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1. 发明授权

US5732029A Method and circuit for testing memory cells in semiconductor memory device 失效
标题翻译：用于测试半导体存储器件中的存储单元的方法和电路
公开(公告)号：US5732029A
公开(公告)日：1998-03-24
申请号：US650398
申请日：1996-05-20
申请人： Sang-Kil Lee , Yong-Sik Seok
发明人： Sang-Kil Lee , Yong-Sik Seok
IPC分类号： G11C11/401 , G11C29/00 , G11C29/24 , G11C29/34 , G11C7/00
CPC分类号： G11C29/808 , G11C29/24 , G11C29/781
摘要： A test control circuit and method of testing a memory cell in a semiconductor memory device. The test control circuit includes a memory cell array having a plurality of normal memory cells to store data on a semiconductor substrate and a plurality of redundancy memory cells to substitute for defective normal memory cells. Row and column redundancy fuse boxes include fuse elements to be electrically fused to enable row and column redundancy decoders for selecting rows and columns of the redundancy memory cells. A redundancy cell test signal generator generates, in response to a test signal applied to an extra line in the address bus, a master clock for testing the redundancy memory cell under the same mode as a test mode of the normal memory cell. A test controller provides an enable signal for selecting the redundancy memory cells of a memory array in response to logic levels of the master clock and an address signal applied during the redundancy memory cell test.
摘要翻译：一种测试半导体存储器件中的存储单元的测试控制电路和方法。测试控制电路包括具有多个正常存储器单元的存储单元阵列，以在半导体衬底上存储数据，以及多个冗余存储单元来代替有缺陷的正常存储单元。行和列冗余保险丝盒包括要电熔接的熔丝元件，以实现用于选择冗余存储器单元的行和列的行和列冗余解码器。冗余单元测试信号发生器响应于施加到地址总线中的额外线路的测试信号而产生用于在与正常存储器单元的测试模式相同的模式下测试冗余存储单元的主时钟。测试控制器提供用于响应于主时钟的逻辑电平和在冗余存储器单元测试期间施加的地址信号来选择存储器阵列的冗余存储单元的使能信号。

2. 发明授权

US08729468B2 Microelectronic substrate inspection equipment using helium ion microscopy 有权
标题翻译：微电子基板检测设备采用氦离子显微镜
公开(公告)号：US08729468B2
公开(公告)日：2014-05-20
申请号：US13596644
申请日：2012-08-28
申请人： Min-Kook Kim , Woo-Seok Ko , Yu-Sin Yang , Sang-Kil Lee , Chang-Hoon Choi
发明人： Min-Kook Kim , Woo-Seok Ko , Yu-Sin Yang , Sang-Kil Lee , Chang-Hoon Choi
IPC分类号： H01J37/26
CPC分类号： H01J37/265 , H01J37/08 , H01J2237/002 , H01J2237/006 , H01J2237/0807
摘要： Microelectronic substrate inspection equipment includes a gas container which contains helium gas, a helium ion generator which is disposed in the gas container and converts the helium gas into helium ions and a wafer stage which is disposed under the gas container and on which a substrate to be inspected is placed. The equipment further includes a secondary electron detector which is disposed above the wafer stage and detects electrons generated from the substrate, a compressor which receives first gaseous nitrogen from a continuous nitrogen supply device and compresses the received first gaseous nitrogen into liquid nitrogen, a liquid nitrogen dewar which is connected to the compressor and stores the liquid nitrogen, and a cooling device that is coupled to the helium ion generator. The cooling device is disposed on the gas container, and cools the helium ion generator by vaporizing the liquid nitrogen. Related methods are also disclosed.
摘要翻译：微电子基板检查设备包括含有氦气的气体容器，设置在气体容器中并将氦气转换为氦离子的氦离子发生器和设置在气体容器下方的晶片载台，检查被放置。该设备还包括二次电子检测器，其设置在晶片台上方并检测从基板产生的电子;压缩机，其接收来自连续氮供应装置的第一气态氮并将接收到的第一气态氮压缩成液态氮;液氮连接到压缩机并储存液氮的杜瓦瓶，以及耦合到氦离子发生器的冷却装置。冷却装置设置在气体容器上，并通过蒸发液氮来冷却氦离子发生器。还公开了相关方法。

