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1. 发明授权

US08410422B2 Method and arrangement for the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma 有权
标题翻译：用于调整从等离子体发射的高能辐射束束的特性的方法和装置
公开(公告)号：US08410422B2
公开(公告)日：2013-04-02
申请号：US13436923
申请日：2012-03-31
申请人： Denis Bolshukhin , Alexander Christian Keller , Max Christian Schuermann , Guido Schriever , Imtiaz Ahmad , Juergen Kleinschmidt
发明人： Denis Bolshukhin , Alexander Christian Keller , Max Christian Schuermann , Guido Schriever , Imtiaz Ahmad , Juergen Kleinschmidt
IPC分类号： G12B13/00 , G01D18/00
CPC分类号： G03F7/70133 , G01J1/4257 , G01J1/429 , G03F7/70141 , G03F7/70166 , G03F7/7085 , H05G2/001
摘要： The invention is related to the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma, particularly for applications in semiconductor lithography. For acquiring and adjusting characteristics of a beam bundle of high-energy radiation emitted from a plasma and focused by means of collector optics, an intensity distribution of the radiation is acquired over the cross section of a convergent beam bundle in a measuring plane perpendicular to the optical axis in front of an intermediate focus of the collector optics, and intensity values are recorded in defined sectors for a quantity of reception regions of a measuring device which are aligned with different radii concentric to the optical axis, and measured quantities and control variables are determined from a comparison of the intensity values of different sectors for aligning the collector optics.
摘要翻译：本发明涉及从等离子体发射的高能辐射的束束的特性的调整，特别是在半导体光刻中的应用。为了获取和调整从等离子体发射并通过集光器光学聚焦的高能辐射束束的特性，在与垂直于等离子体的测量平面中的会聚束束的横截面上获取辐射的强度分布光轴在收集器光学器件的中间焦点前方，并且强度值被记录在与光轴同心的不同半径对准的测量装置的接收区域的数量的限定扇区中，并且测量的量和控制变量是由不同扇区的强度值的比较确定，用于对准收集器光学器件。

2. 发明申请

US20120153829A1 Method and Apparatus for the Generation of Short-Wavelength Radiation by Means of a Gas Discharge-Based High-Frequency, High-Current Discharge 有权
标题翻译：通过基于气体放电的高频，大电流放电产生短波长辐射的方法和装置
公开(公告)号：US20120153829A1
公开(公告)日：2012-06-21
申请号：US13311023
申请日：2011-12-05
申请人： Max Christian SCHUERMANN , Lutz DIPPMANN , Juergen KLEINSCHMIDT , Guido SCHRIEVER
发明人： Max Christian SCHUERMANN , Lutz DIPPMANN , Juergen KLEINSCHMIDT , Guido SCHRIEVER
IPC分类号： H05H1/24
CPC分类号： H05H1/46 , H05G2/003 , H05H2001/4682
摘要： The invention is related to a gas discharge-based radiation source which emits short-wavelength radiation, wherein an emitter is ionized and compressed by pulse-shaped currents between two electrodes arranged in a vacuum chamber and is excited to form an emitting plasma. According to the invention, the plasma is preserved by means of a high-frequency sequence of pulse-shaped currents the pulse repetition period of which is adjusted so as to be shorter than a lifetime of the plasma so that the plasma is kept periodically alternating between a high-energy state of an emitting compressed plasma and a low-energy state of a relaxing plasma. For exciting the relaxing plasma to the compressed plasma, excitation energy is coupled into the relaxing plasma by making use of pulse-shaped currents with repetition frequencies between 50 kHz and 4 MHz and pulse widths equal to the pulse repetition period.
摘要翻译：本发明涉及一种发射短波长辐射的基于气体放电的辐射源，其中发射体被排列在真空室中的两个电极之间的脉冲电流电离和压缩，并被激发以形成发射等离子体。根据本发明，通过脉冲重复周期被调整成比等离子体的寿命更短的脉冲形电流的高频序列来保持等离子体，使得等离子体周期性地在发射压缩等离子体的高能态和松弛等离子体的低能态。为了激发压缩等离子体的松弛等离子体，通过利用重复频率在50kHz和4MHz之间的脉冲形电流并且脉冲宽度等于脉冲重复周期，激发能量耦合到松弛等离子体中。

