器的增益模块包括跨越多层复合镜结构的多层半导体增益结构。在多层复合镜中，镜面结构是用作散热器的相对较厚的金刚石层。

10. 发明申请

US20070036194A1 Excimer-lamp pumped semiconductor laser 审中-公开
标题翻译：准分子泵浦半导体激光器
公开(公告)号：US20070036194A1
公开(公告)日：2007-02-15
申请号：US11203734
申请日：2005-08-15
申请人： Sergei Govorkov , Luis Spinelli , R. Austin
发明人： Sergei Govorkov , Luis Spinelli , R. Austin
IPC分类号： H01S3/22 , H01S3/091 , H01S3/09
CPC分类号： H01S5/041 , B82Y20/00 , H01S5/0222 , H01S5/02296 , H01S5/024 , H01S5/141 , H01S5/183 , H01S5/3018 , H01S5/3045 , H01S5/327 , H01S5/347
摘要： In an optically pumped semiconductor laser including a semiconductor laser heterostructure, energy of high-energy electrons of an electron beam is converted by excimer formation and dissociation in a gas into ultraviolet (UV) radiation. The ultraviolet radiation is used to optically pump the heterostructure. Materials of the heterostructure may include II-VI compounds, oxides, or diamond. Both surface-emitting and edge-emitting heterostructures may be optically pumped by the UV radiation.
摘要翻译：在包括半导体激光异质结构的光泵浦半导体激光器中，电子束的高能电子的能量通过准分子的形成和气体中的解离转化成紫外（UV）辐射。使用紫外线辐射来泵浦异质结构。异质结构的材料可以包括II-VI化合物，氧化物或金刚石。表面发射和边缘发射异质结构都可以通过UV辐射被光泵浦。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式