3. 发明授权

US07923684B2 Methods, systems and computer program products for measuring critical dimensions of fine patterns using scanning electron microscope pictures and secondary electron signal profiles 有权
标题翻译：使用扫描电子显微镜图像和二次电子信号轮廓测量精细图案的关键尺寸的方法，系统和计算机程序产品
公开(公告)号：US07923684B2
公开(公告)日：2011-04-12
申请号：US12274471
申请日：2008-11-20
申请人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
发明人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G06K9/0014 , H01J2237/2814 , H01J2237/2817
摘要： A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
摘要翻译：通过获取检查图案的扫描电子显微镜图像并获取检查图案的扫描电子显微镜二次电子信号轮廓来检查图案。通过将检查图案的扫描电子显微镜照片与样品图案的扫描电子显微镜照片进行比较，并将检查图案的扫描电子显微镜二次电子信号轮廓与样品图案的扫描电子显微镜二次电子信号轮廓。

4. 发明申请

US20100035809A1 STABLE LIQUID COMPOSITIONS FOR TREATING STOMATITIS COMPRISING EPIDERMAL GROWTH FACTOR 有权
标题翻译：稳定液体组合物，用于处理包含生物生长因子的STOMATITI
公开(公告)号：US20100035809A1
公开(公告)日：2010-02-11
申请号：US12444961
申请日：2007-10-09
申请人： Sun-Hee Kim , Sang-Kil Lee , Chae-Ha Yoon , Sun-Mee Yang , Sang-Hyun Nam , Kyeong-Sun Shin , Seung-Kook Park , Sang-Wook Lee
发明人： Sun-Hee Kim , Sang-Kil Lee , Chae-Ha Yoon , Sun-Mee Yang , Sang-Hyun Nam , Kyeong-Sun Shin , Seung-Kook Park , Sang-Wook Lee
IPC分类号： A61K38/18
CPC分类号： A61K9/006 , A61K38/1808 , A61K47/10 , C07K14/485
摘要： Provided is a liquid composition for treating stomatitis, the liquid composition including: an epidermal growth factor; an adhesive polymer; and at least one stabilizer selected from the group consisting of ethylenediaminetetraacetic acid (EDTA) and salts thereof, histidine, lysine and inorganic acid salts thereof, arginin and inorganic acid salts thereof, and dextran. The liquid composition includes a stabilizer selected from EDTA (or salts thereof) and a certain amino acid (or inorganic acid salts thereof) and thus, physicochemical and biological stability of the epidermal growth factor can be substantially increased. Thus, the liquid composition can be stored and distributed for a long period of time. The stabilized composition includes an adhesive polymer, and thus, when ejected in a spray form in the mouth of a user, the liquid composition can be quickly attached to an inflammation site and exhibits effectiveness for a long period of time.
摘要翻译：本发明提供一种用于治疗口腔炎的液体组合物，该液体组合物包括：表皮生长因子; 粘合剂聚合物; 和选自乙二胺四乙酸（EDTA）及其盐，组氨酸，赖氨酸及其无机酸盐，精氨酸及其无机酸盐和右旋糖酐的至少一种稳定剂。液体组合物包括选自EDTA（或其盐）和某些氨基酸（或其无机酸盐）的稳定剂，因此可以显着增加表皮生长因子的物理化学和生物学稳定性。因此，液体组合物可以长期储存和分配。稳定化的组合物包括粘合剂聚合物，因此当以使用者口中喷雾形式喷射时，液体组合物可以快速地附着于炎症部位并且长时间显示出有效性。