3. 发明授权

US07974321B2 Method and arrangement for stabilizing the average emitted radiation output of a pulsed radiation source 有权
标题翻译：用于稳定脉冲辐射源的平均发射辐射输出的方法和装置
公开(公告)号：US07974321B2
公开(公告)日：2011-07-05
申请号：US11949924
申请日：2007-12-04
申请人： Jesko Brudermann , Juergen Kleinschmidt
发明人： Jesko Brudermann , Juergen Kleinschmidt
IPC分类号： H01S3/10
CPC分类号： G03B27/72 , G01J1/18 , G01J1/4257 , G01J11/00 , G03F7/70041 , G03F7/70558
摘要： The invention is directed to a method and an arrangement for stabilizing the average emitted radiation output of a pulsed radiation source. It is the object of the invention to find a novel possibility for stabilizing the average emitted radiation output of a pulsed radiation source which enables a reliable regulation even when there is no sufficiently reliable manipulated variable for influencing the emitted pulse energy (Ei). According to the invention, this object is met in that the individual pulse energy (Ei) of the current radiation pulse is measured, the deviation of the current individual pulse energy (Ei) from a previously determined target value (E0) is determined, and the pulse interval (Δti+1) preceding the triggering of the next radiation pulse is controlled depending on the magnitude of the deviation between the current individual pulse energy (Ei) and the target value (E0) of the pulse energy.
摘要翻译：本发明涉及用于稳定脉冲辐射源的平均发射辐射输出的方法和装置。本发明的目的是找到一种用于稳定脉冲辐射源的平均发射辐射输出的新颖可能性，即使当没有足够可靠的操纵变量来影响发射的脉冲能量（Ei）时，也能够进行可靠的调节。根据本发明，满足目的在于测量当前辐射脉冲的单个脉冲能量（Ei）的目的，确定当前独立脉冲能量（Ei）与先前确定的目标值（E0）的偏差，以及根据当前个体脉冲能量（Ei）与脉冲能量的目标值（E0）之间的偏差大小来控制触发下一个辐射脉冲之前的脉冲间隔（＆Dgr; ti + 1）。

4. 发明授权

US07595594B2 Arrangement for switching high electric currents by a gas discharge 有权
标题翻译：通过气体放电切换高电流的布置
公开(公告)号：US07595594B2
公开(公告)日：2009-09-29
申请号：US12041121
申请日：2008-03-03
申请人： Vladimir Korobochko , Alexander Keller , Juergen Kleinschmidt
发明人： Vladimir Korobochko , Alexander Keller , Juergen Kleinschmidt
IPC分类号： H05B31/26
CPC分类号： H05G2/003 , H05H1/52
摘要： The present invention is directed to an arrangement for switching high electric currents by way of a gas discharge at high voltages or for generating gas discharge plasma emitting EUV radiation. It is the object of the invention to find a novel possibility for generating a hollow cathode plasma that permits a longer life of the cathodes of short wavelength-emitting gas discharge radiation sources and pseudospark switches, also in high-power operation. This object is met in that the metal wall between the hollow cathode space and the discharge space has a thickness on the order of the centimeter range so that the openings of the metal wall change into relatively long channels and in that substantially radially extending cooling channels are introduced in the metal wall to reduce the ion erosion of the metal wall of the hollow cathode through efficient cooling.
摘要翻译：本发明涉及一种用于通过高压气体放电或用于产生气体放电等离子体发射EUV辐射来切换高电流的装置。本发明的目的是发现一种产生中空阴极等离子体的新颖可能性，其允许短波长发射气体放电辐射源和伪脉冲开关的阴极在大功率操作中寿命更长。满足这个目的在于，中空阴极空间和放电空间之间的金属壁具有大约厘米范围的厚度，使得金属壁的开口变成相对较长的通道，并且基本上径向延伸的冷却通道是引入金属壁，以通过有效的冷却来减少空心阴极的金属壁的离子侵蚀。

5. 发明授权

US07531820B2 Arrangement and method for the generation of extreme ultraviolet radiation 有权
标题翻译：用于产生极紫外线辐射的布置和方法
公开(公告)号：US07531820B2
公开(公告)日：2009-05-12
申请号：US11426086
申请日：2006-06-23
申请人： Guido Hergenhan , Christian Ziener , Juergen Kleinschmidt
发明人： Guido Hergenhan , Christian Ziener , Juergen Kleinschmidt
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005
摘要： The object of an arrangement and a method for the generation of extreme ultraviolet radiation is to construct the radiation source with an increased lifetime of the electrodes for using various emitters, wherein deposits inside the discharge chamber are reduced considerably when using metal emitters. The starting material is supplied as a continuous series of individual volumes which are introduced successively by directed injection and are pre-ionized by a pulsed energy beam. At least the electrode that is thermally loaded to a comparatively greater degree is constructed as a rotating electrode.
摘要翻译：用于产生极紫外线辐射的装置和方法的目的是构建具有增加的电极使用寿命的辐射源，以使用各种发射器，其中当使用金属发射体时，放电室内的沉积物显着减少。起始材料作为连续系列的单独体积供应，其通过定向注射连续引入并且通过脉冲能量束预电离。至少将热负载到较大程度的电极构成为旋转电极。

6. 发明申请

US20060192157A1 Device and method for generating extreme ultraviolet (EUV) radiation 有权
标题翻译：用于产生极紫外（EUV）辐射的装置和方法
公开(公告)号：US20060192157A1
公开(公告)日：2006-08-31
申请号：US11354324
申请日：2006-02-14
申请人： Kai Gaebel , Juergen Kleinschmidt
发明人： Kai Gaebel , Juergen Kleinschmidt
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , H05G2/005
摘要： It is the object of a device and method for generating extreme ultraviolet (EUV) radiation to overcome the obstacles formerly posed by the use of efficient metal emitters so that the conversion efficiency can be optimized and, as a result, the radiation output can be increased without shortening the useful life of the collector optics and electrode system. An injection nozzle of an injection device is directed to a discharge area located in a discharge chamber. The injection nozzle supplies a series of individual volumes of a starting material serving to generate radiation at a repetition rate that corresponds to the frequency of the gas discharge. Further, provision is made for successively vaporizing the individual volumes in the discharge area.
摘要翻译：产生极紫外（EUV）辐射的装置和方法的目的是克服先前使用有效的金属发射体造成的障碍，从而可以优化转换效率，结果可以增加辐射输出而不会缩短集光器和电极系统的使用寿命。注射装置的注射喷嘴被引导到位于排放室中的排放区域。注射喷嘴提供一系列单独的体积的起始材料，其用于以对应于气体放电的频率的重复率产生辐射。此外，提供了在排出区域中连续蒸发各个体积。

7. 发明授权

US06801561B2 Laser system and method for spectral narrowing through wavefront correction 失效
标题翻译：激光系统和通过波前校正进行光谱窄化的方法
公开(公告)号：US06801561B2
公开(公告)日：2004-10-05
申请号：US09960875
申请日：2001-09-21
申请人： Juergen Kleinschmidt
发明人： Juergen Kleinschmidt
IPC分类号： H01S3223
CPC分类号： H01S3/225 , H01S3/1055 , H01S3/106
摘要： An excimer or molecular fluorine laser system a wavefront compensating optic within its resonator for adjusting the curvature of the wavefront of the beam for compensating wavefront distortions and thereby enhancing the spectral purity of the beam. The wavefront compensating optic may be a plate, such as a null lens. One or both surfaces of the null lens may be adjustable and/or have an adjustable curvature for controlling the wavefront distortion compensation. A multi-compartment enclosure may be included having at least one optical component of the line-narrowing unit within each compartment. An atmosphere within at least one compartment is preferably controlled for controlling the spectral purity of the beam by controlling an amount of wavefront distortion compensation. The wavefront compensating optic may be sealably disposed between adjacent compartments.
摘要翻译：准分子或分子氟激光系统在其谐振器内的波前补偿光学器件，用于调整波束的波前的曲率以补偿波前失真，从而增强光束的光谱纯度。波前补偿光学元件可以是板，例如零透镜。零透镜的一个或两个表面可以是可调节的和/或具有用于控制波前失真补偿的可调曲率。可以包括多隔室外壳，其具有每个隔室内的线条变窄单元的至少一个光学部件。优选地控制至少一个室内的气氛，以通过控制波前失真补偿量来控制光束的光谱纯度。波前补偿光学元件可以密封地设置在相邻的隔室之间。

8. 发明授权

US06717973B2 Wavelength and bandwidth monitor for excimer or molecular fluorine laser 失效
标题翻译：准分子或分子氟激光的波长和带宽监测
公开(公告)号：US06717973B2
公开(公告)日：2004-04-06
申请号：US09883097
申请日：2001-06-13
申请人： Dirk Basting , Sergei Govorkov , Juergen Kleinschmidt , Peter Lokai , Uwe Stamm
发明人： Dirk Basting , Sergei Govorkov , Juergen Kleinschmidt , Peter Lokai , Uwe Stamm
IPC分类号： H01S320
CPC分类号： H01S3/225 , B23K26/12 , B23K26/128 , B23K26/705 , G01J1/4257 , G03F7/70025 , G03F7/70558 , G03F7/70808 , H01S3/0014 , H01S3/0315 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/08059 , H01S3/1062 , H01S3/134 , H01S3/137 , H01S3/2258
摘要： A F2-laser includes a discharge chamber filled with a gas mixture including molecular fluorine for generating a spectral emission in a wavelength range between 157 nm and 158 nm including a primary line and a secondary line, multiple electrodes coupled with a power supply circuit for producing a pulsed discharge to energize the molecular fluorine, a resonator including the discharge chamber and an interferometric device for generating a laser beam having a bandwidth of less than 1 pm, and a wavelength monitor coupled in a feedback loop with a processor for monitoring a spectral distribution of the laser beam. The processor controls an interferometric spectrum of the interferometric device based on the monitored spectral distribution such that sidebands within the spectral distribution are substantially minimized.
摘要翻译： F2激光器包括填充有包括分子氟的气体混合物的放电室，用于在包括初级线和次级线的157nm和158nm之间的波长范围内产生光谱发射，多个电极与用于生产的电源电路用于激发分子氟的脉冲放电，包括放电室的谐振器和用于产生具有小于1ms的带宽的激光束的干涉仪，以及耦合在反馈环路中的波长监测器，用于监测光谱分布的激光束。处理器基于监测的光谱分布来控制干涉测量装置的干涉光谱，使得光谱分布内的边带基本上最小化。