5. 发明申请

US20090077696A1 Methods, Systems and Computer Program Products for Measuring Critical Dimensions of Fine Patterns Using Scanning Electron Microscope Pictures and Secondary Electron Signal Profiles 有权
标题翻译：使用扫描电子显微镜图像和二次电子信号轮廓测量精细图案的临界尺寸的方法，系统和计算机程序产品
公开(公告)号：US20090077696A1
公开(公告)日：2009-03-19
申请号：US12274471
申请日：2008-11-20
申请人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
发明人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
IPC分类号： G01N13/10 , G01N23/00 , G06K9/00
CPC分类号： H01J37/28 , G06K9/0014 , H01J2237/2814 , H01J2237/2817
摘要： A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
摘要翻译：通过获取检查图案的扫描电子显微镜图像并获取检查图案的扫描电子显微镜二次电子信号轮廓来检查图案。通过将检查图案的扫描电子显微镜照片与样品图案的扫描电子显微镜照片进行比较，并将检查图案的扫描电子显微镜二次电子信号轮廓与样品图案的扫描电子显微镜二次电子信号轮廓。

6. 发明授权

US07468512B2 Computer program products for measuring critical dimensions of fine patterns using scanning electron microscope pictures and secondary electron signal profiles 有权
标题翻译：使用扫描电子显微镜图像和二次电子信号轮廓测量精细图案的关键尺寸的计算机程序产品
公开(公告)号：US07468512B2
公开(公告)日：2008-12-23
申请号：US11426713
申请日：2006-06-27
申请人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
发明人： Min-Sub Kang , Sang-Kil Lee , Kwang-Sik Kim , Kyung-Ho Jung , Sung-Joong Kim
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , G06K9/0014 , H01J2237/2814 , H01J2237/2817
摘要： A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
摘要翻译：通过获取检查图案的扫描电子显微镜图像并获取检查图案的扫描电子显微镜二次电子信号轮廓来检查图案。通过将检查图案的扫描电子显微镜照片与样品图案的扫描电子显微镜照片进行比较，并将检查图案的扫描电子显微镜二次电子信号轮廓与样品图案的扫描电子显微镜二次电子信号轮廓。

7. 发明授权

US07405817B2 Method and apparatus for classifying defects of an object 有权
标题翻译：用于分类物体缺陷的方法和装置
公开(公告)号：US07405817B2
公开(公告)日：2008-07-29
申请号：US10786137
申请日：2004-02-26
申请人： Pil-Sik Hyun , Sun-Yong Choi , Sang-Kil Lee , Chung-Sam Jun , Sang-Min Kim
发明人： Pil-Sik Hyun , Sun-Yong Choi , Sang-Kil Lee , Chung-Sam Jun , Sang-Min Kim
IPC分类号： G01N21/00 , G01J4/00
CPC分类号： G01N21/956 , G01N21/9501
摘要： A method for classifying defects of an object includes irradiating lights having different polarizations onto the object to create an inspection spot on the object, collecting scattered lights generated by the irradiated lights scattering from the inspection spot, and classifying defects of the object by type of defect by analyzing the scattered lights. An apparatus for classifying defects of an object includes light creating means emitting lights having different polarizations to create an inspection spot on the object, and a detecting member for collecting scattered lights that are created from the lights scattering from the inspection spot, wherein the scattered lights are analyzed and classified in accordance with defects positioned on the inspection spot of the object.
摘要翻译：用于对物体的缺陷进行分类的方法包括将具有不同极化的光照射到物体上以在物体上产生检查点，收集由检查点散射的照射光产生的散射光，并根据缺陷类型对物体的缺陷进行分类通过分析散射光。用于对物体的缺陷进行分类的装置包括发光装置，其发射具有不同偏振度的光以在物体上产生检查点;以及检测部件，用于收集从检查点散射的光产生的散射光，其中散射光根据位于物体检查点的缺陷进行分析和分类。

8. 发明授权

US5818285A Fuse signature circuits for microelectronic devices 失效
标题翻译：用于微电子器件的保险丝签名电路
公开(公告)号：US5818285A
公开(公告)日：1998-10-06
申请号：US668346
申请日：1996-06-26
申请人： Sang-Kil Lee , Young-Sik Seok
发明人： Sang-Kil Lee , Young-Sik Seok
IPC分类号： G11C11/418 , G11C11/413 , G11C17/18 , G11C29/00 , G11C29/04 , H01H85/00 , H01H85/30 , H03K19/007
CPC分类号： G11C17/18 , G01R31/31702
摘要： A fuse signature circuit for a microelectronic device includes a fuse circuit and a sensing circuit. The fuse circuit includes a fuse which can be cut electrically in response to a cut control signal, and the fuse circuit generates a fuse state signal indicating if the fuse has been cut. The sensing circuit generates an output signal responsive to the fuse state signal.
摘要翻译：用于微电子器件的熔丝签名电路包括熔丝电路和感测电路。保险丝电路包括可以根据切断控制信号而被电切割的保险丝，并且保险丝电路产生指示保险丝是否被切断的保险丝状态信号。感测电路响应于熔丝状态信号产生输出信号。

9. 发明授权

US09678020B2 Apparatus and method for inspection of substrate defect 有权
公开(公告)号：US09678020B2
公开(公告)日：2017-06-13
申请号：US14795396
申请日：2015-07-09
申请人： Joon-Seo Song , Woo-seok Ko , Ji-Young Shin , Seong-Jin Yun , Yu-Sin Yang , Sang-Kil Lee , Chung-Sam Jun
发明人： Joon-Seo Song , Woo-seok Ko , Ji-Young Shin , Seong-Jin Yun , Yu-Sin Yang , Sang-Kil Lee , Chung-Sam Jun
IPC分类号： G01N21/95 , G01N21/88 , G01N21/956
CPC分类号： G01N21/9505 , G01N21/8806 , G01N21/9501 , G01N21/95692 , G01N2201/061
摘要： Example embodiments relate to an apparatus and method for inspecting a substrate defect. The substrate defect inspecting apparatus includes a substrate, a light source emitting an infrared beam to the substrate, a detector detecting the infrared beam reflected from the substrate, and a defect analyzer receiving first information and second information from the detector and analyzing defects existing in the substrate. According to at least one example embodiment, the second information is acquired during a later process than the first information.

10. 发明授权

US09455206B2 Overlay measuring method and system, and method of manufacturing semiconductor device using the same 有权
标题翻译：覆盖测量方法和系统，以及使用其制造半导体器件的方法
公开(公告)号：US09455206B2
公开(公告)日：2016-09-27
申请号：US14796478
申请日：2015-07-10
申请人： Seong-Jin Yun , Woo-Seok Ko , Yu-Sin Yang , Sang-Kil Lee , Chung-Sam Jun
发明人： Seong-Jin Yun , Woo-Seok Ko , Yu-Sin Yang , Sang-Kil Lee , Chung-Sam Jun
IPC分类号： H01L21/66 , H01J37/22
CPC分类号： H01L22/20 , H01J37/222 , H01J2237/221 , H01J2237/2617 , H01J2237/2817
摘要： An overlay measuring method includes irradiating an electron beam onto a sample, including a multi-layered structure of overlapped upper and lower patterns formed thereon, to obtain an actual image of the upper and lower patterns. A first image representing the upper pattern and a second image representing the lower pattern are obtained from the actual image. A reference position for the upper and lower patterns is determined from a design image of the upper and lower patterns. A position deviation of the upper pattern with respect to the reference position in the first image and a position deviation of the lower pattern with respect to the reference position in the second image are calculated to determine an overlay between the upper pattern and the lower pattern.
摘要翻译：覆盖测量方法包括将电子束照射到样品上，包括形成在其上的重叠的上下图案的多层结构，以获得上下图案的实际图像。从实际图像中获得代表上部图案的第一图像和表示较低图案的第二图像。根据上下图案的设计图像确定上下图案的参考位置。计算上部图形相对于第一图像中的基准位置的位置偏差和下部图形相对于第二图像中的基准位置的位置偏差，以确定上部图案和下部图案之间的叠加。

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