9. 发明授权

US06700915B2 Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections 失效
标题翻译：具有包含用于进行波前校正的光学元件的谐振器的窄带准分子激光器
公开(公告)号：US06700915B2
公开(公告)日：2004-03-02
申请号：US09843604
申请日：2001-04-25
申请人： Juergen Kleinschmidt
发明人： Juergen Kleinschmidt
IPC分类号： H01S3225
CPC分类号： G03F7/70025 , H01S3/1392 , H01S3/225
摘要： A gas discharge laser system for generating a laser beam, such as an excimer or molecular fluorine laser system, includes a laser resonator with an optical element for making wavefront corrections such as an adaptable optical element, a phase conjugating mirror, or a retroreflector array. The resonator preferably also has one or more line-narrowing optical elements for narrowing the bandwidth of the laser beam. One of the resonator reflectors or a transmissive or reflective intracavity optical element of the laser may include the adaptable optical element, phase conjugating mirror or retroreflector plate. A beam expander may be disposed before the adaptable optical element, phase conjugating mirror or retroreflector array for increasing the radius of curvature of the wavefront of the laser beam. A detection and control system including a processor and a detector may be used for controlling the contour of the wavefront correcting optical element in a feedback loop.
摘要翻译：用于产生激光束的气体放电激光系统，例如受激准分子或分子氟激光系统，包括具有用于进行波前校正的光学元件的激光谐振器，例如适应性光学元件，相位共轭反射镜或后向反射器阵列。谐振器优选地还具有用于使激光束的带宽变窄的一个或多个线狭窄的光学元件。谐振器反射器之一或激光器的透射或反射腔内光学元件可以包括适应性光学元件，相位共轭反射镜或后向反射板。光束扩展器可以设置在适应光学元件，相位共轭反射镜或后向反射器阵列之前，用于增加激光束的波前的曲率半径。可以使用包括处理器和检测器的检测和控制系统来控制反馈回路中的波前校正光学元件的轮廓。

10. 发明授权

US08975543B2 Electrical terminal module 有权
标题翻译：电气端子模块
公开(公告)号：US08975543B2
公开(公告)日：2015-03-10
申请号：US13129173
申请日：2009-11-17
申请人： Frank Hakemeyer , Christian Starke , Juergen Kleinschmidt
发明人： Frank Hakemeyer , Christian Starke , Juergen Kleinschmidt
IPC分类号： H01H19/00 , H01H21/00 , H03J1/06 , G04C23/46 , H01H19/02 , H01H19/03 , H01H19/58
CPC分类号： H03J1/06 , G04C23/46 , H01H19/001 , H01H19/025 , H01H19/03 , H01H19/585
摘要： An electric terminal module includes a plurality of electric contact elements configured to connect to electric conductors and a housing including an opening in at least one side wall thereof. A printed circuit board is disposed in the housing. The printed circuit board includes a circuit arrangement having a plurality of electric components configured to perform a specific function and a mount. An adjusting device is operable to change at least one electric characteristic quantity of the circuit arrangement. The adjusting device is mounted directly onto the printed circuit board on the mount and is operable from outside the housing through the opening so as to swivel or turn.
摘要翻译：电气端子模块包括被配置为连接到电导体的多个电接触元件和在其至少一个侧壁中包括开口的壳体。印刷电路板设置在壳体中。印刷电路板包括具有被配置为执行特定功能的多个电气部件和安装件的电路装置。调节装置可操作以改变电路装置的至少一个电特性量。调节装置直接安装在安装座上的印刷电路板上，并可通过开口从壳体的外部操作以便旋转或转动。

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